公开(公告)号：US09812284B2

公开(公告)日：2017-11-07

申请号：US15070679

申请日：2016-03-15

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Hideki Matsui

IPC: H01J37/147 ,  H01J37/317

CPC classification number: H01J37/1472 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/103 ,  H01J2237/1504 ,  H01J2237/2485 ,  H01J2237/3175 ,  H01J2237/31754 ,  H01J2237/31762 ,  H01J2237/31766

Abstract: In one embodiment, a charged particle beam drawing apparatus deflects a charged particle beam with a deflector to draw a pattern. The apparatus includes a storage unit that stores an approximate formula indicating a correspondence relationship between a settling time for a DAC amplifier that controls the deflector, and a position shift amount, from a design position, of a drawn position of each evaluation pattern drawn on a first substrate while the settling time and an amount of deflection by the deflector are changed, a shot position correction unit that creates a correction formula indicating a relationship between an amount of deflection and a shot position shift amount at the settling time, from the approximate formula and the settling time for the DAC amplifier based on an amount of deflection of a shot, obtains a position correction amount by using the amount of deflection of the shot and the correction formula, and corrects a shot position defined by the shot data based on the position correction amount, and a drawing unit that performs drawing by using the shot data with a corrected shot position.

公开(公告)号：US20170236682A1

公开(公告)日：2017-08-17

申请号：US15427672

申请日：2017-02-08

Applicant: Stangenes Industries, Inc.

Inventor： Christopher YECKEL ,  Richard CASSEL

IPC: H01J37/141 ,  H03K17/567

CPC classification number: H05H7/02 ,  H01J2237/1504 ,  H03K3/43 ,  H03K3/45 ,  H05H7/04 ,  H05H2007/022 ,  H05H2007/046 ,  H05H2007/048

Abstract: A device and method for generating pulses to activate and deactivate a kicker magnet is provided. When the kicker magnet is deactivated the circuit generates and stores a magnetic field in an inductor. When the kicker magnet is activated, the circuit changes configuration so that the magnetic field and current stored in the inductor can provide the necessary current to activate the kicker magnet is a minimal amount of time. The configuration of the circuit changes via the use of switches. The switches can employ Zener diodes arranged so as to provide protection against high voltage events and rogue neutrinos that may bombard the switches when the kicker magnet is used in the context of deflecting a particle beam.

公开(公告)号：US09734981B2

公开(公告)日：2017-08-15

申请号：US15088487

申请日：2016-04-01

Applicant: NuFlare Technology, Inc.

Inventor： Saori Gomi ,  Hitoshi Higurashi

IPC: H01J37/30 ,  H01J3/26 ,  G21K1/08 ,  G06F9/455 ,  H01J37/147 ,  H01J37/302 ,  H01J37/317 ,  H01J37/20

CPC classification number: H01J37/1472 ,  H01J37/20 ,  H01J37/3023 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/1504 ,  H01J2237/202 ,  H01J2237/3175 ,  H01J2237/31754 ,  H01J2237/31762 ,  H01J2237/31766

Abstract: A charged particle beam writing apparatus includes a circuitry to set, when a charged particle beam is deflected to move between plural small regions by a deflector, plural first mesh regions obtained by virtually dividing a chip region into regions by length and width sizes same as those of each of the plural small regions; determine whether a shot figure having been assigned exists in each of the plural first mesh regions; a circuitry to perform, for the plural first mesh regions, merging of two or more adjacent first mesh regions; a circuitry to measure, for each of plural second mesh regions each obtained by merging, the number of first mesh regions each having been determined that an assigned shot figure exists therein; and a circuitry to generate a map for each chip, where measured number of first mesh regions with the shot figure is defined as a map value.

公开(公告)号：US09679740B2

公开(公告)日：2017-06-13

申请号：US15109230

申请日：2014-12-16

Applicant: Hitachi High-Technologies Corporation

Inventor： Wen Li ,  Ryo Kadoi ,  Kazuki Ikeda ,  Hiroyuki Takahashi ,  Hajime Kawano

IPC: H01J37/26 ,  G21K5/04 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/1472 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1504 ,  H01J2237/1508 ,  H01J2237/152 ,  H01J2237/1534 ,  H01J2237/2804 ,  H01J2237/2806

Abstract: A processing apparatus and a processing method are provided, which use a charged particle beam device that achieves defection of secondary electrons/reflected electrons at a large angle and cancels out noises of an electromagnetic deflector and an electrostatic deflector to suppress a position shift of a primary electron beam caused by circuit noises of a primary beam/secondary beam separation circuit. In the charged particle beam device that includes an electronic optical system radiating a concentrated electron beam onto a sample placed on a stage to perform scanning and captures an image of the sample, a reference signal and a signal generation unit of a voltage-source control signal applied to the electrostatic deflector generating the electrostatic deflector and a reference signal and a signal generation unit of a current-source control signal applied to the electromagnetic deflector generating a magnetic field are made common in an overlapping-electromagnetic-deflector control unit that controls a path of the secondary electrons/reflected electrons incident on a detector, and frequency characteristics and phase characteristics of the voltage control signal are coincident with those of the current-source control signal.

