公开(公告)号：US20180277334A1

公开(公告)日：2018-09-27

申请号：US15985763

申请日：2018-05-22

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Alexander Hendrik Vincent VAN VEEN ,  Willem Henk URBANUS ,  Marco Jan-Jaco WIELAND

IPC: H01J37/153 ,  H01J37/12 ,  H01J37/09

CPC classification number: H01J37/153 ,  H01J37/023 ,  H01J37/065 ,  H01J37/09 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/0213 ,  H01J2237/0264 ,  H01J2237/0453 ,  H01J2237/1207 ,  H01J2237/1534 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/31774 ,  H01J2237/31793

Abstract: A lens element of a charged particle system comprises an electrode having a central opening. The lens element is configured for functionally cooperating with an aperture array that is located directly adjacent said electrode, wherein the aperture array is configured for blocking part of a charged particle beam passing through the central opening of said electrode. The electrode is configured to operate at a first electric potential and the aperture array is configured to operate at a second electric potential different from the first electric potential. The electrode and the aperture array together form an aberration correcting lens.

公开(公告)号：US20180261422A1

公开(公告)日：2018-09-13

申请号：US15914498

申请日：2018-03-07

Applicant: JEOL Ltd.

Inventor： Tatsuru Kuramoto ,  Yuichiro Ohori ,  Yoshinori Matsuda ,  Makoto Aoshima

IPC: H01J37/09 ,  H01J37/28 ,  H01J37/244 ,  H01J37/14 ,  H01J37/30

CPC classification number: H01J37/09 ,  H01J37/023 ,  H01J37/14 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/3056 ,  H01J2237/024 ,  H01J2237/0262 ,  H01J2237/14 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2804 ,  H01J2237/2806

Abstract: A scanning electron microscope having a charged particle device that processes a specimen using a charged particle beam, the scanning electron microscope includes: an electron source; a secondary-electron detector that detects secondary electrons generated from the specimen; a backscattered-electron detector that is disposed closer to the electron source than a detection surface of the secondary-electron detector to detect backscattered electrons generated from the specimen; a shielding plate for shielding a detection surface of the backscattered-electron detector; and a moving mechanism that moves the shielding plate. In a state where the shielding plate is moved by the moving mechanism so as to shield the detection surface of the backscattered-electron detector, the shielding plate is located between the detection surface of the backscattered-electron detector and the detection surface of the secondary-electron detector.

公开(公告)号：US20180233319A1

公开(公告)日：2018-08-16

申请号：US15895492

申请日：2018-02-13

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yoshimi KAWANAMI

IPC: H01J37/08 ,  H01J37/20 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J37/244 ,  H01J37/09

Abstract: The focused ion beam apparatus includes: a vacuum container; an emitter tip disposed in the vacuum container and having a pointed front end; a gas field ion source; a focusing lens; a first deflector; a first aperture; an objective lens focusing the ion beam passing through the first deflector; and a sample stage. A signal generator responding to the ion beam in a point-shaped area is formed between the sample stage and an optical system including at least the focusing lens, the first aperture, the first deflector, and the objective lens, and a scanning field ion microscope image of the emitter tip is produced by matching a signal output from the signal generator and scanning of the ion beam by the first deflector with each other.

公开(公告)号：US09997329B2

公开(公告)日：2018-06-12

申请号：US15361276

申请日：2016-11-25

Applicant: NuFlare Technology, Inc.

Inventor： Rieko Nishimura

IPC: H01J37/22 ,  H01J37/317 ,  H01J37/09

CPC classification number: H01J37/222 ,  H01J37/09 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/30433 ,  H01J2237/30455

Abstract: An evaluation method according to an embodiment is to evaluate a precision of an aperture formed with multiple openings, and includes steps of forming a first evaluation pattern based on evaluation data using multiple electron beams generated by electron beam that has passed through the aperture, dividing the aperture into multiple regions, each of the regions including the multiple openings and defining the multiple divided regions, forming a second evaluation pattern based on evaluation data using the electron beam that has passed through a first divided region among the multiple divided regions, comparing the first evaluation pattern with the second evaluation pattern, and evaluating the precision of the aperture based on the comparison result between the first evaluation pattern and the second evaluation pattern.

