公开(公告)号：US09960088B2

公开(公告)日：2018-05-01

申请号：US13290879

申请日：2011-11-07

申请人： Yi-Chao Mao ,  Jui-Pin Hung ,  Jing-Cheng Lin ,  Shin-Puu Jeng ,  Chen-Hua Yu

发明人： Yi-Chao Mao ,  Jui-Pin Hung ,  Jing-Cheng Lin ,  Shin-Puu Jeng ,  Chen-Hua Yu

IPC分类号： B24B49/10 ,  H01L21/66 ,  B24B37/013 ,  B24B7/22 ,  H01L23/31

CPC分类号： H01L22/26 ,  B24B7/228 ,  B24B37/013 ,  B24B49/10 ,  H01L22/12 ,  H01L23/3114 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method for performing grinding includes selecting a target wheel loading for wafer grinding processes, and performing a grinding process on a wafer. With the proceeding of the grinding process, wheel loadings of the grinding process are measured. The grinding process is stopped after the target wheel loading is reached. The method alternatively includes selecting a target reflectivity of wafer grinding processes, and performing a grinding process on a wafer. With a proceeding of the grinding process, reflectivities of a light reflected from a surface of the wafer are measured. The grinding process is stopped after one of the reflectivities reaches the target reflectivity.

公开(公告)号：US09620430B2

公开(公告)日：2017-04-11

申请号：US13356173

申请日：2012-01-23

申请人： Szu Wei Lu ,  Ying-Da Wang ,  Li-Chung Kuo ,  Jing-Cheng Lin

发明人： Szu Wei Lu ,  Ying-Da Wang ,  Li-Chung Kuo ,  Jing-Cheng Lin

IPC分类号： H01L21/78 ,  H01L23/31 ,  H01L23/00 ,  H01L21/56 ,  H01L25/065 ,  H01L27/06

CPC分类号： H01L25/0655 ,  H01L21/561 ,  H01L21/563 ,  H01L21/565 ,  H01L21/78 ,  H01L23/3135 ,  H01L23/3178 ,  H01L23/3185 ,  H01L24/05 ,  H01L24/06 ,  H01L24/11 ,  H01L24/13 ,  H01L24/14 ,  H01L24/16 ,  H01L24/32 ,  H01L24/73 ,  H01L24/83 ,  H01L24/92 ,  H01L24/94 ,  H01L24/97 ,  H01L25/0652 ,  H01L2224/0401 ,  H01L2224/05569 ,  H01L2224/0557 ,  H01L2224/06181 ,  H01L2224/11464 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1403 ,  H01L2224/14181 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/83862 ,  H01L2224/83874 ,  H01L2224/92125 ,  H01L2224/93 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/00014 ,  H01L2924/10156 ,  H01L2924/10253 ,  H01L2924/10271 ,  H01L2924/10272 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/1431 ,  H01L2924/1434 ,  H01L2924/15311 ,  H01L2924/157 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/3511 ,  H01L2224/81 ,  H01L2924/00012 ,  H01L2224/11 ,  H01L2924/00 ,  H01L2224/05552

摘要： A method includes bonding a first and a second package component on a top surface of a third package component, and dispensing a polymer. The polymer includes a first portion in a space between the first and the third package components, a second portion in a space between the second and the third package components, and a third portion in a gap between the first and the second package components. A curing step is then performed on the polymer. After the curing step, the third portion of the polymer is sawed to form a trench between the first and the second package components.

公开(公告)号：US09443783B2

公开(公告)日：2016-09-13

申请号：US13619877

申请日：2012-09-14

申请人： Jing-Cheng Lin ,  Chen-Hua Yu

发明人： Jing-Cheng Lin ,  Chen-Hua Yu

IPC分类号： H01L23/31 ,  H01L23/498 ,  H01L23/538 ,  H01L21/56 ,  H01L25/03 ,  H01L25/00 ,  H01L21/768 ,  H01L23/00

CPC分类号： H01L25/0652 ,  H01L21/561 ,  H01L21/563 ,  H01L21/568 ,  H01L21/76898 ,  H01L23/3135 ,  H01L23/3171 ,  H01L23/49816 ,  H01L23/5389 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/14 ,  H01L24/81 ,  H01L24/92 ,  H01L24/96 ,  H01L25/03 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/02372 ,  H01L2224/02379 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05569 ,  H01L2224/05571 ,  H01L2224/05572 ,  H01L2224/05655 ,  H01L2224/05666 ,  H01L2224/11002 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1134 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11849 ,  H01L2224/12105 ,  H01L2224/13023 ,  H01L2224/13024 ,  H01L2224/13082 ,  H01L2224/131 ,  H01L2224/13147 ,  H01L2224/14134 ,  H01L2224/14144 ,  H01L2224/14154 ,  H01L2224/14164 ,  H01L2224/14181 ,  H01L2224/17181 ,  H01L2224/2919 ,  H01L2224/73204 ,  H01L2224/81005 ,  H01L2224/81191 ,  H01L2224/81815 ,  H01L2224/81895 ,  H01L2224/83104 ,  H01L2224/9202 ,  H01L2224/96 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06524 ,  H01L2225/06527 ,  H01L2225/06541 ,  H01L2225/06562 ,  H01L2225/06568 ,  H01L2924/15787 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/351 ,  H01L2224/11 ,  H01L2924/00014 ,  H01L2224/03 ,  H01L2224/81 ,  H01L2924/00 ,  H01L2924/014 ,  H01L2924/0665

