公开(公告)号：US06815698B2

公开(公告)日：2004-11-09

申请号：US09920633

申请日：2001-08-03

Applicant: Osamu Nagano ,  Yuichiro Yamazaki ,  Susumu Hashimoto ,  Motosuke Miyoshi

Inventor： Osamu Nagano ,  Yuichiro Yamazaki ,  Susumu Hashimoto ,  Motosuke Miyoshi

IPC: G21K510

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/04 ,  H01J37/147 ,  H01J37/153 ,  H01J2237/103 ,  H01J2237/1534 ,  H01J2237/1538

Abstract: A charged particle beam exposure system comprising: a charged particle beam emitting device which generates charged particle beams with which a substrate is irradiated, the charged particle beam emitting device generating the charged particle beams at an accelerating voltage which is lower than that at which an influence of a proximity effect occurs; an illumination optical system which adjusts a beam diameter of the charged particle beams so that density of the charged particle beams is uniform; an character aperture in which an aperture hole is formed in a shape corresponding to a desired pattern to be written; a first deflector which deflects the charged particle beams by an electrostatic field that the charged particle beams have a desired sectional shape and travel towards a desired aperture hole and which returns the charged particle beams passing through the aperture hole to an optical axis thereof; a reducing projecting optical system which forms a multi-pole lens field so that the charged particle beams passing through the character aperture substantially reduce at the same demagnification both in X and Y directions when the optical axis extends in Z directions and form an image on the substrate without forming any crossover between the character aperture and the substrate; and a second deflector which deflects the charged particle beams passing through the character aperture by means of an electrostatic field to scan the substrate with the charged particle beams.

公开(公告)号：US06774646B1

公开(公告)日：2004-08-10

申请号：US10058614

申请日：2002-01-28

Applicant: Liqun Han ,  Mark A. McCord

Inventor： Liqun Han ,  Mark A. McCord

IPC: G01R3100

CPC classification number: H01J37/28 ,  G01N23/04 ,  H01J37/04 ,  H01J37/141 ,  H01J37/145 ,  H01J37/147 ,  H01J2237/04756 ,  H01J2237/103 ,  H01J2237/2817

Abstract: A method for inspecting samples uses a multiple beam electron system having a uniform magnetic focusing field. Deflection of the incident electron beams is produced by deflector plates generating an electrostatic deflection force which produces a uniform force on the electron beams. Thermal field emission sources generate incident electron beams towards at least two portions of the sample. A detector array collects multiple detection electrons.

Abstract translation: 用于检查样品的方法使用具有均匀磁场的多束电子系统。 入射电子束的偏转由偏转板产生，该偏转板产生在电子束上产生均匀的力的静电偏转力。 热场发射源朝向样品的至少两部分产生入射电子束。 检测器阵列收集多个检测电子。

公开(公告)号：US20240128044A1

公开(公告)日：2024-04-18

申请号：US18392494

申请日：2023-12-21

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Xuerang HU ,  Zhongwei CHEN

IPC: H01J37/147 ,  H01J37/06 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/1474 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/1478 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

公开(公告)号：US20230282441A1

公开(公告)日：2023-09-07

申请号：US18158444

申请日：2023-01-23

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Xuerang HU ,  Zhongwei CHEN

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/06 ,  H01J37/10

CPC classification number: H01J37/1474 ,  H01J37/1477 ,  H01J37/1478 ,  H01J37/28 ,  H01J37/06 ,  H01J37/10 ,  H01J2237/024 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1536 ,  H01J2237/1534

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

公开(公告)号：US09947504B2

公开(公告)日：2018-04-17

申请号：US15180735

申请日：2016-06-13

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Klaus Hegele ,  Edgar Fichter ,  Michel Aliman ,  Dirk Preikszas ,  Christian Hendrich ,  Momme Mommsen ,  Michael Schnell ,  Kai Schubert

