公开(公告)号：US20160196951A1

公开(公告)日：2016-07-07

申请号：US15067832

申请日：2016-03-11

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Yuichi OHSAWA ,  Akio UI ,  Junichi ITO ,  Chikayoshi KAMATA ,  Megumi YAKABE ,  Saori KASHIWADA

IPC: H01J37/08 ,  H01J37/30 ,  H01J37/09 ,  H01J37/20

CPC classification number: H01J37/08 ,  H01J37/09 ,  H01J37/20 ,  H01J37/30 ,  H01J37/3053 ,  H01J2237/0822 ,  H01J2237/083 ,  H01J2237/3151 ,  H01L27/228 ,  H01L43/12

Abstract: According to one embodiment, a device manufacturing apparatus includes a substrate holding portion holding a substrate; an ion source including a housing, an anode disposed in the housing, a cathode disposed outside the housing, and a first opening disposed in a portion of the housing such that the anode is exposed to a region between the anode and the substrate holding portion, the ion source configured to generate an ion beam with which the substrate is irradiated; and at least one first structure disposed between the ion source and the substrate holding portion, and having a first through hole through which the ion beam passes. The first structure includes a conductor, and an opening dimension of the first through hole is equal to or larger than an opening dimension of the first opening.

Abstract translation: 根据一个实施例，一种装置制造装置包括：保持基板的基板保持部; 离子源，包括壳体，设置在壳体中的阳极，设置在壳体外部的阴极和设置在壳体的一部分中的第一开口，使得阳极暴露于阳极和衬底保持部分之间的区域， 所述离子源被配置为产生照射所述衬底的离子束; 以及设置在所述离子源和所述基板保持部之间的至少一个第一结构，并且具有离子束通过的第一通孔。 第一结构包括导体，第一通孔的开口尺寸等于或大于第一开口的开口尺寸。

公开(公告)号：US09384938B2

公开(公告)日：2016-07-05

申请号：US13825820

申请日：2011-09-23

Applicant: Dirk Zeidler ,  Thomas Kemen ,  Pascal Anger ,  Antonio Casares ,  Christof Riedesel

Inventor： Dirk Zeidler ,  Thomas Kemen ,  Pascal Anger ,  Antonio Casares ,  Christof Riedesel

IPC: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/317

CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/1205

Abstract: The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a carrier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.

Abstract translation: 本发明涉及一种带电粒子多子束系统，其包括带电粒子源（301）; 第一多孔板（320），其具有设置在所述源的下游的所述系统的带电粒子束路径中的多个孔; 具有多个孔的第一多孔选择板（313） 载体（340），其中所述第一多孔径选择器板安装在所述载体上; 以及构造成移动所述载体的致动器（350），使得所述第一多孔径选择器板在所述系统的第一操作模式中被布置在所述源的下游的系统的带电粒子束路径中，并且使得所述第一 多孔径选择器板在系统的第二操作模式中设置在带电粒子束路径的外部。 源极，第一多孔板和系统的载体被布置成使得在第一多孔径板和第一多孔径选择器板的下游位置处产生第一数量的带电粒子子束 第一操作模式，并且在第二操作模式的位置处产生第二数量的带电粒子子束，其中第一数量的子束与第二数量的子束不同。

公开(公告)号：US09336981B2

公开(公告)日：2016-05-10

申请号：US13639491

申请日：2011-03-31

Applicant: Rainer Knippelmeyer

Inventor： Rainer Knippelmeyer

IPC: H01J37/09 ,  H01J37/244

CPC classification number: H01J37/244 ,  H01J37/09 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/2446 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: A charged particle detection system comprises plural detection elements and a multi-aperture plate in proximity of the detection elements. Charged particle beamlets can traverse the apertures of the multi-aperture plate to be incident on the detection elements. More than one multi-aperture plate can be provided to form a stack of multi-aperture plates in proximity of the detector. A suitable electric potential supplied to the multi-aperture plate can have an energy filtering property for the plural charged particle beamlets traversing the apertures of the plate.

