公开(公告)号：US09824859B1

公开(公告)日：2017-11-21

申请号：US14980884

申请日：2015-12-28

Applicant: Multibeam Corporation

Inventor： Michael C. Smayling ,  Kevin M. Monahan ,  David K. Lam ,  Theodore A. Prescop

IPC: H01J37/30 ,  H01J37/317 ,  H01L21/3065 ,  H01L21/308 ,  H01J37/244

CPC classification number: H01L21/3065 ,  B81C1/00373 ,  B81C2201/0143 ,  B81C2201/0188 ,  C23C14/48 ,  C23C16/047 ,  C23C16/48 ,  C23C16/486 ,  C23C16/487 ,  H01J37/05 ,  H01J37/06 ,  H01J37/08 ,  H01J37/228 ,  H01J37/244 ,  H01J37/30 ,  H01J37/304 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/3172 ,  H01J37/3174 ,  H01J37/3177 ,  H01J37/3178 ,  H01J2237/004 ,  H01J2237/0635 ,  H01J2237/1501 ,  H01J2237/24592 ,  H01J2237/30466 ,  H01J2237/30472 ,  H01J2237/31708 ,  H01J2237/31732 ,  H01J2237/31735 ,  H01J2237/31737 ,  H01J2237/3174 ,  H01J2237/31749 ,  H01L21/0228 ,  H01L21/0262 ,  H01L21/26 ,  H01L21/308 ,  H01L21/3085 ,  H01L22/12 ,  H01L22/20 ,  H01L22/26

Abstract: Methods, devices and systems for targeted, maskless modification of material on or in a substrate using charged particle beams. Electrostatically-deflected charged particle beam columns can be targeted in direct dependence on the design layout database to perform direct and knock-on ion implantation, producing patterned material modifications with selected chemical and 3D-structural profiles. The number of required process steps is reduced, reducing manufacturing cycle time and increasing yield by lowering the probability of defect introduction. Local gas and photon injectors and detectors are local to corresponding individual columns, and support superior, highly-configurable process execution and control. Targeted implantation can be used to prepare the substrate for patterned blanket etch; patterned ALD can be used to prepare the substrate for patterned blanket deposition; neither process requiring photomasks or resist. Arrays of highly configurable beam columns can also be used to perform both positive and negative tone lithography in a single pass.

公开(公告)号：US20170330723A1

公开(公告)日：2017-11-16

申请号：US15591331

申请日：2017-05-10

Applicant: JEOL Ltd.

Inventor： Masaki Mukai

IPC: H01J37/24 ,  H01J37/06 ,  H01J37/05 ,  H01J37/147 ,  H01J37/26

CPC classification number: H01J37/24 ,  H01J37/05 ,  H01J37/06 ,  H01J37/147 ,  H01J37/26 ,  H01J37/265 ,  H01J37/3178 ,  H01J2237/0473 ,  H01J2237/04735 ,  H01J2237/057

Abstract: There is provided an electron microscope in which a crossover position can be kept constant. The electron microscope (100) includes: an electron source (110) for emitting an electron beam; an acceleration tube (170) having acceleration electrodes (170a-170f) and operative to accelerate the electron beam; a first electrode (160) operative such that a lens action is produced between this first electrode (160) and the initial stage of acceleration electrode (170a); an accelerating voltage supply (112) for supplying an accelerating voltage to the acceleration tube (170); a first electrode voltage supply (162) for supplying a voltage to the first electrode (160); and a controller (109b) for controlling the first electrode voltage supply (162). The lens action produced between the first electrode (160) and the initial stage of acceleration electrode (170a) forms a crossover (CO2) of the electron beam. The controller (109b) controls the first electrode voltage supply (162) such that, if the accelerating voltage is modified, the ratio between the voltage applied to the first electrode (160) and the voltage applied to the initial stage of acceleration electrode (170a) is kept constant.

公开(公告)号：US20170125217A1

公开(公告)日：2017-05-04

申请号：US15146133

申请日：2016-05-04

Applicant: APPLIED MATERIALS, INC.