公开(公告)号：US09799482B2

公开(公告)日：2017-10-24

申请号：US15067832

申请日：2016-03-11

Applicant: Toshiba Memory Corporation

Inventor： Yuichi Ohsawa ,  Akio Ui ,  Junichi Ito ,  Chikayoshi Kamata ,  Megumi Yakabe ,  Saori Kashiwada

IPC: H01J37/08 ,  H01L43/12 ,  H01J37/30 ,  H01J37/09 ,  H01J37/20 ,  H01J37/305 ,  H01L27/22

CPC classification number: H01J37/08 ,  H01J37/09 ,  H01J37/20 ,  H01J37/30 ,  H01J37/3053 ,  H01J2237/0822 ,  H01J2237/083 ,  H01J2237/3151 ,  H01L27/228 ,  H01L43/12

Abstract: A device manufacturing apparatus and manufacturing method of a magnetic device. The device manufacturing apparatus can include a substrate holding portion configured to hold a substrate, an ion source, an anode disposed in a housing of the ion source, and a cathode disposed outside the housing of the ion source. A first opening can be disposed in a portion of the housing such the anode is exposed to a region between the anode and the substrate holding portion. The ion source can be configured to generate an ion beam with which the substrate is irradiated. A first structure can be disposed between the ion source and the substrate holding portion. The first structure can have a first through hole through which the ion beam can pass. The first structure can include a conductor, and an opening dimension of the first through hole can be equal to or larger than an opening dimension of the first opening.

公开(公告)号：US20170229278A1

公开(公告)日：2017-08-10

申请号：US15017559

申请日：2016-02-05

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Chwen YU ,  Chih-Ming TSAO

IPC: H01J37/09 ,  H01J37/30

CPC classification number: H05K9/00 ,  G12B17/00 ,  G12B17/02 ,  H01J37/09 ,  H01J37/3002 ,  H01J2237/0264 ,  H05K9/0001 ,  H05K9/0003

Abstract: A board includes a first magnetic conductive plate and a second magnetic conductive plate. The first magnetic conductive plate has a first magnetic conductive direction. The second magnetic conductive plate overlaps with the first magnetic conductive plate. The second magnetic conductive plate has a second magnetic conductive direction. The first magnetic conductive direction and the second magnetic conductive direction cross.

公开(公告)号：US09673024B2

公开(公告)日：2017-06-06

申请号：US14975314

申请日：2015-12-18

Applicant: CARL ZEISS MICROSCOPY GMBH ,  APPLIED MATERIALS ISRAEL LTD.

Inventor： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares ,  Steven Rogers

IPC: H01J37/30 ,  H01J37/10 ,  H01J37/147 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/28 ,  H01J37/317 ,  H01J37/14

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

公开(公告)号：US09666404B2

公开(公告)日：2017-05-30

申请号：US15041008

申请日：2016-02-10

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Jürgen Frosien

IPC: H01J37/077 ,  H01J37/08 ,  H01J37/09 ,  H01J37/065

CPC classification number: H01J37/065 ,  H01J2237/057 ,  H01J2237/164 ,  H01J2237/182

Abstract: The present disclosure provides a charged particle source arrangement for a charged particle beam device. The charged particle source arrangement includes: a first vacuum region and a second vacuum region; a charged particle source in the first vacuum region, wherein the charged particle source is configured to generate a primary charged particle beam; and a membrane configured to provide a gas barrier between the first vacuum region and the second vacuum region, and wherein the membrane is configured to let at least a portion of the primary charged particle beam pass through the membrane, wherein a first vacuum generation device is connectable to the first vacuum region and a second vacuum generation device is connectable to the second vacuum region.

公开(公告)号：US09653254B2

公开(公告)日：2017-05-16

申请号：US15016743

申请日：2016-02-05

Applicant: Applied Materials Israel Ltd. ,  Carl Zeiss Microscopy GMBH

Inventor： Dirk Zeidler ,  Thomas Kemen ,  Anger Pascal ,  Antonio Casares ,  Christof Riedesel

IPC: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/317 ,  H01J37/21

CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/1205

Abstract: The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a carrier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.

公开(公告)号：US09601302B2

公开(公告)日：2017-03-21

申请号：US14813768

申请日：2015-07-30

Applicant: EBARA CORPORATION

Inventor： Shoji Yoshikawa ,  Kiwamu Tsukamoto ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Tsutomu Karimata

IPC: H01J37/26 ,  H01J37/02 ,  G01N23/22 ,  H01J37/09 ,  H01J37/16 ,  H01J37/20 ,  H01J37/285 ,  G01N21/95

CPC classification number: H01J37/023 ,  G01N21/9501 ,  G01N23/2204 ,  H01J37/09 ,  H01J37/16 ,  H01J37/20 ,  H01J37/285 ,  H01J2237/022 ,  H01J2237/0264 ,  H01J2237/1501 ,  H01J2237/166 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/20221 ,  H01J2237/20278 ,  H01J2237/26

Abstract: An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.