Abstract translation: 带电粒子检测系统包括检测元件附近的多个检测元件和多孔板。 带电粒子子束可穿过多孔板的入射到检测元件上的孔。 可以提供多于一个的多孔板以在检测器附近形成多孔板的堆叠。 提供给多孔板的合适电位可以对穿过板的孔的多个带电粒子子束具有能量过滤特性。

公开(公告)号：US20160071689A1

公开(公告)日：2016-03-10

申请号：US14844778

申请日：2015-09-03

Applicant: FEI Company

Inventor： Erwin Fernand de Jong ,  Sorin Lazar ,  Peter Christiaan Tiemeijer ,  Rudolf Geurink

IPC: H01J37/22 ,  H01J37/147 ,  H01J37/20 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/226 ,  H01J37/05 ,  H01J37/09 ,  H01J37/147 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/0455 ,  H01J2237/057 ,  H01J2237/15 ,  H01J2237/2007 ,  H01J2237/24485 ,  H01J2237/24585 ,  H01J2237/2802

Abstract: A method of performing spectroscopy in a Transmission Charged-Particle Microscope comprising: a specimen holder; a source, for producing a beam of charged particles; an illuminator, for directing said beam so as to irradiate the specimen; an imaging system, for directing a flux of charged particles transmitted through the specimen onto a spectroscopic apparatus comprising a dispersing device for dispersing said flux into an energy-resolved array of spectral sub-beams, the method comprising: using an adjustable aperture device to admit a first portion of said array to a detector, while blocking a second portion of said array; providing; using a radiation sensor in said flux upstream of said aperture device to perform localized radiation sensing in a selected region of said second portion of the array, simultaneous with detection of said first portion by said detector; using a sensing result from said sensor to adjust a detection result from said detector.

Abstract translation: 一种在透射带电粒子显微镜中进行光谱的方法，包括：样品架; 用于产生带电粒子束的源; 照明器，用于引导所述光束以照射所述样本; 一种成像系统，用于将通过样本传输的带电粒子的通量引导到分光装置上，该分光装置包括用于将所述通量分散到光谱子束的能量分辨阵列中的分散装置，所述方法包括：使用可调节孔径装置来允许 所述阵列的第一部分到达检测器，同时阻挡所述阵列的第二部分; 提供; 在所述孔设备上游的所述通量中使用辐射传感器，以在阵列的所述第二部分的选定区域中进行局部辐射感测，同时由所述检测器检测所述第一部分; 使用来自所述传感器的感测结果来调整来自所述检测器的检测结果。

公开(公告)号：US20160013011A1

公开(公告)日：2016-01-14

申请号：US14833533

申请日：2015-08-24

Applicant: ULVAC, Inc.

Inventor： Takumi YUZE ,  Toshihiro TERASAWA

IPC: H01J37/04

CPC classification number: H01J37/04 ,  H01J37/09 ,  H01J37/1472 ,  H01J37/3171 ,  H01J2237/0213 ,  H01J2237/028 ,  H05H1/16 ,  H05H7/04

Abstract: Positive ions that fly within an ion acceleration tube are accelerated by a plurality of acceleration electrodes arranged within the ion acceleration tube and are irradiated to an irradiation target. A plurality of magnet devices is arranged within the ion acceleration tube; the directions of the lines of magnetic force formed respectively by the magnet devices are made to differ between the adjacent magnet devices by an angle of more than 0 degree and at most 90 degrees or less; and each of the lines of magnetic force is rotated in one direction within the ion acceleration tube. Electrons travelling in reverse within the ion acceleration tube are made to intersect the lines of magnetic force, and made to increase a distance from a flying axis while traveling in reverse. Since the electrons collide with members within the ion acceleration tube and stop before having high energy, high-energy X-rays are not generated.

Abstract translation: 在离子加速管内飞行的正离子被布置在离子加速管内的多个加速电极加速并照射到照射目标。 多个磁体装置设置在离子加速管内; 使磁铁装置分别形成的磁力线的方向在相邻的磁体装置之间的角度大于0度，最大为90度以下; 并且每个磁力线在离子加速管内沿一个方向旋转。 使离子加速管内的相反行进的电子与磁力线相交，并且在相反行进时增加与飞行轴的距离。 由于电子与离子加速管内的构件碰撞并且在具有高能量之前停止，所以不产生高能X射线。

公开(公告)号：US20150357156A1

公开(公告)日：2015-12-10

申请号：US14759241

申请日：2014-01-10

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yasushi EBIZUKA ,  Seiichiro KANNO ,  Naoya ISHIGAKI ,  Masashi FUJITA

IPC: H01J37/20 ,  H01J37/02 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/026 ,  H01J37/09 ,  H01J37/28 ,  H01J2237/2007

Abstract: The present invention explains a charged-particle beam device for the purpose of highly accurately measuring electrostatic charge of a sample in a held state by an electrostatic chuck (105). In order to attain the object, according to the present invention, there is proposed a charged-particle beam device including an electrostatic chuck (105) for holding a sample on which a charged particle beam is irradiated and a sample chamber (102) in which the electrostatic chuck (105) is set. The charged-particle beam device includes a potential measuring device that measures potential on a side of an attraction surface for the sample of the electrostatic chuck (105) and a control device that performs potential measurement by the potential measuring device in a state in which the sample is attracted by the electrostatic chuck (105).

