公开(公告)号：US20200294756A1

公开(公告)日：2020-09-17

申请号：US16645511

申请日：2018-08-24

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Toshiyuki YOKOSUKA ,  Hajime KAWANO ,  Kouichi KUROSAWA ,  Hideyuki KAZUMI ,  Chahn LEE

IPC: H01J37/05 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

Abstract: The purpose of the present invention is to provide a charged particle ray device which is capable of simply estimating the cross-sectional shape of a pattern. The charged particle ray device according to the present invention acquires a detection signal for each different discrimination condition of an energy discriminator, and estimates the cross-sectional shape of a sample by comparing the detection signal for each discrimination condition with a reference pattern (see FIG. 5).

公开(公告)号：US20180012725A1

公开(公告)日：2018-01-11

申请号：US15545550

申请日：2015-01-28

Applicant: Hitachi High-Technologies Corporation

Inventor： Toshiyuki YOKOSUKA ,  Hideyuki KAZUMI ,  Yuzuru MIZUHARA ,  Hajime KAWANO

IPC: H01J37/05 ,  H01J37/29 ,  H01J37/26

CPC classification number: H01J37/05 ,  H01J37/265 ,  H01J37/28 ,  H01J37/292 ,  H01J2237/24592 ,  H01J2237/2487 ,  H01J2237/2814 ,  H01J2237/2817

Abstract: Provided is a charged particle beam device that enables, even if a visual field includes therein a plurality of regions having different secondary electron emission conditions, the setting of appropriate energy filter conditions adapted to each of these regions. The charged particle beam device is equipped with a detector for detecting charged particles obtained on the basis of scanning, over a sample, a charged particle beam emitted from a charged particle source, and an energy filter for filtering by energy the charged particles emitted from the sample. Index values are determined for the plurality of regions contained within the scanning region of the charged particle beam, and, for each of a plurality of energy filter conditions, differences are calculated between the plurality of index values and the reference index values that have been set for each of the plurality of regions.

公开(公告)号：US20160300690A1

公开(公告)日：2016-10-13

申请号：US15035265

申请日：2014-11-05

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Akira IKEGAMI ,  Hideto DOHI ,  Hideyuki KAZUMI ,  Yoichi OSE ,  Naomasa SUZUKI ,  Momoyo ENYAMA ,  Ryuji NISHI ,  Akio TAKAOKA

IPC: H01J37/28 ,  H01J37/153 ,  H01J3/12 ,  H01J37/14

CPC classification number: H01J37/28 ,  H01J3/12 ,  H01J37/14 ,  H01J37/147 ,  H01J37/153 ,  H01J2237/15 ,  H01J2237/2611 ,  H01J2237/2814

Abstract: Provided is a charged-particle-beam device capable of simultaneously cancelling out a plurality of aberrations caused by non-uniform distribution of the opening angle and energy of a charged particle beam. The charged-particle-beam device is provided with an aberration generation lens for generating an aberration due to the charged particle beam passing off-axis, and a corrective lens for causing the trajectory of the charged particle beam to converge on the main surface of an objective lens irrespective of the energy of the charged particle beam. The main surface of the corrective lens is disposed at a crossover position at which a plurality of charged particle beams having differing opening angles converge after passing through the aberration generation lens.

Abstract translation: 提供一种带电粒子束装置，其能够同时消除由打开角度的非均匀分布和带电粒子束的能量引起的多个像差。 带电粒子束装置设有像差产生透镜，用于产生由于穿过离轴的带电粒子束造成的像差，以及校正透镜，用于使带电粒子束的轨迹会聚在 物镜不管带电粒子束的能量如何。 校正透镜的主表面设置在交叉位置，在该交叉位置处，具有不同开口角度的多个带电粒子束在通过像差产生透镜之后会聚。

公开(公告)号：US20160225583A1

公开(公告)日：2016-08-04

申请号：US15021039

申请日：2014-05-30

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Natsuki TSUNO ,  Yoshinobu KIMURA ,  Hideyuki KAZUMI ,  Hajime KAWANO ,  Junichiro TOMIZAWA

IPC: H01J37/28 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/043

Abstract: An object of the present invention is to realize both of the accuracy of measuring the amount of secondary electron emissions and the stability of a charged particle beam image in a charged particle beam device. In a charged particle beam device, extraction of detected signals is started by a first trigger signal, the extraction of the detected signals is completed by a second trigger signal, the detected signals are sampled N times using N (N is a natural number) third trigger signals that equally divide an interval time T between the first trigger signal and the second trigger signal, secondary charged particles are measured by integrating and averaging the signals sampled in respective division times ΔT obtained by equally dividing the interval time T, and the division time ΔT is controlled in such a manner that the measured number of secondary charged particles becomes larger than the minimum number of charged particles satisfying ergodicity.

