公开(公告)号：US20160099129A1

公开(公告)日：2016-04-07

申请号：US14857095

申请日：2015-09-17

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi YAMASHITA ,  Hiroshi MATSUMOTO ,  Kazuhiro CHIBA

IPC: H01J37/317

CPC classification number: H01J37/3174 ,  H01J37/045 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/31774

Abstract: In one embodiment, a blanking aperture array includes a substrate including an upper surface on which an insulating film is provided, a plurality of blanking aperture portions provided in the substrate, each of the plurality of blanking aperture portions including one of penetration holes, through which a predetermined beam passes, and one of blanking electrodes and one of ground electrodes which are provided on the insulating film, and the blanking electrodes and the ground electrodes configured to perform blanking deflection of the predetermined beam, and a high-resistivity film provided so as to cover the insulating film and at least part of the ground electrodes, the high-resistivity film having an electric resistance that is higher than an electric resistance of the ground electrodes and lower than an electric resistance of the insulating film.

Abstract translation: 在一个实施例中，消隐孔阵列包括：衬底，其包括设置绝缘膜的上表面;设置在衬底中的多个消隐孔部，多个消隐孔部分中的每一个包括一个穿透孔， 预定的光束通过，并且设置在绝缘膜上的消隐电极和接地电极之一以及被配置为执行预定光束的消隐偏转的消隐电极和接地电极以及设置为如下的高电阻膜 覆盖绝缘膜和至少一部分接地电极，高电阻膜具有高于接地电极的电阻并低于绝缘膜的电阻的电阻。

公开(公告)号：US20160061876A1

公开(公告)日：2016-03-03

申请号：US14836065

申请日：2015-08-26

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi YAMASHITA

IPC: G01R31/02 ,  H01J37/04 ,  H01J37/317

CPC classification number: G01R31/025 ,  H01J37/045 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/24514

Abstract: An inspection method for a blanking device for multi-beams, for inspecting whether a separate blanking system of the blanking device is defective, includes, using the blanking device, measuring a value of current flowing from a power source for supplying voltage based on a difference between a first potential and a second potential to each of a plurality of separate blanking systems, in a state where the first potential is applied to a first electrode from a first potential applying unit and the second potential is applied to a second electrode from a corresponding second potential applying unit in at least one second potential applying unit in each of a plurality of separate blanking systems of the blanking device, and determining, when a measured current value is a finite value and equal to or below a preset threshold, that a separate blanking system where a short circuit has occurred exists.

Abstract translation: 用于检查冲切装置的单独的冲裁系统是否有缺陷的用于多梁的冲切装置的检查方法包括使用消隐装置测量从供给电压的电源流出的电流的值， 在从第一电位施加单元将第一电位施加到第一电极并且将第二电位从相应的第一电位施加到第二电极的状态下，在多个分离的消隐系统中的每一个之间的第一电位和第二电位之间 在消隐装置的多个分离的消隐系统的每一个中的至少一个第二电位施加单元中的第二电位施加单元，并且当测量的电流值是有限值并且等于或低于预设阈值时，确定单独的 发生短路的消隐系统存在。

公开(公告)号：US20180182593A1

公开(公告)日：2018-06-28

申请号：US15854303

申请日：2017-12-26

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO ,  Hiroshi YAMASHITA ,  Kenichi KATAOKA

IPC: H01J37/09 ,  H01J37/317

CPC classification number: H01J37/09 ,  H01J37/3177

Abstract: In one embodiment, an aperture set for a multi-beam includes a shaping aperture array in which a plurality of first openings are formed, a region including the plurality of first openings is irradiated with a charged particle beam discharged from a discharge unit, and portions of the charged particle beam pass through the plurality of respective first openings to form a multi-beam, a first shield plate in which a plurality of second openings is formed, through which a corresponding beam in the multi-beam, which passes through the plurality of first openings, passes, and a blanking aperture array in which a plurality of third openings is formed, through which a corresponding beam in the multi-beam, which passes through the plurality of first openings and the plurality of second openings, passes. The second openings are wider than the first openings.

公开(公告)号：US20160064179A1

公开(公告)日：2016-03-03

申请号：US14838907

申请日：2015-08-28

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi YAMASHITA ,  Ryoichi YOSHIKAWA ,  Kazuhiro CHIBA ,  Hiroshi MATSUMOTO

IPC: H01J37/04

CPC classification number: H01J37/045 ,  H01J37/1471 ,  H01J37/20 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/0435 ,  H01J2237/20292 ,  H01J2237/30483 ,  H01J2237/3175

Abstract: A blanking device for multi-beams includes arrayed plural separate blanking systems, each performing blanking control switching a corresponding beam of multi charged particle beams between a beam ON state and a beam OFF state and each including a first electrode, a first potential applying mechanism applying two different potentials selectively to the first electrode for the blanking control, and a second electrode performing blanking deflection of the corresponding beam, the second electrode being grounded and paired with the first electrode, and a potential change mechanism changing a potential of the second electrode from a ground potential to another potential, wherein when a potential of the first electrode included in one of the separate blanking systems is fixed to the ground potential, the potential change mechanism changes the potential of the second electrode corresponding to the first electrode fixed to the ground potential, from the ground potential to the another potential.

Abstract translation: 用于多光束的消隐装置包括排列的多个单独的消隐系统，每个消隐控制系统执行消隐控制，以在光束接通状态和光束关闭状态之间切换相应的多带电粒子束束，并且每个包括第一电极，第一电位施加机构 选择性地与用于消隐控制的第一电极相对应的两个不同的电位，以及执行相应光束的消隐偏转的第二电极，第二电极与第一电极接地并配对;以及电位改变机构，改变第二电极的电位 将地电位转换为另一电势，其中当包括在一个分离的消隐系统中的第一电极的电位固定到接地电位时，电位改变机构改变对应于固定到地面的第一电极的第二电极的电位 潜力，从地面潜力到另一个潜力 。

公开(公告)号：US20240029999A1

公开(公告)日：2024-01-25

申请号：US18343128

申请日：2023-06-28

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi YAMASHITA

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/09

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/09 ,  H01J2237/0435 ,  H01J2237/026

Abstract: In one embodiment, a blanking aperture array system includes a blanking aperture array substrate including a plurality of beam passage holes through which beams in a multi charged particle beam pass and being provided with blankers to perform blanking deflection on the beams, and an X-ray shield disposed upstream of the blanking aperture array substrate. A cell section including the beam passage holes and the blankers is provided in a central portion of the blanking aperture array substrate, and a circuit section applying a voltage to each of the blankers is disposed in a periphery of the cell section. The circuit section is disposed such that a shortest distance between the circuit section and an outermost peripheral beam passage hole of the plurality of beam passage holes is greater than or equal to a distance based on an electron range in the blanking aperture array substrate.

公开(公告)号：US20210296074A1

公开(公告)日：2021-09-23

申请号：US17169782

申请日：2021-02-08

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi YAMASHITA ,  Yoshikuni GOSHIMA ,  Hirofumi MORITA ,  Hiroshi MATSUMOTO

IPC: H01J37/04 ,  H01J37/147 ,  H01J37/20

Abstract: In one embodiment, a multi-beam blanking device includes a semiconductor substrate, an insulating film that is disposed on the semiconductor substrate, an antistatic film that is disposed on the insulating film, a plurality of cells each of which is related to a through-hole that penetrate the semiconductor substrate and the insulating film and each of which includes a blanking electrode and a ground electrode that are disposed on the insulating film, and a ground wiring line that is disposed in the insulating film. The antistatic film and the ground wiring line are connected to each other at a joint that extends through the insulating film on the ground wiring line.