Abstract translation: 本发明解释了一种带电粒子束装置，用于通过静电卡盘（105）高度准确地测量处于保持状态的样品的静电荷。 为了达到上述目的，本发明提出一种带电粒子束装置，其特征在于，包括：静电卡盘（105），用于保持照射有带电粒子束的样品和样品室（102），所述样品室 静电吸盘（105）被设定。 带电粒子束装置包括：电位测量装置，其测量用于静电卡盘（105）的样本的吸引表面的电位;以及控制装置，其通过电位测量装置进行电位测量，其中， 样品被静电吸盘（105）吸引。

公开(公告)号：US20150311030A1

公开(公告)日：2015-10-29

申请号：US14694959

申请日：2015-04-23

Applicant: IMS Nanofabrication AG

Inventor： Elmar Platzgummer ,  Hans Löschner

IPC: H01J37/147 ,  H01J37/317 ,  H01J37/252 ,  H01J37/31

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/09 ,  H01J37/147 ,  H01J37/3174 ,  H01J2237/0435

Abstract: In a charged-particle multi-beam processing apparatus for exposure of a target with a plurality of parallel particle-optical columns, each column has a beam shaping device forming the shape of the illuminating beam into a desired pattern composed of a multitude of sub-beams, by means of an aperture array device, which defines the shape of a respective sub-beam by means of an array of apertures, and a deflection array device selectively deflecting sub-beams off their nominal paths; thus, only the non-selected sub-beams can reach the target. According to many embodiments of the invention each beam shaping device is provided with a first field-boundary device and a second field-boundary device, which are the first and last plate elements traversed by the beam. One of the first and second field-boundary devices defines a field-free space interval so as to accommodate feeding lines for controlling the deflection array device.

Abstract translation: 在用多个平行粒子光学柱曝光靶的带电粒子多光束处理装置中，每列具有将照明光束的形状形成为由多个子像素组成的期望图案的光束整形装置， 通过孔阵列器件，其通过孔阵列限定相应子光束的形状，并且偏转阵列器件选择性地使子光束偏离其标称通路; 因此，只有未选择的子光束才能到达目标。 根据本发明的许多实施例，每个光束整形装置设置有第一场边界装置和第​​二场边界装置，第一场边界装置和第​​二场边界装置是由横梁穿过的第一和最后的板件。 第一和第二场边界装置之一限定了无场空间间隔，以适应用于控制偏转阵列装置的馈线。

公开(公告)号：US20150311029A1

公开(公告)日：2015-10-29

申请号：US14630922

申请日：2015-02-25

Applicant: JEOL Ltd.

Inventor： Kazuya Yamazaki

IPC: H01J37/141 ,  H01J37/26

CPC classification number: H01J37/141 ,  H01J37/09 ,  H01J37/26 ,  H01J2237/14

Abstract: A transmission electron microscope (100) capable of reducing the effects of stray magnetic fields includes an electron beam source (2), an illumination lens system (4) for causing the electron beam to impinge on a sample (S), a sample stage (6) for holding the sample (S), a first objective lens (8), a second objective lens (10) disposed behind the first objective lens (8), an imaging lens system (16) disposed behind the second objective lens (10), and a controller (22) configured or programmed for controlling the first objective lens (8) and the second objective lens (10). The first objective lens (8) has upper and lower polepieces disposed on opposite sides of the sample (S). The upper and lower polepieces together produce a magnetic field. The controller (22) performs an operation for controlling the second objective lens (10) to construct a TEM (transmission electron microscope) image of the sample (S) out of the electron beam transmitted through the sample (S). Furthermore, the controller performs an operation for controlling the first objective lens (8) according to imaging conditions to produce a magnetic field that cancels out stray magnetic fields at the position where the sample (S) is placed.

