摘要:
A multiple charged particle beam writing method according to one aspect of the present invention includes performing writing, during writing in the k-th (k being an integer of at least one) stripe region, in the k-th extended region, which is obtained by extending the irradiation region in the first direction by a predetermined extension width, while deflecting multiple charged particle beams and moving the multiple charged particle beams in the second direction, and performing writing, during writing in the (k+1)th stripe region, in the (k+1)th extended region, which is obtained by extending the irradiation region in the first direction by the extension width, while deflecting the multiple charged particle beams and moving the multiple charged particle beams in the second direction.
摘要:
A multiple charged particle beam writing apparatus includes a distribution coefficient calculation circuitry to calculate, using defective beam information based on which a defective beam can be identified, for each design grid in a plurality of design grids being irradiation positions in design of multiple charged particle beams, a distribution coefficient for each of three or more beams, for distributing a dose to irradiate a design grid concerned in the plurality of design grids to the three or more beams, excluding the defective beam, whose actual irradiation positions are close to or approximately coincident with the design grid concerned, such that the position of the gravity center of each distributed dose coincides with the position of the design grid concerned and the sum of each distributed dose after distribution coincides with the dose to irradiate the design grid concerned.
摘要:
A multi charged particle beam exposure method includes transmitting ON/OFF control signals each being an ON/OFF control signal for a corresponding beam of multi-beams of charged particle beams in a batch to a blanking apparatus in which there are mounted a substrate where a plurality of passage holes are formed to let a corresponding beam of the multi-beams individually pass therethrough, and a plurality of individual blanking mechanisms arranged in the substrate to individually perform blanking deflection of each beam of the multi-beams, and irradiating the substrate with the multi-beams in accordance with the ON/OFF control signals transmitted in a batch, while shifting an irradiation timing for each group obtained by grouping the multi-beams into a plurality of groups by a plurality of individual blanking mechanisms mounted in the blanking apparatus.
摘要:
A multi charged particle beam exposing method includes setting, in multiple exposures by a plurality of shots of each beam of multi-beams where the plurality of shots continuously irradiate a same irradiation position, a plurality of clock periods including at least one different clock period where the plurality of clock periods individually control an irradiation time of each beam of the multi-beams such that a clock period of at least one exposure processing differs from clock periods of other exposure processing, and exposing respective corresponding irradiation positions on a target object with the multi-beams by controlling, in each exposure processing of the multiple exposures, the irradiation time in exposure processing concerned using a clock period which has been set in the plurality of clock periods including the at least one different clock period.
摘要:
A multi charged particle beam writing method includes calculating an offset dose to irradiate all the small regions by multiplying one beam dose equivalent to a maximum irradiation time of multi-beams of each pass in multiple writing by a maximum number of defective beams being always ON to irradiate one of the small regions; calculating an incident dose, in addition to the offset dose, for each of the small regions; and performing multiple writing, using multi-beams including a defective beam being always ON, such that a beam of a total dose, between the incident dose and the offset dose, irradiates a corresponding small region for each small region, while switching a beam for each pass of the multiple writing, and controlling an irradiation time equivalent to the offset dose by a common blanking mechanism collectively blanking-controlling the multi-beams.
摘要:
A multi charged particle beam writing method includes assigning, for each unit irradiation region per beam of multi-beams, each divided shot obtained by dividing a shot of a maximum irradiation time and continuously irradiate the same unit irradiation region, to at least one of a plurality of beams that can be switched by collective deflection; calculating, for each unit irradiation region, an irradiation time; determining, for each unit irradiation region, whether to make each divided shot be beam “on” or “off” so that the total irradiation time for a plurality of corresponding divided shots to be beam “on” may become a combination equivalent to the irradiation time calculated; and applying, to the corresponding unit irradiation region, the plurality of corresponding divided shots to be beam “on”, using the plurality of beams while switching a beam between beams by collective deflection.
摘要:
A multi charged particle beam writing apparatus according to one aspect of the present invention includes a plurality of first blankers to respectively perform blanking deflection of a corresponding beam in multiple beams having passed through the plurality of openings of the aperture member, a plurality of second blankers to deflect a defective beam in the multiple beams having passed through the plurality of openings of the aperture member to be in a direction orthogonal to a deflection direction of the plurality of first blankers, a blanking aperture member to block each of beams which were deflected to be in a beam off state by at least one of the plurality of first blankers and the plurality of second blankers, and a detection processing unit to detect a defective beam in the multiple beams having passed through the plurality of openings of the aperture member.
摘要:
A multi charged particle beam writing method includes emitting each corresponding beam in an “on” state while starting and continuing tracking control, shifting a writing position by beam deflection of the multi beams, in addition to tracking control, while continuing tracking control, emitting each corresponding beam in the next “on” state to the next writing position having been shifted while continuing tracking control, and returning the tracking position by resetting tracking control, after emitting each next corresponding beam to the next writing position having been shifted at least once, wherein writing of a predetermined region is completed by repeating the number of preset times a group of performing emitting, shifting, emitting, and returning, wherein the tracking time from start to reset of tracking control in at least one of the repeated groups is longer than the others.
摘要:
A multi charged particle beam writing method includes emitting each corresponding beam in an “on” state while starting and continuing tracking control, shifting a writing position by beam deflection of the multi beams, in addition to tracking control, while continuing tracking control, emitting each corresponding beam in the next “on” state to the next writing position having been shifted while continuing tracking control, and returning the tracking position by resetting tracking control, after emitting each next corresponding beam to the next writing position having been shifted at least once, wherein writing of a predetermined region is completed by repeating the number of preset times a group of performing emitting, shifting, emitting, and returning, wherein the tracking time from start to reset of tracking control in at least one of the repeated groups is longer than the others.
摘要:
A blanking device for multi-charged particle beams includes plural shift registers arranged in two dimensions, and plural data transmitters each configured to be arranged, where each of first shift register groups is aligned in the same row or column, in the plural shift registers arranged in two dimensions, the plural data transmitters each arranged for each of second shift register groups each obtained by grouping shift registers of one of the first shift register groups into one or more groups, wherein each of the second shift register groups is further grouped into third shift register groups each having shift registers serially connected, as plural subgroups, and each of the plural data transmitters is connected to shift registers configuring a part of shift registers serially connected in each of the third shift register groups such that all of the plural subgroups in a corresponding second shift register group are parallelly connected.