公开(公告)号：US10217599B2

公开(公告)日：2019-02-26

申请号：US14785730

申请日：2015-01-09

申请人： TECHNOLOGY RESEARCH ASSOCIATION FOR FUTURE ADDITIVE MANUFACTURING

发明人： Takashi Sato

IPC分类号： H01J37/065 ,  H01J37/06 ,  H01J37/304 ,  B22F3/105 ,  H01J3/08 ,  H01J3/12 ,  B33Y30/00

摘要： When an emission current is changed, a decrease in brightness of an electron beam is prevented. An electron gun includes a cathode that emits thermoelectrons, a Wehnelt electrode that focuses the thermoelectrons, a control electrode that extracts the thermoelectrons from a distal end of said cathode, an anode that accelerates the thermoelectrons and irradiates a powder with the thermoelectrons as an electron beam, and an optimum condition collection controller that changes at least one of a bias voltage to be applied to the Wehnelt electrode and a control electrode voltage to be applied to the control electrode, and decides a combination of the bias voltage and the control electrode voltage at which the brightness of the electron beam reaches a peak.

公开(公告)号：US09256068B2

公开(公告)日：2016-02-09

申请号：US14338542

申请日：2014-07-23

申请人： JEOL Ltd.

发明人： Hidetaka Sawada ,  Yu Jimbo

IPC分类号： G02B27/14 ,  H01J3/14 ,  H01J3/26 ,  G02B27/00 ,  H01J3/12 ,  H01J37/05 ,  H01J37/147 ,  H01J37/153 ,  H01J37/28 ,  G21K1/08 ,  G01N23/20 ,  G02B27/42 ,  H01J3/04

CPC分类号： G02B27/0037 ,  G01N23/20 ,  G02B27/42 ,  G02B27/4205 ,  G21K1/08 ,  H01J3/04 ,  H01J3/12 ,  H01J3/26 ,  H01J37/05 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/1534

摘要： A spherical aberration corrector is offered which permits a correction of deviation of the circularity of at least one of an image and a diffraction pattern and a correction of on-axis aberrations to be carried out independently. The spherical aberration corrector (100) is for use with a charged particle beam instrument (1) for obtaining the image and the diffraction pattern and has a hexapole field generating portion (110) for producing plural stages of hexapole fields, an octopole field superimposing portion (120) for superimposing an octopole on at least one of the plural stages of hexapole fields to correct deviation of the circularity of at least one of the image and diffraction pattern, and a deflection portion (130) for deflecting a charged particle beam.

摘要翻译： 提供了一种球面像差校正器，其允许校正图像和衍射图案中的至少一个的圆度的偏差和单独进行的轴上像差校正。 球面像差校正器（100）用于带电粒子束仪器（1），用于获得图像和衍射图案，并具有用于产生多级六极场的六极场产生部分（110），八极场叠加部分 （120），用于将至少一个六极场中的至少一个叠加八极杆，以校正图像和衍射图案中的至少一个的圆度的偏差，以及用于偏转带电粒子束的偏转部分（130）。

公开(公告)号：US08766183B2

公开(公告)日：2014-07-01

申请号：US13058712

申请日：2009-09-10

申请人： Muneyuki Fukuda ,  Hiromasa Yamanashi ,  Yasunari Sohda

发明人： Muneyuki Fukuda ,  Hiromasa Yamanashi ,  Yasunari Sohda

IPC分类号： H01J3/12 ,  H01J37/153

CPC分类号： H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

摘要： The astigmatism control processing time is decreased to 1 second or less by improving the astigmatic difference measurement accuracy. A charged particle beam device includes: a stage on which a sample is loaded; a transport mechanism which carries the sample onto the stage; a charged particle beam optical system which irradiates the sample on the stage with a charged particle beam and detects secondary charged particles generated from the sample; and a controller which determines setup parameters for the charged particle beam optical system and controls the charged particle beam optical system. The controller registers and holds electro-optical system setup parameters for irradiation with a beam tilted from a normal line on the sample as the charged particle beam, compares observation images obtained by the tilted beam, measures the amount and direction of movement and calculates the amount of astigmatism correction from the amount of movement and the direction.

