公开(公告)号：US20240272099A1

公开(公告)日：2024-08-15

申请号：US18631733

申请日：2024-04-10

Applicant: Carl Zeiss SMT GmbH

Inventor： Daniel Schwarz ,  Michael Schnell ,  Nicole Auth

IPC: G01N23/203 ,  G01N23/20058 ,  H01J37/147 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J37/30 ,  H01L21/67

CPC classification number: G01N23/203 ,  G01N23/20058 ,  H01J37/147 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01L21/67288 ,  G01N2223/401 ,  G01N2223/6116 ,  G01N2223/6462 ,  H01J37/30 ,  H01J2237/24475 ,  H01J2237/2814

Abstract: A corrected scanning electron microscope (CSEM) and a method of operating the CSEM for selectively separating a material contrast from a topography contrast is presented. The microscope and the method enable high imaging resolution with backscattered electrons generated from low energy primary electrons. The CSEM and the method is applicable to mask repair and circuit editing processes with resolution requirements in the low nm range or even below.

公开(公告)号：US20190250361A1

公开(公告)日：2019-08-15

申请号：US16272208

申请日：2019-02-11

Applicant: EBARA CORPORATION

Inventor： Shinichi OKADA

IPC: G02B7/02 ,  G02B5/20 ,  H01J37/30

CPC classification number: G02B7/02 ,  G02B5/20 ,  H01J37/30

Abstract: A Wien filter to be disposed inside a lens barrel made of a magnetic material includes: a plurality of electromagnetic poles disposed at equal angular intervals about a center axis of the lens barrel; a first magnetic shield disposed so as to cover the area around the plurality of electromagnetic poles; and a second magnetic shield disposed so as to cover the area around the first magnetic shield. The first magnetic shield is supported by a first support member made of a non-magnetic material provided at an inner surface of the second magnetic shield. The second magnetic shield is supported by a second support member made of a magnetic material provided at an inner surface of the lens barrel.

公开(公告)号：US10043633B2

公开(公告)日：2018-08-07

申请号：US14994724

申请日：2016-01-13

Applicant: PROTOCHIPS, INC.

Inventor： John Damiano, Jr. ,  David P. Nackashi ,  Stephen E. Mick

IPC: G21K5/10 ,  H01J37/20 ,  H01J37/16 ,  H01J37/29 ,  H01J37/18 ,  H01J37/26

CPC classification number: H01J37/20 ,  H01J37/16 ,  H01J37/18 ,  H01J37/26 ,  H01J37/29 ,  H01J37/30 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2007

Abstract: A novel sample holder for specimen support devices for insertion in electron microscopes. The novel sample holder of the invention allows for the introduction of gases or liquids to specimens for in situ imaging, as well as electrical contacts for electrochemical or thermal experiments.

公开(公告)号：US10020200B1

公开(公告)日：2018-07-10

申请号：US14966165

申请日：2015-12-11

Applicant: Multibeam Corporation

Inventor： Kevin M. Monahan ,  Theodore A. Prescop ,  Michael C. Smayling ,  David K. Lam

IPC: H01L21/3065 ,  H01L21/02 ,  H01L21/308 ,  H01L21/66

CPC classification number: H01L21/3065 ,  B81C1/00373 ,  B81C2201/0143 ,  B81C2201/0188 ,  C23C14/48 ,  C23C16/047 ,  C23C16/48 ,  C23C16/486 ,  C23C16/487 ,  H01J37/05 ,  H01J37/06 ,  H01J37/08 ,  H01J37/228 ,  H01J37/244 ,  H01J37/30 ,  H01J37/304 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/3172 ,  H01J37/3174 ,  H01J37/3177 ,  H01J37/3178 ,  H01J2237/004 ,  H01J2237/0635 ,  H01J2237/1501 ,  H01J2237/24592 ,  H01J2237/30466 ,  H01J2237/30472 ,  H01J2237/31708 ,  H01J2237/31732 ,  H01J2237/31735 ,  H01J2237/31737 ,  H01J2237/3174 ,  H01J2237/31749 ,  H01L21/0228 ,  H01L21/0262 ,  H01L21/26 ,  H01L21/308 ,  H01L21/3085 ,  H01L22/12 ,  H01L22/20 ,  H01L22/26

Abstract: Methods and systems for direct atomic layer etching and deposition on or in a substrate using charged particle beams. Electrostatically-deflected charged particle beam columns can be targeted in direct dependence on the design layout database to perform atomic layer etch and atomic layer deposition, expressing pattern with selected 3D-structure. Reducing the number of process steps in patterned atomic layer etch and deposition reduces manufacturing cycle time and increases yield by lowering the probability of defect introduction. Local gas and photon injectors and detectors are local to corresponding columns, and support superior, highly-configurable process execution and control.

