摘要:
To realize a focused-ion-beam machining apparatus capable of machining a thin sample with a wide area and a uniform film thickness and a needle-like sample with a sharp tip, in a focused-ion-beam machining apparatus including: an ion source (1); an electronic lens (3) focusing an ion beam extracted from the ion source (1) and irradiating the ion beam to a sample (5); and a sample holder (13) holding the sample (5), the sample holder (13) is provided with a shield electrode (7) arranged in a manner such as to cover the sample (5), and the sample (5) and the shield electrode (7) are insulated from each other in a manner such that voltages can be applied to them separately from each other.
摘要:
Ordinary charged particle beam apparatuses have each been an apparatus manufactured for dedicated use in making observations in a gas atmosphere at atmospheric pressure or at a pressure substantially equal thereto. There have existed no devices capable of simply making observations using an ordinary high-vacuum charged particle microscope in a gas atmosphere at atmospheric pressure or at a pressure approximately equal thereto. Furthermore, ordinary techniques have been incapable of observing the same spot of the sample in such an atmosphere using a charged particle beam and light simultaneously. This invention thus provides an apparatus including: a charged particle optical tube that irradiates a sample with a primary charged particle beam; a vacuum pump that evacuates the inside of the charged particle optical tube; a diaphragm arranged to separate a space in which the sample is placed from the charged particle optical tube, the diaphragm being detachable and allowing the primary charged particle beam to permeate or pass therethrough; and an optical microscope positioned on the opposite side of the charged particle optical tube across the diaphragm and the sample, the optical microscope having an optical axis thereof aligned with at least part of an extension of the optical axis of the charged particle optical tube.
摘要:
Apparatus having a magnetic lens configured to diverge an electron beam are useful in three-dimensional imaging using an electron microscope. The magnetic lens includes a body member having a core and defining a gap, and a winding surrounding a portion of the core. The body member and winding are configured such that an electrical current through the winding produces a magnetic field proximate to the gap.
摘要:
Method and apparatus for processing a substrate with an energetic particle beam. Features on the substrate are oriented relative to the energetic particle beam and the substrate is scanned through the energetic particle beam. The substrate is periodically indexed about its azimuthal axis of symmetry, while shielded from exposure to the energetic particle beam, to reorient the features relative to the major dimension of the beam.
摘要:
A method of operating a particle beam microscope includes: directing a particle beam onto a sample and detecting particles emanating from the sample during a first period for generating an image of the sample; generating electrons having a first distribution of kinetic energies and directing these electrons onto the sample during a second period for reducing a charge of the sample being generated while the directing the particle beam onto the sample; and generating electrons having a second distribution of their kinetic energies and directing these electrons onto the sample during a third period for further reducing the charge of the sample being generated while the directing of the particle beam onto the sample. An average value of the kinetic energy of the first distribution of the kinetic energy is greater than an average value of the kinetic energy of the second distribution of kinetic energies.
摘要:
An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening is made in a thin conductive film positioned over a cavity in a support substrate, where the aperture size and shape is determined by the opening in the conductive film and not determined by the substrate.
摘要:
A method and electron microscope system of performing three-dimensional imaging using an electron microscope. At least some of the illustrative embodiments are methods comprising generating an electron beam, and creating a hollow-cone electron beam (by passing the electron beam through an annular aperture), focusing the hollow-cone electron beam to form a probe, scanning a specimen using the probe; and performing three-dimensional imaging based on the scanning.
摘要:
An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.
摘要:
Disclosed is a transmission interference microscope that provides a degree of freedom to a region being observed while obtaining pure transmission information, and obtains highly-accurate interference images at high magnification under optimized radiation conditions. An electron beam emitted from an electron source 1 is split by a biprism 11 positioned under a converging lens 3, and enters objective lenses 4 as an electron beam 6 passing through a sample and an electron beam 7 passing through a vacuum. The electron beams are bent at the front magnetic fields of the objective lenses 4, and are emitted as a collimated beam in a state in which the sample location and vacuum are each appropriately are left a space.
摘要:
A background reduction system may include, but is not limited to: a charged particle source configured to generate a charged-particle beam; a louvered structure including one or more apertures configured to selectively transmit charged particles according to their angle of incidence; and a charged-particle detector configured to receive charged particles selectively transmitted by the louvered structure.