Charged Particle Beam Device and Charged Particle Beam Measurement Method
    2.
    发明申请
    Charged Particle Beam Device and Charged Particle Beam Measurement Method 审中-公开
    带电粒子束装置和带电粒子束测量方法

    公开(公告)号:US20160225583A1

    公开(公告)日:2016-08-04

    申请号:US15021039

    申请日:2014-05-30

    IPC分类号: H01J37/28 H01J37/244

    摘要: An object of the present invention is to realize both of the accuracy of measuring the amount of secondary electron emissions and the stability of a charged particle beam image in a charged particle beam device. In a charged particle beam device, extraction of detected signals is started by a first trigger signal, the extraction of the detected signals is completed by a second trigger signal, the detected signals are sampled N times using N (N is a natural number) third trigger signals that equally divide an interval time T between the first trigger signal and the second trigger signal, secondary charged particles are measured by integrating and averaging the signals sampled in respective division times ΔT obtained by equally dividing the interval time T, and the division time ΔT is controlled in such a manner that the measured number of secondary charged particles becomes larger than the minimum number of charged particles satisfying ergodicity.

    摘要翻译: 本发明的目的在于实现测量二次电子发射量的精度和带电粒子束装置中的带电粒子束图像的稳定性。 在带电粒子束装置中,通过第一触发信号开始检测到的信号的提取,通过第二触发信号完成检测信号的提取,使用N(N是自然数)第三 触发信号,将第一触发信号和第二触发信号之间的间隔时间T均等地分开,通过对通过等分间隔时间T获得的各个分割时间ΔT中采样的信号进行积分和平均来测量次级带电粒子, 以这样的方式控制ΔT,使得测量的二次带电粒子的数量变得大于满足遍遍性的带电粒子的最小数量。

    CHARGED PARTICLE BEAM DEVICE
    3.
    发明申请

    公开(公告)号:US20190051490A1

    公开(公告)日:2019-02-14

    申请号:US16088771

    申请日:2016-04-27

    IPC分类号: H01J37/28 H01J37/26 G01B15/04

    摘要: To provide a charged particle beam device which enables observation and evaluation of the surface and the inside of a sample with low damage to the sample, the charged particle beam device has: a charged particle beam source 2; a sample table 9 in which the sample 210 is placed; a charged particle beam optical system which pulsates a charged particle beam 100 and irradiates the charged particle beam to the sample at an acceleration voltage within a range of 0 kV to 5 kV; a split distance selector 125 for selecting a measurement object of the sample; and a split distance setting unit 124 for setting a split distance in one line scanning of the charged particle beam on the sample.

    CHARGED PARTICLE BEAM APPARATUS
    4.
    发明申请

    公开(公告)号:US20210020422A1

    公开(公告)日:2021-01-21

    申请号:US16306911

    申请日:2016-06-23

    摘要: In order to provide a charged particle beam apparatus capable of stably detecting secondary particles and electromagnetic waves even for a non-conductive sample under high vacuum environment and enabling excellent observation and analysis, the charged particle beam apparatus includes a charged particle gun (12), scanning deflectors (17 and 18) configured to scan a charged particle beam (20) emitted from the charged particle gun (12) onto a sample (21), detectors (40 and 41) configured to detect a scanning control voltage input from an outside into the scanning deflectors, an arithmetic unit (42) configured to calculate, based on the detected scanning control voltage, irradiation pixel coordinates for the charged particle beam; and an irradiation controller (45) configured to control irradiation of the sample with the charged particle beam according to the irradiation pixel coordinates.

    Charged Particle Microscope and Method of Imaging Sample

    公开(公告)号:US20210233740A1

    公开(公告)日:2021-07-29

    申请号:US16094281

    申请日:2016-04-22

    IPC分类号: H01J37/244 H01J37/12

    摘要: The present invention provides an electron microscope and an observation method capable of observing secondary electrons in the atmosphere. In detail, a charged particle microscope of the invention includes: a partition wall that separates a non-vacuum space in which a sample is loaded from a vacuum space inside a charged particle optical lens barrel; an upper electrode; a lower electrode on which the sample is loaded; a power supply for applying a voltage to at least one of the upper electrode and the lower electrode; a sample gap adjusting mechanism for adjusting a gap between the sample and the partition wall; and an image forming unit for forming an image of the sample based on the current absorbed by the lower electrode. The secondary electrons are selectively measured by using an amplification effect due to ionization collision between electrons and gas molecules generated when a voltage is applied between the upper electrode and the lower electrode. As a detection method, a method is used which measures a current value flowing in a substrate.

    CHARGED PARTICLE BEAM APPARATUS AND INSPECTION METHOD USING THE SAME
    7.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS AND INSPECTION METHOD USING THE SAME 有权
    充电颗粒光束装置和使用该装置的检查方法

    公开(公告)号:US20160148781A1

    公开(公告)日:2016-05-26

    申请号:US14948167

    申请日:2015-11-20

    摘要: A charged particle beam apparatus makes it possible to acquire information in the cross-sectional direction (depth direction) of a sample having an internal structure in a nondestructive manner with reduced damage. Further, the apparatus makes it possible to analyze the depth and/or dimensions in the depth direction of the internal structure. The charged particle beam apparatus includes: a means for providing a time base for control signals; a means for applying a charged particle beam to a sample in synchronization with the time base and controlling an irradiation position; a means for analyzing the emission characteristics of an emission electron from the sample from a detection signal of the emission electron; and a means for analyzing the electrical characteristics or cross-sectional morphological characteristics of the sample based on the emission characteristics.

    摘要翻译: 带电粒子束装置使得可以以非破坏性的方式获得具有内部结构的样品的横截面方向(深度方向)上的信息,并减少损伤。 此外,该装置使得可以分析内部结构的深度方向上的深度和/或尺寸。 带电粒子束装置包括:用于提供控制信号的时基的装置; 用于与时基同步地将带电粒子束施加到样本并控制照射位置的装置; 用于从发射电子的检测信号分析来自样品的发射电子的发射特性的装置; 以及用于基于发射特性分析样品的电特性或横截面形态特征的手段。