Abstract translation: 本发明的目的在于实现测量二次电子发射量的精度和带电粒子束装置中的带电粒子束图像的稳定性。 在带电粒子束装置中，通过第一触发信号开始检测到的信号的提取，通过第二触发信号完成检测信号的提取，使用N（N是自然数）第三 触发信号，将第一触发信号和第二触发信号之间的间隔时间T均等地分开，通过对通过等分间隔时间T获得的各个分割时间ΔT中采样的信号进行积分和平均来测量次级带电粒子， 以这样的方式控制ΔT，使得测量的二次带电粒子的数量变得大于满足遍遍性的带电粒子的最小数量。

公开(公告)号：US20170278671A1

公开(公告)日：2017-09-28

申请号：US15618203

申请日：2017-06-09

Applicant: Hitachi High-Technologies Corporation

Inventor： Toshiyuki YOKOSUKA ,  Chahn LEE ,  Hideyuki KAZUMI ,  Hajime KAWANO ,  Shahedul HOQUE ,  Kumiko SHIMIZU ,  Hiroyuki TAKAHASHI

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/22 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J2237/2803 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01J2237/2826 ,  H01J2237/3045

Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

公开(公告)号：US20170186583A1

公开(公告)日：2017-06-29

申请号：US15304869

申请日：2015-04-20

Applicant: Hitachi High-Technologies Corporation

Inventor： Kaori SHIRAHATA ,  Daisuke BIZEN ,  Makoto SAKAKIBARA ,  Yasunari SOHDA ,  Hajime KAWANO ,  Hideyuki KAZUMI

IPC: H01J37/28 ,  G01N23/225 ,  H01J37/26

CPC classification number: H01J37/28 ,  G01N23/2251 ,  H01J37/252 ,  H01J37/263 ,  H01J49/48 ,  H01J2237/2602 ,  H01J2237/28 ,  H01J2237/2801 ,  H01J2237/2806

Abstract: The scanning electron microscope includes: an electron source; a first deflector for deflecting a primary electron beam emitted from the electron source; a second deflector for focusing the primary electron beam deflected by the first deflector and deflecting a second electron from a sample, which is generated the focused primary electron beam, to the outside of the optical axis; a voltage applying unit for applying a negative voltage to the sample to decelerate the primary electron beam; a spectrometer for dispersing the secondary electron; a detector for detecting the secondary electron passing through the spectrometer; an electrostatic lens provided between the second deflector and the spectrometer; and a voltage control unit that controls the voltage applied to the electrostatic lens based on the negative voltage applied to the sample. The electrostatic lens allows the deflecting action to be overlapped with the converging action.

公开(公告)号：US20150364290A1

公开(公告)日：2015-12-17

申请号：US14741324

申请日：2015-06-16

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Momoyo ENYAMA ,  Akira IKEGAMI ,  Hideto DOHI ,  Hideyuki KAZUMI ,  Naomasa SUZUKI

IPC: H01J37/147 ,  H01J37/06 ,  H01J37/141

CPC classification number: H01J37/1478 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1534

Abstract: The charged particle beam application device is provided with a charged particle source and an objective lens that converges charged particle beam generated by the charged particle source onto a sample. In this case, the charged particle beam application device is further provided with an aberration generating element installed between the charged particle beam source and the objective lens, a tilt-use deflector installed between the aberration generating element and the objective lens, a deflection aberration control unit for controlling the aberration generating element, a first electromagnetic field superposing multipole installed between the aberration generating element and the objective lens, and an electromagnetic field superposing multipole control unit for controlling the first electromagnetic field superposing multipole. The aberration generating element has such a function that when the charged particle beam is tilted relative to the sample by the tilt-use deflector, a plurality of resulting aberrations are cancelled with one another. Moreover, the first electromagnetic field superposing multipole has a function to change the orbit of a charged particle beam having energy different from that of the main charged particle beam in the charged particle beam.

