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    Charged Particle Beam Device
    4.
    发明申请
    Charged Particle Beam Device 审中-公开

    公开(公告)号：US20170345613A1

    公开(公告)日：2017-11-30

    申请号：US15533517

    申请日：2014-12-10

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Yuzuru MIZUHARA ,  Toshiyuki YOKOSUKA ,  Hideyuki KAZUMI ,  Kouichi KUROSAWA ,  Kenichi MYOCHIN

    IPC: H01J37/12 ,  H01J37/244

    Abstract: The purpose of the present invention is to reduce the amount of charged particles that are lost by colliding with the interior of a column of a charged particle beam device, and detect charged particles with high efficiency. To achieve this purpose, proposed is a charged particle beam device provided with: an objective lens that focuses a charged particle beam; a detector that is disposed between the objective lens and a charged particle source; a deflector that deflects charged particles emitted from a sample such that the charged particles separate from the axis of the charged particle beam; and a plurality of electrodes that are disposed between the deflector and the objective lens and that form a plurality of electrostatic lenses for focusing the charged particles emitted from the sample on a deflection point of the deflector.

    Charged Particle Beam Device
    5.
    发明申请
    Charged Particle Beam Device 有权
    带电粒子束装置

    公开(公告)号：US20150357154A1

    公开(公告)日：2015-12-10

    申请号：US14762621

    申请日：2014-02-05

    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

    Inventor： Toshiyuki YOKOSUKA ,  Chahn LEE ,  Hideyuki KAZUMI

    IPC: H01J37/147 ,  H01J37/28

    CPC classification number: H01J37/1474 ,  H01J37/147 ,  H01J37/22 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/15 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/24592 ,  H01J2237/2806 ,  H01J2237/2817

    Abstract: An object of the invention is to provide a charged particle beam apparatus capable of performing high-precision measurement even on a pattern in which a width of edges is narrow and inherent peaks of the edges cannot be easily detected. In order to achieve the above object, there is proposed a charged particle beam apparatus including an opening portion forming member having a passage opening of a charged particle beam and a detector for detecting charged particles emitted from a sample or charged particles generated by causing the charged particles to collide with the opening portion forming member, the charged particle beam apparatus including: a deflector for deflecting the charged particles emitted from the sample; and a control device for controlling the deflector, the control device performing pattern measurement with the use of a first detected signal in which a signal of one edge is emphasized relatively more than a signal of another edge among a plurality of edges on the sample and a second detected signal in which the signal of the another edge is emphasized relatively more than the signal of the one edge among the plurality of edges.

    Abstract translation: 本发明的目的是提供一种即使在边缘宽度窄的图案上也能够进行高精度测量的带电粒子束装置，不能容易地检测到边缘的固有峰值。 为了实现上述目的，提出了一种带电粒子束装置，其包括具有带电粒子束的通道开口的开口部分形成部件和用于检测从样品发射的带电粒子或通过使带电粒子产生的带电粒子的检测器 粒子与开口部形成部件碰撞，带电粒子束装置包括：偏转器，用于偏转从样品发射的带电粒子; 以及用于控制偏转器的控制装置，所述控制装置使用第一检测信号执行图案测量，其中一个边缘的信号被相对地比样本上的多个边缘中的另一边缘的信号强调，并且 第二检测信号，其中另一边缘的信号比多个边缘中的一个边缘的信号相对地强调。

    Charged Particle Beam Device
    7.
    发明申请
    Charged Particle Beam Device 审中-公开

    公开(公告)号：US20190103250A1

    公开(公告)日：2019-04-04

    申请号：US16136534

    申请日：2018-09-20

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Toshiyuki YOKOSUKA ,  Chahn LEE ,  Hideyuki KAZUMI ,  Hajime KAWANO

    IPC: H01J37/28 ,  H01J37/26

    Abstract: There is proposed a charged particle beam device that generates a first signal waveform on the basis of scanning, the number of scanning lines of which is one or more, the scanning intersecting an edge of a pattern on a sample, generates a second signal waveform for a first area that is wider than the one scanning line on the basis of scanning, the number of scanning lines of which is larger than that of scanning for generating the first signal waveform, then determines a deviation between the generated first and second signal waveforms, and thereby determines, from the deviation, correction data used at the time of dimensional measurement.

    SCANNING ELECTRON MICROSCOPE AND CALCULATION METHOD FOR THREE-DIMENSIONAL STRUCTURE DEPTH
    9.
    发明申请
    SCANNING ELECTRON MICROSCOPE AND CALCULATION METHOD FOR THREE-DIMENSIONAL STRUCTURE DEPTH 审中-公开

    公开(公告)号：US20200234916A1

    公开(公告)日：2020-07-23

    申请号：US16747761

    申请日：2020-01-21

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Kenji YASUI ,  Mayuka OSAKI ,  Makoto SUZUKI ,  Hirohiko KITSUKI ,  Toshiyuki YOKOSUKA ,  Daisuke BIZEN ,  Yusuke ABE

    IPC: H01J37/28 ,  H01J37/244 ,  G01N23/2251 ,  H01J37/20

    Abstract: To measure a depth of a three-dimensional structure, for example, a hole or a groove, formed in a sample without preparing information for each pattern or calibration in advance. The invention provides an electron microscope including a detection unit that detects, among emitted electrons generated from a sample by irradiating the sample with a primary electron beam, emitted electrons of which an emission angle is in a predetermined range, the emission angle being an angle formed between an axial direction of the primary electron beam and an emission direction of the emitted electrons from the sample, and outputs a detection signal corresponding to the number of the emitted electrons which are detected. In the electron microscope, an emission angle distribution of a detection signal is obtained based on a plurality of detection signals output by the detection unit, the detection signals being obtained by detecting the emitted electrons having emission angles in each of the plurality of set ranges of emission angles and generated by irradiating a bottom portion of the three-dimensional structure with the primary electron beam, and an opening angle is obtained based on a change point of the emission angle distribution, the opening angle being an angle formed between an optical axis direction of the primary electron beam and a straight line that passes through an upper end of a side wall of the three-dimensional structure from a position irradiated with the primary electron beam in the bottom portion of the three-dimensional structure.

    Charged Particle Beam Device
    10.
    发明申请
    Charged Particle Beam Device 审中-公开

    公开(公告)号：US20180012725A1

    公开(公告)日：2018-01-11

    申请号：US15545550

    申请日：2015-01-28

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Toshiyuki YOKOSUKA ,  Hideyuki KAZUMI ,  Yuzuru MIZUHARA ,  Hajime KAWANO

    IPC: H01J37/05 ,  H01J37/29 ,  H01J37/26

    CPC classification number: H01J37/05 ,  H01J37/265 ,  H01J37/28 ,  H01J37/292 ,  H01J2237/24592 ,  H01J2237/2487 ,  H01J2237/2814 ,  H01J2237/2817

    Abstract: Provided is a charged particle beam device that enables, even if a visual field includes therein a plurality of regions having different secondary electron emission conditions, the setting of appropriate energy filter conditions adapted to each of these regions. The charged particle beam device is equipped with a detector for detecting charged particles obtained on the basis of scanning, over a sample, a charged particle beam emitted from a charged particle source, and an energy filter for filtering by energy the charged particles emitted from the sample. Index values are determined for the plurality of regions contained within the scanning region of the charged particle beam, and, for each of a plurality of energy filter conditions, differences are calculated between the plurality of index values and the reference index values that have been set for each of the plurality of regions.

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