IPC: H01J37/24 ,  H01J37/28 ,  H01J37/147 ,  H01J37/30 ,  H01J37/141 ,  H01J37/21 ,  H01J37/26

CPC classification number: H01J37/1477 ,  H01J37/141 ,  H01J37/147 ,  H01J37/21 ,  H01J37/24 ,  H01J37/265 ,  H01J37/28 ,  H01J37/3007 ,  H01J2237/103 ,  H01J2237/1504 ,  H01J2237/151 ,  H01J2237/152

Abstract: The system described herein relates to a particle beam apparatus for analyzing and/or for processing an object and to a method for operating a particle beam apparatus. The particle beam apparatus is designed for example as an electron beam apparatus and/or an ion beam apparatus. The particle beam apparatus comprises a beam deflection device, for example an objective lens, which is provided with a first coil and a second coil. The first coil is operated with a first coil current. The second coil is operated with a second coil current. The first coil current and/or the second coil current may always be controlled in such a way that the sum of the first coil current and the second coil current (the summation current) or the difference between the first coil current and the second coil current (the difference current) is controlled to a setpoint value.

公开(公告)号：US09818573B2

公开(公告)日：2017-11-14

申请号：US14594852

申请日：2015-01-12

Applicant: Ion Beam Applications S.A.

Inventor： Michel Abs ,  Szymon Zaremba ,  Willem Kleeven

IPC: H01J37/10 ,  A61L2/08 ,  A61N5/10 ,  G21K1/08 ,  G21K5/04 ,  G21K5/10 ,  H05G2/00 ,  H01J37/30 ,  H01J37/317 ,  H01J37/147 ,  H01J37/304

CPC classification number: H01J37/10 ,  A61L2/087 ,  A61L2202/122 ,  A61N5/1043 ,  A61N2005/1087 ,  G21K1/08 ,  G21K5/04 ,  G21K5/10 ,  H01J37/147 ,  H01J37/1474 ,  H01J37/3002 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/3045 ,  H01J37/317 ,  H01J2237/103 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/2602 ,  H01J2237/30 ,  H01J2237/31701 ,  H05G2/00

Abstract: The present invention is related to an apparatus for transporting a charged particle beam. The apparatus may include means for scanning the charged particle beam on a target, a dipole magnet arranged upstream of the means for scanning, at least three quadrupole lenses arranged between the dipole magnet and the means for scanning and means for adjusting the field strength of said at least three quadrupole lenses in function of the scanning angle of the charged particle beam. The apparatus can be made at least single achromatic.

公开(公告)号：US20170287675A1

公开(公告)日：2017-10-05

申请号：US15387388

申请日：2016-12-21

Applicant: KLA-Tencor Corporation

Inventor： Arjun Hegde ,  Luca Grella ,  Christopher Sears

IPC: H01J37/153 ,  H01J37/244 ,  H01J37/18 ,  H01J37/26 ,  H01J37/10 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/153 ,  H01J37/10 ,  H01J37/18 ,  H01J37/20 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/103 ,  H01J2237/20285 ,  H01J2237/221

Abstract: A scanning electron microscopy system is disclosed. The system includes a sample stage configured to secure a sample having conducting structures disposed on an insulating substrate. The system includes an electron-optical column including an electron source configured to generate a primary electron beam and a set of electron-optical elements configured to direct at least a portion of the primary electron beam onto a portion of the sample. The system includes a detector assembly configured to detect electrons emanating from the surface of the sample. The system includes a controller communicatively coupled to the detector assembly. The controller is configured to direct the electron-optical column and stage to perform, with the primary electron beam, an alternating series of image scans and flood scans of the portion of the sample, wherein each of the flood scans are performed sequential to one or more of the imaging scans.

公开(公告)号：US20170254755A1

公开(公告)日：2017-09-07

申请号：US15061769

申请日：2016-03-04

Applicant: Applied Materials, Inc.

