公开(公告)号：US09576771B2

公开(公告)日：2017-02-21

申请号：US14996032

申请日：2016-01-14

Applicant: Sumitomo Heavy Industries Ion Technology Co., Ltd.

Inventor： Kouji Inada ,  Kouji Kato

IPC: H01J37/09 ,  H01J37/08 ,  H01J37/304 ,  H01J37/317 ,  H01J37/04

CPC classification number: H01J37/304 ,  H01J37/04 ,  H01J37/3171 ,  H01J2237/0455 ,  H01J2237/08 ,  H01J2237/24535 ,  H01J2237/304 ,  H01J2237/30472 ,  H01J2237/31701

Abstract: A beam current adjuster for an ion implanter includes a variable aperture device which is disposed at an ion beam focus point or a vicinity thereof. The variable aperture device is configured to adjust an ion beam width in a direction perpendicular to an ion beam focusing direction at the focus point in order to control an implanting beam current. The variable aperture device may be disposed immediately downstream of a mass analysis slit. The beam current adjuster may be provided with a high energy ion implanter including a high energy multistage linear acceleration unit.

Abstract translation: 用于离子注入机的束流调节器包括设置在离子束聚焦点或其附近的可变孔径装置。 可变孔径装置被配置为在焦点处调整垂直于离子束聚焦方向的方向上的离子束宽度，以便控制注入束电流。 可变孔径装置可以紧靠质量分析狭缝的下游设置。 束电流调节器可以设置有包括高能多级线性加速单元的高能离子注入机。

公开(公告)号：US09520268B2

公开(公告)日：2016-12-13

申请号：US14795535

申请日：2015-07-09

Applicant: IMS Nanofabrication AG

Inventor： Elmar Platzgummer

IPC: G21K5/04 ,  H01J37/317 ,  H01J37/302 ,  G06F17/50 ,  H01J37/09 ,  H01J37/04

CPC classification number: H01J37/3177 ,  G06F17/5072 ,  G06F17/5081 ,  H01J37/045 ,  H01J37/09 ,  H01J37/3026 ,  H01J37/3175 ,  H01J2237/043 ,  H01J2237/3175 ,  H01J2237/31764

Abstract: An exposure pattern is computed for exposing a desired pattern on a target in a charged-particle multi-beam processing apparatus to match a reference writing tool, and/or for compensating a deviation of the imaging from a pattern definition device onto the target from a desired value of critical dimension along at least one direction in the image area on the target: The desired pattern is provided as a graphical representation suitable for the reference tool, on the image area on the target. A convolution kernel is used which describes a mapping from an element of the graphical representation to a group of pixels which is centered around a nominal position of said element. A nominal exposure pattern is calculated by convolution of the graphical representation with the convolution kernel, said nominal exposure pattern being suitable to create a nominal dose distribution on the target when exposed with the processing apparatus.

Abstract translation: 计算曝光图案以在带电粒子多光束处理装置中的目标上曝光期望图案以匹配参考写入工具，和/或用于从图案定义装置将图像偏离从图案定义装置补偿到目标上 在目标图像区域中至少沿一个方向的临界尺寸的期望值：所需图案作为适合参考工具的图形表示，在目标上的图像区域上提供。 使用卷积核，其描述从图形表示的元素到以所述元素的标称位置为中心的一组像素的映射。 通过图形表示与卷积核的卷积来计算标称曝光图案，所述标称曝光图案适于在用处理装置曝光时在目标上产生标称剂量分布。

公开(公告)号：US09496117B2

公开(公告)日：2016-11-15

申请号：US14158972

申请日：2014-01-20

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Jason M. Schaller ,  Robert B. Vopat

IPC: G21K1/04 ,  H01J37/05 ,  H01J37/317 ,  H01J37/09

CPC classification number: H01J37/05 ,  H01J37/09 ,  H01J37/3171 ,  H01J2237/0455 ,  H01J2237/057 ,  H01J2237/1501

Abstract: An adjustable mass-resolving slit assembly includes an aperture portion and an actuation portion. The aperture portion includes first and second shield members that define an aperture therebetween for receiving an ion beam during semiconductor processing operations. The actuation portion is coupled to the aperture portion and selectively and independently adjusts the position of the first and second shield members along first and second non-parallel axes. Adjusting the position of the first and second shield members along the first axis adjusts a width of the aperture. Adjusting the position of the first and second shield members along the second axis adjusts a region of the first and second shield members impinged by the ion beam. Methods for using the adjustable mass-resolving slit assembly are also disclosed.

