公开(公告)号：US20150228455A1

公开(公告)日：2015-08-13

申请号：US14607559

申请日：2015-01-28

Applicant: NuFlare Technology, Inc.

Inventor： Tomoo MOTOSUGI ,  Takayuki OHNISHI ,  Kaoru TSURUTA ,  Kenji OHTOSHI

IPC: H01J37/317 ,  H01J37/10 ,  H01J37/20 ,  H01J37/302 ,  H01J37/21

CPC classification number: H01J37/3174 ,  H01J37/10 ,  H01J37/20 ,  H01J37/21 ,  H01J37/3026 ,  H01J2237/006 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/103 ,  H01J2237/2007

Abstract: A charged particle beam writing apparatus includes an emission unit to emit a charged particle beam, a stage to mount thereon a target object to be written, an objective lens to focus the charged particle beam on a surface of the target object, a chamber to house the stage, a measurement unit to measure a partial pressure of a predetermined gas in the chamber in a state where a pressure inside the chamber is controlled to be lower than an atmospheric pressure, and an adjustment unit to adjust a focus position for focusing the charged particle beam on the target object, based on the partial pressure of the predetermined gas.

Abstract translation: 带电粒子束写入装置包括发射带电粒子束的发射单元，其上安装待写入的目标物体的载物台，将带电粒子束聚焦在目标物体的表面上的物镜， 该阶段是在室内的压力被控制为低于大气压力的状态下测量室内的预定气体的分压的测量单元，以及调节单元，用于调整聚焦位置以聚焦带电 基于预定气体的分压，靶物体上的粒子束。

公开(公告)号：US20150123005A1

公开(公告)日：2015-05-07

申请号：US14594852

申请日：2015-01-12

Applicant: Ion Beam Applications S.A.

Inventor： Michel Abs ,  Szymon Zaremba ,  Willem Kleeven

IPC: H01J37/10

CPC classification number: H01J37/10 ,  A61L2/087 ,  A61L2202/122 ,  A61N5/1043 ,  A61N2005/1087 ,  G21K1/08 ,  G21K5/04 ,  G21K5/10 ,  H01J37/147 ,  H01J37/1474 ,  H01J37/3002 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/3045 ,  H01J37/317 ,  H01J2237/103 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/2602 ,  H01J2237/30 ,  H01J2237/31701 ,  H05G2/00

Abstract: The present invention is related to an apparatus for transporting a charged particle beam. The apparatus may include means for scanning the charged particle beam on a target, a dipole magnet arranged upstream of the means for scanning, at least three quadrupole lenses arranged between the dipole magnet and the means for scanning and means for adjusting the field strength of said at least three quadrupole lenses in function of the scanning angle of the charged particle beam. The apparatus can be made at least single achromatic.

Abstract translation: 本发明涉及一种用于运送带电粒子束的装置。 该装置可以包括用于扫描目标上的带电粒子束的装置，布置在扫描装置上游的偶极子磁体，布置在偶极子磁体和扫描装置之间的至少三个四极透镜，以及用于调节所述 至少三个四极透镜，其功能是带电粒子束的扫描角度。 该装置可以制成至少单个消色差。

公开(公告)号：US08946659B2

公开(公告)日：2015-02-03

申请号：US12680158

申请日：2008-09-26

Applicant: Michel Abs ,  Szymon Zaremba ,  Willem Kleeven

Inventor： Michel Abs ,  Szymon Zaremba ,  Willem Kleeven

IPC: G21K1/093 ,  G21K1/08 ,  A61L2/08 ,  A61N5/10 ,  G21K5/04 ,  G21K5/10 ,  H05G2/00 ,  H01J37/30 ,  H01J37/317 ,  H01J37/147 ,  H01J37/10 ,  H01J37/304

CPC classification number: H01J37/10 ,  A61L2/087 ,  A61L2202/122 ,  A61N5/1043 ,  A61N2005/1087 ,  G21K1/08 ,  G21K5/04 ,  G21K5/10 ,  H01J37/147 ,  H01J37/1474 ,  H01J37/3002 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/3045 ,  H01J37/317 ,  H01J2237/103 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/2602 ,  H01J2237/30 ,  H01J2237/31701 ,  H05G2/00

Abstract: An apparatus for transporting a charged particle beam is provided. The apparatus may include: means for scanning the charged particle beam on a target, a dipole magnet arranged upstream of the means for scanning, at least three quadrupole lenses arranged between the dipole magnet and the means for scanning, and means for adjusting the field strength of at least three quadrupole lenses in function of the scanning angle of the charged particle beam. The apparatus can be made at least single achromatic.

