CHARGED PARTICLE BEAM DEVICE WITH DYNAMIC FOCUS AND METHOD OF OPERATING THEREOF
    1.
    发明申请
    CHARGED PARTICLE BEAM DEVICE WITH DYNAMIC FOCUS AND METHOD OF OPERATING THEREOF 审中-公开
    具有动态聚焦的充电颗粒光束装置及其操作方法

    公开(公告)号:US20130214155A1

    公开(公告)日:2013-08-22

    申请号:US13405759

    申请日:2012-02-27

    IPC分类号: H01J37/04

    摘要: A retarding field scanning electron microscope is described. The microscope includes a scanning deflection assembly configured for scanning an electron beam over a specimen, one or more controllers in communication with the scanning deflection assembly for controlling the electron beam scanning pattern, and a combined magnetic-electrostatic objective lens configured for focusing the electron beam including an electrostatic lens portion. The electrostatic lens portion includes a first electrode with a high potential bias, and a second electrode disposed between the first electrode and the specimen plane with a potential bias lower than the first electrode, wherein the second electrode is configured for providing a retarding field. The microscope further includes a voltage supply connected to the second electrode for biasing the second electrode and being in communication with the controllers, wherein the controllers synchronize a variation of the potential of the second electrode with the scanning pattern.

    摘要翻译: 描述了延迟场扫描电子显微镜。 显微镜包括扫描偏转组件,其被配置为扫描试样上的电子束,与用于控制电子束扫描图案的扫描偏转组件连通的一个或多个控制器,以及组合的静电物镜,其被配置用于聚焦电子束 包括静电透镜部分。 静电透镜部分包括具有高电位偏置的第一电极和设置在第一电极和检体平面之间的电位偏压低于第一电极的第二电极,其中第二电极被配置为提供延迟场。 显微镜还包括连接到第二电极的电压源,用于偏置第二电极并与控制器连通,其中控制器使第二电极的电位变化与扫描图案同步。

    Process for the production of low-concentration ethylene for chemical use
    3.
    发明申请
    Process for the production of low-concentration ethylene for chemical use 失效
    用于生产低浓度乙烯化学品的方法

    公开(公告)号:US20110077439A1

    公开(公告)日:2011-03-31

    申请号:US12995509

    申请日:2009-05-28

    IPC分类号: C07C4/04

    摘要: Process for the production of ethylene for chemical use starting with a hydrocarbon source according to which: a) the hydrocarbon source is subjected to a first cracking step, namely a pyrolysis step carried out in a cracking oven, thus producing a mixture of cracking products; b) the mixture of cracking products is subjected to a succession of treatment steps, including a compression step, which makes it possible to obtain a purified crude gas stream; c) the purified crude gas stream is then cooled to a temperature where hydrocarbons with 6 and more carbon atoms condense so that they can be removed from the purified crude gas stream; d) the resulting purified gas stream is afterwards supplied to one separating column, where a fraction A containing hydrogen, methane and ethylene is separated at the head of the column and a heavy fraction C is separated at the bottom of the column; e) a part of the reflux of this column is supplied to a refrigeration cycle leading to a fraction B enriched with ethylene; and f) the fraction A and fraction B are separately supplied to chemical use of ethylene.

    摘要翻译: 从烃源开始生产用于化学用途的乙烯的方法,其中:a)烃源经受第一裂化步骤,即在裂化炉中进行的热解步骤,从而产生裂化产物的混合物; b)裂化产物的混合物经受连续的处理步骤,包括压缩步骤,这使得可以获得纯化的粗气流; c)然后将纯化的粗气流冷却至具有6个或更多个碳原子的烃冷凝的温度,使得它们可以从纯化的粗气流中除去; d)所得纯化气流随后供应至一个分离塔,其中含有氢气,甲烷和乙烯的馏分A在塔头分离,重馏分C在塔底部分离; e)将该塔的一部分回流供应到导致富乙烯馏分B的制冷循环; 和f)级分A和级分B分别提供给乙烯的化学用途。

    Charged particle beam device with a gas field ion source and a gas supply system
    6.
    发明授权
    Charged particle beam device with a gas field ion source and a gas supply system 有权
    带气体离子源和气体供应系统的带电粒子束装置

    公开(公告)号:US07692165B2

    公开(公告)日:2010-04-06

    申请号:US11752560

    申请日:2007-05-23

    申请人: Dieter Winkler

    发明人: Dieter Winkler

    IPC分类号: G21K5/10 H01J37/08

    摘要: The present invention provides a charged particle beam device for irradiating a specimen with ions. The charged particle beam device comprises a gas field ion source unit for generating a beam of ions, the gas field ion source having an emitter unit having an emitter unit tip; and a gas supply system for directing gas to the emitter unit tip. The gas supply system comprises an array of capillary tubes. Further, the present invention provides a method for irradiating a specimen with ions by operating a charged particle beam device having a gas field ion source, wherein the method comprises the step of directing a gas flow to an emitter unit tip, wherein the gas flow has a gas beam aperture angle of 3° or less.