Inventor： Tae Seung CHO ,  Junghoon KIM ,  Soonwook JUNG ,  Soonam PARK ,  Dmitry LUBOMIRSKY

IPC: G01N21/68 ,  H01J37/32 ,  H01J37/10

CPC classification number: G01N21/68 ,  G01J3/0208 ,  G01J3/0229 ,  G01J3/0237 ,  G01J3/0289 ,  G01J3/06 ,  G01J3/443 ,  G01N21/73 ,  G01N2201/0638 ,  G01N2201/068 ,  H01J37/10 ,  H01J37/32458 ,  H01J37/32935 ,  H01J37/32963 ,  H01J37/32972 ,  H01J2237/103 ,  H01J2237/3341

Abstract: Implementations of the present disclosure relate to a plasma chamber having an optical device for measuring emission intensity of plasma species. In one implementation, the plasma chamber includes a chamber body defining a substrate processing region therein, the chamber body having a sidewall, a viewing window disposed in the sidewall, and a plasma monitoring device coupled to the viewing window. The plasma monitoring device includes an objective lens and an aperture member having a pinhole, wherein the aperture member is movable relative to the objective lens by an actuator to adjust the focal point in the plasma using principles of optics, allowing only the light rays from the focal point in the plasma to reach the pinhole. The plasma monitoring device therefore enables an existing OES (coupled to the plasma monitoring device through an optical fiber) to monitor emission intensity of the species at any specific locations of the plasma.

公开(公告)号：US20170236683A1

公开(公告)日：2017-08-17

申请号：US15180735

申请日：2016-06-13

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Klaus Hegele ,  Edgar Fichter ,  Michel Aliman ,  Dirk Preikszas ,  Christian Hendrich ,  Momme Mommsen ,  Michael Schnell ,  Kai Schubert

IPC: H01J37/147 ,  H01J37/30 ,  H01J37/24 ,  H01J37/28

CPC classification number: H01J37/1477 ,  H01J37/141 ,  H01J37/147 ,  H01J37/21 ,  H01J37/24 ,  H01J37/265 ,  H01J37/28 ,  H01J37/3007 ,  H01J2237/103 ,  H01J2237/1504 ,  H01J2237/151 ,  H01J2237/152

Abstract: The system described herein relates to a particle beam apparatus for analyzing and/or for processing an object and to a method for operating a particle beam apparatus. The particle beam apparatus is designed for example as an electron beam apparatus and/or an ion beam apparatus. The particle beam apparatus comprises a beam deflection device, for example an objective lens, which is provided with a first coil and a second coil. The first coil is operated with a first coil current. The second coil is operated with a second coil current. The first coil current and/or the second coil current may always be controlled in such a way that the sum of the first coil current and the second coil current (the summation current) or the difference between the first coil current and the second coil current (the difference current) is controlled to a setpoint value.

公开(公告)号：US20170025251A1

公开(公告)日：2017-01-26

申请号：US15217460

申请日：2016-07-22

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Momoyo ENYAMA ,  Muneyuki FUKUDA ,  Hideyuki KAZUMI ,  Koichi HAMADA ,  Sayaka TANIMOTO

IPC: H01J37/26 ,  H01J37/22

CPC classification number: H01J37/265 ,  H01J37/153 ,  H01J37/21 ,  H01J37/222 ,  H01J37/226 ,  H01J2237/049 ,  H01J2237/103 ,  H01J2237/1534 ,  H01J2237/223 ,  H01J2237/24542 ,  H01J2237/24592 ,  H01J2237/2801

Abstract: A charged particle beam apparatus with improved depth of focus and maintained/improved resolution has a charged particle source, an off-axis illumination aperture, a lens, a computer, and a memory unit. The apparatus acquires an image by detecting a signal generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture. The computer has a beam-computing-process unit to estimate a beam profile of the charged particle beam and an image-sharpening-process unit to sharpen the image using the estimated beam profile.

Abstract translation: 具有改善的聚焦深度和分辨率的改进的带电粒子束装置具有带电粒子源，离轴照明孔径，透镜，计算机和存储单元。 该装置通过检测通过从带电粒子源经由离轴照射孔引起的带电粒子束照射样品而产生的信号来获取图像。 计算机具有用于估计带电粒子束的束轮廓的波束计算处理单元和使用估计波束轮廓来锐化图像的图像锐化处理单元。