Abstract translation: 提供了一种用于运送带电粒子束的装置。 该装置可以包括：用于扫描目标上的带电粒子束的装置，布置在扫描装置上游的偶极子磁体，布置在偶极子磁体和扫描装置之间的至少三个四极透镜，以及用于调整场强的装置 的至少三个四极透镜，其功能是带电粒子束的扫描角度。 该装置可以制成至少单个消色差。

公开(公告)号：US20140367585A1

公开(公告)日：2014-12-18

申请号：US14469898

申请日：2014-08-27

Applicant: JEOL Ltd.

Inventor： Hidetaka Sawada ,  Takeo Sasaki

IPC: H01J37/147 ,  H01J37/153

CPC classification number: H01J37/1471 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/103 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/262

Abstract: A method for axial alignment of a charged particle beam relative to at least three stages of multipole elements and a charged particle beam system capable of making the axial alignment. Some parts of the orbit of the beam or the distributions of three astigmatic fields, or both, are simultaneously translated in a direction perpendicular to the optical axis such that astigmatisms of the same order and same type due to axial deviations between successive ones of the astigmatic fields cancel.

Abstract translation: 一种用于相对于多极元件的至少三级的带电粒子束和能够进行轴向对准的带电粒子束系统的轴向对准的方法。 光束轨道的一些部分或三个散光场或两者的分布在垂直于光轴的方向上同时平移，使得由于像散的连续散射之间的轴向偏差而具有相同阶数和相同类型的像散 字段取消。

公开(公告)号：US08907298B1

公开(公告)日：2014-12-09

申请号：US14469898

申请日：2014-08-27

Applicant: JEOL Ltd.

Inventor： Hidetaka Sawada ,  Takeo Sasaki

IPC: H01J37/00

CPC classification number: H01J37/1471 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/103 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/262

Abstract: A method for axial alignment of a charged particle beam relative to at least three stages of multipole elements and a charged particle beam system capable of making the axial alignment. Some parts of the orbit of the beam or the distributions of three astigmatic fields, or both, are simultaneously translated in a direction perpendicular to the optical axis such that astigmatisms of the same order and same type due to axial deviations between successive ones of the astigmatic fields cancel.

公开(公告)号：US08421028B2

公开(公告)日：2013-04-16

申请号：US12733931

申请日：2008-09-26

Applicant: Dirk Preikszas

Inventor： Dirk Preikszas

IPC: H01J37/30

CPC classification number: H01J37/3007 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/02 ,  H01J37/045 ,  H01J37/14 ,  H01J37/147 ,  H01J37/3174 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/26

Abstract: A device for deflecting a particle beam out of a beam axis, or for guiding a particle beam into the beam axis, has a simple design, requires little space, and additionally ensures that no area of an object that is not to be struck is struck by a particle beam. The device may include components in the following sequence along the beam axis: first deflection element, a magnetic apparatus for providing a magnetic field axially to the beam axis, and a second deflection element. A particle beam apparatus may have a device of this type.

Abstract translation: 用于将粒子束偏离射束轴线或用于将粒子束引导到射束轴线中的装置具有简单的设计，需要很小的空间，并且另外确保不会撞击不被撞击的物体的区域 通过粒子束。 装置可以沿着光束轴线包括以下顺序的部件：第一偏转元件，用于向光束轴线轴向提供磁场的磁性装置和第二偏转元件。 粒子束装置可以具有这种类型的装置。

公开(公告)号：US20110210263A1

公开(公告)日：2011-09-01

申请号：US12680158

申请日：2008-09-26

Applicant: Michel Abs ,  Szymon Zaremba ,  Willem Kleeven

Inventor： Michel Abs ,  Szymon Zaremba ,  Willem Kleeven

IPC: G21K1/093

CPC classification number: H01J37/10 ,  A61L2/087 ,  A61L2202/122 ,  A61N5/1043 ,  A61N2005/1087 ,  G21K1/08 ,  G21K5/04 ,  G21K5/10 ,  H01J37/147 ,  H01J37/1474 ,  H01J37/3002 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/3045 ,  H01J37/317 ,  H01J2237/103 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/2602 ,  H01J2237/30 ,  H01J2237/31701 ,  H05G2/00

Abstract: An apparatus for transporting a charged particle beam is provided. The apparatus may include: means for scanning the charged particle beam on a target, a dipole magnet arranged upstream of the means for scanning, at least three quadrupole lenses arranged between the dipole magnet and the means for scanning, and means for adjusting the field strength of at least three quadrupole lenses in function of the scanning angle of the charged particle beam. The apparatus can be made at least single achromatic.

