Method for manufacturing semiconductor and structure thereof

    公开(公告)号:US10937858B2

    公开(公告)日:2021-03-02

    申请号:US16852749

    申请日:2020-04-20

    IPC分类号: H01L49/02 H01L27/06

    摘要: A method of manufacturing a semiconductor structure is provided. The method includes: providing a substrate including an electrical component; forming a capacitor structure in the substrate, proximal to a heterogeneous interface of the substrate, and physically and electrically isolated from the electrical component; forming a conductive terminal over and electrically connected with the capacitor structure; and contacting the conductive terminal with a probe to measure an electrical parameter of the capacitor structure, wherein the electrical parameter corresponds to a humidity permeability at the heterogeneous interface. A semiconductor structure thereof is also provided.