Abstract translation: 能够减少杂散磁场的影响的透射电子显微镜（100）包括电子束源（2），使电子束照射在样品（S）上的照明透镜系统（4），样品台 6），用于保持样品（S），设置在第一物镜（8）后面的第一物镜（8），第二物镜（10），设置在第二物镜（10）后面的成像透镜系统 ）和配置或编程用于控制第一物镜（8）和第二物镜（10）的控制器（22）。 第一物镜（8）具有设置在样品（S）的相对侧上的上下杆。 上下极点一起产生磁场。 控制器（22）执行用于控制第二物镜（10）的操作，以在透过样品（S）的电子束中构成样品（S）的TEM（透射电子显微镜）图像。 此外，控制器根据成像条件执行用于控制第一物镜（8）的操作，以产生抵消放置样品（S）的位置处的杂散磁场的磁场。

公开(公告)号：US20150311028A1

公开(公告)日：2015-10-29

申请号：US14630719

申请日：2015-02-25

Applicant: JEOL Ltd.

Inventor： Tsutomu Negishi

IPC: H01J37/09 ,  H01J37/22 ,  H01J37/08

CPC classification number: H01J37/09 ,  G01N1/32 ,  H01J37/08 ,  H01J37/226

Abstract: A sample preparation apparatus (100) is used to prepare a cross section of a sample (S) by irradiating it with an ion beam. The apparatus (100) includes an ion beam generator (10), a shield plate (40) disposed to cover a part of the sample (S) to shield the sample (S) from the ion beam, and a controller (82) controlling the ion beam generator (10). The controller (82) controls performance of first and second operations. In the first operation, the ion beam is accelerated by a first accelerating voltage and hits the sample (S) while the sample (S) and the shield plate (40) are located in a given positional relationship. In the second operation, the ion beam is accelerated by a second accelerating voltage lower than the first accelerating voltage and hits the sample (S) while the given positional relationship is maintained.

Abstract translation: 样品制备装置（100）用于通过用离子束照射来制备样品（S）的横截面。 设备（100）包括离子束发生器（10），设置成覆盖样品（S）的一部分以屏蔽样品（S）离子束的屏蔽板（40），以及控制器（82），其控制 离子束发生器（10）。 控制器（82）控制第一和第二操作的性能。 在第一操作中，离子束以第一加速电压加速，并且在样品（S）和屏蔽板（40）位于给定的位置关系中时，撞击样品（S）。 在第二操作中，离子束加速低于第一加速电压的第二加速电压，并且在保持给定的位置关系的同时击中样品（S）。

公开(公告)号：US20150287568A1

公开(公告)日：2015-10-08

申请号：US14000213

申请日：2012-02-17

Applicant: Steven R. Rodgers ,  Rainer K. Knippelmeyer ,  Thomas Kemen ,  Stefan Schubert ,  Nissim Elmaliah

Inventor： Steven R. Rodgers ,  Rainer K. Knippelmeyer ,  Thomas Kemen ,  Stefan Schubert ,  Nissim Elmaliah

IPC: H01J37/21 ,  H01J37/22 ,  H01J37/06 ,  H01J37/244

CPC classification number: H01J37/21 ,  H01J37/06 ,  H01J37/09 ,  H01J37/153 ,  H01J37/22 ,  H01J37/222 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0453 ,  H01J2237/049 ,  H01J2237/063 ,  H01J2237/1532 ,  H01J2237/21 ,  H01J2237/2817

Abstract: A charged particle beam focusing apparatus includes a charged particle beam generator configured to project simultaneously at least one non-astigmatic charged particle beam and at least one astigmatic charged particle beam onto locations on a surface of a specimen, thereby causing released electrons to be emitted from the locations. The apparatus also includes an imaging detector configured to receive the released electrons from the locations and to form images of the locations from the released electrons. A processor analyzes the image produced by the at least one astigmatic charged particle beam and in response thereto adjusts a focus of the at least one non-astigmatic charged particle beam.

Abstract translation: 带电粒子束聚焦装置包括带电粒子束发生器，其被配置为同时将至少一个非散光带电粒子束和至少一个散光带电粒子束投射到样品表面上的位置，从而使释放的电子从 的位置。 该装置还包括成像检测器，其被配置为从该位置接收释放的电子并且从释放的电子形成位置的图像。 处理器分析由至少一个散光带电粒子束产生的图像，并且响应于此调整至少一个非散光带电粒子束的焦点。