公开(公告)号：US20150311029A1

公开(公告)日：2015-10-29

申请号：US14630922

申请日：2015-02-25

Applicant: JEOL Ltd.

Inventor： Kazuya Yamazaki

IPC: H01J37/141 ,  H01J37/26

CPC classification number: H01J37/141 ,  H01J37/09 ,  H01J37/26 ,  H01J2237/14

Abstract: A transmission electron microscope (100) capable of reducing the effects of stray magnetic fields includes an electron beam source (2), an illumination lens system (4) for causing the electron beam to impinge on a sample (S), a sample stage (6) for holding the sample (S), a first objective lens (8), a second objective lens (10) disposed behind the first objective lens (8), an imaging lens system (16) disposed behind the second objective lens (10), and a controller (22) configured or programmed for controlling the first objective lens (8) and the second objective lens (10). The first objective lens (8) has upper and lower polepieces disposed on opposite sides of the sample (S). The upper and lower polepieces together produce a magnetic field. The controller (22) performs an operation for controlling the second objective lens (10) to construct a TEM (transmission electron microscope) image of the sample (S) out of the electron beam transmitted through the sample (S). Furthermore, the controller performs an operation for controlling the first objective lens (8) according to imaging conditions to produce a magnetic field that cancels out stray magnetic fields at the position where the sample (S) is placed.

Abstract translation: 能够减少杂散磁场的影响的透射电子显微镜（100）包括电子束源（2），使电子束照射在样品（S）上的照明透镜系统（4），样品台 6），用于保持样品（S），设置在第一物镜（8）后面的第一物镜（8），第二物镜（10），设置在第二物镜（10）后面的成像透镜系统 ）和配置或编程用于控制第一物镜（8）和第二物镜（10）的控制器（22）。 第一物镜（8）具有设置在样品（S）的相对侧上的上下杆。 上下极点一起产生磁场。 控制器（22）执行用于控制第二物镜（10）的操作，以在透过样品（S）的电子束中构成样品（S）的TEM（透射电子显微镜）图像。 此外，控制器根据成像条件执行用于控制第一物镜（8）的操作，以产生抵消放置样品（S）的位置处的杂散磁场的磁场。

公开(公告)号：US10332720B2

公开(公告)日：2019-06-25

申请号：US15258025

申请日：2016-09-07

Applicant: JEOL Ltd.

Inventor： Kazuya Yamazaki

IPC: H01J37/10 ,  H01J37/22 ,  H01J37/147 ,  H01J37/26 ,  H01J37/28

Abstract: There is provided a charged particle system (100) that has: illumination optics (104) for illuminating a sample with charged particles; an imaging deflector system (112) disposed behind an objective lens (110); a detector (116) having a detection surface (115), imaging optics (114) disposed behind the imaging deflector system (112) and operative to focus the charged particles as diffraction discs (2) onto the detection surface (115); a storage unit (120) for storing intensity information detected by the detector (116); and a controller (130) for controlling the imaging deflector system (112). The controller (130) controls the imaging deflector system (112) to cause the charged particles passing through a given position of particle impingement on the sample to be deflected under successively different sets of deflection conditions and to bring the diffraction discs (2) into focus onto successively different regions of the detection surface (115).

公开(公告)号：US20170133196A1

公开(公告)日：2017-05-11

申请号：US15258025

申请日：2016-09-07

Applicant: JEOL Ltd.

Inventor： Kazuya Yamazaki

IPC: H01J37/22 ,  H01J37/147 ,  H01J37/28 ,  H01J37/10

CPC classification number: H01J37/226 ,  H01J37/10 ,  H01J37/147 ,  H01J37/268 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/2614 ,  H01J2237/2802 ,  H01J2237/2803

Abstract: There is provided a charged particle system capable of measuring deflection fields in a sample without using a segmented detector. The charged particle system (100) has: illumination optics (104) for illuminating the sample with charged particles; an imaging deflector system (112) disposed behind an objective lens (110) and operative to deflect the charged particles; a detector (116) having a detection surface (115) and operative to detect the charged particles incident thereon, imaging optics (114) disposed behind the imaging deflector system (112) and operative to focus the charged particles as diffraction discs (2) onto the detection surface (115); a storage unit (120) for storing intensity information detected by the detector (116); and a controller (130) for controlling the imaging deflector system (112). The controller (130) controls the imaging deflector system (112) to cause the charged particles passing through a given position of particle impingement on the sample to be deflected under successively different sets of deflection conditions and to bring the diffraction discs (2) into focus onto successively different regions of the detection surface (115). The storage unit (120) stores the intensity information for each set of the deflection conditions.

公开(公告)号：US20130299696A1

公开(公告)日：2013-11-14

申请号：US13667046

申请日：2012-11-02

Applicant: JEOL LTD.

