公开(公告)号：US20190051490A1

公开(公告)日：2019-02-14

申请号：US16088771

申请日：2016-04-27

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Natsuki TSUNO ,  Naomasa SUZUKI ,  Atsushi OKITA ,  Muneyuki FUKUDA

IPC: H01J37/28 ,  H01J37/26 ,  G01B15/04

Abstract: To provide a charged particle beam device which enables observation and evaluation of the surface and the inside of a sample with low damage to the sample, the charged particle beam device has: a charged particle beam source 2; a sample table 9 in which the sample 210 is placed; a charged particle beam optical system which pulsates a charged particle beam 100 and irradiates the charged particle beam to the sample at an acceleration voltage within a range of 0 kV to 5 kV; a split distance selector 125 for selecting a measurement object of the sample; and a split distance setting unit 124 for setting a split distance in one line scanning of the charged particle beam on the sample.