    摘要翻译: 本发明提供一种用离子照射样本的带电粒子束装置。 带电粒子束装置包括用于产生离子束的气体离子源单元,气体离子源具有发射极单元,其具有发射极单元尖端; 以及用于将气体引导到发射器单元尖端的气体供应系统。 气体供应系统包括一排毛细管。 此外,本发明提供了一种通过操作具有气体离子源的带电粒子束装置对离子进行照射的方法,其中该方法包括将气流引导到发射器单元尖端的步骤,其中气流具有 气束孔径角为3°以下。

    Imaging system with multi source array
    7.
    发明授权
    Imaging system with multi source array 有权
    具有多源阵列的成像系统

    公开(公告)号:US07638777B2

    公开(公告)日:2009-12-29

    申请号:US10564752

    申请日:2004-05-17

    IPC分类号: H01J1/50

    摘要: The present invention provides a charged particle beam device. The device comprises an emitter array for emitting a plurality of charged particle beams. The plurality of charged particle beams are imaged with a lens. An electrode unit is provided for accelerating the plurality of charged particle beams. The potential differences between a first potential of the emitter array, a second potential of the electrode unit, and a third potential of a specimen, are controlled by a first control unit and a second control unit. Thereby, the second potential is capable of accelerating the plurality of charged particle beams with respect to the first potential, and the third potential is capable of decelerating the plurality of charged particle beams with respect to the second potential.

    摘要翻译: 本发明提供一种带电粒子束装置。 该装置包括用于发射多个带电粒子束的发射极阵列。 多个带电粒子束用透镜成像。 提供电极单元用于加速多个带电粒子束。 第一控制单元和第二控制单元控制发射极阵列的第一电位与电极单元的第二电位和第三电位之间的电位差。 因此,第二电位能够相对于第一电位加速多个带电粒子束,并且第三电位能够使多个带电粒子束相对于第二电位减速。

    Stable Emission Gas Ion Source and Method for Operation Thereof
    8.
    发明申请
    Stable Emission Gas Ion Source and Method for Operation Thereof 有权
    稳定排放气体离子源及其操作方法

    公开(公告)号:US20090260112A1

    公开(公告)日:2009-10-15

    申请号:US12420384

    申请日:2009-04-08

    IPC分类号: G01N13/10

    摘要: A method of operating a focused ion beam device for emitting during operation a focused ion beam including ions of a gas generated at a first partial pressure, comprising cleaning an emitter tip positioned in an emitter tip region of the focused ion beam device, the cleaning comprises introducing the gas into the emitter tip region such that the gas has a second partial pressure of at least two times the first pressure. Further, a focused ion beam device is provided, comprising a gas field emitter tip (13) in an emitter tip region emitting an ion beam including ions of a gas, a gas inlet for supplying a gas with different pressures (110), a gas outlet (120), a pressure measurement device for measuring the pressure in the emitter tip region and a control unit (130) for controlling switching between an operation mode and a cleaning mode, further controlling the pressures in the emitter tip region and being connected to the pressure measurement device.

    摘要翻译: 一种操作聚焦离子束装置的方法,用于在操作期间发射包括以第一分压产生的气体的离子的聚焦离子束,包括清洁位于聚焦离子束装置的发射极尖端区域中的发射极尖端,所述清洁包括 将气体引入发射极尖端区域,使得气体具有至少两倍于第一压力的第二分压。 此外,提供聚焦离子束装置,其包括发射极尖端区域中的气体发射极尖端(13),其发射包括气体离子的离子束,用于供应不同压力的气体的气体入口(110),气体 出口(120),用于测量发射极尖端区域中的压力的​​压力测量装置和用于控制操作模式和清洁模式之间的切换的控制单元(130),进一步控制发射极尖端区域中的压力并连接到 压力测量装置。

    HIGH RESOLUTION GAS FIELD ION COLUMN WITH REDUCED SAMPLE LOAD
    9.
    发明申请
    HIGH RESOLUTION GAS FIELD ION COLUMN WITH REDUCED SAMPLE LOAD 有权
    高分辨率气体场离子柱与减少样品负载

    公开(公告)号:US20090146074A1

    公开(公告)日:2009-06-11

    申请号:US12277818

    申请日:2008-11-25

    IPC分类号: H01J3/14

    摘要: A method of operating a focused ion beam device having a gas field ion source is described. According to some embodiments, the method includes emitting an ion beam from a gas field ion source, providing an ion beam column ion beam energy in the ion beam column which is higher than the final beam energy, decelerating the ion beam for providing a final beam energy on impingement of the ion beam on the specimen of 1 keV to 4 keV, and imaging the specimen.

    摘要翻译: 描述了具有气体场离子源的聚焦离子束装置的操作方法。 根据一些实施例,该方法包括从气体场离子源发射离子束,在离子束列中提供高于最终光束能量的离子束柱离子束能量,使离子束减速以提供最终光束 将离子束撞击在1keV至4keV的样品上的能量,并对样品进行成像。