Abstract translation: 提供了一种用于运送带电粒子束的装置。 该装置可以包括：用于扫描目标上的带电粒子束的装置，布置在扫描装置上游的偶极子磁体，布置在偶极子磁体和扫描装置之间的至少三个四极透镜，以及用于调整场强的装置 的至少三个四极透镜，其功能是带电粒子束的扫描角度。 该装置可以制成至少单个消色差。

公开(公告)号：US20090321630A1

公开(公告)日：2009-12-31

申请号：US12477631

申请日：2009-06-03

Applicant: Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

Inventor： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

IPC: B01D59/44 ,  A61N5/00 ,  H01J37/08

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1501 ,  H01J2237/1523 ,  H01J2237/153 ,  H01J2237/21 ,  H01J2237/24528 ,  H01J2237/31705

Abstract: A system and method for magnetically filtering an ion beam during an ion implantation into a workpiece is provided, wherein ions are emitted from an ion source and accelerated the ions away from the ion source to form an ion beam. The ion beam is mass analyzed by a mass analyzer, wherein ions are selected. The ion beam is then decelerated via a decelerator once the ion beam is mass-analyzed, and the ion beam is further magnetically filtered the ion beam downstream of the deceleration. The magnetic filtering is provided by a quadrapole magnetic energy filter, wherein a magnetic field is formed for intercepting the ions in the ion beam exiting the decelerator to selectively filter undesirable ions and fast neutrals.

Abstract translation: 提供了一种用于在离子注入工件期间对离子束进行磁过滤的系统和方法，其中离子从离子源发射并且将离子加速离开离子源以形成离子束。 离子束通过质量分析器进行质量分析，其中选择离子。 一旦离子束被质量分析，离子束然后通过减速器减速，并且离子束进一步对减速度下游的离子束进行磁过滤。 磁滤波由四极磁能滤波器提供，其中形成磁场以截取离开减速器的离子束中的离子，以选择性地过滤不需要的离子和快速中性粒子。

公开(公告)号：US11942303B2

公开(公告)日：2024-03-26

申请号：US17359365

申请日：2019-12-06

Applicant: ASML Netherlands B.V.

Inventor： Yan Ren ,  Albertus Victor Gerardus Mangnus

IPC: H01J37/147 ,  G01N23/2251 ,  H01J37/09 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/1478 ,  G01N23/2251 ,  H01J37/09 ,  H01J37/145 ,  H01J37/1474 ,  H01J37/20 ,  H01J37/28 ,  G01N2223/07 ,  G01N2223/418 ,  G01N2223/507 ,  H01J2237/0455 ,  H01J2237/04926 ,  H01J2237/103 ,  H01J2237/151 ,  H01J2237/226 ,  H01J2237/2611

Abstract: Embodiments consistent with the disclosure herein include methods and a multi-beam apparatus configured to emit charged-particle beams for imaging a top and side of a structure of a sample, including: a deflector array including a first deflector and configured to receive a first charged-particle beam and a second charged-particle beam; a blocking plate configured to block one of the first charged-particle beam and the second charged-particle beam; and a controller having circuitry and configured to change the configuration of the apparatus to transition between a first mode and a second mode. In the first mode, the deflector array directs the second charged-particle beam to the top of the structure, and the blocking plate blocks the first charged-particle beam. And in the second mode, the first deflector deflects the first charged-particle beam to the side of the structure, and the blocking plate blocks the second charged-particle beam.

公开(公告)号：US10037866B2

公开(公告)日：2018-07-31

申请号：US15217460

申请日：2016-07-22

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Momoyo Enyama ,  Muneyuki Fukuda ,  Hideyuki Kazumi ,  Koichi Hamada ,  Sayaka Tanimoto

IPC: H01J37/26 ,  H01J37/22

CPC classification number: H01J37/265 ,  H01J37/153 ,  H01J37/21 ,  H01J37/222 ,  H01J37/226 ,  H01J2237/049 ,  H01J2237/103 ,  H01J2237/1534 ,  H01J2237/223 ,  H01J2237/24542 ,  H01J2237/24592 ,  H01J2237/2801

Abstract: A charged particle beam apparatus with improved depth of focus and maintained/improved resolution has a charged particle source, an off-axis illumination aperture, a lens, a computer, and a memory unit. The apparatus acquires an image by detecting a signal generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture. The computer has a beam-computing-process unit to estimate a beam profile of the charged particle beam and an image-sharpening-process unit to sharpen the image using the estimated beam profile.