公开(公告)号：US20230317436A1

公开(公告)日：2023-10-05

申请号：US18192304

申请日：2023-03-29

Applicant: Semes Co., Ltd.

Inventor： Dukhyun Son ,  Jihun Kim ,  Yeonghun Wi

IPC: H01J37/32 ,  H01L21/687 ,  H01L21/683

CPC classification number: H01J37/32807 ,  H01L21/68742 ,  H01J37/32715 ,  H01L21/68721 ,  H01J37/32642 ,  H01L21/6831 ,  H01J2237/3343 ,  H01J2237/024 ,  H01J2237/2007

Abstract: The disclosure provides a substrate processing apparatus including an electrostatic chuck disposed on a base to support a substrate, a focus ring disposed on the base to surround an outer circumference of the electrostatic chuck, and a lift pin configured to lift the focus ring, wherein the focus ring includes a lower ring and an upper ring disposed on the lower ring, the upper ring and/or the lower ring are configured to be simultaneously lifted according to a height of the lift pin, the lower ring includes an insertion groove, the upper ring includes a main body unit, a first protrusion extending downward from the main body unit and inserted into the insertion groove of the lower ring, and a second protrusion extending downward from the main body unit, contacting an outer circumference of the lower ring, and directly contacting the lift pin.

公开(公告)号：US20230317402A1

公开(公告)日：2023-10-05

申请号：US18118701

申请日：2023-03-07

Applicant: ASML Netherlands B.V.

Inventor： Derk Ferdinand WALVOORT ,  Dmitry MUDRETSOV ,  Xuerang HU ,  Qingpo XI ,  Jurgen VAN SOEST ,  Marco Jan-Jaco WIELAND

IPC: H01J37/09

CPC classification number: H01J37/09 ,  H01J2237/0266 ,  H01J2237/024

Abstract: Disclosed herein is an electron-optical assembly for an electron-optical column for projecting a charged particle beam along a beam path towards a target, the electron-optical assembly comprising: electromagnetic shielding surrounding the charged particle beam path and configured to shield the charged particle beam from an electromagnetic field external to the electromagnetic shielding; wherein the electromagnetic shielding comprises a plurality of sections extending along different positions along the beam path, each section surrounding the charged particle beam, wherein the sections are separable.

公开(公告)号：US20180240640A1

公开(公告)日：2018-08-23

申请号：US15887861

申请日：2018-02-02

Applicant: KLA-Tencor Corporation

Inventor： Mohammed Tahmassebpur

IPC: H01J37/063 ,  H01J37/065 ,  H01J37/09 ,  H01J37/28 ,  H01J37/147 ,  H01J37/244

CPC classification number: H01J37/063 ,  H01J37/065 ,  H01J37/067 ,  H01J37/073 ,  H01J37/09 ,  H01J37/1471 ,  H01J37/244 ,  H01J37/261 ,  H01J37/28 ,  H01J37/3002 ,  H01J37/3177 ,  H01J2237/024 ,  H01J2237/061 ,  H01J2237/0635

Abstract: A scanning electron microscopy (SEM) system includes a plurality of electron-optical columns and a plurality of electron beam sources. The electron beam sources include an emitter including one or more emitter tips configured to generate one or more electron beams of a plurality of electron beams. The electron beam sources include a stack of one or more positioners configured to adjust a position of the emitter based on one or more measurements of the electron beam generated by the emitter. The emitter is configured to scan the one or more electron beams across an area surrounding a bore of an electron-optical column of the plurality of electron-optical columns. The electron beam source array includes a carrier plate and a source tower. The source tower is configured to adjust a position of the plurality of electron beam sources relative to a position of the plurality of electron-optical columns.

公开(公告)号：US20180218877A1

公开(公告)日：2018-08-02

申请号：US15886269

申请日：2018-02-01

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Wolfgang Berger

IPC: H01J37/22 ,  G01N23/225 ,  H01J37/18 ,  H01J37/244 ,  G01N15/14 ,  G01T1/16 ,  H01J37/28

CPC classification number: H01J37/226 ,  G01N15/1436 ,  G01N23/225 ,  G01T1/16 ,  H01J37/18 ,  H01J37/228 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/182 ,  H01J2237/2448 ,  H01J2237/2608 ,  H01J2237/2801 ,  H01J2237/2802 ,  H01J2237/2806

Abstract: The system described herein relates to an imaging device for imaging an object in a particle beam apparatus and/or for imaging a structural unit of a particle beam apparatus, and to a particle beam apparatus having such an imaging device. The imaging device has an illumination unit having a first switching state and a second switching state for illuminating the object and/or the structural unit with illumination light, where, in the first switching state, the illumination light comprises only light of a first spectral range and where, in the second switching state, the illumination light comprises only light of a second spectral range. The imaging device has a control unit for switching the illumination unit into the first switching state or into the second switching state, and a camera unit for imaging the object and/or the structural unit.

