公开(公告)号：US09275817B2

公开(公告)日：2016-03-01

申请号：US13849496

申请日：2013-03-23

Applicant: Frederick Wight Martin

Inventor： Frederick Wight Martin

IPC: H01J37/145 ,  H01J3/22 ,  H01J37/141 ,  H01J37/153 ,  H01J3/12

CPC classification number: H01J3/22 ,  H01J3/12 ,  H01J37/141 ,  H01J37/145 ,  H01J37/153 ,  H01J2237/04926 ,  H01J2237/1534 ,  H01J2237/31749

Abstract: An objective lens for use in probe-forming particle-optical columns such as focused ion beam equipment, scanning electron microscopes, and helium microscopes is described. It comprises two interleaved (quadrupole/octopole) lenses and two or three ancillary octopole lenses, and is capable of simultaneous compensation of spherical (Cs) and chromatic (Cc) aberrations of the objective lens alone or of the complete particle-optical column. Additional apparatus comprising a gridded aperture and position-sensitive detector is specified, together with a method to measure and minimize all of the five independent third-order aberration coefficients of the objective lens.

Abstract translation: 描述了用于探针形成颗粒光学柱的物镜，例如聚焦离子束设备，扫描电子显微镜和氦显微镜。 它包括两个交错（四极/八极）透镜和两个或三个辅助八极透镜，并且能够同时补偿单独的物镜或完整的粒子 - 光学柱的球面（Cs）和彩色（Cc）像差。 规定包括网格孔径和位置敏感检测器的附加装置，以及用于测量和最小化物镜的所有五个独立三阶像差系数的方法。

公开(公告)号：US09224577B2

公开(公告)日：2015-12-29

申请号：US13587598

申请日：2012-08-16

Applicant: Patrick Schiavone ,  Thiago Figueiro

Inventor： Patrick Schiavone ,  Thiago Figueiro

IPC: H01J37/31 ,  H01J37/317 ,  H01J3/12 ,  G03F7/20 ,  H01J37/22 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/2061 ,  H01J3/12 ,  H01J37/222 ,  H01J2229/563 ,  H01J2237/226 ,  H01J2237/31769

Abstract: A method for projecting an electron beam, used notably in direct or indirect writing lithography and in electronic microscopy. Proximity effects created by the forward and backward scattering of the electrons of the beam in interaction with the target must be corrected. For this, the convolution of a point spread function with the geometry of the target is conventionally used. At least one of the components of the point spread function has its maximum value not located on the center of the beam. Preferably, the maximum value is instead located on the backward scattering peak. Advantageously, the point spread function uses gamma distribution laws.

Abstract translation: 一种用于投射电子束的方法，特别用于直接或间接写入光刻和电子显微镜。 必须校正通过与靶相互作用的光束的电子的向前和向后散射产生的接近效应。 为此，通常使用点扩散函数与目标几何的卷积。 点扩散函数的至少一个分量的最大值不在波束的中心。 优选地，最大值代替地位于后向散射峰上。 有利地，点扩散函数使用伽马分布规律。

公开(公告)号：US08035086B2

公开(公告)日：2011-10-11

申请号：US12379442

申请日：2009-02-23

Applicant: Yoichi Hirayama ,  Takaho Yoshida

Inventor： Yoichi Hirayama ,  Takaho Yoshida

IPC: H01J3/24

CPC classification number: H01J3/12 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/1534 ,  H01J2237/28

Abstract: To provide an aberration correction configuration that can realize both an aberration correction function for a long focus and an aberration correction function for a short focus. While having a conventional aberration correction apparatus configuration that has two rotationally symmetric lenses arranged between two multipole lenses, three rotationally symmetric lenses are disposed between an objective lens and a multipole lens instead of the conventional arrangement in which two rotationally symmetric lenses are disposed therebetween. When using the objective lens with a long focal length, aberrations are corrected using two rotationally symmetric lenses among three rotationally symmetric lenses disposed between the objective lens and the multipole lens. When using the objective lens with a short focal length, e.g. for high resolution observation, aberrations are corrected using two rotationally symmetric lenses of a different combination to those used for a long focus, among the three rotationally symmetric lenses disposed between the objective lens and the multipole lens. (See FIG. 3)

