MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD AND MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS

    公开(公告)号:US20230420217A1

    公开(公告)日:2023-12-28

    申请号:US18340152

    申请日:2023-06-23

    发明人: Hiroshi MATSUMOTO

    摘要: A multiple charged particle beam writing method according to one aspect of the present invention includes performing writing, during writing in the k-th (k being an integer of at least one) stripe region, in the k-th extended region, which is obtained by extending the irradiation region in the first direction by a predetermined extension width, while deflecting multiple charged particle beams and moving the multiple charged particle beams in the second direction, and performing writing, during writing in the (k+1)th stripe region, in the (k+1)th extended region, which is obtained by extending the irradiation region in the first direction by the extension width, while deflecting the multiple charged particle beams and moving the multiple charged particle beams in the second direction.

    MULTI CHARGED PARTICLE BEAM EXPOSURE METHOD, AND MULTI CHARGED PARTICLE BEAM BLANKING APPARATUS

    公开(公告)号:US20170301506A1

    公开(公告)日:2017-10-19

    申请号:US15466304

    申请日:2017-03-22

    发明人: Hiroshi MATSUMOTO

    摘要: A multi charged particle beam exposure method includes transmitting ON/OFF control signals each being an ON/OFF control signal for a corresponding beam of multi-beams of charged particle beams in a batch to a blanking apparatus in which there are mounted a substrate where a plurality of passage holes are formed to let a corresponding beam of the multi-beams individually pass therethrough, and a plurality of individual blanking mechanisms arranged in the substrate to individually perform blanking deflection of each beam of the multi-beams, and irradiating the substrate with the multi-beams in accordance with the ON/OFF control signals transmitted in a batch, while shifting an irradiation timing for each group obtained by grouping the multi-beams into a plurality of groups by a plurality of individual blanking mechanisms mounted in the blanking apparatus.

    MULTI CHARGED PARTICLE BEAM EXPOSING METHOD, AND MULTI CHARGED PARTICLE BEAM EXPOSING APPARATUS

    公开(公告)号:US20170207064A1

    公开(公告)日:2017-07-20

    申请号:US15405443

    申请日:2017-01-13

    发明人: Hiroshi MATSUMOTO

    摘要: A multi charged particle beam exposing method includes setting, in multiple exposures by a plurality of shots of each beam of multi-beams where the plurality of shots continuously irradiate a same irradiation position, a plurality of clock periods including at least one different clock period where the plurality of clock periods individually control an irradiation time of each beam of the multi-beams such that a clock period of at least one exposure processing differs from clock periods of other exposure processing, and exposing respective corresponding irradiation positions on a target object with the multi-beams by controlling, in each exposure processing of the multiple exposures, the irradiation time in exposure processing concerned using a clock period which has been set in the plurality of clock periods including the at least one different clock period.

    MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

    公开(公告)号:US20170103869A1

    公开(公告)日:2017-04-13

    申请号:US15278963

    申请日:2016-09-28

    发明人: Hiroshi MATSUMOTO

    IPC分类号: H01J37/304 H01J37/317

    摘要: A multi charged particle beam writing method includes calculating an offset dose to irradiate all the small regions by multiplying one beam dose equivalent to a maximum irradiation time of multi-beams of each pass in multiple writing by a maximum number of defective beams being always ON to irradiate one of the small regions; calculating an incident dose, in addition to the offset dose, for each of the small regions; and performing multiple writing, using multi-beams including a defective beam being always ON, such that a beam of a total dose, between the incident dose and the offset dose, irradiates a corresponding small region for each small region, while switching a beam for each pass of the multiple writing, and controlling an irradiation time equivalent to the offset dose by a common blanking mechanism collectively blanking-controlling the multi-beams.

    MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
    6.
    发明申请
    MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS 审中-公开
    多电荷粒子束写入方法和多重粒子束写入装置

    公开(公告)号:US20170076912A1

    公开(公告)日:2017-03-16

    申请号:US15262094

    申请日:2016-09-12

    发明人: Hiroshi MATSUMOTO

    IPC分类号: H01J37/302 H01J37/317

    摘要: A multi charged particle beam writing method includes assigning, for each unit irradiation region per beam of multi-beams, each divided shot obtained by dividing a shot of a maximum irradiation time and continuously irradiate the same unit irradiation region, to at least one of a plurality of beams that can be switched by collective deflection; calculating, for each unit irradiation region, an irradiation time; determining, for each unit irradiation region, whether to make each divided shot be beam “on” or “off” so that the total irradiation time for a plurality of corresponding divided shots to be beam “on” may become a combination equivalent to the irradiation time calculated; and applying, to the corresponding unit irradiation region, the plurality of corresponding divided shots to be beam “on”, using the plurality of beams while switching a beam between beams by collective deflection.