Inventor： Kazuya Yamazaki

IPC: H01J37/22

CPC classification number: H01J37/22 ,  H01J37/26 ,  H01J2237/2802 ,  H01J2237/2804

Abstract: A transmission electron microscope (TEM) includes an electron beam source (2), an illumination lens (4), a first objective lens (6), a second objective lens (8), a selected area aperture (16), a projector lens (10), a detector (12), and a control portion (22). A first plane (17) is located between the second objective lens (8) and the projector lens (10). The control portion (22) performs first sets of processing for controlling the illumination lens (4) such that an electron beam (L) hits the sample (S), controlling the second objective lens (8) such that a diffraction pattern of the sample (S) is imaged onto the first plane (17), and controlling the projector lens (10) such that a TEM image of the sample (S) formed by the second objective lens (8) is focused onto a second plane where the light-sensitive portion (13) of the detector (12) is disposed.

Abstract translation: 透射电子显微镜（TEM）包括电子束源（2），照明透镜（4），第一物镜（6），第二物镜（8），选择区域孔（16），投影透镜 （10），检测器（12）和控制部分（22）。 第一平面（17）位于第二物镜（8）和投影透镜（10）之间。 控制部分（22）执行用于控制照明透镜（4）的第一组处理，使得电子束（L）撞击样品（S），控制第二物镜（8）使得样品的衍射图案 （S）被成像到第一平面（17）上，并且控制投影透镜（10），使得由第二物镜（8）形成的样品（S）的TEM图像聚焦到第二平面上，其中光 设置检测器（12）的敏感部分（13）。

公开(公告)号：US11309161B2

公开(公告)日：2022-04-19

申请号：US17155308

申请日：2021-01-22

Applicant: JEOL Ltd.

Inventor： Kazuya Yamazaki

IPC: H01J37/20 ,  H01J37/18 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

Abstract: A charged particle apparatus includes: a specimen chamber which is maintained at vacuum and in which a specimen is disposed; a preliminary exhaust chamber that is connected to the specimen chamber via a vacuum gate valve; an exhaust device that exhausts the preliminary exhaust chamber; charged particle beam source an optical system; a detector; a transporting device that transports the specimen from the preliminary exhaust chamber to the specimen chamber; and a control unit. The control unit performs: adjustment processing in which at least one of the optical system and the detector is adjusted in a state where the specimen is housed in the preliminary exhaust chamber; and transporting processing which is performed after the adjustment processing and in which the vacuum gate valve is opened and the transporting device transports the specimen to the specimen chamber.

公开(公告)号：US20170301507A1

公开(公告)日：2017-10-19

申请号：US15451546

申请日：2017-03-07

Applicant: JEOL Ltd.

Inventor： Yuko Shimizu ,  Akira Yasuhara ,  Kazuya Yamazaki ,  Fumio Hosokawa

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/20 ,  H01J37/22

CPC classification number: H01J37/1478 ,  H01J37/1471 ,  H01J37/20 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/221 ,  H01J2237/223 ,  H01J2237/2802

Abstract: There is provided a beam alignment method capable of easily aligning an electron beam with a coma-free axis in an electron microscope. The method starts with tilting the electron beam (EB) in a first direction (+X) relative to a reference axis (A) and obtaining a first TEM (transmission electron microscope) image. Then, the beam is tilted in a second direction (−X) relative to the reference axis, the second direction (−X) being on the opposite side of the reference axis (A) from the first direction (+X), and a second TEM image is obtained. The reference axis is incrementally varied so as to reduce the brightness of the differential image between a power spectrum of the first TEM image and a power spectrum of the second TEM image.

公开(公告)号：US09595416B2

公开(公告)日：2017-03-14

申请号：US14630922

申请日：2015-02-25

Applicant: JEOL Ltd.

Inventor： Kazuya Yamazaki

IPC: H01J37/14 ,  H01J37/141 ,  H01J37/26

CPC classification number: H01J37/141 ,  H01J37/09 ,  H01J37/26 ,  H01J2237/14

Abstract: A transmission electron microscope (100) capable of reducing the effects of stray magnetic fields includes an electron beam source (2), an illumination lens system (4) for causing the electron beam to impinge on a sample (S), a sample stage (6) for holding the sample (S), a first objective lens (8), a second objective lens (10) disposed behind the first objective lens (8), an imaging lens system (16) disposed behind the second objective lens (10), and a controller (22) configured or programmed for controlling the first objective lens (8) and the second objective lens (10). The first objective lens (8) has upper and lower polepieces disposed on opposite sides of the sample (S). The upper and lower polepieces together produce a magnetic field. The controller (22) performs an operation for controlling the second objective lens (10) to construct a TEM (transmission electron microscope) image of the sample (S) out of the electron beam transmitted through the sample (S). Furthermore, the controller performs an operation for controlling the first objective lens (8) according to imaging conditions to produce a magnetic field that cancels out stray magnetic fields at the position where the sample (S) is placed.