公开(公告)号：US20180002806A1

公开(公告)日：2018-01-04

申请号：US15686864

申请日：2017-08-25

Applicant: University of North Texas

Inventor： Guido Fridolin Verbeck, IV ,  Stephen Davila

IPC: C23C14/22 ,  C23C14/28 ,  B82B3/00 ,  C23C14/04 ,  B82Y40/00 ,  B82Y30/00 ,  C23C14/54 ,  C23C14/12

CPC classification number: C23C14/221 ,  B81C2201/112 ,  B82B3/00 ,  B82Y30/00 ,  B82Y40/00 ,  C23C14/04 ,  C23C14/12 ,  C23C14/14 ,  C23C14/28 ,  C23C14/52 ,  C23C14/54 ,  H01J37/30

Abstract: A soft-landing (SL) instrument for depositing ions onto substrates using a laser ablation source is described herein. The instrument of the instant invention is designed with a custom drift tube and a split-ring ion optic for the isolation of selected ions and is capable of operating at atmospheric pressure. The drift tube allows for the separation and thermalization of ions formed after laser ablation through collisions with an inert bath gas that allow the ions to be landed at energies below 1 eV onto substrates. The split-ring ion optic is capable of directing ions toward the detector or a landing substrate for selected components.

公开(公告)号：US09733366B2

公开(公告)日：2017-08-15

申请号：US14397478

申请日：2013-04-16

Applicant: INDIAN INSTITUTE OF TECHNOLOGY KANPUR

Inventor： Sudeep Bhattacharjee ,  Samit Paul

IPC: G01T1/29 ,  H01J37/244 ,  H01J37/30

CPC classification number: G01T1/2921 ,  H01J37/244 ,  H01J37/30 ,  H01J2237/24542

Abstract: An apparatus for characterizing a focused charged beam is provided. The apparatus includes a plurality of parallel conducting channels and at least one current sensing unit configured to measure current across each of the plurality of parallel conducting channels.

公开(公告)号：US09543116B2

公开(公告)日：2017-01-10

申请号：US15190899

申请日：2016-06-23

Applicant: Arcam AB

Inventor： Tomas Lock

IPC: A61N5/00 ,  H01J37/304 ,  B33Y10/00 ,  B33Y40/00 ,  B33Y50/02 ,  B28B1/00 ,  B28B17/00 ,  B29C67/00 ,  B22F3/105 ,  B23K15/00 ,  B23K15/02 ,  H01J37/30 ,  H01J37/317 ,  H01J37/305 ,  G01T1/29 ,  B33Y30/00

CPC classification number: H01J37/3045 ,  B22F3/1055 ,  B22F2003/1056 ,  B22F2003/1057 ,  B23K15/0013 ,  B23K15/002 ,  B23K15/0026 ,  B23K15/0086 ,  B23K15/02 ,  B28B1/001 ,  B28B17/00 ,  B28B17/0081 ,  B29C64/153 ,  B29C64/20 ,  B29C64/386 ,  B29C67/0077 ,  B29C67/0088 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00 ,  B33Y50/02 ,  G01T1/295 ,  H01J37/09 ,  H01J37/244 ,  H01J37/30 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/305 ,  H01J37/317 ,  H01J2237/0453 ,  H01J2237/2445 ,  H01J2237/2448 ,  H01J2237/24514 ,  H01J2237/2826 ,  H01J2237/30433 ,  H01J2237/3045 ,  H01J2237/30472 ,  H01J2237/3128 ,  Y02P10/295

Abstract: A method is provided for forming a three-dimensional article through successive fusion of parts of a powder bed. The method includes the steps of: applying a first powder layer on a work table; directing an electron beam from an electron beam source over the work table, the directing of the electron beam causing the first powder layer to fuse in first selected locations according to a pre-determined model, so as to form a first part of a cross section of the three dimensional article, and intensity modulating X-rays from the powder layer or from a clean work table with a patterned aperture modulator and a patterned aperture resolver, wherein a verification of at least one of a size, position, scan speed, or shape of the electron beam is achieved by comparing detected intensity modulated X-ray signals with saved reference values.