摘要： A system and method for stacking semiconductor devices in three dimensions is provided. In an embodiment two or more semiconductor dies are attached to a carrier and encapsulated. Connections of the two or more semiconductor dies are exposed, and the two or more semiconductor dies may be thinned to form connections on an opposite side. Additional semiconductor dies may then be placed in either an offset or overhanging position.

摘要翻译： 提供了一种三维堆叠半导体器件的系统和方法。 在一个实施例中，将两个或更多个半导体管芯附着到载体并封装。 两个或更多个半导体管芯的连接被暴露，并且两个或更多个半导体管芯可以被薄化以在相对侧上形成连接。 然后可以将另外的半导体管芯置于偏移或悬垂位置中。

公开(公告)号：US09391000B2

公开(公告)日：2016-07-12

申请号：US13445734

申请日：2012-04-12

申请人： Cheng-Chieh Hsieh ,  Jing-Cheng Lin

发明人： Cheng-Chieh Hsieh ,  Jing-Cheng Lin

IPC分类号： H01L23/473 ,  H01L21/48

CPC分类号： H01L23/473 ,  H01L21/4882 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method includes forming a first oxide layer on a surface of an integrated heat spreader, and forming a second oxide layer on top surfaces of fins, wherein the fins are parts of a heat sink. The integrated heat spreader is bonded to the heat sink through the bonding of the first oxide layer to the second oxide layer.

摘要翻译： 一种方法包括在集成散热器的表面上形成第一氧化物层，并且在翅片的顶表面上形成第二氧化物层，其中散热片是散热片的一部分。 集成散热器通过第一氧化物层与第二氧化物层的结合而结合到散热器。

公开(公告)号：US09219016B2

公开(公告)日：2015-12-22

申请号：US13247659

申请日：2011-09-28

申请人： Jing-Cheng Lin ,  Po-Hao Tsai

发明人： Jing-Cheng Lin ,  Po-Hao Tsai

IPC分类号： H05K7/00 ,  H01L21/66 ,  H01L23/00 ,  H01L23/31

CPC分类号： H01L22/32 ,  H01L23/3192 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/81 ,  H01L2224/0401 ,  H01L2224/05024 ,  H01L2224/05027 ,  H01L2224/05166 ,  H01L2224/05572 ,  H01L2224/05647 ,  H01L2224/10126 ,  H01L2224/1146 ,  H01L2224/1147 ,  H01L2224/1182 ,  H01L2224/11823 ,  H01L2224/13022 ,  H01L2224/13082 ,  H01L2224/13083 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13118 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13157 ,  H01L2224/13164 ,  H01L2224/13565 ,  H01L2224/13566 ,  H01L2224/13578 ,  H01L2224/13644 ,  H01L2224/13655 ,  H01L2224/1369 ,  H01L2224/16148 ,  H01L2224/73204 ,  H01L2224/81193 ,  H01L2224/81815 ,  H01L2224/94 ,  H01L2924/00014 ,  H01L2924/181 ,  H01L2924/01029 ,  H01L2224/81 ,  H01L2224/05552 ,  H01L2924/00

摘要： A work piece includes a first copper-containing pillar having a top surface and sidewalls, and a first protection layer on the sidewalls, and not over the top surface, of the first copper-containing pillar. A test pad includes a second copper-containing pillar having a top surface and sidewalls. The test pad is electrically coupled to the first copper-containing pillar. A second protection layer is disposed on the sidewalls, and not over the top surface, of the second copper-containing pillar. The first and the second protection layers include a compound of copper and a polymer, and are dielectric layers.