Abstract translation: 可调节的质量分辨率狭缝组件包括孔部分和致动部分。 开口部分包括在半导体处理操作期间限定其间用于接收离子束的孔的第一和第二屏蔽构件。 致动部分联接到开口部分，并且选择性地和独立地调节第一和第二屏蔽部件沿第一和第二非平行轴线的位置。 沿着第一轴线调节第一和第二屏蔽件的位置调整孔径的宽度。 沿着第二轴调整第一和第二屏蔽构件的位置调节由离子束撞击的第一和第二屏蔽构件的区域。 还公开了使用可调节质量分辨率缝隙组件的方法。

公开(公告)号：US09484138B2

公开(公告)日：2016-11-01

申请号：US14389972

申请日：2012-07-17

Applicant: Guoqiang Yu ,  Peng Guo ,  Xiufeng Han ,  Chaohui Guo ,  Xiaoyu Sun ,  Xiangqian Zhou

Inventor： Guoqiang Yu ,  Peng Guo ,  Xiufeng Han ,  Chaohui Guo ,  Xiaoyu Sun ,  Xiangqian Zhou

IPC: H01F7/20 ,  H01F41/00 ,  G01R33/09 ,  H01L43/12 ,  H01J37/09

CPC classification number: H01J37/09 ,  G01R33/093 ,  G01R33/096 ,  H01F7/202 ,  H01F7/204 ,  H01F41/00 ,  H01J37/141 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/28 ,  H01J2237/31754 ,  H01L43/12

Abstract: A nano-patterned system comprises a vacuum chamber, a sample stage and a magnetic-field applying device. The magnetic-field applying device comprises a power supply, magnetic poles, and a magnetic-field generation device having a magnetic conductive soft iron core and a coil connected to the power supply and wound on the soft iron core to generate a magnetic field. The soft iron core is a semi-closed frame structure and the magnetic poles are respectively disposed at the two ends of the semi-closed frame structure. The sample stage is inside the vacuum chamber. The magnetic poles are opposite one another inside the vacuum chamber with respect to the sample stage. The coil and soft iron core are outside the vacuum chamber. The soft iron core leads the magnetic field generated by the coil into the vacuum chamber. The magnetic poles locate a sample on the sample stage and apply a local magnetic field.

Abstract translation: 纳米图案系统包括真空室，样品台和磁场施加装置。 磁场施加装置包括电源，磁极和具有导电软铁芯的磁场产生装置和连接到电源的线圈并缠绕在软铁芯上以产生磁场的磁场产生装置。 软铁芯是半封闭框架结构，磁极分别设置在半封闭框架结构的两端。 样品台位于真空室内。 磁极相对于样品台在真空室内彼此相对。 线圈和软铁芯在真空室外。 软铁芯将线圈产生的磁场引入真空室。 磁极将样品定位在样品台上并施加局部磁场。

公开(公告)号：US09466457B2

公开(公告)日：2016-10-11

申请号：US14422531

申请日：2013-07-01

Applicant: Hitachi High-Technologies Corporation

Inventor： Yusuke Ominami ,  Mami Konomi ,  Shinsuke Kawanishi ,  Sukehiro Ito

IPC: H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/28 ,  H01J37/04 ,  H01J37/16 ,  H01J37/09 ,  H01J37/26

CPC classification number: H01J37/18 ,  H01J37/04 ,  H01J37/09 ,  H01J37/16 ,  H01J37/20 ,  H01J37/228 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/045 ,  H01J2237/164 ,  H01J2237/1825 ,  H01J2237/2602 ,  H01J2237/2605

Abstract: Ordinary charged particle beam apparatuses have each been an apparatus manufactured for dedicated use in making observations in a gas atmosphere at atmospheric pressure or at a pressure substantially equal thereto. There have existed no devices capable of simply making observations using an ordinary high-vacuum charged particle microscope in a gas atmosphere at atmospheric pressure or at a pressure approximately equal thereto. Furthermore, ordinary techniques have been incapable of observing the same spot of the sample in such an atmosphere using a charged particle beam and light simultaneously. This invention thus provides an apparatus including: a charged particle optical tube that irradiates a sample with a primary charged particle beam; a vacuum pump that evacuates the inside of the charged particle optical tube; a diaphragm arranged to separate a space in which the sample is placed from the charged particle optical tube, the diaphragm being detachable and allowing the primary charged particle beam to permeate or pass therethrough; and an optical microscope positioned on the opposite side of the charged particle optical tube across the diaphragm and the sample, the optical microscope having an optical axis thereof aligned with at least part of an extension of the optical axis of the charged particle optical tube.

