公开(公告)号：US09312091B2

公开(公告)日：2016-04-12

申请号：US14396769

申请日：2013-04-18

Applicant: Hitachi High-Technologies Corporation

Inventor： Yasunari Sohda ,  Tasuku Yano ,  Muneyuki Fukuda ,  Noritsugu Takahashi ,  Hajime Kawano ,  Hiroyuki Ito

IPC: G21K5/04 ,  H01J37/141 ,  H01J37/153 ,  H01J37/28 ,  H01J37/147

CPC classification number: H01J37/141 ,  H01J37/147 ,  H01J37/1475 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1405 ,  H01J2237/1532 ,  H01J2237/1536

Abstract: In order to provide a charged particle beam apparatus enabling reduction of deflecting coma aberration in cases such as where wide field-of-view scanning is carried out, a charged particle beam apparatus is provided with an electromagnetic objective lens and a stage on which a sample is placed, wherein the electromagnetic objective lens is provided with the following: a plurality of magnetic paths; an objective lens coil; an opening disposed so as to face the sample; an inner lens deflector disposed more on the objective lens coil side than the end of the opening.

Abstract translation: 为了提供在诸如进行宽视场扫描的情况下能够减少偏转彗形像差的带电粒子束装置，带电粒子束装置设置有电磁物镜和在其上具有样品 放置，其中电磁物镜设置有：多个磁路; 物镜线圈; 设置成面向样品的开口; 设置在比开口端部更靠物镜线圈侧的内透镜偏转器。

公开(公告)号：US09287082B2

公开(公告)日：2016-03-15

申请号：US14616658

申请日：2015-02-07

Applicant: Hitachi High-Technologies Corporation

Inventor： Kenichi Morita ,  Sayaka Tanimoto ,  Makoto Sakakibara ,  Muneyuki Fukuda ,  Naomasa Suzuki ,  Kenji Obara

IPC: H01J37/141 ,  H01J37/28 ,  H01J37/26 ,  H01J37/22

CPC classification number: H01J37/141 ,  H01J37/222 ,  H01J37/243 ,  H01J37/261 ,  H01J37/265 ,  H01J2237/04922 ,  H01J2237/221 ,  H01J2237/2801 ,  H01J2237/2806 ,  H01J2237/2809 ,  H01J2237/2817

Abstract: A charged particle beam apparatus includes a charged particle beam source which irradiates a sample with a charged particle beam, an electromagnetic lens, a lens control electric source for controlling strength of a convergence effect of the electromagnetic lens; and a phase compensation circuit which is connected to the lens control electric source in parallel with the electromagnetic lens, and controls a lens current at the time of switching the strength of the convergence effect of the electromagnetic lens such that the lens current monotonically increases or monotonically decreases.

Abstract translation: 带电粒子束装置包括用带电粒子束照射样本的带电粒子束源，电磁透镜，用于控制电磁透镜的会聚效应的强度的透镜控制电源; 以及相位补偿电路，其与电磁透镜并联连接到透镜控制电源，并且在切换电磁透镜的会聚效果的强度时控制透镜电流，使得透镜电流单调增加或单调 减少

公开(公告)号：US20150294833A1

公开(公告)日：2015-10-15

申请号：US14439628

申请日：2013-10-21

Applicant: Hitachi High-Technologies Corporation

Inventor： Muneyuki Fukuda ,  Naomasa Suzuki ,  Akira Ikegami ,  Hideto Dohi ,  Momoyo Enyama ,  Tomoyasu Shojo

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/141

CPC classification number: H01J37/1478 ,  H01J37/141 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/1506 ,  H01J2237/2801

Abstract: In order to provide a charged particle beam apparatus capable of high resolution measurement of a sample at any inclination angle, a charged particle beam apparatus for detecting secondary charged particles (115) generated by irradiating a sample (114) with a primary charged particle beam (110) is provided with a beam tilt lens (113) having: a yoke magnetic path member (132) and a lens coil (134) to focus the primary charged particle beam (110) on the sample (114); and a solenoid coil (133) configured to arrange the upper end on the side surface of the yoke magnetic path member (132) and arrange the bottom end between the tip end of the pole piece of the yoke magnetic path member (132) and the sample (114) in order to arbitrarily tilt the primary charged particle beam (110) on the sample (114).