Abstract translation: 提供能够实现长焦点的像差校正功能和短焦点的像差校正功能的像差校正配置。 在具有布置在两个多极透镜之间的两个旋转对称透镜的常规像差校正装置配置的同时，三个旋转对称透镜设置在物镜和多极透镜之间，而不是其中设置两个旋转对称透镜的常规布置。 当使用具有长焦距的物镜时，使用设置在物镜和多极镜头之间的三个旋转对称透镜之中的两个旋转对称透镜校正像差。 当使用具有短焦距的物镜时，例如， 对于高分辨率观察，在物镜和多极透镜之间设置的三个旋转对称透镜中，使用与用于长焦距的不同组合的两个旋转对称透镜来校正像差。 （参照图3）

公开(公告)号：US06236713B1

公开(公告)日：2001-05-22

申请号：US09179805

申请日：1998-10-27

Applicant: Richard B. True ,  James C. Taylor ,  Christopher P. Ferrari ,  Curtis G. Allen ,  Thomas M. Bemis

Inventor： Richard B. True ,  James C. Taylor ,  Christopher P. Ferrari ,  Curtis G. Allen ,  Thomas M. Bemis

IPC: H01J3514

CPC classification number: H01J35/06 ,  H01J3/12 ,  H01J35/14

Abstract: A variable spot size x-ray tube comprises a cathode having an electron emitting surface providing an electron beam that travels essentially along the tube axis of symmetry to an anode. The anode, spaced from the cathode, includes a target, the front surface of which is disposed at an oblique angle with respect to the axis of symmetry. The potential of the anode is generally positive with respect to that of the cathode. The cathode is heated to a temperature at which electrons are emitted by the thermionic emission process. Current from the cathode can be controlled by varying the cathode temperature if the cathode is operated in the temperature limited region. The incident electron beam forms a spot on the target surface whereupon x-rays are produced in response to impingement of the electron beam on the target. The x-rays propagate outwardly from the target spot through a vacuum window to form a beam of x-radiation outside the x-ray tube. An aperture grid is disposed between the cathode and the anode, and has a central aperture permitting the electron beam to pass therethrough. The aperture grid further has a variable voltage applied to it which may be positive, negative, or equal to the potential of the cathode. The voltage on the control grid is used to control the diameter of the electron beam which impinges upon the target. Specifically, the electron beam diameter varies in correspondence with the variable aperture grid voltage, and selective variation of the electron beam diameter results in a corresponding variation in size of the x-ray imaging spot.

Abstract translation: 可变点尺寸x射线管包括具有电子发射表面的阴极，该电子发射表面提供基本上沿着管对称轴线向阳极行进的电子束。 与阴极间隔开的阳极包括靶，其前表面相对于对称轴线倾斜设置。 阳极的电位通常相对于阴极的电位为正。 将阴极加热到通过热离子发射过程发射电子的温度。 如果阴极在温度限制区域中运行，则可以通过改变阴极温度来控制来自阴极的电流。 入射的电子束在目标表面上形成一个点，因此响应于电子束撞击靶而产生X射线。 x射线从靶点向外传播通过真空窗口，以在x射线管外部形成x辐射束。 孔栅格设置在阴极和阳极之间，并且具有允许电子束通过的中心孔。 孔径栅格还具有施加到其上的可变电压，其可以是正的，负的或等于阴极的电位。 控制网格上的电压用于控制撞击目标的电子束的直径。 具体地，电子束直径与可变孔径栅极电压相对应地变化，并且电子束直径的选择性变化导致x射线成像光斑的尺寸的相应变化。

公开(公告)号：US5637953A

公开(公告)日：1997-06-10

申请号：US589265

申请日：1996-01-22

Applicant: George Wakalopulos

Inventor： George Wakalopulos

IPC: H01J3/12 ,  H01J33/02 ,  H01J29/70 ,  H01J29/58

CPC classification number: H01J3/12 ,  H01J33/02

Abstract: An electron beam device has a cathode that generates a fan-shaped electron beam. A first focusing lens includes first and second plates on opposed sides of a filament. The edges of the plates closest to a positively charged anode are arcuate, so that as individual electrons are accelerated normal to the edge of the charged plates, the beam increases in length with departure from the filament. A second focusing lens includes third and fourth plates on opposed sides of the first focusing lens. Each of the third and fourth plates has an arcuate edge proximate to the positively charged anode. The plates of the first and second focusing lenses provide focusing in a widthwise direction, while defining the increase in the lengthwise direction. Preferably, the filament is also curved. In the preferred embodiment, the curvature of the plates of the first focusing lens defines a common radius with the plates of the second focusing lens. The electron beam may be projected from the interior of an evacuated tube and may have a length that is not limited by the length of the filament.