摘要翻译： 散光控制处理时间通过改善像散差测量精度而降低到1秒以下。 带电粒子束装置包括：加载样品的载物台; 将样品携带到舞台上的运送机构; 带电粒子束光学系统，其用带电粒子束照射台上的样品，并检测从样品产生的二次带电粒子; 以及控制器，其确定带电粒子束光学系统的设置参数并控制带电粒子束光学系统。 控制器注册并保持电子光学系统设置参数，用于照射来自样品上的法线的光束作为带电粒子束，比较通过倾斜光束获得的观察图像，测量移动量和移动方向， 从运动量和方向上矫正散光。

公开(公告)号：US08188451B1

公开(公告)日：2012-05-29

申请号：US12561969

申请日：2009-09-17

申请人： Mehran Nasser-Ghodsi

发明人： Mehran Nasser-Ghodsi

IPC分类号： H01J1/304 ,  H01J3/12

CPC分类号： H01J37/073 ,  H01J37/265 ,  H01J2237/022 ,  H01J2237/06341 ,  H01J2237/0653

摘要： Contamination may be removed from an emitter tip of a field emitter during operation of the emitter tip in a system having an electron beam column having an electrode with a beam defining aperture, an electron collector located proximate to the beam defining aperture between the electrode and the field emitter, and an electron deflector located between the emitter tip and the electron collector. At regular predetermined intervals an electron beam from the emitter tip may be deflected away from a path through the beam defining aperture and onto the electron collector. An electron beam current to the electron collector may be determined and the emitter tip may be flash heated if the current to the electron collector is below a threshold.

摘要翻译： 在具有电子束列的电子束列的系统中，在发射极尖端的操作期间，可以从场致发射体的发射极尖端去除污染，电子束具有限定孔的光束，位于电极和电极之间的光束限定孔附近的电子收集器 位于发射极尖端和电子收集器之间的电子偏转器。 以规则的预定间隔，来自发射极尖端的电子束可以偏离通过光束限定孔径的路径并且到电子收集器上。 可以确定到电子收集器的电子束电流，并且如果到电子收集器的电流低于阈值，则可以将发射极尖端闪光加热。

公开(公告)号：US4795912A

公开(公告)日：1989-01-03

申请号：US15193

申请日：1987-02-17

申请人： Alfred W. Maschke

发明人： Alfred W. Maschke

IPC分类号： G21K1/08 ,  H01J3/12 ,  H01J3/14

CPC分类号： H01J3/12 ,  G21K1/08

摘要： A technique for compensating for chromatic aberration in particle beams, caused by differing particle energy levels when a beam is deflected for beam steering or beam focusing. A compensating deflection is applied to the beam upstream of its intended point of deflection. When the particles reach the point of deflection, the effect of the compensating deflection is proportional to the energy level of each particle, and compensates for the aberration that would normally occur. The point at which the compensating deflection is applied is selected to be one-fourth of a cycle in longitudinal phase space and an integral number of half-cycles in transverse phase space. With this critical spacing, the compensating deflection at the point of its application is proportional to relative phase in longitudinal phase space, but is proportional to energy level at the intended point of deflection.

摘要翻译： 一种用于补偿粒子束中的色差的技术，当束被偏转以用于光束转向或光束聚焦时，由不同的粒子能级引起。 在其预期的偏转点上游向梁施加补偿偏转。 当颗粒到达偏转点时，补偿偏转的影响与每个颗粒的能级成比例，并补偿通常发生的像差。 施加补偿偏转的点被选择为纵向相位空间中的周期的四分之一和横向相位空间中的半周期的整数。 利用这个临界间距，其应用点处的补偿偏转与纵向相位空间中的相对相位成比例，但与预期的偏转点处的能级成比例。

公开(公告)号：US4763003A

公开(公告)日：1988-08-09

申请号：US15208

申请日：1987-02-17

申请人： Alfred W. Maschke

发明人： Alfred W. Maschke

IPC分类号： G21K1/087 ,  H01J3/12

CPC分类号： G21K1/087 ,  H01J3/12

摘要： A technique for correcting spherical and other aberrations in a particle beam. Spherical aberration is caused by variations in beam behavior dependent on the cube of the radius or radial position with respect to the beam axis. To correct for such aberration, the beam is passed through multiple compensation electric field arrays, each of which has multiple rows of parallel wires stretched transversely across the beam path, the rows being biased with separate voltages to provide an electric field that varies in proportion to the cube of the distance from the central row of the array. The multiple arrays provide a cylindrically symmetrical electric field, and are oriented at a uniform angular spacing, which, for spherical aberration, is 120 degrees.

