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    Electron Microscope and Specimen Contamination Prevention Method
    2.
    发明申请
    Electron Microscope and Specimen Contamination Prevention Method 有权

    公开(公告)号：US20220328280A1

    公开(公告)日：2022-10-13

    申请号：US17718976

    申请日：2022-04-12

    Applicant: JEOL Ltd.

    Inventor： Takeshi Kaneko ,  Norihiro Okoshi ,  Yu Jimbo ,  Sang Tae Park

    IPC: H01J37/22 ,  H01J37/28 ,  H01J37/244

    Abstract: A contamination prevention irradiation device includes a generation unit and a mirror unit. The generation unit generates a laser beam. The mirror unit has a mirror surface for reflecting a laser beam. The laser beam reflected on the mirror surface is applied to a specimen disposed inside an objective lens. The laser beam is composed of a pulse train. Once a laser beam is applied to the specimen before observation of the specimen, deposition of contaminants on the specimen can be prevented for a predetermined subsequent period.

    Charged particle beam device
    3.
    发明授权
    Charged particle beam device 有权

    公开(公告)号：US11676796B2

    公开(公告)日：2023-06-13

    申请号：US17472816

    申请日：2021-09-13

    Applicant: JEOL Ltd.

    Inventor： Kazuki Yagi ,  Yu Jimbo ,  Bryan W. Reed ,  Ruth Shewmon Bloom

    IPC: H01J37/28 ,  H01J37/04 ,  H01J37/147 ,  H01J37/244

    CPC classification number: H01J37/28 ,  H01J37/045 ,  H01J37/1477 ,  H01J37/244 ,  H01J2237/24415

    Abstract: A charged particle beam device including: a charged particle beam source which emits a charged particle beam; a blanking device which has an electrostatic deflector that deflects and blocks the charged particle beam; an irradiation optical system which irradiates a specimen with the charged particle beam; and a control unit which controls the electrostatic deflector, the control unit performing processing of: acquiring a target value of a dose of the charged particle beam for the specimen; setting a ratio A/B of a time A during which the charged particle beam is not blocked to a unit time B (where A≠B, A≠0), based on the target value; and operating the electrostatic deflector based on the ratio.

    Charged Particle Beam Device
    5.
    发明申请
    Charged Particle Beam Device 有权

    公开(公告)号：US20220084783A1

    公开(公告)日：2022-03-17

    申请号：US17472816

    申请日：2021-09-13

    Applicant: JEOL Ltd.

    Inventor： Kazuki Yagi ,  Yu Jimbo ,  Bryan W. Reed ,  Ruth Shewmon Bloom

    IPC: H01J37/28 ,  H01J37/04 ,  H01J37/147 ,  H01J37/244

    Abstract: A charged particle beam device including: a charged particle beam source which emits a charged particle beam; a blanking device which has an electrostatic deflector that deflects and blocks the charged particle beam; an irradiation optical system which irradiates a specimen with the charged particle beam; and a control unit which controls the electrostatic deflector, the control unit performing processing of: acquiring a target value of a dose of the charged particle beam for the specimen; setting a ratio A/B of a time A during which the charged particle beam is not blocked to a unit time B (where A≠B, A≠0), based on the target value; and operating the electrostatic deflector based on the ratio.

    Spherical Aberration Corrector, Method of Spherical Aberration Correction, and Charged Particle Beam Instrument
    9.
    发明申请
    Spherical Aberration Corrector, Method of Spherical Aberration Correction, and Charged Particle Beam Instrument 有权
    球面畸变校正器，球面畸变校正方法和带电粒子束仪器

    公开(公告)号：US20150029593A1

    公开(公告)日：2015-01-29

    申请号：US14338542

    申请日：2014-07-23

    Applicant: JEOL Ltd.

    Inventor： Hidetaka Sawada ,  Yu Jimbo

    IPC: G02B27/00

    CPC classification number: G02B27/0037 ,  G01N23/20 ,  G02B27/42 ,  G02B27/4205 ,  G21K1/08 ,  H01J3/04 ,  H01J3/12 ,  H01J3/26 ,  H01J37/05 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/1534

    Abstract: A spherical aberration corrector is offered which permits a correction of deviation of the circularity of at least one of an image and a diffraction pattern and a correction of on-axis aberrations to be carried out independently. The spherical aberration corrector (100) is for use with a charged particle beam instrument (1) for obtaining the image and the diffraction pattern and has a hexapole field generating portion (110) for producing plural stages of hexapole fields, an octopole field superimposing portion (120) for superimposing an octopole on at least one of the plural stages of hexapole fields to correct deviation of the circularity of at least one of the image and diffraction pattern, and a deflection portion (130) for deflecting a charged particle beam.

    Abstract translation: 提供了一种球面像差校正器，其允许校正图像和衍射图案中的至少一个的圆度的偏差和单独进行的轴上像差校正。 球面像差校正器（100）用于带电粒子束仪器（1），用于获得图像和衍射图案，并具有用于产生多级六极场的六极场产生部分（110），八极场叠加部分 （120），用于将至少一个六极场中的至少一个叠加八极杆，以校正图像和衍射图案中的至少一个的圆度的偏差，以及用于偏转带电粒子束的偏转部分（130）。

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