摘要翻译： 工件包括具有顶表面和侧壁的第一含铜柱，以及第一含铜柱的侧壁而不是顶表面上的第一保护层。 测试垫包括具有顶表面和侧壁的第二含铜柱。 测试垫电耦合到第一含铜柱。 第二保护层设置在第二含铜柱的侧壁上，而不是在顶表面上。 第一和第二保护层包括铜和聚合物的化合物，并且是电介质层。

公开(公告)号：US09159687B2

公开(公告)日：2015-10-13

申请号：US13572302

申请日：2012-08-10

申请人： Jung-Hua Chang ,  Cheng-Lin Huang ,  Jing-Cheng Lin

发明人： Jung-Hua Chang ,  Cheng-Lin Huang ,  Jing-Cheng Lin

IPC分类号： H01L23/495 ,  H01L23/00 ,  H01L23/498

CPC分类号： H01L24/13 ,  H01L23/49816 ,  H01L24/11 ,  H01L2224/118 ,  H01L2224/13 ,  H01L2224/13016 ,  H01L2224/131 ,  H01L2224/1319 ,  H01L2924/01029 ,  H01L2924/014 ,  H01L2924/06 ,  H01L2924/0665 ,  H01L2924/15788 ,  H01L2924/37001 ,  H01L2924/00

摘要： A solder bump structure for a ball grid array (BGA) includes at least one under bump metal (UBM) layer and a solder bump formed over the at least one UBM layer. The solder bump has a bump width and a bump height and the ratio of the bump height over the bump width is less than 1.

摘要翻译： 用于球栅阵列（BGA）的焊料凸块结构包括在至少一个UBM层上形成的至少一个下凸块金属（UBM）层和焊料凸块。 焊料凸块具有凸块宽度和凸块高度，并且凸块高度比凸块宽度的比值小于1。

公开(公告)号：US08975183B2

公开(公告)日：2015-03-10

申请号：US13370477

申请日：2012-02-10

申请人： Jing-Cheng Lin

发明人： Jing-Cheng Lin

IPC分类号： H01L21/44

CPC分类号： H01L21/561 ,  H01L21/486 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L25/0655 ,  H01L2224/16227 ,  H01L2224/16235 ,  H01L2224/16237 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/97 ,  H01L2924/15311 ,  H01L2924/157 ,  H01L2924/18161 ,  H01L2224/83 ,  H01L2224/81

摘要： A method for forming a semiconductor structure. A semiconductor substrate including a plurality of dies mounted thereon is provided. The substrate includes a first portion proximate to the dies and a second portion distal to the dies. In some embodiments, the first portion may include front side metallization. The second portion of the substrate is thinned and a plurality of conductive through substrate vias (TSVs) is formed in the second portion of the substrate after the thinning operation. Prior to thinning, the second portion may not contain metallization. In one embodiment, the substrate may be a silicon interposer. Further back side metallization may be formed to electrically connect the TSVs to other packaging substrates or printed circuit boards.

摘要翻译： 一种形成半导体结构的方法。 提供了包括安装在其上的多个管芯的半导体基板。 衬底包括靠近模具的第一部分和远离模具的第二部分。 在一些实施例中，第一部分可以包括前侧金属化。 衬底的第二部分变薄，并且在变薄操作之后，在衬底的第二部分中形成多个导电贯通衬底通孔（TSV）。 在变薄之前，第二部分可以不包含金属化。 在一个实施例中，衬底可以是硅插入器。 可以形成另外的背侧金属化以将TSV电连接到其他封装基板或印刷电路板。

公开(公告)号：US08922004B2

公开(公告)日：2014-12-30

申请号：US12846260

申请日：2010-07-29

申请人： Jing-Cheng Lin ,  Ya-Hsi Hwung ,  Hsin-Yu Chen ,  Po-Hao Tsai ,  Yan-Fu Lin ,  Cheng-Lin Huang ,  Fang Wen Tsai ,  Wen-Chih Chiou

发明人： Jing-Cheng Lin ,  Ya-Hsi Hwung ,  Hsin-Yu Chen ,  Po-Hao Tsai ,  Yan-Fu Lin ,  Cheng-Lin Huang ,  Fang Wen Tsai ,  Wen-Chih Chiou

IPC分类号： H01L23/48 ,  H01L23/488 ,  H01L23/00 ,  H01L25/065

CPC分类号： H01L24/11 ,  H01L23/488 ,  H01L24/13 ,  H01L24/16 ,  H01L24/73 ,  H01L24/81 ,  H01L24/92 ,  H01L24/94 ,  H01L25/0657 ,  H01L2224/0401 ,  H01L2224/05099 ,  H01L2224/05571 ,  H01L2224/05599 ,  H01L2224/10126 ,  H01L2224/10145 ,  H01L2224/1182 ,  H01L2224/11823 ,  H01L2224/1191 ,  H01L2224/13017 ,  H01L2224/13022 ,  H01L2224/13083 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13118 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13157 ,  H01L2224/13164 ,  H01L2224/13564 ,  H01L2224/13565 ,  H01L2224/1357 ,  H01L2224/13578 ,  H01L2224/13583 ,  H01L2224/13644 ,  H01L2224/13655 ,  H01L2224/13664 ,  H01L2224/1369 ,  H01L2224/16058 ,  H01L2224/16148 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/81193 ,  H01L2224/81801 ,  H01L2224/81815 ,  H01L2224/92125 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/00011 ,  H01L2924/0002 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/01327 ,  H01L2924/014 ,  H01L2924/10253 ,  H01L2924/14 ,  H01L2924/37001 ,  H01L2924/00 ,  H01L2224/81 ,  H01L2224/16225 ,  H01L2924/00012 ,  H01L2224/16145 ,  H01L2924/00014 ,  H01L2924/01047 ,  H01L2224/05552 ,  H01L2224/81805