Abstract translation: 为了提供能够以任何倾斜角对样品进行高分辨率测量的带电粒子束装置，用于检测通过用一次带电粒子束（114）照射样品（114）而产生的二次带电粒子（115）的带电粒子束装置 110）设置有光束倾斜透镜（113），其具有：一个磁轭磁路部件（132）和一个用于将一次带电粒子束（110）聚焦在样本（114）上的透镜线圈; 以及螺线管线圈（133），其配置为将所述上端配置在所述磁轭磁路部件（132）的侧面，并将所述磁轭磁路部件（132）的极片的前端部与所述磁轭部件 样品（114），以便任意倾斜样品（114）上的初级带电粒子束（110）。

公开(公告)号：US08785890B2

公开(公告)日：2014-07-22

申请号：US13871624

申请日：2013-04-26

Applicant: Hitachi High-Technologies Corporation

Inventor： Muneyuki Fukuda ,  Naomasa Suzuki ,  Tomoyasu Shojo ,  Noritsugu Takahashi

IPC: A61N5/00 ,  G21G5/00

CPC classification number: H01J37/28 ,  G01N23/225 ,  H01J37/145 ,  H01J2237/21 ,  H01J2237/28

Abstract: A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.

Abstract translation: 电磁叠加型物镜的下极片分为上磁路和下磁路。 几乎等于延迟电压的电压被施加到下磁路。 提供了能够获得具有比常规图像更高分辨率和更高对比度的图像的物镜。 电磁叠加型物镜包括包围线圈的磁路，围绕电子束的圆柱形或锥形增强器磁路，介于线圈和样品之间的控制磁路，加速电场控制单元，其加速 使用升压电源的电子束，使用级电源减速电子束的减速电场控制部，以及抑制使用控制磁路电源对样品进行放电的抑制部。

公开(公告)号：US20130228701A1

公开(公告)日：2013-09-05

申请号：US13871624

申请日：2013-04-26

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Muneyuki Fukuda ,  Naomasa Suzuki ,  Tomoyasu Shojo ,  Noritsugu Takahashi

IPC: G01N23/225

CPC classification number: H01J37/28 ,  G01N23/225 ,  H01J37/145 ,  H01J2237/21 ,  H01J2237/28

Abstract: A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.

Abstract translation: 电磁叠加型物镜的下极片分为上磁路和下磁路。 几乎等于延迟电压的电压被施加到下磁路。 提供了能够获得具有比常规图像更高分辨率和更高对比度的图像的物镜。 电磁叠加型物镜包括包围线圈的磁路，围绕电子束的圆柱形或锥形增强器磁路，介于线圈和样品之间的控制磁路，加速电场控制单元，其加速 使用升压电源的电子束，使用级电源减速电子束的减速电场控制部，以及抑制使用控制磁路电源对样品进行放电的抑制部。

公开(公告)号：US10101150B2

公开(公告)日：2018-10-16

申请号：US15533489

申请日：2014-12-10

Applicant: Hitachi High-Technologies Corporation

Inventor： Hiroki Kawada ,  Muneyuki Fukuda ,  Yoshinori Momonoi ,  Shou Takami

IPC: H01J37/00 ,  G01B15/02 ,  H01J37/317

Abstract: The objective of the present invention is to provide a height measurement device capable of highly accurate measurement in the depth direction of a structure on a sample. To achieve this objective, proposed are a charged particle beam device and a height measurement device that is provided with a calculation device for determining the size of a structure on a sample on the basis of a detection signal obtained by irradiating the sample with a charged particle beam, wherein the calculation device calculates the distance from a first charged particle beam irradiation mark formed at a first height on the sample and a second charged particle beam irradiation mark formed at a second height on the sample and on the basis of this distance and the charged particle beam irradiation angle when the first charged particle beam irradiation mark and second charged particle beam irradiation mark were formed, calculates the distance between the first height and the second height.

公开(公告)号：US10037866B2

公开(公告)日：2018-07-31

申请号：US15217460

申请日：2016-07-22

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Momoyo Enyama ,  Muneyuki Fukuda ,  Hideyuki Kazumi ,  Koichi Hamada ,  Sayaka Tanimoto

IPC: H01J37/26 ,  H01J37/22

CPC classification number: H01J37/265 ,  H01J37/153 ,  H01J37/21 ,  H01J37/222 ,  H01J37/226 ,  H01J2237/049 ,  H01J2237/103 ,  H01J2237/1534 ,  H01J2237/223 ,  H01J2237/24542 ,  H01J2237/24592 ,  H01J2237/2801

Abstract: A charged particle beam apparatus with improved depth of focus and maintained/improved resolution has a charged particle source, an off-axis illumination aperture, a lens, a computer, and a memory unit. The apparatus acquires an image by detecting a signal generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture. The computer has a beam-computing-process unit to estimate a beam profile of the charged particle beam and an image-sharpening-process unit to sharpen the image using the estimated beam profile.