摘要翻译： 用于校正粒子束中的球面和其他像差的技术。 球面像差由取决于相对于光束轴的半径或径向位置的立方体的光束行为的变化引起。 为了校正这种像差，光束通过多个补偿电场阵列，每个阵列具有跨行束路径横向延伸的多排平行线，这些行被单独的电压偏置以提供与...成比例地变化的电场 距阵列中心行距离的立方体。 多个阵列提供圆柱对称的电场，并且以均匀的角度间隔定向，其用于球面像差为120度。

公开(公告)号：US4511980A

公开(公告)日：1985-04-16

申请号：US388936

申请日：1982-06-16

申请人： Susumu Watanabe

发明人： Susumu Watanabe

IPC分类号： H01L21/027 ,  H01J37/302 ,  H01J37/317 ,  H01J3/12

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/30461 ,  H01J2237/30488 ,  H01J2237/31762 ,  H01J2237/31769

摘要： Dot pattern data stored in the first dot pattern memory is read out by a predetermined number of successive bits at a time under the control of a microprocessor and corrected with respect to an X direction. The corrected dot pattern data is temporarily stored in a main memory. The dot pattern data stored in the main memory is then corrected with respect to a Y direction. The resultant corrected dot pattern data is stored in a second dot pattern memory for use for electron beam blanking control.

摘要翻译： 存储在第一点阵图形存储器中的点图案数据在微处理器的控制下一次被预定数量的连续位读出，并相对于X方向被校正。 校正后的点阵图形数据临时存储在主存储器中。 然后，存储在主存储器中的点图案数据相对于Y方向被校正。 所得到的校正后的点图案数据被存储在用于电子束消隐控制的第二点阵图形存储器中。

公开(公告)号：US3450884A

公开(公告)日：1969-06-17

申请号：US3450884D

申请日：1966-10-03

申请人： BELGE LAMPES MAT ELECTR MBLE

发明人： SCHAYES RAYMOND ,  GOURLET ROGER

IPC分类号： G01J1/58 ,  G01T1/115 ,  H01J3/12

CPC分类号： G01J1/58 ,  G01T1/115

公开(公告)号：US09275817B2

公开(公告)日：2016-03-01

申请号：US13849496

申请日：2013-03-23

申请人： Frederick Wight Martin

发明人： Frederick Wight Martin

IPC分类号： H01J37/145 ,  H01J3/22 ,  H01J37/141 ,  H01J37/153 ,  H01J3/12

CPC分类号： H01J3/22 ,  H01J3/12 ,  H01J37/141 ,  H01J37/145 ,  H01J37/153 ,  H01J2237/04926 ,  H01J2237/1534 ,  H01J2237/31749

摘要： An objective lens for use in probe-forming particle-optical columns such as focused ion beam equipment, scanning electron microscopes, and helium microscopes is described. It comprises two interleaved (quadrupole/octopole) lenses and two or three ancillary octopole lenses, and is capable of simultaneous compensation of spherical (Cs) and chromatic (Cc) aberrations of the objective lens alone or of the complete particle-optical column. Additional apparatus comprising a gridded aperture and position-sensitive detector is specified, together with a method to measure and minimize all of the five independent third-order aberration coefficients of the objective lens.

摘要翻译： 描述了用于探针形成颗粒光学柱的物镜，例如聚焦离子束设备，扫描电子显微镜和氦显微镜。 它包括两个交错（四极/八极）透镜和两个或三个辅助八极透镜，并且能够同时补偿单独的物镜或完整的粒子 - 光学柱的球面（Cs）和彩色（Cc）像差。 规定包括网格孔径和位置敏感检测器的附加装置，以及用于测量和最小化物镜的所有五个独立三阶像差系数的方法。

公开(公告)号：US09224577B2

公开(公告)日：2015-12-29

申请号：US13587598

申请日：2012-08-16

申请人： Patrick Schiavone ,  Thiago Figueiro

发明人： Patrick Schiavone ,  Thiago Figueiro

IPC分类号： H01J37/31 ,  H01J37/317 ,  H01J3/12 ,  G03F7/20 ,  H01J37/22 ,  B82Y10/00 ,  B82Y40/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/2061 ,  H01J3/12 ,  H01J37/222 ,  H01J2229/563 ,  H01J2237/226 ,  H01J2237/31769

摘要： A method for projecting an electron beam, used notably in direct or indirect writing lithography and in electronic microscopy. Proximity effects created by the forward and backward scattering of the electrons of the beam in interaction with the target must be corrected. For this, the convolution of a point spread function with the geometry of the target is conventionally used. At least one of the components of the point spread function has its maximum value not located on the center of the beam. Preferably, the maximum value is instead located on the backward scattering peak. Advantageously, the point spread function uses gamma distribution laws.

摘要翻译： 一种用于投射电子束的方法，特别用于直接或间接写入光刻和电子显微镜。 必须校正通过与靶相互作用的光束的电子的向前和向后散射产生的接近效应。 为此，通常使用点扩散函数与目标几何的卷积。 点扩散函数的至少一个分量的最大值不在波束的中心。 优选地，最大值代替地位于后向散射峰上。 有利地，点扩散函数使用伽马分布规律。