公开(公告)号：US09899193B1

公开(公告)日：2018-02-20

申请号：US15341040

申请日：2016-11-02

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Bon-Woong Koo ,  Yong-Seok Hwang ,  Kyong-Jae Chung

IPC: H01J37/08 ,  H01J37/32

CPC classification number: H01J37/32458 ,  H01J27/16 ,  H01J37/08 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32412 ,  H01J37/32422 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32623 ,  H01J37/32669 ,  H01J2237/024 ,  H01J2237/065 ,  H01J2237/31701 ,  H01J2237/327 ,  H01J2237/3365

Abstract: Provided herein are approaches for dynamically modifying plasma volume in an ion source chamber by positioning an end plate and radio frequency (RF) antenna at a selected axial location. In one approach, an ion source includes a plasma chamber having a longitudinal axis extending between a first end wall and a second end wall, and an RF antenna adjacent a plasma within the plasma chamber, wherein the RF antenna is configured to provide RF energy to the plasma. The ion source may further include an end plate disposed within the plasma chamber, adjacent the first end wall, the end plate actuated along the longitudinal axis between a first position and a second position to adjust a volume of the plasma. By providing an actuable end plate and RF antenna, plasma characteristics may be dynamically controlled to affect ion source characteristics, such as composition of ion species, including metastable neutrals.

公开(公告)号：US20170213697A1

公开(公告)日：2017-07-27

申请号：US15005949

申请日：2016-01-25

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Alon Litman ,  Efim Vinnitsky

IPC: H01J37/285 ,  H01J37/20 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/244 ,  H01J37/20 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/024 ,  H01J2237/2445 ,  H01J2237/2807

Abstract: A method for evaluating a specimen, the method can include positioning an energy dispersive X-ray (EDX) detector at a first position; scanning a flat surface of the specimen by a charged particle beam that exits from a charged particle beam optics tip and propagates through an aperture of an EDX detector tip; detecting, by the EDX detector, x-ray photons emitted from the flat surface as a result of the scanning of the flat surface with the charged particle beam; after a completion of the scanning of the flat surface, positioning the EDX detector at a second position in which a distance between the EDX detector tip and a plane of the flat surface exceeds a distance between the plane of the flat surface and the charged particle beam optics tip; and wherein a projection of the EDX detector on the plane of the flat surface virtually falls on the flat surface when the EDX detector is positioned at the first position and when the EDX detector is positioned at the second position.

公开(公告)号：US20170025243A1

公开(公告)日：2017-01-26

申请号：US15216258

申请日：2016-07-21

Applicant: Hermes Microvision, Inc.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/147 ,  H01J37/10 ,  H01J37/06

CPC classification number: H01J37/1474 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/1478 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

Abstract translation: 提出了一种用于以高分辨率和高吞吐量观察样品的多光束装置。 在该装置中，源极转换单元通过偏转平行的一次电子束的多个子束形成一个单个电子源的多个并行图像，并且一个物镜将多个偏转的子束聚焦在样本表面上并形成多个探针点 上。 使用可移动聚光透镜来准直一次电子束并改变多个探针点的电流，前束形成装置削弱一次电子束的库仑效应，并且源转换单元使尺寸最小化 通过最小化和补偿物镜和聚光透镜的离轴像差来实现多个探测点。

公开(公告)号：US09373481B2

公开(公告)日：2016-06-21

申请号：US14618630

申请日：2015-02-10

Applicant: Sumitomo Heavy Industries Ion Technology Co., Ltd.

Inventor： Kouji Kato ,  Yoshitaka Amamo

IPC: H01J37/05 ,  H01J37/09 ,  H01J37/317 ,  H01J37/12

CPC classification number: H01J37/3171 ,  H01J37/12 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/121 ,  H01J2237/16

Abstract: A beam collimator includes a plurality of lens units that are arranged along a reference trajectory so that a beam collimated to the reference trajectory comes out from an exit of the beam collimator. Each of the plurality of lens units forms a bow-shaped curved gap and is formed such that an angle of a beam traveling direction with respect to the reference trajectory is changed by an electric field generated in the bow-shaped curved gap. A vacant space is provided between one lens unit of the plurality of lens units and a lens unit that is adjacent to the lens unit. The vacant space is directed in a transverse direction of the collimated beam in a cross section that is perpendicular to the reference trajectory. An inner field containing the reference trajectory is connected to an outer field of the plurality of lens units through the vacant space.

