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公开(公告)号:US11087950B2
公开(公告)日:2021-08-10
申请号:US16112832
申请日:2018-08-27
Applicant: KLA-TENCOR CORPORATION
Inventor: Christopher Sears , Luca Grella
IPC: H01J37/10 , H01J37/153 , H01J37/06 , H01J37/22 , H01J37/28
Abstract: Systems and methods to focus and align multiple electron beams are disclosed. A camera produces image data of light from electron beams that is projected at a fiber optics array with multiple targets. An image processing module determines an adjustment to a voltage applied to a relay lens, a field lens, or a multi-pole array based on the image data. The adjustment minimizes at least one of a displacement, a defocus, or an aberration of one of the electron beams. Using a control module, the voltage is applied to the relay lens, the field lens, or the multi-pole array.
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公开(公告)号:US09934933B1
公开(公告)日:2018-04-03
申请号:US15593900
申请日:2017-05-12
Applicant: KLA-Tencor Corporation
Inventor: Laurence S. Hordon , Nikolai Chubun , Luca Grella , Xinrong Jiang , Daniel Bui , Kevin Cummings , Christopher Sears , Oscar G. Florendo
IPC: H01J37/28 , H01J37/00 , H01J37/073 , H01J37/065 , H01J37/14
CPC classification number: H01J37/065 , H01J37/073 , H01J37/14 , H01J37/28 , H01J2237/06316 , H01J2237/06341 , H01J2237/06375 , H01J2237/14
Abstract: Extractors and extractor systems minimize the generation of secondary electrons which interact with and degrade the primary electron beam. This can improve the performance of an electron beam system, such as a scanning electron microscope. The extractor may include a frustoconical aperture that widens as distance from the source of the electron beam increases. The entrance into the frustoconical aperture also can include a curved edge.
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公开(公告)号:US20170287675A1
公开(公告)日:2017-10-05
申请号:US15387388
申请日:2016-12-21
Applicant: KLA-Tencor Corporation
Inventor: Arjun Hegde , Luca Grella , Christopher Sears
IPC: H01J37/153 , H01J37/244 , H01J37/18 , H01J37/26 , H01J37/10 , H01J37/20 , H01J37/28
CPC classification number: H01J37/153 , H01J37/10 , H01J37/18 , H01J37/20 , H01J37/244 , H01J37/265 , H01J37/28 , H01J2237/0044 , H01J2237/103 , H01J2237/20285 , H01J2237/221
Abstract: A scanning electron microscopy system is disclosed. The system includes a sample stage configured to secure a sample having conducting structures disposed on an insulating substrate. The system includes an electron-optical column including an electron source configured to generate a primary electron beam and a set of electron-optical elements configured to direct at least a portion of the primary electron beam onto a portion of the sample. The system includes a detector assembly configured to detect electrons emanating from the surface of the sample. The system includes a controller communicatively coupled to the detector assembly. The controller is configured to direct the electron-optical column and stage to perform, with the primary electron beam, an alternating series of image scans and flood scans of the portion of the sample, wherein each of the flood scans are performed sequential to one or more of the imaging scans.
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公开(公告)号:US11302510B2
公开(公告)日:2022-04-12
申请号:US16100812
申请日:2018-08-10
Applicant: KLA-TENCOR CORPORATION
Inventor: Christopher Sears , Luca Grella
IPC: H01J37/063 , H01J37/073 , H01J37/24 , H01J37/28 , H01J37/065
Abstract: Electron gun systems with a particular inner width dimension, sweep electrodes, or a combination of a particular inner width dimension and sweep electrodes are disclosed. The inner width dimension may be less than twice a value of a Larmor radius of secondary electrons in a channel downstream of a beam limiting aperture, and a Larmor time for the secondary electrons may be greater than 1 ns. The sweep electrode can generates an electric field in a drift region, which can increase kinetic energy of secondary electrons in the channel.
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公开(公告)号:US10460903B2
公开(公告)日:2019-10-29
申请号:US15387388
申请日:2016-12-21
Applicant: KLA-Tencor Corporation
Inventor: Arjun Hegde , Luca Grella , Christopher Sears
IPC: H01J37/153 , H01J37/10 , H01J37/18 , H01J37/20 , H01J37/244 , H01J37/26 , H01J37/28
Abstract: A scanning electron microscopy system is disclosed. The system includes a sample stage configured to secure a sample having conducting structures disposed on an insulating substrate. The system includes an electron-optical column including an electron source configured to generate a primary electron beam and a set of electron-optical elements configured to direct at least a portion of the primary electron beam onto a portion of the sample. The system includes a detector assembly configured to detect electrons emanating from the surface of the sample. The system includes a controller communicatively coupled to the detector assembly. The controller is configured to direct the electron-optical column and stage to perform, with the primary electron beam, an alternating series of image scans and flood scans of the portion of the sample, wherein each of the flood scans are performed sequential to one or more of the imaging scans.
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