Abstract translation: 普通带电粒子束装置各自是制造用于在大气压或基本上等于其的压力下在气体气氛中进行观察的专用制造装置。 在大气压或大致相等的压力下，不存在使用普通的高真空带电粒子显微镜简单地进行观察的装置。 此外，普通技术已经不能使用带电粒子束和光同时在这样的大气中观察样品的相同点。 因此，本发明提供了一种装置，包括：带有电荷的粒子束照射样品的带电粒子光管; 抽真空带电粒子光管内部的真空泵; 隔膜，布置成将带有样品的空间与带电粒子光管分离，隔膜可拆卸并允许初级带电粒子束渗透或通过; 以及光学显微镜，其位于带电粒子光管的横跨隔膜和样品的相对侧，光学显微镜的光轴与带电粒子光管的光轴的延伸部分的至少一部分对准。

公开(公告)号：US09443699B2

公开(公告)日：2016-09-13

申请号：US14694959

申请日：2015-04-23

Applicant: IMS Nanofabrication AG

Inventor： Elmar Platzgummer ,  Hans Löschner

IPC: H01J37/317 ,  H01J37/09 ,  H01J37/04 ,  H01J37/147

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/09 ,  H01J37/147 ,  H01J37/3174 ,  H01J2237/0435

Abstract: In a charged-particle multi-beam processing apparatus for exposure of a target with a plurality of parallel particle-optical columns, each column has a beam shaping device forming the shape of the illuminating beam into a desired pattern composed of a multitude of sub-beams, by means of an aperture array device, which defines the shape of a respective sub-beam by means of an array of apertures, and a deflection array device selectively deflecting sub-beams off their nominal paths; thus, only the non-selected sub-beams can reach the target. According to many embodiments of the invention each beam shaping device is provided with a first field-boundary device and a second field-boundary device, which are the first and last plate elements traversed by the beam. One of the first and second field-boundary devices defines a field-free space interval so as to accommodate feeding lines for controlling the deflection array device.

Abstract translation: 在用多个平行粒子光学柱曝光靶的带电粒子多光束处理装置中，每列具有将照明光束的形状形成为由多个子像素组成的期望图案的光束整形装置， 通过孔阵列器件，其通过孔阵列限定相应子光束的形状，并且偏转阵列器件选择性地使子光束偏离其标称通路; 因此，只有未选择的子光束才能到达目标。 根据本发明的许多实施例，每个光束整形装置设置有第一场边界装置和第​​二场边界装置，第一场边界装置和第​​二场边界装置是由横梁穿过的第一和最后的板件。 第一和第二场边界装置之一限定了无场空间间隔，以适应用于控制偏转阵列装置的馈线。

公开(公告)号：US09390882B2

公开(公告)日：2016-07-12

申请号：US14171357

申请日：2014-02-03

Applicant: Micron Technology, Inc.

Inventor： Shixin Wang

IPC: H01J47/00 ,  H01J37/14 ,  H01J37/09 ,  H01J37/153 ,  H01J37/28 ,  H01J29/64

CPC classification number: H01J37/14 ,  H01J29/64 ,  H01J37/09 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/045 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1534

Abstract: Apparatus having a magnetic lens configured to diverge an electron beam are useful in three-dimensional imaging using an electron microscope. The magnetic lens includes a body member having a core and defining a gap, and a winding surrounding a portion of the core. The body member and winding are configured such that an electrical current through the winding produces a magnetic field proximate to the gap.

