公开(公告)号：US20140001359A1

公开(公告)日：2014-01-02

申请号：US13922239

申请日：2013-06-19

Applicant: Hitachi High-Technologies Corporation

Inventor： Makoto EZUMI ,  Satoru IWAMA ,  Junichi KAKUTA ,  Takahiro SATO ,  Akira IKEGAMI

IPC: H01J37/26

CPC classification number: H01J37/26 ,  G01N23/2251 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0048 ,  H01J2237/281

Abstract: As an aspect for realizing accurate observation, inspection, or measurement of the contact hole with large aspect ratio, a method and a device to scan a second electron beam after scanning a first electron beam to a sample to charge the sample are proposed wherein the beam diameter of the first electron beam is made larger than the beam diameter of the second electron beam.

Abstract translation: 作为用于实现具有大纵横比的接触孔的精确观察，检查或测量的一个方面，提出了在将第一电子束扫描到样品以对样品充电之后扫描第二电子束的方法和装置，其中， 使第一电子束的直径大于第二电子束的光束直径。

公开(公告)号：US20160300690A1

公开(公告)日：2016-10-13

申请号：US15035265

申请日：2014-11-05

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Akira IKEGAMI ,  Hideto DOHI ,  Hideyuki KAZUMI ,  Yoichi OSE ,  Naomasa SUZUKI ,  Momoyo ENYAMA ,  Ryuji NISHI ,  Akio TAKAOKA

IPC: H01J37/28 ,  H01J37/153 ,  H01J3/12 ,  H01J37/14

CPC classification number: H01J37/28 ,  H01J3/12 ,  H01J37/14 ,  H01J37/147 ,  H01J37/153 ,  H01J2237/15 ,  H01J2237/2611 ,  H01J2237/2814

Abstract: Provided is a charged-particle-beam device capable of simultaneously cancelling out a plurality of aberrations caused by non-uniform distribution of the opening angle and energy of a charged particle beam. The charged-particle-beam device is provided with an aberration generation lens for generating an aberration due to the charged particle beam passing off-axis, and a corrective lens for causing the trajectory of the charged particle beam to converge on the main surface of an objective lens irrespective of the energy of the charged particle beam. The main surface of the corrective lens is disposed at a crossover position at which a plurality of charged particle beams having differing opening angles converge after passing through the aberration generation lens.

Abstract translation: 提供一种带电粒子束装置，其能够同时消除由打开角度的非均匀分布和带电粒子束的能量引起的多个像差。 带电粒子束装置设有像差产生透镜，用于产生由于穿过离轴的带电粒子束造成的像差，以及校正透镜，用于使带电粒子束的轨迹会聚在 物镜不管带电粒子束的能量如何。 校正透镜的主表面设置在交叉位置，在该交叉位置处，具有不同开口角度的多个带电粒子束在通过像差产生透镜之后会聚。

公开(公告)号：US20210233738A1

公开(公告)日：2021-07-29

申请号：US17230650

申请日：2021-04-14

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta Kawamoto ,  Akira IKEGAMI ,  Yasushi EBIZUKA ,  Nobuo FUJINAGA

IPC: H01J37/153 ,  H01J37/10 ,  H01J37/147

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

公开(公告)号：US20150364290A1

公开(公告)日：2015-12-17

申请号：US14741324

申请日：2015-06-16

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Momoyo ENYAMA ,  Akira IKEGAMI ,  Hideto DOHI ,  Hideyuki KAZUMI ,  Naomasa SUZUKI

IPC: H01J37/147 ,  H01J37/06 ,  H01J37/141

CPC classification number: H01J37/1478 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1534

Abstract: The charged particle beam application device is provided with a charged particle source and an objective lens that converges charged particle beam generated by the charged particle source onto a sample. In this case, the charged particle beam application device is further provided with an aberration generating element installed between the charged particle beam source and the objective lens, a tilt-use deflector installed between the aberration generating element and the objective lens, a deflection aberration control unit for controlling the aberration generating element, a first electromagnetic field superposing multipole installed between the aberration generating element and the objective lens, and an electromagnetic field superposing multipole control unit for controlling the first electromagnetic field superposing multipole. The aberration generating element has such a function that when the charged particle beam is tilted relative to the sample by the tilt-use deflector, a plurality of resulting aberrations are cancelled with one another. Moreover, the first electromagnetic field superposing multipole has a function to change the orbit of a charged particle beam having energy different from that of the main charged particle beam in the charged particle beam.

