公开(公告)号：US20130248731A1

公开(公告)日：2013-09-26

申请号：US13733955

申请日：2013-01-04

申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

发明人： Sayaka TANIMOTO ,  Hiroya OHTA ,  Makoto SAKAKIBARA ,  Momoyo ENYAMA ,  Kenji TANIMOTO

IPC分类号： H01J37/10

CPC分类号： H01J37/10 ,  H01J37/153 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/1534

摘要： There is provided both an electron beam apparatus and a lens array, capable of correcting a curvature of field aberration under various optical conditions. The electron beam apparatus comprises the lens array having a plurality of electrodes, and multiple openings are formed in the respective electrodes. An opening diameter distribution with respect to the respective opening diameters of the plural openings formed in the respective electrodes are individually set, and voltages applied to the respective electrodes are independently controlled to thereby independently adjust an image forming position of a reference beam, and a curvature of the lens array image surface.

摘要翻译： 提供能够在各种光学条件下校正场像差曲率的电子束装置和透镜阵列。 电子束装置包括具有多个电极的透镜阵列，并且在各个电极中形成多个开口。 分别设置相对于形成在各个电极中的多个开口的开口直径的开口直径分布，并且独立地控制施加到各个电极的电压，从而独立地调整参考光束的图像形成位置和曲率 的透镜阵列图像表面。

公开(公告)号：US20150228443A1

公开(公告)日：2015-08-13

申请号：US14616658

申请日：2015-02-07

申请人： Hitachi High-Technologies Corporation

发明人： Kenichi MORITA ,  Sayaka TANIMOTO ,  Makoto SAKAKIBARA ,  Muneyuki FUKUDA ,  Naomasa SUZUKI ,  Kenji OBARA

IPC分类号： H01J37/141 ,  H01J37/22 ,  H01J37/26

CPC分类号： H01J37/141 ,  H01J37/222 ,  H01J37/243 ,  H01J37/261 ,  H01J37/265 ,  H01J2237/04922 ,  H01J2237/221 ,  H01J2237/2801 ,  H01J2237/2806 ,  H01J2237/2809 ,  H01J2237/2817

摘要： A charged particle beam apparatus includes a charged particle beam source which irradiates a sample with a charged particle beam, an electromagnetic lens, a lens control electric source for controlling strength of a convergence effect of the electromagnetic lens; and a phase compensation circuit which is connected to the lens control electric source in parallel with the electromagnetic lens, and controls a lens current at the time of switching the strength of the convergence effect of the electromagnetic lens such that the lens current monotonically increases or monotonically decreases.

摘要翻译： 带电粒子束装置包括用带电粒子束照射样本的带电粒子束源，电磁透镜，用于控制电磁透镜的会聚效应的强度的透镜控制电源; 以及相位补偿电路，其与电磁透镜并联连接到透镜控制电源，并且在切换电磁透镜的会聚效果的强度时控制透镜电流，使得透镜电流单调增加或单调 减少

公开(公告)号：US20170025251A1

公开(公告)日：2017-01-26

申请号：US15217460

申请日：2016-07-22

申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

发明人： Momoyo ENYAMA ,  Muneyuki FUKUDA ,  Hideyuki KAZUMI ,  Koichi HAMADA ,  Sayaka TANIMOTO

IPC分类号： H01J37/26 ,  H01J37/22

CPC分类号： H01J37/265 ,  H01J37/153 ,  H01J37/21 ,  H01J37/222 ,  H01J37/226 ,  H01J2237/049 ,  H01J2237/103 ,  H01J2237/1534 ,  H01J2237/223 ,  H01J2237/24542 ,  H01J2237/24592 ,  H01J2237/2801

摘要： A charged particle beam apparatus with improved depth of focus and maintained/improved resolution has a charged particle source, an off-axis illumination aperture, a lens, a computer, and a memory unit. The apparatus acquires an image by detecting a signal generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture. The computer has a beam-computing-process unit to estimate a beam profile of the charged particle beam and an image-sharpening-process unit to sharpen the image using the estimated beam profile.

摘要翻译： 具有改善的聚焦深度和分辨率的改进的带电粒子束装置具有带电粒子源，离轴照明孔径，透镜，计算机和存储单元。 该装置通过检测通过从带电粒子源经由离轴照射孔引起的带电粒子束照射样品而产生的信号来获取图像。 计算机具有用于估计带电粒子束的束轮廓的波束计算处理单元和使用估计波束轮廓来锐化图像的图像锐化处理单元。