公开(公告)号：US20160300687A1

公开(公告)日：2016-10-13

申请号：US15088487

申请日：2016-04-01

Applicant: NuFlare Technology, Inc.

Inventor： Saori GOMI ,  Hitoshi Higurashi

IPC: H01J37/147 ,  H01J37/317 ,  H01J37/20 ,  H01J37/302

CPC classification number: H01J37/1472 ,  H01J37/20 ,  H01J37/3023 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/1504 ,  H01J2237/202 ,  H01J2237/3175 ,  H01J2237/31754 ,  H01J2237/31762 ,  H01J2237/31766

Abstract: A charged particle beam writing apparatus includes a circuitry to set, when a charged particle beam is deflected to move between plural small regions by a deflector, plural first mesh regions obtained by virtually dividing a chip region into regions by length and width sizes same as those of each of the plural small regions; determine whether a shot figure having been assigned exists in each of the plural first mesh regions; a circuitry to perform, for the plural first mesh regions, merging of two or more adjacent first mesh regions; a circuitry to measure, for each of plural second mesh regions each obtained by merging, the number of first mesh regions each having been determined that an assigned shot figure exists therein; and a circuitry to generate a map for each chip, where measured number of first mesh regions with the shot figure is defined as a map value.

Abstract translation: 带电粒子束写入装置包括电路，用于当带电粒子束被偏转器偏转以在多个小区域之间移动时，设置多个第一网格区域，其通过将芯片区域虚拟地划分成与区域相同的长度和宽度的尺寸， 的多个小区域; 确定在所述多个第一网格区域中的每一个中是否存在被分配的镜头图像; 对多个第一网格区域执行两个或更多个相邻的第一网格区域的合并的电路; 对于通过合并而获得的多个第二网格区域中的每一个，对已经确定分配的镜头图形存在于其中的第一网格区域的数量进行测量的电路; 以及用于为每个芯片生成地图的电路，其中具有拍摄图形的第一网格区域的测量次数被定义为地图值。

公开(公告)号：US08290743B2

公开(公告)日：2012-10-16

申请号：US12507385

申请日：2009-07-22

Applicant: Seiichi Tsuchiya ,  Akinori Mine

Inventor： Seiichi Tsuchiya ,  Akinori Mine

IPC: G06F11/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/24 ,  H01J2237/1504

Abstract: The charged particle beam writing apparatus includes a position deflection control circuit. First digital data that is to be used for circuit diagnosis is transmitted from the position deflection control circuit to the DAC amplifier unit at the same rate as a rate of writing on a product reticle and stored in a first maintenance memory. Second digital data is output from a digital section included in the DAC amplifier unit in response to the first digital data and stored in a second maintenance memory. A maintenance clock generator generates a clock signal and reads the first digital data stored in the first maintenance memory and the second digital data stored in the second maintenance memory. The first digital data thus read is compared with the second digital data thus read for each bit to diagnose the digital section.

Abstract translation: 带电粒子束写入装置包括位置偏转控制电路。 将要用于电路诊断的第一数字数据以与产品掩模版上的写入速率相同的速率从位置偏转控制电路传输到DAC放大器单元并存储在第一维护存储器中。 响应于第一数字数据，第二数字数据从包括在DAC放大器单元中的数字部分输出并存储在第二维护存储器中。 维护时钟发生器产生时钟信号并读取存储在第一维护存储器中的第一数字数据和存储在第二维护存储器中的第二数字数据。 将如此读取的第一数字数据与对于每个位读取的第二数字数据进行比较以诊断数字部分。

公开(公告)号：US20090084990A1

公开(公告)日：2009-04-02

申请号：US12239116

申请日：2008-09-26

Applicant: Rieko NISHIMURA ,  Kiyoshi HATTORI

Inventor： Rieko NISHIMURA ,  Kiyoshi HATTORI

IPC: G21K5/10

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/1474 ,  H01J37/302 ,  H01J2237/0432 ,  H01J2237/1504 ,  H01J2237/30488

Abstract: A timing control circuit controls the timing for applying a voltage to a sub deflector when changing a position to be irradiated with the charged-particle beam. A control computer compares a target line width and a line width of a pattern written with the timing for applying voltage to the sub deflector changed, and determines appropriate timing for applying voltage to the sub deflector from a timing range corresponding to a predetermined allowable range of the difference between the target line width and the line width of the written pattern. The control computer then controls the timing control circuit based on the determined timing.