Abstract translation: 具有配置成发散电子束的磁性透镜的装置在使用电子显微镜的三维成像中是有用的。 磁性透镜包括具有芯并限定间隙的主体部件和围绕芯部的一部分的绕组。 身体构件和绕组被配置成使得通过绕组的电流产生靠近间隙的磁场。

公开(公告)号：US20160196951A1

公开(公告)日：2016-07-07

申请号：US15067832

申请日：2016-03-11

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Yuichi OHSAWA ,  Akio UI ,  Junichi ITO ,  Chikayoshi KAMATA ,  Megumi YAKABE ,  Saori KASHIWADA

IPC: H01J37/08 ,  H01J37/30 ,  H01J37/09 ,  H01J37/20

CPC classification number: H01J37/08 ,  H01J37/09 ,  H01J37/20 ,  H01J37/30 ,  H01J37/3053 ,  H01J2237/0822 ,  H01J2237/083 ,  H01J2237/3151 ,  H01L27/228 ,  H01L43/12

Abstract: According to one embodiment, a device manufacturing apparatus includes a substrate holding portion holding a substrate; an ion source including a housing, an anode disposed in the housing, a cathode disposed outside the housing, and a first opening disposed in a portion of the housing such that the anode is exposed to a region between the anode and the substrate holding portion, the ion source configured to generate an ion beam with which the substrate is irradiated; and at least one first structure disposed between the ion source and the substrate holding portion, and having a first through hole through which the ion beam passes. The first structure includes a conductor, and an opening dimension of the first through hole is equal to or larger than an opening dimension of the first opening.

Abstract translation: 根据一个实施例，一种装置制造装置包括：保持基板的基板保持部; 离子源，包括壳体，设置在壳体中的阳极，设置在壳体外部的阴极和设置在壳体的一部分中的第一开口，使得阳极暴露于阳极和衬底保持部分之间的区域， 所述离子源被配置为产生照射所述衬底的离子束; 以及设置在所述离子源和所述基板保持部之间的至少一个第一结构，并且具有离子束通过的第一通孔。 第一结构包括导体，第一通孔的开口尺寸等于或大于第一开口的开口尺寸。

公开(公告)号：US09384938B2

公开(公告)日：2016-07-05

申请号：US13825820

申请日：2011-09-23

Applicant: Dirk Zeidler ,  Thomas Kemen ,  Pascal Anger ,  Antonio Casares ,  Christof Riedesel

Inventor： Dirk Zeidler ,  Thomas Kemen ,  Pascal Anger ,  Antonio Casares ,  Christof Riedesel

IPC: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/317

CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/1205

Abstract: The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a carrier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.

Abstract translation: 本发明涉及一种带电粒子多子束系统，其包括带电粒子源（301）; 第一多孔板（320），其具有设置在所述源的下游的所述系统的带电粒子束路径中的多个孔; 具有多个孔的第一多孔选择板（313） 载体（340），其中所述第一多孔径选择器板安装在所述载体上; 以及构造成移动所述载体的致动器（350），使得所述第一多孔径选择器板在所述系统的第一操作模式中被布置在所述源的下游的系统的带电粒子束路径中，并且使得所述第一 多孔径选择器板在系统的第二操作模式中设置在带电粒子束路径的外部。 源极，第一多孔板和系统的载体被布置成使得在第一多孔径板和第一多孔径选择器板的下游位置处产生第一数量的带电粒子子束 第一操作模式，并且在第二操作模式的位置处产生第二数量的带电粒子子束，其中第一数量的子束与第二数量的子束不同。

公开(公告)号：US09336981B2

公开(公告)日：2016-05-10

申请号：US13639491

申请日：2011-03-31

Applicant: Rainer Knippelmeyer

Inventor： Rainer Knippelmeyer

IPC: H01J37/09 ,  H01J37/244

CPC classification number: H01J37/244 ,  H01J37/09 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/2446 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: A charged particle detection system comprises plural detection elements and a multi-aperture plate in proximity of the detection elements. Charged particle beamlets can traverse the apertures of the multi-aperture plate to be incident on the detection elements. More than one multi-aperture plate can be provided to form a stack of multi-aperture plates in proximity of the detector. A suitable electric potential supplied to the multi-aperture plate can have an energy filtering property for the plural charged particle beamlets traversing the apertures of the plate.

Abstract translation: 带电粒子检测系统包括检测元件附近的多个检测元件和多孔板。 带电粒子子束可穿过多孔板的入射到检测元件上的孔。 可以提供多于一个的多孔板以在检测器附近形成多孔板的堆叠。 提供给多孔板的合适电位可以对穿过板的孔的多个带电粒子子束具有能量过滤特性。