公开(公告)号：US10340115B2

公开(公告)日：2019-07-02

申请号：US15869460

申请日：2018-01-12

Applicant: Hitachi High-Technologies Corporation

Inventor： Muneyuki Fukuda ,  Yoshinori Momonoi ,  Akihiro Miura ,  Fumihiro Sasajima ,  Hiroaki Mito

IPC: H01J37/21 ,  H01J37/22 ,  H01J37/28

Abstract: A charged particle beam device is provided that performs proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. The charged particle beam device includes: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.

公开(公告)号：US09644955B2

公开(公告)日：2017-05-09

申请号：US14364392

申请日：2012-11-26

Applicant: Hitachi High-Technologies Corporation

Inventor： Tasuku Yano ,  Yasunari Sohda ,  Muneyuki Fukuda ,  Katsunori Onuki ,  Hajime Kawano ,  Naomasa Suzuki

IPC: H01J37/28 ,  G01B15/00 ,  H01J37/21 ,  H01L21/66 ,  H01J37/244

CPC classification number: G01B15/00 ,  G01B2210/56 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/20 ,  H01J2237/281 ,  H01L22/12

Abstract: A scanning electron beam device having: a deflector (5) for deflecting an electron beam (17) emitted from an electron source (1); an objective lens (7) for causing the electron beam to converge; a retarding electrode; a stage (9) for placing a wafer (16); and a controller (15); wherein the stage can be raised and lowered. In the low acceleration voltage region, the controller performs rough adjustment and fine adjustment of the focus in relation to the variation in the height of the wafer using electromagnetic focusing performed through excitation current adjustment of the objective lens. In the high acceleration voltage region, the controller performs rough adjustment of the focus in relation to the variation in the height of the wafer by mechanical focusing performed through raising and lowering of the stage, and performs fine adjustment by electrostatic focusing performed through adjustment of the retarding voltage. It thereby becomes possible to provide a scanning electron beam device that measures, in a highly accurate manner, both the upper part and the bottom part of a groove or a hole having a high aspect ratio.

公开(公告)号：US09384940B2

公开(公告)日：2016-07-05

申请号：US14439628

申请日：2013-10-21

Applicant: Hitachi High-Technologies Corporation

Inventor： Muneyuki Fukuda ,  Naomasa Suzuki ,  Akira Ikegami ,  Hideto Dohi ,  Momoyo Enyama ,  Tomoyasu Shojo

IPC: H01J37/00 ,  H01J37/147 ,  H01J37/141 ,  H01J37/28

CPC classification number: H01J37/1478 ,  H01J37/141 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/1506 ,  H01J2237/2801

Abstract: In order to provide a charged particle beam apparatus capable of high resolution measurement of a sample at any inclination angle, a charged particle beam apparatus for detecting secondary charged particles (115) generated by irradiating a sample (114) with a primary charged particle beam (110) is provided with a beam tilt lens (113) having: a yoke magnetic path member (132) and a lens coil (134) to focus the primary charged particle beam (110) on the sample (114); and a solenoid coil (133) configured to arrange the upper end on the side surface of the yoke magnetic path member (132) and arrange the bottom end between the tip end of the pole piece of the yoke magnetic path member (132) and the sample (114) in order to arbitrarily tilt the primary charged particle beam (110) on the sample (114).

Abstract translation: 为了提供能够以任何倾斜角对样品进行高分辨率测量的带电粒子束装置，用于检测通过用一次带电粒子束（114）照射样品（114）而产生的二次带电粒子（115）的带电粒子束装置 110）设置有光束倾斜透镜（113），其具有：一个磁轭磁路部件（132）和一个用于将一次带电粒子束（110）聚焦在样本（114）上的透镜线圈; 以及螺线管线圈（133），其配置为将所述上端配置在所述磁轭磁路部件（132）的侧面，并将所述磁轭磁路部件（132）的极片的前端部与所述磁轭部件 样品（114），以便任意倾斜样品（114）上的初级带电粒子束（110）。