Abstract translation: 电子束装置具有产生扇形电子束的阴极。 第一聚焦透镜包括在灯丝的相对侧上的第一和第二板。 最靠近正电荷的阳极的板的边缘是弧形的，使得随着各个电子垂直于带电板的边缘加速，光束随着灯丝的长度而增加。 第二聚焦透镜在第一聚焦透镜的相对侧上包括第三和第四平板。 第三和第四板中的每一个具有靠近带正电的阳极的弧形边缘。 第一和第二聚焦透镜的板在宽度方向上提供聚焦，同时限定长度方向上的增加。 优选地，细丝也是弯曲的。 在优选实施例中，第一聚焦透镜的板的曲率与第二聚焦透镜的平板形成共同的半径。 电子束可以从真空管的内部突出并且可以具有不受长丝长度限制的长度。

公开(公告)号：US20170154750A1

公开(公告)日：2017-06-01

申请号：US14785730

申请日：2015-01-09

Applicant: TECHNOLOGY RESEARCH ASSOCIATION FOR FUTURE ADDITIVE MANUFACTURING

Inventor： Takashi SATO

IPC: H01J37/065

CPC classification number: H01J37/065 ,  B22F3/1055 ,  B22F2003/1056 ,  B22F2003/1057 ,  B22F2999/00 ,  B33Y30/00 ,  H01J3/08 ,  H01J3/12 ,  H01J37/06 ,  H01J37/304 ,  H01J2237/06308 ,  H01J2237/0653 ,  Y02P10/295 ,  B22F2203/03 ,  B22F2202/06 ,  B22F2202/11

Abstract: When an emission current is changed, a decrease in brightness of an electron beam is prevented. An electron gun includes a cathode that emits thermoelectrons, a Wehnelt electrode that focuses the thermoelectrons, a control electrode that extracts the thermoelectrons from a distal end of said cathode, an anode that accelerates the thermoelectrons and irradiates a powder with the thermoelectrons as an electron beam, and an optimum condition collection controller that changes at least one of a bias voltage to be applied to the Wehnelt electrode and a control electrode voltage to be applied to the control electrode, and decides a combination of the bias voltage and the control electrode voltage at which the brightness of the electron beam reaches a peak.

公开(公告)号：US09256068B2

公开(公告)日：2016-02-09

申请号：US14338542

申请日：2014-07-23

Applicant: JEOL Ltd.

Inventor： Hidetaka Sawada ,  Yu Jimbo

IPC: G02B27/14 ,  H01J3/14 ,  H01J3/26 ,  G02B27/00 ,  H01J3/12 ,  H01J37/05 ,  H01J37/147 ,  H01J37/153 ,  H01J37/28 ,  G21K1/08 ,  G01N23/20 ,  G02B27/42 ,  H01J3/04

CPC classification number: G02B27/0037 ,  G01N23/20 ,  G02B27/42 ,  G02B27/4205 ,  G21K1/08 ,  H01J3/04 ,  H01J3/12 ,  H01J3/26 ,  H01J37/05 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/1534

Abstract: A spherical aberration corrector is offered which permits a correction of deviation of the circularity of at least one of an image and a diffraction pattern and a correction of on-axis aberrations to be carried out independently. The spherical aberration corrector (100) is for use with a charged particle beam instrument (1) for obtaining the image and the diffraction pattern and has a hexapole field generating portion (110) for producing plural stages of hexapole fields, an octopole field superimposing portion (120) for superimposing an octopole on at least one of the plural stages of hexapole fields to correct deviation of the circularity of at least one of the image and diffraction pattern, and a deflection portion (130) for deflecting a charged particle beam.

Abstract translation: 提供了一种球面像差校正器，其允许校正图像和衍射图案中的至少一个的圆度的偏差和单独进行的轴上像差校正。 球面像差校正器（100）用于带电粒子束仪器（1），用于获得图像和衍射图案，并具有用于产生多级六极场的六极场产生部分（110），八极场叠加部分 （120），用于将至少一个六极场中的至少一个叠加八极杆，以校正图像和衍射图案中的至少一个的圆度的偏差，以及用于偏转带电粒子束的偏转部分（130）。