    摘要翻译: 多带电粒子束写入方法包括:对于每束多光束的每个单位照射区域,分配通过将最大照射时间的镜头除以每个划分的射线并将相同的单位照射区域连续照射到以下各项中的至少一个: 可以通过集体偏转切换的多个梁; 对于每个单位照射区域计算照射时间; 对于每个单位照射区域,确定是否使每个分割的镜头成为“打开”或“关闭”,使得多个相应的分割镜头的总照射时间为“开”,可以变成与照射相当的组合 时间计算; 并且通过使用所述多个光束将所述多个相应的分割光束施加到所述对应的单位照射区域,以在通过集体偏转切换光束之间的光束。

    MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
    9.
    发明申请
    MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS 有权
    多电荷粒子束写入方法和多重粒子束写入装置

    公开(公告)号:US20150348741A1

    公开(公告)日:2015-12-03

    申请号:US14721363

    申请日:2015-05-26

    发明人: Hiroshi MATSUMOTO

    摘要: A multi charged particle beam writing method includes emitting each corresponding beam in an “on” state while starting and continuing tracking control, shifting a writing position by beam deflection of the multi beams, in addition to tracking control, while continuing tracking control, emitting each corresponding beam in the next “on” state to the next writing position having been shifted while continuing tracking control, and returning the tracking position by resetting tracking control, after emitting each next corresponding beam to the next writing position having been shifted at least once, wherein writing of a predetermined region is completed by repeating the number of preset times a group of performing emitting, shifting, emitting, and returning, wherein the tracking time from start to reset of tracking control in at least one of the repeated groups is longer than the others.

    摘要翻译: 一种多带电粒子束写入方法包括:在启动并且继续跟踪控制的同时发射处于“接通”状态的每个对应的波束,并且除继续跟踪控制之外,继续跟踪控制,同时继续跟踪控制, 将下一个“开”状态的相应光束移动到下一个写入位置,同时继续跟踪控制,并且在将每个下一个对应的光束发射到已经被移位至少一次的下一个写入位置之后,通过重新设置跟踪控制返回跟踪位置, 其中通过重复进行发射,移位,发射和返回的一组的预设次数来完成预定区域的写入,其中至少一个重复组中的跟踪控制的开始到复位的跟踪时间长于 其他。

    BLANKING DEVICE FOR MULTI CHARGED PARTICLE BEAM, AND MULTI CHARGED PARTICLE BEAM WRITING METHOD
    10.
    发明申请
    BLANKING DEVICE FOR MULTI CHARGED PARTICLE BEAM, AND MULTI CHARGED PARTICLE BEAM WRITING METHOD 有权
    用于多次粒子束的空白设备和多次粒子束写入方法

    公开(公告)号:US20150129773A1

    公开(公告)日:2015-05-14

    申请号:US14532430

    申请日:2014-11-04

    发明人: Hiroshi MATSUMOTO

    摘要: A blanking device for multi-charged particle beams includes plural shift registers arranged in two dimensions, and plural data transmitters each configured to be arranged, where each of first shift register groups is aligned in the same row or column, in the plural shift registers arranged in two dimensions, the plural data transmitters each arranged for each of second shift register groups each obtained by grouping shift registers of one of the first shift register groups into one or more groups, wherein each of the second shift register groups is further grouped into third shift register groups each having shift registers serially connected, as plural subgroups, and each of the plural data transmitters is connected to shift registers configuring a part of shift registers serially connected in each of the third shift register groups such that all of the plural subgroups in a corresponding second shift register group are parallelly connected.

    摘要翻译: 一种用于多带电粒子束的消隐装置,包括:两个排列的多个移位寄存器,以及多个数据发送器,每个数据发送器被配置为在其中每个第一移位寄存器组在同一行或列中排列, 在二维中,多个数据发送器各自被布置用于每个第二移位寄存器组,每个通过将第一移位寄存器组中的一个的移位寄存器分组成一个或多个组而获得,其中每个第二移位寄存器组进一步分组为第三移位寄存器组 移位寄存器组各自具有串行连接的移位寄存器,作为多个子组,并且多个数据发送器中的每一个连接到移位寄存器,移位寄存器构成串行连接在每个第三移位寄存器组中的移位寄存器的一部分,使得所有多个子组 对应的第二移位寄存器组并联连接。