公开(公告)号：US11222764B2

公开(公告)日：2022-01-11

申请号：US16827111

申请日：2020-03-23

Applicant: JEOL Ltd.

Inventor： Kazuya Yamazaki ,  Yuko Shimizu ,  Hirofumi Iijima ,  Takuma Fukumura ,  Naoki Hosogi ,  Tomohiro Nakamichi

IPC: H01J37/10 ,  H01J37/147 ,  H01J37/26

Abstract: A charged particle beam device includes: a charged particle source; an optical system which acts on a charged particle beam emitted from the charged particle source; a control unit which controls the optical system; and a storage unit which stores previous setting values of the optical system. The optical system includes a first optical element and a second optical element for controlling a state of the charged particle beam to be incident on the first optical element. The control unit obtains an initial value of a setting value of the second optical element based on previous setting values of the second optical element; and changes a state of the charged particle beam by changing the setting value of the second optical element from the obtained initial value and obtains the setting value of the second optical element based on the change in the state of the charged particle beam.

公开(公告)号：US20200343072A1

公开(公告)日：2020-10-29

申请号：US16827111

申请日：2020-03-23

Applicant: JEOL Ltd.

Inventor： Kazuya Yamazaki ,  Yuko Shimizu ,  Hirofumi Iijima ,  Takuma Fukumura ,  Naoki Hosogi ,  Tomohiro Nakamichi

IPC: H01J37/10 ,  H01J37/147

Abstract: A charged particle beam device includes: a charged particle source; an optical system which acts on a charged particle beam emitted from the charged particle source; a control unit which controls the optical system; and a storage unit which stores previous setting values of the optical system. The optical system includes a first optical element and a second optical element for controlling a state of the charged particle beam to be incident on the first optical element. The control unit obtains an initial value of a setting value of the second optical element based on previous setting values of the second optical element; and changes a state of the charged particle beam by changing the setting value of the second optical element from the obtained initial value and obtains the setting value of the second optical element based on the change in the state of the charged particle beam.

公开(公告)号：US20200013582A1

公开(公告)日：2020-01-09

申请号：US16454181

申请日：2019-06-27

Applicant: JEOL Ltd.

Inventor： Yuko Shimizu ,  Hirofumi Iijima ,  Naoki Hosogi ,  Jun Yamashita

IPC: H01J37/22 ,  H01J37/26 ,  H01J37/244

Abstract: An electron microscope comprises: an electron microscope main body including a phase plate that imparts a phase change to an electron wave, a moving mechanism that moves the phase plate, and a detector that acquires an image formed by an electron beam transmitted through a sample; and a control unit that controls the electron microscope main body. The control unit performs a phase plate image acquisition process of acquiring a phase plate image which is an image of the phase plate; an unevenness determination process of determining whether or not the phase plate has unevenness based on the phase plate image; and a moving mechanism control process of moving the phase plate by controlling the moving mechanism when the control unit has determined that the unevenness is present.

公开(公告)号：US10020162B2

公开(公告)日：2018-07-10

申请号：US15451546

申请日：2017-03-07

Applicant: JEOL Ltd.

Inventor： Yuko Shimizu ,  Akira Yasuhara ,  Kazuya Yamazaki ,  Fumio Hosokawa

IPC: G01N23/00 ,  H01J37/147 ,  H01J37/28 ,  H01J37/20 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/1478 ,  H01J37/1471 ,  H01J37/20 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/221 ,  H01J2237/223 ,  H01J2237/2802

Abstract: There is provided a beam alignment method capable of easily aligning an electron beam with a coma-free axis in an electron microscope. The method starts with tilting the electron beam (EB) in a first direction (+X) relative to a reference axis (A) and obtaining a first TEM (transmission electron microscope) image. Then, the beam is tilted in a second direction (−X) relative to the reference axis, the second direction (−X) being on the opposite side of the reference axis (A) from the first direction (+X), and a second TEM image is obtained. The reference axis is incrementally varied so as to reduce the brightness of the differential image between a power spectrum of the first TEM image and a power spectrum of the second TEM image.

公开(公告)号：US10741358B2

公开(公告)日：2020-08-11

申请号：US16454181

申请日：2019-06-27

Applicant: JEOL Ltd.

Inventor： Yuko Shimizu ,  Hirofumi Iijima ,  Naoki Hosogi ,  Jun Yamashita

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/26

Abstract: An electron microscope comprises: an electron microscope main body including a phase plate that imparts a phase change to an electron wave, a moving mechanism that moves the phase plate, and a detector that acquires an image formed by an electron beam transmitted through a sample; and a control unit that controls the electron microscope main body. The control unit performs a phase plate image acquisition process of acquiring a phase plate image which is an image of the phase plate; an unevenness determination process of determining whether or not the phase plate has unevenness based on the phase plate image; and a moving mechanism control process of moving the phase plate by controlling the moving mechanism when the control unit has determined that the unevenness is present.

公开(公告)号：US20170301507A1

公开(公告)日：2017-10-19

申请号：US15451546

申请日：2017-03-07

Applicant: JEOL Ltd.

Inventor： Yuko Shimizu ,  Akira Yasuhara ,  Kazuya Yamazaki ,  Fumio Hosokawa

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/20 ,  H01J37/22

CPC classification number: H01J37/1478 ,  H01J37/1471 ,  H01J37/20 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/221 ,  H01J2237/223 ,  H01J2237/2802

Abstract: There is provided a beam alignment method capable of easily aligning an electron beam with a coma-free axis in an electron microscope. The method starts with tilting the electron beam (EB) in a first direction (+X) relative to a reference axis (A) and obtaining a first TEM (transmission electron microscope) image. Then, the beam is tilted in a second direction (−X) relative to the reference axis, the second direction (−X) being on the opposite side of the reference axis (A) from the first direction (+X), and a second TEM image is obtained. The reference axis is incrementally varied so as to reduce the brightness of the differential image between a power spectrum of the first TEM image and a power spectrum of the second TEM image.