Invention Grant
US09384938B2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
有权
用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件
- Patent Title: Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
- Patent Title (中): 用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件
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Application No.: US13825820Application Date: 2011-09-23
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Publication No.: US09384938B2Publication Date: 2016-07-05
- Inventor: Dirk Zeidler , Thomas Kemen , Pascal Anger , Antonio Casares , Christof Riedesel
- Applicant: Dirk Zeidler , Thomas Kemen , Pascal Anger , Antonio Casares , Christof Riedesel
- Applicant Address: DE Oberkochen IL Rehovot
- Assignee: CARL ZEISS MICROSCOPY GMBH,APPLIED MATERIALS ISRAEL LTD.
- Current Assignee: CARL ZEISS MICROSCOPY GMBH,APPLIED MATERIALS ISRAEL LTD.
- Current Assignee Address: DE Oberkochen IL Rehovot
- Agency: Morris & Kamlay LLP
- International Application: PCT/EP2011/004777 WO 20110923
- International Announcement: WO2012/041464 WO 20120405
- Main IPC: H01J37/09
- IPC: H01J37/09 ; B82Y10/00 ; B82Y40/00 ; H01J37/28 ; H01J37/317

Abstract:
The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a carrier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.
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