Abstract translation: 光束准直仪包括沿着参考轨迹布置的多个透镜单元，使得准直到参考轨迹的光束从光束准直仪的出口出来。 多个透镜单元中的每一个形成弓形弯曲间隙，并且形成为使得相对于基准轨迹的光束移动方向的角度由弓形弯曲间隙中产生的电场改变。 在多个透镜单元的一个透镜单元和与透镜单元相邻的透镜单元之间设置有空白空间。 在垂直于参考轨迹的横截面中，空白空间被引导在准直光束的横向方向上。 包含参考轨迹的内部场通过空置空间连接到多个透镜单元的外部场。

公开(公告)号：US09362084B2

公开(公告)日：2016-06-07

申请号：US13458936

申请日：2012-04-27

Applicant: Alrik van den Brom ,  Stijn Willem Herman Karel Steenbrink ,  Marco Jan-Jaco Wieland ,  Guido De Boer ,  Pieter Kappelhof

Inventor： Alrik van den Brom ,  Stijn Willem Herman Karel Steenbrink ,  Marco Jan-Jaco Wieland ,  Guido De Boer ,  Pieter Kappelhof

IPC: H01J37/20 ,  H01J37/317

CPC classification number: H01J37/20 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70975 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/024 ,  H01J2237/03 ,  H01J2237/0437 ,  H01J2237/1502 ,  H01J2237/153

Abstract: The invention relates to a charged particle system for processing a target surface with at least one charged particle beam. The system comprises an optical column with a beam generator module for generating a plurality of charged particle beams, a beam modulator module for switching on and off said plurality of beams and a beam projector module for projecting beams or subbeams on said target surface. The system further comprises a frame supporting each of said modules in a fixed position and alignment elements for aligning at least one of beams and/or subbeams with a downstream module element.

Abstract translation: 本发明涉及一种用至少一个带电粒子束来处理目标表面的带电粒子系统。 该系统包括具有用于产生多个带电粒子束的光束发生器模块的光学柱，用于接通和关闭所述多个光束的光束调制器模块和用于在所述目标表面上投射光束或子光束的光束投影器模块。 该系统还包括支撑固定位置的每个模块的框架和用于将梁和/或子梁中的至少一个与下游模块元件对准的对准元件。

公开(公告)号：US09355751B2

公开(公告)日：2016-05-31

申请号：US14541238

申请日：2014-11-14

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Willem Henk Urbanus ,  Marco Jan-Jaco Wieland

IPC: G21K1/02 ,  G21K5/04 ,  H01J37/24 ,  H01J37/30 ,  H01J37/317 ,  H01J37/02 ,  H01J37/16 ,  H01J37/065 ,  H01J37/12

CPC classification number: G21K1/02 ,  G21K5/04 ,  H01J37/026 ,  H01J37/065 ,  H01J37/12 ,  H01J37/16 ,  H01J37/24 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/04 ,  H01J2237/1215 ,  H01J2237/16 ,  H01J2237/1825 ,  H01J2237/303 ,  H01J2237/30472

Abstract: The invention relates to an electrode stack (70) comprising stacked electrodes (71-80) for manipulating a charged particle beam along an optical axis (A). Each electrode comprises an electrode body with an aperture for the charged particle beam. The electrode bodies are mutually spaced and the electrode apertures are coaxially aligned along the optical axis. The electrode stack comprises electrically insulating spacing structures (89) between each pair of adjacent electrodes for positioning the electrodes (71-80) at predetermined mutual distances along the axial direction (Z). A first electrode and a second electrode each comprise an electrode body with one or more support portions (86), wherein each support portion is configured to accommodate at least one spacing structure (89). The electrode stack has at least one clamping member (91-91c) configured to hold the support portions (86) of the first and second electrodes, as well as the intermediate spacing structure (89) together.

Abstract translation: 本发明涉及一种电极堆叠（70），其包括用于沿光轴（A）操纵带电粒子束的堆叠电极（71-80）。 每个电极包括具有用于带电粒子束的孔的电极体。 电极体相互间隔开，并且电极孔沿光轴同轴对准。 电极堆叠包括在每对相邻电极之间的电绝缘间隔结构（89），用于将电极（71-80）沿着轴向方向（Z）定位在预定的相互距离处。 第一电极和第二电极各自包括具有一个或多个支撑部分（86）的电极主体，其中每个支撑部分构造成容纳至少一个间隔结构（89）。 电极堆叠具有至少一个构造成将第一和第二电极的支撑部分（86）以及中间间隔结构（89）保持在一起的夹紧构件（91-91c）。