Abstract:
An aberration corrector for an electron microscope includes a geometric aberration corrector provided with a transfer lens system, wherein the transfer lens system includes an optical system for chromatic aberration correction, the optical system for chromatic aberration correction has a first portion, a second portion, and a third portion disposed along an optical axis, and each of the first portion, the second portion, and the third portion has a thickness in a direction along the optical axis and generates an electromagnetic field having two-fold symmetry in which an electric field having two-fold symmetry and a magnetic field having two-fold symmetry are superimposed.
Abstract:
There is provided a liner tube capable of reducing the effects of magnetic field variations on an electron beam. The liner tube (10) is disposed inside the electron optical column (2) of an electron microscope (100). The interior of the tube (10) forms a path for the electron beam (EB). The liner tube (10) has a first cylindrical member (110) that is made of copper, gold, silver, or an alloy consisting principally of one of these metals.
Abstract:
An electron microscope is provided which can measure, with high sensitivity and high positional resolution, an amount of deflection of an electron beam occurring when it is transmitted through a sample. The electron microscope (100) is adapted to measure the amount of deflection of the electron beam (EB) when it is transmitted through the sample (S), and has an electron beam source (10) producing the electron beam (EB), an illumination lens system for focusing the electron beam (EB) onto the sample (S), an aperture (30) having an electron beam blocking portion (32) for providing a shield between a central portion (EB1) and an outer peripheral portion (EB2) of the cross section of the beam (EB) impinging on the sample (S), and a segmented detector (20) having a detection surface (22) for detecting the electron beam (EB) transmitted through the sample (S). The detection surface (22) is divided into a plurality of detector segments (D1-D4).
Abstract:
A distortion measurement method for an electron microscope image includes: loading a distortion measurement specimen having structures arranged in a lattice to a specimen plane of an electron microscope or a plane conjugate to the specimen plane in order to obtain an electron microscope image of the distortion measurement specimen; and measuring a distortion from the obtained electron microscope image of the distortion measurement specimen.
Abstract:
A multipole lens (100) which can produce static magnetic fields showing different strengths in the direction of travel of an electron beam has lens subasssemblies (10a, 10b, 10c) stacked on top of each other. The lens subassemblies (10a, 10b, 10c) have yokes (14a, 14b, 14c), respectively, and polar elements (12a, 12b, 12c), respectively. The polar elements (12a, 12b, 12c) have base portions (13a, 13b, 13c), respectively, magnetically coupled to the yokes (14a, 14b, 14c), respectively, and front end portions (11a, 11b, 11c), respectively, magnetically coupled to the base portions (13a, 13b, 13c), respectively. Magnetic field separators (20, 22) made of a nonmagnetic material are mounted between the front end portions (11a, 11b, 11c) which are successively adjacent to each other in the direction of stacking of the lens subassemblies (10a, 10b, 10c).
Abstract:
An aberration corrector for an electron microscope includes a geometric aberration corrector provided with a transfer lens system, wherein the transfer lens system includes an optical system for chromatic aberration correction, the optical system for chromatic aberration correction has a first portion, a second portion, and a third portion disposed along an optical axis, and each of the first portion, the second portion, and the third portion has a thickness in a direction along the optical axis and generates an electromagnetic field having two-fold symmetry in which an electric field having two-fold symmetry and a magnetic field having two-fold symmetry are superimposed.
Abstract:
There is provided a liner tube capable of reducing the effects of magnetic field variations on an electron beam. The liner tube (10) is disposed inside the electron optical column (2) of an electron microscope (100). The interior of the tube (10) forms a path for the electron beam (EB). The liner tube (10) has a first cylindrical member (110) that is made of copper, gold, silver, or an alloy consisting principally of one of these metals.
Abstract:
A multipole lens (100) which can produce static magnetic fields showing different strengths in the direction of travel of an electron beam has lens subasssemblies (10a, 10b, 10c) stacked on top of each other. The lens subassemblies (10a, 10b, 10c) have yokes (14a, 14b, 14c), respectively, and polar elements (12a, 12b, 12c), respectively. The polar elements (12a, 12b, 12c) have base portions (13a, 13b, 13c), respectively, magnetically coupled to the yokes (14a, 14b, 14c), respectively, and front end portions (11a, 11b, 11c), respectively, magnetically coupled to the base portions (13a, 13b, 13c), respectively. Magnetic field separators (20, 22) made of a nonmagnetic material are mounted between the front end portions (11a, 11b, 11c) which are successively adjacent to each other in the direction of stacking of the lens subassemblies (10a, 10b, 10c).
Abstract:
A spherical aberration corrector is offered which permits a correction of deviation of the circularity of at least one of an image and a diffraction pattern and a correction of on-axis aberrations to be carried out independently. The spherical aberration corrector (100) is for use with a charged particle beam instrument (1) for obtaining the image and the diffraction pattern and has a hexapole field generating portion (110) for producing plural stages of hexapole fields, an octopole field superimposing portion (120) for superimposing an octopole on at least one of the plural stages of hexapole fields to correct deviation of the circularity of at least one of the image and diffraction pattern, and a deflection portion (130) for deflecting a charged particle beam.
Abstract:
The chromatic aberration corrector (100) has a first multipole element (110) for producing a first electromagnetic field and a second multipole element (120) for producing a second electromagnetic field. The first multipole element (110) first, second, and third portions (110a, 110b, 110c) arranged along an optical axis (OA) having a thickness and producing a quadrupole field in which an electric quadrupole field and a magnetic quadrupole field are superimposed. In the first and third portions (110a, 110c), the electric quadrupole field is set stronger than the magnetic quadrupole field. In the second portion (110b), the magnetic quadrupole field is set stronger than the electric quadrupole field. The second portion (110b) produces a two-fold astigmatism component that is opposite in sign to two-fold astigmatism components produced by the first portion (110a) and third portion (110c).