公开(公告)号：US08835848B2

公开(公告)日：2014-09-16

申请号：US14180350

申请日：2014-02-13

Applicant: Industry-University Cooperation Foundation Sunmoon University

Inventor： Tae Sik Oh ,  Ho Seob Kim ,  Dae Wook Kim ,  Seung-Joon Ahn

IPC: H01J29/46 ,  H01J3/36 ,  H01J3/14 ,  H01J3/26

CPC classification number: H01J3/26 ,  H01J3/021 ,  H01J3/12 ,  H01J3/14 ,  H01J3/18 ,  H01J3/30 ,  H01J37/04 ,  H01J2237/1205

Abstract: An ultra-miniaturized electron optical microcolumn is provided. The electron optical microcolumn includes an electron-emitting source emitting electrons using a field emission principle, an extraction electrode causing the emission of electrons from the electron-emitting source, a focusing electrode to which voltage is flexibly applied in response to a working distance to a target for regulating a focusing force of electron beams emitted from the electron-emitting source, an acceleration electrode accelerating electrons emitted by the extraction electrode, a limit electrode regulating an amount and a size of electron beams using electrons accelerated by the acceleration electrode, and a deflector deflecting electron beams towards the target.

Abstract translation: 提供超小型电子光学微柱。 电子光学微柱包括使用场致发射原理发射电子的电子发射源，引起来自电子发射源的电子的引出电极，响应于工作距离而被柔性施加电压的聚焦电极 用于调节从电子发射源发射的电子束的聚焦力的目标，加速由引出电极发射的电子的加速电极，限制电极使用由加速电极加速的电子来调节电子束的量和尺寸，以及 偏转器偏转电子束朝向目标。

公开(公告)号：US4795912A

公开(公告)日：1989-01-03

申请号：US15193

申请日：1987-02-17

Applicant: Alfred W. Maschke

Inventor： Alfred W. Maschke

IPC: G21K1/08 ,  H01J3/12 ,  H01J3/14

CPC classification number: H01J3/12 ,  G21K1/08

Abstract: A technique for compensating for chromatic aberration in particle beams, caused by differing particle energy levels when a beam is deflected for beam steering or beam focusing. A compensating deflection is applied to the beam upstream of its intended point of deflection. When the particles reach the point of deflection, the effect of the compensating deflection is proportional to the energy level of each particle, and compensates for the aberration that would normally occur. The point at which the compensating deflection is applied is selected to be one-fourth of a cycle in longitudinal phase space and an integral number of half-cycles in transverse phase space. With this critical spacing, the compensating deflection at the point of its application is proportional to relative phase in longitudinal phase space, but is proportional to energy level at the intended point of deflection.

Abstract translation: 一种用于补偿粒子束中的色差的技术，当束被偏转以用于光束转向或光束聚焦时，由不同的粒子能级引起。 在其预期的偏转点上游向梁施加补偿偏转。 当颗粒到达偏转点时，补偿偏转的影响与每个颗粒的能级成比例，并补偿通常发生的像差。 施加补偿偏转的点被选择为纵向相位空间中的周期的四分之一和横向相位空间中的半周期的整数。 利用这个临界间距，其应用点处的补偿偏转与纵向相位空间中的相对相位成比例，但与预期的偏转点处的能级成比例。

公开(公告)号：US4763003A

公开(公告)日：1988-08-09

申请号：US15208

申请日：1987-02-17

Applicant: Alfred W. Maschke

Inventor： Alfred W. Maschke

IPC: G21K1/087 ,  H01J3/12

CPC classification number: G21K1/087 ,  H01J3/12

Abstract: A technique for correcting spherical and other aberrations in a particle beam. Spherical aberration is caused by variations in beam behavior dependent on the cube of the radius or radial position with respect to the beam axis. To correct for such aberration, the beam is passed through multiple compensation electric field arrays, each of which has multiple rows of parallel wires stretched transversely across the beam path, the rows being biased with separate voltages to provide an electric field that varies in proportion to the cube of the distance from the central row of the array. The multiple arrays provide a cylindrically symmetrical electric field, and are oriented at a uniform angular spacing, which, for spherical aberration, is 120 degrees.

Abstract translation: 用于校正粒子束中的球面和其他像差的技术。 球面像差由取决于相对于光束轴的半径或径向位置的立方体的光束行为的变化引起。 为了校正这种像差，光束通过多个补偿电场阵列，每个阵列具有跨行束路径横向延伸的多排平行线，这些行被单独的电压偏置以提供与...成比例地变化的电场 距阵列中心行距离的立方体。 多个阵列提供圆柱对称的电场，并且以均匀的角度间隔定向，其用于球面像差为120度。