公开(公告)号：US20180182593A1

公开(公告)日：2018-06-28

申请号：US15854303

申请日：2017-12-26

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO ,  Hiroshi YAMASHITA ,  Kenichi KATAOKA

IPC: H01J37/09 ,  H01J37/317

CPC classification number: H01J37/09 ,  H01J37/3177

Abstract: In one embodiment, an aperture set for a multi-beam includes a shaping aperture array in which a plurality of first openings are formed, a region including the plurality of first openings is irradiated with a charged particle beam discharged from a discharge unit, and portions of the charged particle beam pass through the plurality of respective first openings to form a multi-beam, a first shield plate in which a plurality of second openings is formed, through which a corresponding beam in the multi-beam, which passes through the plurality of first openings, passes, and a blanking aperture array in which a plurality of third openings is formed, through which a corresponding beam in the multi-beam, which passes through the plurality of first openings and the plurality of second openings, passes. The second openings are wider than the first openings.

公开(公告)号：US20180130634A1

公开(公告)日：2018-05-10

申请号：US15620144

申请日：2017-06-12

Applicant: JEOL Ltd.

Inventor： Yukihito Kondo ,  Ryusuke Sagawa

IPC: H01J37/22 ,  H01J37/147 ,  H01J37/28 ,  H01J37/09 ,  H01J37/04

CPC classification number: H01J37/22 ,  H01J37/045 ,  H01J37/09 ,  H01J37/1474 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/2443 ,  H01J2237/2446 ,  H01J2237/24475 ,  H01J2237/2449 ,  H01J2237/28 ,  H01J2237/2802 ,  H01J2237/2803

Abstract: There is provided an electron microscope capable of recording images in a shorter time. The electron microscope (100) includes: an illumination system (4) for illuminating a sample (S) with an electron beam; an imaging system (6) for focusing electrons transmitted through the sample (S); an electron deflector (24) for deflecting the electrons transmitted through the sample (S); an imager (28) having a photosensitive surface (29) for detecting the electrons transmitted through the sample (S), the imager (28) being operative to record focused images formed by the electrons transmitted through the sample (S); and a controller (30) for controlling the electron deflector (24) such that an active electron incident region (2) of the photosensitive surface (29) currently hit by the beam is varied in response to variations in illumination conditions of the illumination system (4).

公开(公告)号：US20180130632A1

公开(公告)日：2018-05-10

申请号：US15797588

申请日：2017-10-30

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA ,  Hirofumi MORITA

IPC: H01J37/09 ,  H01J37/317 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/09 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3174

Abstract: A multi-beam optical system adjustment method includes forming multi-beams by making a region including the whole of a plurality of openings in a shaping aperture array substrate irradiated by a charged particle beam, and making portions of the charged particle beam individually pass through a corresponding one of the plurality of openings, measuring a distortion of the multi-beams while variably changing the crossover height position of the multi-beams, measuring the crossover height position of the multi-beams where the distortion of the multi-beams is smaller than the others, and adjusting the height position of a limiting aperture substrate which limits passage of a beam deviated from the trajectory in the multi-beams to the crossover height position.

公开(公告)号：US09934943B2

公开(公告)日：2018-04-03

申请号：US14787775

申请日：2014-05-05

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Vincent Sylvester Kuiper ,  Erwin Slot

IPC: H01J37/317 ,  H01J37/09 ,  H01J37/30

CPC classification number: H01J37/3177 ,  H01J37/09 ,  H01J37/3007 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/3175 ,  H01J2237/31774

Abstract: A sub-beam aperture array for forming a plurality of sub-beams from one or more charged particle beams. The sub-beam aperture array comprises one or more beam areas, each beam area comprising a plurality of sub-beam apertures arranged in a non-regular hexagonal pattern, the sub-beam apertures arranged so that, when projected in a first direction onto a line parallel to a second direction, the sub-beam apertures are uniformly spaced along the line, and wherein the first direction is different from the second direction. The system further comprises a beamlet aperture array with a plurality of beamlet apertures arranged in one or more groups. The beamlet aperture array is arranged to receive the sub-beams and form a plurality of beamlets at the locations of the beamlet apertures of the beamlet array.

公开(公告)号：US09922796B1

公开(公告)日：2018-03-20

申请号：US15366455

申请日：2016-12-01

Applicant: APPLIED MATERIALS ISRAEL LTD. ,  Technische Universiteit Delft

Inventor： Jürgen Frosien ,  Pieter Kruit

IPC: H01J37/28 ,  H01J37/147 ,  H01J37/145 ,  H01J37/09 ,  H01J37/22

CPC classification number: H01J37/145 ,  H01J37/09 ,  H01J37/1474 ,  H01J37/153 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1534 ,  H01J2237/1536 ,  H01J2237/2817

Abstract: A method for inspecting a specimen with an array of primary charged particle beamlets in a charged particle beam device having an optical axis. The method includes generating a primary charged particle beam; illuminating a multi-aperture lens plate with the primary charged particle beam to generate the array of primary charged particle beamlets; and correcting a field curvature of the charged particle beam device with a first and a second field curvature correction electrode. The method further includes applying a voltage to the first and to the second field curvature correction electrode. At least one of the field strength provided by the first and the second field curvature correction electrode varies in a plane perpendicular to the optical axis of the charged particle beam device. The method further includes focusing the primary charged particle beamlets on separate locations on the specimen with an objective lens.

公开(公告)号：US20180040453A1

公开(公告)日：2018-02-08

申请号：US15665839

申请日：2017-08-01

Applicant: NuFlare Technology, Inc.