Abstract translation: 定时控制电路在改变要被带电粒子束照射的位置时控制向副偏转器施加电压的定时。 控制计算机将目标线宽度和写入用于向副偏转器施加电压的定时的图案的线宽进行比较，并且从对应于预定允许范围的定时范围确定适合于向副偏转器施加电压的定时 目标线宽与写入图案的线宽之间的差异。 然后，控制计算机基于确定的定时来控制定时控制电路。

公开(公告)号：US20070228297A1

公开(公告)日：2007-10-04

申请号：US11710930

申请日：2007-02-27

Applicant: Munehiro Ogasawara

Inventor： Munehiro Ogasawara

IPC: G21K5/10 ,  H01J37/08

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J2237/03 ,  H01J2237/1504 ,  H01J2237/151

Abstract: A charged beam drawing apparatus deflects, by an electrostatic deflector, a charged beam generated from a charged beam source, and applies the charged beam to a desired position on a sample to draw a pattern. The electrostatic deflector includes a plurality of deflecting electrodes arranged symmetrically with respect to a point around an optical axis of the charged beam, a ground external cylinder which is disposed coaxially with the optical axis and which is provided to enclose the deflecting electrodes, a resistive film provided on an inner surface of the ground external cylinder, and a conductive film provided on a surface of the resistive film. A capacitance is formed between the deflecting electrodes and the conductive film, and a resistance is formed between the ground conductor and the conductive film.

Abstract translation: 带电束的拉伸装置通过静电偏转器偏转从带电束源产生的带电束，并将带电束施加到样品上的期望位置以绘制图案。 静电偏转器包括相对于带电光束的光轴围绕的点对称布置的多个偏转电极，与光轴同轴设置并且被设置为包围偏转电极的电阻膜 设置在接地外筒的内表面上，以及设置在电阻膜的表面上的导电膜。 在偏转电极和导电膜之间形成电容，并且在接地导体和导电膜之间形成电阻。

公开(公告)号：US20070075256A1

公开(公告)日：2007-04-05

申请号：US11241789

申请日：2005-09-30

Applicant: Benyamin Buller ,  William Devore ,  Juergen Frosien ,  Eugene Mirro ,  Henry Pearce-Percy ,  Dieter Winkler

Inventor： Benyamin Buller ,  William Devore ,  Juergen Frosien ,  Eugene Mirro ,  Henry Pearce-Percy ,  Dieter Winkler

IPC: H01J37/147

CPC classification number: H01J37/147 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/24 ,  H01J37/3174 ,  H01J2237/0432 ,  H01J2237/1504 ,  H01J2237/28

Abstract: An apparatus and method for deflecting electron beams with high precision and high throughput. At least one electrode of a deflecting capacitor is connected to a signal source via a coaxial cable. A termination resistor is further connected to the coaxial cable and the electrode at the joint of the coaxial cable and the electrode. The termination resistor has a resistance matched to the impedance of the coaxial cable and the electrode has an impedance matched to half of the impedance of the coaxial. The deflecting capacitors of the present invention have a minimized loss of precision due to eddy current. The spacing of electrodes in the deflecting capacitors is reduced by a factor of approximately two compared to the state-the-art system.

公开(公告)号：US20060022138A1

公开(公告)日：2006-02-02

申请号：US11219659

申请日：2005-09-07

Applicant: Yoshiaki Kohama

Inventor： Yoshiaki Kohama

IPC: G21K7/00

CPC classification number: H01J37/045 ,  G01N23/2251 ,  H01J37/26 ,  H01J37/265 ,  H01J37/28 ,  H01J37/304 ,  H01J2237/0203 ,  H01J2237/1504 ,  H01J2237/151 ,  H01J2237/221 ,  H01J2237/2817

Abstract: A beam source of an inspection apparatus discharges a beam, and a stage system holds a specimen and moves in at least one direction. A primary optical system directs the beam to the specimen, and a secondary optical system guides a secondary beam coming from the specimen. A sensor outputs an electric signal of the specimen image from the secondary beam, an image processor generates image information of the specimen by processing the electric signal output by the sensor, and a host computer generates an inspection timing signal for controlling the sensor to transfer the image information at a preset data transfer rate.

Abstract translation: 检查装置的光束源射出光束，舞台系统保持试样并沿至少一个方向移动。 主光学系统将光束引导到样品，并且次级光学系统引导来自样品的次级光束。 传感器从副光束输出样本图像的电信号，图像处理器通过处理由传感器输出的电信号来生成样本的图像信息，并且主计算机生成检查定时信号，用于控制传感器传送 图像信息以预设的数据传输速率。