Inventor： Leonid Dorf ,  Kenneth S. Collins ,  Shahid Rauf ,  Kartik Ramaswamy ,  James D. Carducci ,  Hamid Tavassoli ,  Olga Regelman ,  Ying Zhang

IPC: H01J37/32 ,  H01J37/06

CPC classification number: H01J37/32174 ,  H01J37/06 ,  H01J37/32082 ,  H01J37/3233 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/3244 ,  H01J37/32458 ,  H01J37/32532 ,  H01J2237/3151 ,  H01J2237/3174 ,  H01J2237/334 ,  H01J2237/3348 ,  H01L21/3065 ,  H01L21/31116

Abstract: The disclosure concerns a method of operating a plasma reactor having an electron beam plasma source for independently adjusting electron beam energy, plasma ion energy and radical population. The disclosure further concerns an electron beam source for a plasma reactor having an RF-driven electrode for producing the electron beam.

公开(公告)号：US20170098525A1

公开(公告)日：2017-04-06

申请号：US15380649

申请日：2016-12-15

Applicant: Frederick A. Flitsch

Inventor： Frederick A. Flitsch

IPC: H01J37/244 ,  H01J37/317

CPC classification number: H01J37/244 ,  B82B3/00 ,  G03F9/00 ,  H01J9/022 ,  H01J37/06 ,  H01J37/08 ,  H01J37/20 ,  H01J37/248 ,  H01J37/317 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/20 ,  H01J2237/303 ,  H01J2237/304 ,  H01J2237/3174 ,  H01J2237/31759 ,  H01J2237/31798 ,  Y10T29/49004

Abstract: The present invention provides apparatus for an imaging system comprising a multitude of imaging elements upon a substrate. In some embodiments the substrate may be approximately round with a radius of approximately one inch. Various methods relating to using and producing an imaging system are discussed.

公开(公告)号：US09613781B2

公开(公告)日：2017-04-04

申请号：US15000305

申请日：2016-01-19

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Masahiro Hayashi

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/04 ,  H01J37/06

CPC classification number: H01J37/28 ,  H01J37/04 ,  H01J37/06 ,  H01J37/244 ,  H01J2237/2444 ,  H01J2237/2806

Abstract: An embodiment of the invention relates to a SEM enabling a surface analysis of a sample at a high throughput. The SEM has an electron gun, an irradiation unit, and a detector. The detector, as a first structure, includes an MCP, an anode, and a dynode. The dynode is set at a potential higher than a potential of an output face of the MCP and the anode is set at a potential higher than that of the dynode. The anode is disposed on the dynode side with respect to an intermediate position between the output face of the MCP and the dynode. The anode has an aperture for letting electrons from the output face of the MCP pass toward the dynode.

公开(公告)号：US20170069461A1

公开(公告)日：2017-03-09

申请号：US15122403

申请日：2014-12-19

Applicant: Intel Corporation

Inventor： Yan A. BORODOVSKY ,  Donald W. NELSON ,  Mark C. PHILLIPS

IPC: H01J37/30 ,  H01J37/147 ,  H01J37/317 ,  H01J37/06 ,  H01L21/027 ,  G03F7/20

CPC classification number: G03F7/2037 ,  H01J37/045 ,  H01J37/06 ,  H01J37/1474 ,  H01J37/3007 ,  H01J37/3026 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/303 ,  H01J2237/30422 ,  H01J2237/30438 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01J2237/31776 ,  H01J2237/31796 ,  H01L21/0277 ,  H01L21/31144

Abstract: Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool is described. The BAA is a non-universal cutter.

Abstract translation: 描述适用于涉及补充电子束光刻（CEBL）的光刻设备和方法。 在一个示例中，描述了用于电子束工具的遮光器孔径阵列（BAA）。 BAA是一种非通用刀具。

公开(公告)号：US09558909B2

公开(公告)日：2017-01-31

申请号：US14395765

申请日：2014-05-06

Applicant: INSTITUTE OF PHYSICS, CHINESE ACADEMY OF SCIENCES

Inventor： Jianqi Li ,  Huanfang Tian ,  Gaolong Cao ,  Chao Ma ,  Huaixin Yang

IPC: H01J37/26 ,  H01J37/06 ,  H01J37/073 ,  H01J37/28

CPC classification number: H01J37/06 ,  H01J37/073 ,  H01J37/26 ,  H01J37/28 ,  H01J37/3178 ,  H01J2237/2802