Inventor： Tsubasa NANAO ,  Yukitaka Shimizu

IPC: H01J37/09 ,  H01J37/304 ,  H01J37/20 ,  H01J37/317 ,  H01J37/04

CPC classification number: H01J37/09 ,  H01J37/045 ,  H01J37/20 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/153 ,  H01J2237/24475 ,  H01J2237/30472

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes an emitter that emits a charged particle beam, an aperture plate in which a plurality of openings are formed and that forms multiple beams by allowing the charged particle beam to pass through the plurality of openings, a blanking plate provided with a plurality of blankers that each perform blanking deflection on a corresponding beam included in the multiple beams, a stage on which a substrate irradiated with the multiple beams, a detector that detects a reflection charged particle from the substrate, feature amount calculation circuitry that calculates a feature amount of an aperture image based on a detection value of the detector, and aberration correction circuitry that corrects aberration of the charged particle beam based on the feature amount.

公开(公告)号：US09721755B2

公开(公告)日：2017-08-01

申请号：US14973230

申请日：2015-12-17

Applicant: Arcam AB

Inventor： Tomas Lock

IPC: G01N23/00 ,  H01J37/304 ,  H01J37/305 ,  H01J37/244 ,  H01J37/30 ,  H01J37/317 ,  B23K15/00 ,  B29C67/00 ,  G01T1/29 ,  B33Y50/02 ,  B33Y10/00 ,  B33Y40/00 ,  B23K15/02 ,  B28B1/00 ,  B28B17/00 ,  B22F3/105 ,  B33Y30/00

CPC classification number: H01J37/3045 ,  B22F3/1055 ,  B22F2003/1056 ,  B22F2003/1057 ,  B23K15/0013 ,  B23K15/002 ,  B23K15/0026 ,  B23K15/0086 ,  B23K15/02 ,  B28B1/001 ,  B28B17/00 ,  B28B17/0081 ,  B29C64/153 ,  B29C64/20 ,  B29C64/386 ,  B29C67/0077 ,  B29C67/0088 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00 ,  B33Y50/02 ,  G01T1/295 ,  H01J37/09 ,  H01J37/244 ,  H01J37/30 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/305 ,  H01J37/317 ,  H01J2237/0453 ,  H01J2237/2445 ,  H01J2237/2448 ,  H01J2237/24514 ,  H01J2237/2826 ,  H01J2237/30433 ,  H01J2237/3045 ,  H01J2237/30472 ,  H01J2237/3128 ,  Y02P10/295

Abstract: A device for detecting X-rays radiated out of a substrate surface, said device comprising at least one X-ray detector, a resolver grating and a modulator grating, said resolver grating with at least one opening facing towards said X-ray detector is arranged in front of said X-ray detector. Said modulator grating is provided between said resolver grating and said substrate at a predetermined distance from said resolver grating and said substrate, where said modulator grating having a plurality of openings in at least a first direction, wherein said x-rays from said surface is spatially modulated with said modulator grating and resolver grating.

公开(公告)号：US20170148608A1

公开(公告)日：2017-05-25

申请号：US14947723

申请日：2015-11-20

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Pavel Adamec

IPC: H01J37/09 ,  H01J37/28

CPC classification number: H01J37/09 ,  H01J2237/0264 ,  H01J2237/28

Abstract: A housing device for providing a magnetic shielding of a charged particle beam is described. The housing device includes a housing element configured to at least partially enclose a charged particle beam propagation path and comprising a magnetic shielding material, wherein the housing element includes an inner surface directed toward the charged particle beam propagation path, an outer surface directed away from the charged particle beam propagation path and at least one edge region with an edge surface connecting the inner surface with the outer surface; and a contacting element comprising a conductive material and fixed to the at least one edge region in at least one of a form-fit connection and a bonded connection. Further, a housing arrangement including two or more electrically contacting housing devices, a charged particle beam device with a housing device, and methods of manufacturing a housing device are described.

公开(公告)号：US20170125203A1

公开(公告)日：2017-05-04

申请号：US15404618

申请日：2017-01-12

Applicant: Hermes Microvision Inc.

Inventor： Shuai Li

IPC: H01J37/143

CPC classification number: H01J37/143 ,  H01J3/20 ,  H01J37/063 ,  H01J37/065 ,  H01J37/09 ,  H01J37/14 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/063 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/0653 ,  H01J2237/083 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: This invention provides a charged particle source, which comprises an emitter and means fo generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

公开(公告)号：US20160336141A1

公开(公告)日：2016-11-17

申请号：US15145398

申请日：2016-05-03

Applicant: NuFlare Technology, Inc.

Inventor： Haruyuki NOMURA

IPC: H01J37/14 ,  H01J37/317

CPC classification number: H01J37/14 ,  H01J37/063 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/0451 ,  H01J2237/0458 ,  H01J2237/0653

Abstract: A charged particle beam writing apparatus includes a limiting aperture member at the downstream side of the emission source, arranged such that its height position can be selectively adjusted, according to condition, to be one of the n-th height position (n being an integer of 1 or more) based on the n-th condition depending on at least one of the height position of the emission source and an emission current value, and the (n+m)th height position (m being an integer of 1 or more) based on the (n+m)th condition depending on at least one of the height position of the emission source and the emission current value, and a shaping aperture member at the downstream side of the electron lens and the limiting aperture member to shape the charged particle beam by letting a part of the charged particle beam pass through a second opening.

Abstract translation: 带电粒子束写入装置包括在发射源的下游侧的限制孔径构件，其布置成使得其高度位置可以根据条件被选择性地调节为第n高度位置之一（n为整数） 基于根据发光源的高度位置和发射电流值中的至少一个的第n个条件，并且第（n + m）个高度位置（m是1或更大的整数） ）基于取决于发射源的高度位置和发射电流值中的至少一个的第（n + m）条件，以及在电子透镜的下游侧的成形孔构件和限制孔径构件 带电粒子束通过使一部分带电粒子束通过第二个开口。