Abstract translation: 能够减少杂散磁场的影响的透射电子显微镜（100）包括电子束源（2），使电子束照射在样品（S）上的照明透镜系统（4），样品台 6），用于保持样品（S），设置在第一物镜（8）后面的第一物镜（8），第二物镜（10），设置在第二物镜（10）后面的成像透镜系统 ）和配置或编程用于控制第一物镜（8）和第二物镜（10）的控制器（22）。 第一物镜（8）具有设置在样品（S）的相对侧上的上下杆。 上下极点一起产生磁场。 控制器（22）执行用于控制第二物镜（10）的操作，以在透过样品（S）的电子束中构成样品（S）的TEM（透射电子显微镜）图像。 此外，控制器根据成像条件执行用于控制第一物镜（8）的操作，以产生抵消放置样品（S）的位置处的杂散磁场的磁场。

公开(公告)号：US08772714B2

公开(公告)日：2014-07-08

申请号：US13667046

申请日：2012-11-02

Applicant: JEOL Ltd.

Inventor： Kazuya Yamazaki

IPC: H01J37/26

CPC classification number: H01J37/22 ,  H01J37/26 ,  H01J2237/2802 ,  H01J2237/2804

Abstract: A transmission electron microscope (TEM) includes an electron beam source (2), an illumination lens (4), a first objective lens (6), a second objective lens (8), a selected area aperture (16), a projector lens (10), a detector (12), and a control portion (22). A first plane (17) is located between the second objective lens (8) and the projector lens (10). The control portion (22) performs first sets of processing for controlling the illumination lens (4) such that an electron beam (L) hits the sample (S), controlling the second objective lens (8) such that a diffraction pattern of the sample (S) is imaged onto the first plane (17), and controlling the projector lens (10) such that a TEM image of the sample (S) formed by the second objective lens (8) is focused onto a second plane where the light-sensitive portion (13) of the detector (12) is disposed.

Abstract translation: 透射电子显微镜（TEM）包括电子束源（2），照明透镜（4），第一物镜（6），第二物镜（8），选择区域孔（16），投影透镜 （10），检测器（12）和控制部分（22）。 第一平面（17）位于第二物镜（8）和投影透镜（10）之间。 控制部分（22）执行用于控制照明透镜（4）的第一组处理，使得电子束（L）撞击样品（S），控制第二物镜（8）使得样品的衍射图案 （S）被成像到第一平面（17）上，并且控制投影透镜（10），使得由第二物镜（8）形成的样品（S）的TEM图像聚焦到第二平面上，其中光 设置检测器（12）的敏感部分（13）。

公开(公告)号：US11222764B2

公开(公告)日：2022-01-11

申请号：US16827111

申请日：2020-03-23

Applicant: JEOL Ltd.

Inventor： Kazuya Yamazaki ,  Yuko Shimizu ,  Hirofumi Iijima ,  Takuma Fukumura ,  Naoki Hosogi ,  Tomohiro Nakamichi

IPC: H01J37/10 ,  H01J37/147 ,  H01J37/26

Abstract: A charged particle beam device includes: a charged particle source; an optical system which acts on a charged particle beam emitted from the charged particle source; a control unit which controls the optical system; and a storage unit which stores previous setting values of the optical system. The optical system includes a first optical element and a second optical element for controlling a state of the charged particle beam to be incident on the first optical element. The control unit obtains an initial value of a setting value of the second optical element based on previous setting values of the second optical element; and changes a state of the charged particle beam by changing the setting value of the second optical element from the obtained initial value and obtains the setting value of the second optical element based on the change in the state of the charged particle beam.

公开(公告)号：US20200343072A1

公开(公告)日：2020-10-29

申请号：US16827111

申请日：2020-03-23

Applicant: JEOL Ltd.

Inventor： Kazuya Yamazaki ,  Yuko Shimizu ,  Hirofumi Iijima ,  Takuma Fukumura ,  Naoki Hosogi ,  Tomohiro Nakamichi

IPC: H01J37/10 ,  H01J37/147

Abstract: A charged particle beam device includes: a charged particle source; an optical system which acts on a charged particle beam emitted from the charged particle source; a control unit which controls the optical system; and a storage unit which stores previous setting values of the optical system. The optical system includes a first optical element and a second optical element for controlling a state of the charged particle beam to be incident on the first optical element. The control unit obtains an initial value of a setting value of the second optical element based on previous setting values of the second optical element; and changes a state of the charged particle beam by changing the setting value of the second optical element from the obtained initial value and obtains the setting value of the second optical element based on the change in the state of the charged particle beam.