Abstract: The present invention discloses a multifunctional ultrafast electron gun of a transmission electron microscopy. The ultrafast electron gun of a transmission electron microscope comprises: a laser source, an electron gun body and a laser introducing module. The electron gun body comprises: an electron gun sleeve comprising a first section sleeve and a second section sleeve; and, a cathode, an acceleration electrode and an anode arranged in up-down order, wherein the cathode and the acceleration electrode are located within the first section sleeve and the anode is located within the second section sleeve. The laser introducing module includes an introducing module sleeve sealedly connected between the first section sleeve and the second section sleeve and provided with a laser incoming window in a side thereof; and a laser reflective mirror located in the introducing module sleeve, which is configured to face right the laser incoming window and configured adjacent to a central axis of the introducing module sleeve, and the reflective face of which is configured to make an angle of 45° with the central axis of the introducing module sleeve. The multifunctional ultrafast electron gun of a transmission electron microscopy according to the present invention achieve the best coherence performance of the electrons obtained in the case of the photoelectron emission compared with those in the prior art.

Abstract translation: 本发明公开了一种透射电子显微镜的多功能超快电子枪。 透射电子显微镜的超快电子枪包括：激光源，电子枪体和激光引入模块。 电子枪主体包括：电子枪套筒，包括第一部分套筒和第二部分套筒; 阴极，加速电极和阳极，其以上下顺序排列，其中阴极和加速电极位于第一部分套筒内，阳极位于第二部分套筒内。 激光引入模块包括密封地连接在第一部分套筒和第二部分套筒之间并在其侧面设置有激光进入窗口的引导模块套筒; 以及位于所述引导模块套筒中的激光反射镜，所述激光反射镜被配置为面对所述激光入射窗口的右侧并且被配置成与所述引入模块套筒的中心轴线相邻，并且其反射面被配置为形成45°的角度 与引入模块套筒的中心轴线。 与现有技术相比，根据本发明的透射电子显微镜的多功能超快电子枪实现了在光电子发射的情况下获得的电子的最佳相干性能。

公开(公告)号：US09556521B1

公开(公告)日：2017-01-31

申请号：US14809985

申请日：2015-07-27

Applicant: Multibeam Corporation

Inventor： Theodore A. Prescop ,  Kevin M. Monahan ,  David K. Lam ,  Michael C. Smayling

IPC: C23C16/48 ,  H01J37/06 ,  H01J37/08 ,  H01J37/244 ,  H01J37/30

CPC classification number: H01L21/3065 ,  B81C1/00373 ,  B81C2201/0143 ,  B81C2201/0188 ,  C23C14/48 ,  C23C16/047 ,  C23C16/48 ,  C23C16/486 ,  C23C16/487 ,  H01J37/05 ,  H01J37/06 ,  H01J37/08 ,  H01J37/228 ,  H01J37/244 ,  H01J37/30 ,  H01J37/304 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/3172 ,  H01J37/3174 ,  H01J37/3177 ,  H01J37/3178 ,  H01J2237/004 ,  H01J2237/0635 ,  H01J2237/1501 ,  H01J2237/24592 ,  H01J2237/30466 ,  H01J2237/30472 ,  H01J2237/31708 ,  H01J2237/31732 ,  H01J2237/31735 ,  H01J2237/31737 ,  H01J2237/3174 ,  H01J2237/31749 ,  H01L21/0228 ,  H01L21/0262 ,  H01L21/26 ,  H01L21/308 ,  H01L21/3085 ,  H01L22/12 ,  H01L22/20 ,  H01L22/26

Abstract: Methods, devices and systems for patterning of substrates using charged particle beams without photomasks and without a resist layer. Material can be deposited onto a substrate, as directed by a design layout database, localized to positions targeted by multiple, matched charged particle beam columns. Reducing the number of process steps, and eliminating lithography steps, in localized material addition has the dual benefit of reducing manufacturing cycle time and increasing yield by lowering the probability of defect introduction. Furthermore, highly localized, precision material deposition allows for controlled variation of deposition rate and enables creation of 3D structures. Local gas injectors and detectors, and local photon injectors and detectors, are local to corresponding ones of the columns, and can be used to facilitate rapid, accurate, targeted, highly configurable substrate processing, advantageously using large arrays of said beam columns.

