Abstract:
This invention relates to a purified form of streptogramins, having of a combination of one or more group B components of streptogramins, of general formula: ##STR1## in which A.sub.1 is a radical of general formula: ##STR2## for which R' is H or OH and Y is H, a methylamino radical or a dimethylamino radical, R is an ethyl radical or, when R' is H, R can also represent--CH.sub.3, andR.sub.1 and R.sub.2 are H, or alternatively A.sub.1 is a radical of formula: ##STR3## R is an isobutyl radical, and R.sub.1 is OH and R.sub.2 is --CH.sub.3, and one or more group A minority components of streptogramins, of general formula: ##STR4## in which R" is H or a methyl or ethyl radical, in the state of cocrystallizate, of a coprecipitate or of a physical mixture of the powders.
Abstract:
This invention relates to a purified form of streptogramins, consisting of a combination of one or more group B components of streptogramins, of general formula: ##STR1## in which A.sub.1 is a radical of general formula: ##STR2## for which R' is H or OH and Y is H, a methylamino radical or a dimethylamino radical, R is an ethyl radical or, when R' is H, R can also represent --CH.sub.3, and R.sub.1 and R.sub.2 are H, or alternatively A.sub.1 is a radical of formula: ##STR3## R is an isobutyl radical, and R.sub.1 is OH and R.sub.2 is --CH.sub.3, and one or more group A minority components of streptogramins, of general formula: ##STR4## in which R" is H or a methyl or ethyl radical, in the state of cocrystallizate, of a coprecipitate or of a physical mixture of the powders.
Abstract:
The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a carrier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.
Abstract:
The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system down-stream of the source; a first multi-aperture selector plate (313) having plural apertures; a carrier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.
Abstract:
Purified form of streptogramines, characterised in that it contains at least one component from group B streptogramines of general formula (I), wherein R1 is Me or Et, R2 is H or OH, and R3 is substituted benzyl of general formula (III), such that 1) if R2 is H, R is NR4R5, wherein one of R4 and R5 is H or an Me radical and the other is Me, and R′ is Cl or Br, or R is (C3-5)alkenyl if R4 and R5 are Me, or 2) R is H and R′ is halogen, alkylamino or dialkylamino, an ether-oxide residue, alkylthio, (C1-3)alkyl or trihalogenomethyl, or R is halogen, (C2-4)alkylamino, (C2-4)dialkylamino or methyl ethyl amino, pyrrolidino alkenyl alkyl amino, dialkylamino, an alkyl cycloalkylmethyl amino radical or in ether-oxide residue, alkylthio, alkylthiomethyl, (C1-6)alkyl, aryl or trihalogenomethyl, and R′ is H, or R is halogen, amino, alkylamino or dialkylamino, an ether-oxide residue, an alkylthio radical, (C1-6)alkyl or trihalogenomethyl and R′ is halogen, alkylamino or dialkylamino, an ether-oxide residue or alkylthio, (C1-3)alkyl, cocrystallised with one or more minor components of group A of general formula (II) wherein R″ is H, Me or Et.