摘要： A work piece includes a copper bump having a top surface and sidewalls. A protection layer is formed on the sidewalls, and not on the top surface, of the copper bump. The protection layer includes a compound of copper and a polymer, and is a dielectric layer.

摘要翻译： 工件包括具有顶表面和侧壁的铜凸块。 在铜凸块的侧壁而不是顶表面上形成保护层。 保护层包括铜和聚合物的化合物，并且是介电层。

公开(公告)号：US08871568B2

公开(公告)日：2014-10-28

申请号：US13345485

申请日：2012-01-06

申请人： Ying-Ching Shih ,  Szu Wei Lu ,  Jing-Cheng Lin

发明人： Ying-Ching Shih ,  Szu Wei Lu ,  Jing-Cheng Lin

IPC分类号： H01L21/58 ,  H01L23/485 ,  H01L21/78

CPC分类号： H01L21/6835 ,  H01L21/561 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/3185 ,  H01L23/49816 ,  H01L24/97 ,  H01L2221/68345 ,  H01L2221/68381 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/81005 ,  H01L2224/81192 ,  H01L2224/83005 ,  H01L2224/97 ,  H01L2924/00014 ,  H01L2924/12042 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2224/81 ,  H01L2924/00 ,  H01L2224/0401 ,  H01L2224/83

摘要： A method includes forming a dielectric layer over a substrate, forming an interconnect structure over the dielectric layer, and bonding a die to the interconnect structure. The substrate is then removed, and the dielectric layer is patterned. Connectors are formed at a surface of the dielectric layer, wherein the connectors are electrically coupled to the die.

摘要翻译： 一种方法包括在衬底上形成电介质层，在电介质层上形成互连结构，以及将管芯结合到互连结构。 然后去除衬底，并对电介质层进行图案化。 连接器形成在电介质层的表面，其中连接器电耦合到管芯。

公开(公告)号：US08866301B2

公开(公告)日：2014-10-21

申请号：US12781960

申请日：2010-05-18

申请人： Yung-Chi Lin ,  Jing-Cheng Lin ,  Chen-Hua Yu

发明人： Yung-Chi Lin ,  Jing-Cheng Lin ,  Chen-Hua Yu

IPC分类号： H01L23/48 ,  H01L23/52 ,  H01L29/40 ,  H01L23/02 ,  H01L23/498 ,  H01L23/538 ,  H01L23/00 ,  H01L23/31 ,  H01L21/56 ,  H01L23/29 ,  H01L21/48

CPC分类号： H01L21/4857 ,  H01L21/4846 ,  H01L21/4853 ,  H01L21/486 ,  H01L21/56 ,  H01L21/563 ,  H01L21/565 ,  H01L21/6835 ,  H01L21/768 ,  H01L23/295 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/5389 ,  H01L24/03 ,  H01L24/11 ,  H01L24/19 ,  H01L24/24 ,  H01L25/0657 ,  H01L25/50 ,  H01L2221/68359 ,  H01L2224/02331 ,  H01L2224/02372 ,  H01L2224/0239 ,  H01L2224/0401 ,  H01L2224/12105 ,  H01L2224/16225 ,  H01L2224/24227 ,  H01L2224/32225 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2225/06517 ,  H01L2225/06548 ,  H01L2225/06572 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01032 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01059 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01327 ,  H01L2924/10253 ,  H01L2924/10329 ,  H01L2924/12042 ,  H01L2924/1305 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15192 ,  H01L2924/15311 ,  H01L2924/15788 ,  H01L2924/181 ,  H01L2924/00012 ,  H01L2924/00

摘要： A package system includes a first integrated circuit disposed over an interposer. The interposer includes at least one molding compound layer including a plurality of electrical connection structures through the at least one molding compound layer. A first interconnect structure is disposed over a first surface of the at least one molding compound layer and electrically coupled with the plurality of electrical connection structures. The first integrated circuit is electrically coupled with the first interconnect structure.

摘要翻译： 封装系统包括设置在插入器上的第一集成电路。 所述插入器包括至少一个包含穿过所述至少一个模塑复合层的多个电连接结构的模塑复合层。 第一互连结构设置在至少一个模塑复合层的第一表面上并与多个电连接结构电耦合。 第一集成电路与第一互连结构电耦合。