Abstract translation: 提供了一种用于通过粉末床的部分的连续熔融来形成三维制品的方法。 该方法包括以下步骤：将第一粉末层施加在工作台上; 将来自电子束源的电子束引导到工作台上，根据预定模型引导使第一粉末层在第一选定位置熔化的电子束，以便形成横截面的第一部分 以及强度调制来自粉末层的X射线或来自具有图案化孔径调制器和图案化孔径分解器的清洁工作台的X射线，其中验证尺寸，位置，扫描速度或 通过将检测到的强度调制的X射线信号与保存的参考值进行比较来实现电子束的形状。

公开(公告)号：US09499900B2

公开(公告)日：2016-11-22

申请号：US14379805

申请日：2013-02-18

Applicant: Hitachi High-Technologies Corporation

Inventor： Atsushi Kamino ,  Hisayuki Takasu ,  Hirobumi Muto ,  Toru Iwaya

IPC: C23C14/30 ,  G01N1/32 ,  H01J37/305 ,  H01J37/20 ,  H01J37/30

CPC classification number: C23C14/30 ,  G01N1/32 ,  H01J37/20 ,  H01J37/30 ,  H01J37/3053 ,  H01J37/3056 ,  H01J2237/317 ,  H01J2237/31745 ,  H01J2237/31749 ,  H01J2237/334

Abstract: The present invention advantageously provides an ion milling device that can set a high-precision processing area with a simple structure. The ion milling device includes a sample holder that holds a sample and a mask partially restricting irradiation of the sample with an ion beam. The sample holder includes a first contact surface that contacts an end surface of the sample located on a passing orbit side of the ion beam, and a second contact surface that contacts an end surface of the mask so that the mask is located at a position spaced apart from the ion beam more than the first contact surface.

Abstract translation: 本发明有利地提供了一种能够以简单结构设置高精度加工区域的离子铣削装置。 离子研磨装置包括保持样品的保持器和用离子束部分地限制样品的照射的掩模。 样品保持器包括接触位于离子束的通过轨道侧的样品的端面的第一接触表面和接触掩模的端面的第二接触表面，使得掩模位于间隔开的位置 离子束除了第一接触表面以外。

公开(公告)号：US20160118220A1

公开(公告)日：2016-04-28

申请号：US14921691

申请日：2015-10-23

Applicant: E/G ELECTRO-GRAPH, INC.

Inventor： MICHAEL VELLA

IPC: H01J37/30 ,  H01L21/02

CPC classification number: H01J37/30 ,  H01J37/3171 ,  H01J37/32862 ,  H01J2237/0206 ,  H01J2237/022 ,  H01J2237/03 ,  H01L21/02041 ,  H02G13/00 ,  H05H2001/483

Abstract: Features that create localized electric field enhancement are deliberately introduced on conductors where deposits having insulating characteristics can form. The purpose of the introduced features is to enhance localized breakdown of the deposits in order to maintain electrode conductivity.

Abstract translation: 产生局部电场增强的特征有意引入具有绝缘特性的沉积物形成的导体上。 引入特征的目的是增强沉积物的局部破坏，以保持电极导电性。

公开(公告)号：US20160071723A1

公开(公告)日：2016-03-10

申请号：US14937968

申请日：2015-11-11

Applicant: International Business Machines Corporation

Inventor： Oleg Gluschenkov ,  Ahmet S. Ozcan

IPC: H01L21/02 ,  H01L21/3065

CPC classification number: H01L21/02057 ,  C23C14/02 ,  C23C16/0236 ,  C23C16/42 ,  C23C16/452 ,  C23C16/45523 ,  C23C16/4582 ,  C23C16/486 ,  C23C16/52 ,  H01J37/30 ,  H01J37/3002 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/32449 ,  H01J2237/0812 ,  H01J2237/30472 ,  H01J2237/31732 ,  H01J2237/3174 ,  H01J2237/334 ,  H01L21/02068 ,  H01L21/28506 ,  H01L21/28518 ,  H01L21/2855 ,  H01L21/28575 ,  H01L21/3065 ,  H01L21/3205 ,  H01L21/67028

Abstract: A method of performing in-situ cleaning of a substrate includes inserting a gas cluster ion beam into a processing chamber containing a substrate, the gas cluster ion beam includes a broad gas cluster ion bean that reaches an entire surface of the substrate. The entire surface of the substrate becomes substantially uniform after an exposure to the gas cluster ion beam.

Abstract translation: 对基板进行原位清洗的方法包括将气体簇离子束插入到含有基板的处理室中，气体簇离子束包括到达基板的整个表面的宽气体簇离子束。 在暴露于气体簇离子束之后，基板的整个表面变得基本均匀。