Abstract translation: 带电粒子束施加装置设置有带电粒子源和将由带电粒子源产生的带电粒子束会聚到样本上的物镜。 在这种情况下，带电粒子束施加装置还设置有安装在带电粒子束源和物镜之间的像差产生元件，安装在像差产生元件和物镜之间的倾斜用偏转器，偏转像差控制 用于控制像差产生元件的单元，安装在像差产生元件和物镜之间的第一电磁场叠加多极，以及用于控制第一电磁场叠加多极的电磁场叠加多极控制单元。 像差产生元件具有这样的功能：当通过倾斜使用偏转器使带电粒子束相对于样本倾斜时，多个得到的像差彼此抵消。 此外，第一电磁场叠加多极具有改变具有与带电粒子束中的主带电粒子束的能量不同的能量的带电粒子束的轨道的功能。

公开(公告)号：US20150348748A1

公开(公告)日：2015-12-03

申请号：US14760259

申请日：2014-01-22

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuzuru MIZUHARA ,  Miki ISAWA ,  Minoru YAMAZAKI ,  Hitoshi TAMURA ,  Hideyuki KAZUMI

IPC: H01J37/244 ,  H01J37/26 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/268 ,  H01J37/1472 ,  H01J37/244 ,  H01J37/265 ,  H01J37/266 ,  H01J37/28 ,  H01J37/3178 ,  H01J2237/24564 ,  H01J2237/28 ,  H01J2237/2809

Abstract: An object of the present invention is to provide a method and an apparatus capable of measuring a potential of a sample surface by using a charged particle beam, or of detecting a compensation value of a variation in an apparatus condition which changes due to sample charging, by measuring a sample potential caused by irradiation with the charged particle beam. In order to achieve the object, a method and an apparatus are provided in which charged particle beams (2(a), 2(b)) emitted from a sample (23) are deflected by a charged particle deflector (33) in a state in which the sample (23) is irradiated with a charged particle beam (1), and information regarding a sample potential is detected by using a signal obtained at that time.

Abstract translation: 本发明的目的是提供一种能够通过使用带电粒子束来测量样品表面的电位或检测由于样品充电而发生变化的装置状态的变化的补偿值的方法和装置， 通过测量由带电粒子束的照射引起的样品电位。 为了实现该目的，提供了一种方法和装置，其中从样品（23）发射的带电粒子束（2（a），2（b））由带电粒子偏转器（33）在某种状态下偏转 其中样品（23）被带电粒子束（1）照射，并且通过使用当时获得的信号来检测关于样品电位的信息。

公开(公告)号：US20190103250A1

公开(公告)日：2019-04-04

申请号：US16136534

申请日：2018-09-20

Applicant: Hitachi High-Technologies Corporation

Inventor： Toshiyuki YOKOSUKA ,  Chahn LEE ,  Hideyuki KAZUMI ,  Hajime KAWANO

IPC: H01J37/28 ,  H01J37/26

Abstract: There is proposed a charged particle beam device that generates a first signal waveform on the basis of scanning, the number of scanning lines of which is one or more, the scanning intersecting an edge of a pattern on a sample, generates a second signal waveform for a first area that is wider than the one scanning line on the basis of scanning, the number of scanning lines of which is larger than that of scanning for generating the first signal waveform, then determines a deviation between the generated first and second signal waveforms, and thereby determines, from the deviation, correction data used at the time of dimensional measurement.

公开(公告)号：US20150357153A1

公开(公告)日：2015-12-10

申请号：US14410999

申请日：2013-06-10

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hiroshi MAKINO ,  Hideyuki KAZUMI ,  Minoru YAMAZAKI ,  Yuzuru MIZUHARA ,  Miki ISAWA

IPC: H01J37/147 ,  H01J37/28

CPC classification number: H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24485 ,  H01J2237/2449 ,  H01J2237/2806 ,  H01J2237/281

Abstract: An objective of the present invention is to provide a charged particle beam device with which information based on a charged particle which is discharged from a bottom part of high-aspect structure is revealed more than with previous technology. To achieve the objective, proposed is a charged particle beam device comprising: a first orthogonal electromagnetic field generator which deflects charged particles which are discharged from a material; a second orthogonal electromagnetic field generator which further deflects the charged particles which are deflected by the first orthogonal electromagnetic field generator; an aperture forming member having a charged particle beam pass-through aperture; and a third orthogonal electromagnetic field generator which deflects the charged particles which have passed through the aperture forming member.

Abstract translation: 本发明的目的是提供一种带电粒子束装置，与先前的技术相比，显示出从高方面结构的底部排出的基于带电粒子的信息。 为了实现该目的，提出了一种带电粒子束装置，包括：第一正交电磁场发生器，其偏转从材料排出的带电粒子; 第二正交电磁场发生器，其进一步偏转由第一正交电磁场发生器偏转的带电粒子; 具有带电粒子束直通孔的孔形成构件; 以及第三正交电磁场发生器，其使穿过孔形成构件的带电粒子偏转。