Abstract translation: 带电粒子束施加装置设置有带电粒子源和将由带电粒子源产生的带电粒子束会聚到样本上的物镜。 在这种情况下，带电粒子束施加装置还设置有安装在带电粒子束源和物镜之间的像差产生元件，安装在像差产生元件和物镜之间的倾斜用偏转器，偏转像差控制 用于控制像差产生元件的单元，安装在像差产生元件和物镜之间的第一电磁场叠加多极，以及用于控制第一电磁场叠加多极的电磁场叠加多极控制单元。 像差产生元件具有这样的功能：当通过倾斜使用偏转器使带电粒子束相对于样本倾斜时，多个得到的像差彼此抵消。 此外，第一电磁场叠加多极具有改变具有与带电粒子束中的主带电粒子束的能量不同的能量的带电粒子束的轨道的功能。

公开(公告)号：US20190287754A1

公开(公告)日：2019-09-19

申请号：US16291090

申请日：2019-03-04

Applicant: Hitachi High-Technologies Corporation

Inventor： Akira IKEGAMI ,  Yuta KAWAMOTO ,  Naomasa SUZUKI ,  Manabu YANO ,  Yasushi EBIZUKA ,  Naoma BAN

IPC: H01J37/141 ,  H01J37/153 ,  H01J37/147 ,  H01J37/09 ,  H01J37/28

Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.

公开(公告)号：US20160217967A1

公开(公告)日：2016-07-28

申请号：US15006721

申请日：2016-01-26

Applicant: Hitachi High-Technologies Corporation

Inventor： Hideto DOHI ,  Akira IKEGAMI ,  Hideyuki KAZUMI

IPC: H01J37/141 ,  H01J37/147 ,  H01J37/28 ,  H01J37/21

CPC classification number: H01J37/141 ,  H01J37/1471 ,  H01J37/1472 ,  H01J37/1478 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/04922 ,  H01J2237/1506 ,  H01J2237/1534 ,  H01J2237/2448 ,  H01J2237/24592 ,  H01J2237/2809

Abstract: In a charged particle beam device including an objective lens that focuses a charged particle beam; a first deflector that deflects the charged particle beam to emit the charged particle beam to a sample from a direction different from an ideal optical axis of the objective lens; and a second deflector that deflects a charged particle emitted from the sample, a charged particle focusing lens to focus the charged particle emitted from the sample is disposed between the sample and the second deflector and strengths of the objective lens and the charged particle focusing lens are controlled, according to deflection conditions of the first deflector.

Abstract translation: 在包括聚焦带电粒子束的物镜的带电粒子束装置中; 第一偏转器，其使带电粒子束偏转，以从与物镜的理想光轴不同的方向将带电粒子束发射到样品; 以及第二偏转器，其使从样品发射的带电粒子偏转，带电粒子聚焦透镜将样品发射的带电粒子聚焦在样品和第二偏转器之间，物镜和带电粒子聚焦透镜的强度为 根据第一偏转器的偏转条件进行控制。

公开(公告)号：US20150357155A1

公开(公告)日：2015-12-10

申请号：US14760053

申请日：2014-01-21

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hideto DOHI ,  Akira IKEGAMI ,  Hideyuki KAZUMI

IPC: H01J37/147 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/1478 ,  H01J37/147 ,  H01J37/153 ,  H01J37/22 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/1507 ,  H01J2237/221 ,  H01J2237/2806

Abstract: There is provided a charged particle beam apparatus that includes a trajectory monitoring unit which is disposed above an objective lens (14) and which includes an optical element (12) having a lens action and a trajectory correcting deflector (10). An applied voltage and an excitation current of the optical element (12) are set to zero after a trajectory correction of a primary charged particle beam (30). Accordingly, the lens action and an aberration of the optical element (12) have no influence on resolution.

Abstract translation: 提供了一种带电粒子束装置，其包括设置在物镜（14）上方并包括具有透镜作用的光学元件（12）和轨迹校正偏转器（10）的轨迹监测单元。 在一次带电粒子束（30）的轨迹校正之后，光学元件（12）的施加电压和激励电流被设置为零。 因此，透镜作用和光学元件（12）的像差对分辨率没有影响。

公开(公告)号：US20210398770A1

公开(公告)日：2021-12-23

申请号：US17462455

申请日：2021-08-31

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta KAWAMOTO ,  Akira IKEGAMI ,  Yasushi EBIZUKA ,  Nobuo FUJINAGA

IPC: H01J37/153 ,  H01J37/10 ,  H01J37/147

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

公开(公告)号：US20200294757A1

公开(公告)日：2020-09-17

申请号：US16782521

申请日：2020-02-05

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta KAWAMOTO ,  Akira IKEGAMI ,  Yasushi EBIZUKA ,  Nobuo FUJINAGA

IPC: H01J37/153 ,  H01J37/10 ,  H01J37/147

Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.

公开(公告)号：US20200185186A1

公开(公告)日：2020-06-11

申请号：US16664100

申请日：2019-10-25

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuta KAWAMOTO ,  Akira IKEGAMI ,  Masahiro FUKUTA

IPC: H01J37/147 ,  H01J37/12

Abstract: To provide a charged particle beam device capable of preventing generation of geometric aberration by aligning axes of electrostatic lenses with high accuracy even when center holes of respective electrodes which constitute the electrostatic lens are not disposed coaxially. The charged particle beam device according to the invention includes an electrostatic lens disposed between an acceleration electrode and an objective lens, wherein at least one of the electrodes which constitutes the electrostatic lens is formed of a magnetic body, and two or more magnetic field generating elements are disposed along an outer periphery of the electrode.