Abstract translation: 用于使用没有光掩模并且没有抗蚀剂层的带电粒子束来图案化衬底的方法，装置和系统。 材料可以沉积到衬底上，如设计布局数据库所指示的那样，被定位到由多个匹配的带电粒子束柱靶向的位置上。 减少工艺步骤的数量和消除光刻步骤在局部化材料添加中具有减少制造周期时间并通过降低缺陷引入概率来提高产量的双重优点。 此外，高度局部化的精密材料沉积允许沉积速率的受控变化并且能够创建3D结构。 局部气体注入器和检测器以及本地光子注入器和检测器对于相应的列是局部的，并且可以用于促进快速，准确，有针对性的高度可配置的衬底处理，有利地使用所述束柱的大阵列。

公开(公告)号：US20170025249A1

公开(公告)日：2017-01-26

申请号：US15209988

申请日：2016-07-14

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Giuseppe Pavia

IPC: H01J37/244 ,  H01J37/06

CPC classification number: H01J37/244 ,  G01N23/2251 ,  G01N2223/633 ,  H01J37/06 ,  H01J2237/24585

Abstract: A method of determining crystallographic properties of a sample includes: generating first and second electron beams of electrons having first and second mean kinetic energies, respectively; detecting, for each of first locations of a region of the sample, a two-dimensional spatial distribution of electrons incident onto a detection area while directing the first electron beam onto the first locations; generating, for each of the first locations, first data representing the two-dimensional spatial distribution; detecting, for each of second locations of the region of the sample, a two-dimensional spatial distribution of electrons incident onto the detection area while directing the second electron beam onto the second locations; generating, for each of the second locations, second data representing the two-dimensional spatial distribution; and determining the crystallographic properties for target locations of the region based on the first data of the first locations and the second data of the second locations.

Abstract translation: 确定样品的晶体学性质的方法包括：分别产生具有第一和第二平均动能的电子的第一和第二电子束; 对于所述样本的区域的每个第一位置，检测入射到检测区域上的电子的二维空间分布，同时将所述第一电子束引导到所述第一位置; 为每个第一位置生成表示二维空间分布的第一数据; 对所述样品区域的第二位置的每一个检测入射到所述检测区域上的电子的二维空间分布，同时将所述第二电子束引导到所述第二位置; 为每个第二位置生成表示二维空间分布的第二数据; 以及基于第一位置的第一数据和第二位置的第二数据来确定区域的目标位置的结晶特性。

公开(公告)号：US20160372300A1

公开(公告)日：2016-12-22

申请号：US15244569

申请日：2016-08-23

Applicant: Liang Jie Wong ,  Byron Freelon ,  Timm Rohwer ,  Nuh Gedik ,  Steven Glenn Johnson

Inventor： Liang Jie Wong ,  Byron Freelon ,  Timm Rohwer ,  Nuh Gedik ,  Steven Glenn Johnson

IPC: H01J37/06

CPC classification number: H01J37/06 ,  H01J2237/047 ,  H01J2237/0473 ,  H01J2237/0475 ,  H01J2237/063

Abstract: Methods and apparatus for modulating a particle pulse include a succession of Hermite-Gaussian optical modes that effectively construct a three-dimensional optical trap in the particle pulse's rest frame. Optical incidence angles between the propagation of the particle pulse and the optical pulse are tuned for improved compression. Particles pulses that can be modulated by these methods and apparatus include charged particles and particles with non-zero polarizability in the Rayleigh regime. Exact solutions to Maxwell's equations for first-order Hermite-Gaussian beams demonstrate single-electron pulse compression factors of more than 100 in both longitudinal and transverse dimensions. The methods and apparatus are useful in ultrafast electron imaging for both single- and multi-electron pulse compression, and as a means of circumventing temporal distortions in magnetic lenses when focusing ultra-short electron pulses.

Abstract translation: 用于调制粒子脉冲的方法和装置包括一系列Hermite-Gaussian光学模式，其有效地构成了粒子脉冲的休止帧中的三维光阱。 调整粒子脉冲的传播和光脉冲之间的光入射角以改善压缩。 可以通过这些方法和装置调制的粒子脉冲包括带电粒子和在瑞利状态下具有非零极化率的粒子。 针对一阶Hermite-Gaussian光束的麦克斯韦方程的精确解决方案在纵向和横向尺寸上均显示出超过100的单电子脉冲压缩因子。 该方法和装置在用于单电子和多电子脉冲压缩的超快电子成像中是有用的，并且作为在聚焦超短电子脉冲时避开磁性透镜中的时间失真的手段。