公开(公告)号：US20150064934A1

公开(公告)日：2015-03-05

申请号：US14528652

申请日：2014-10-30

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi YOSHIKAWA ,  Munehiro OGASAWARA

IPC: H01L21/263 ,  H01L21/308

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31766 ,  H01L21/263 ,  H01L21/2633 ,  H01L21/3085

Abstract: In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form multi-beams by making portions of the charged particle beam pass through the plurality of openings; a plurality of blankers configured to perform blanking-deflect regarding beams corresponding to the multi-beams; a writing processing control unit configured to control writing processing with a plurality of beams having passed through different openings among the plurality of openings being irradiated on the target object at a predetermined control grid interval; and a dose controlling unit configured to variably control a dose of a beam associated with deviation according to a deviation amount when an interval between the plurality of beams irradiated is deviated from the control grid interval.

Abstract translation: 根据本发明的一个方面，一种多带电粒子束写入装置，包括：孔部件，其中形成有多个开口，构成为通过使带电粒子束的部分通过多个开口而形成多光束; ; 多个阻挡器，被配置为对与所述多光束对应的光束执行消隐偏转; 写入处理控制单元，被配置为以预定的控制网格间隔以多个已经穿过所述多个开口中的不同开口的光束来对所述目标物体照射的所述写入处理进行控制; 以及剂量控制单元，被配置为当所述多个照射的光束之间的间隔偏离所述控制网格间隔时，根据偏差量可变地控制与偏差相关联的光束的剂量。

公开(公告)号：US20160064179A1

公开(公告)日：2016-03-03

申请号：US14838907

申请日：2015-08-28

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi YAMASHITA ,  Ryoichi YOSHIKAWA ,  Kazuhiro CHIBA ,  Hiroshi MATSUMOTO

IPC: H01J37/04

CPC classification number: H01J37/045 ,  H01J37/1471 ,  H01J37/20 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/0435 ,  H01J2237/20292 ,  H01J2237/30483 ,  H01J2237/3175

Abstract: A blanking device for multi-beams includes arrayed plural separate blanking systems, each performing blanking control switching a corresponding beam of multi charged particle beams between a beam ON state and a beam OFF state and each including a first electrode, a first potential applying mechanism applying two different potentials selectively to the first electrode for the blanking control, and a second electrode performing blanking deflection of the corresponding beam, the second electrode being grounded and paired with the first electrode, and a potential change mechanism changing a potential of the second electrode from a ground potential to another potential, wherein when a potential of the first electrode included in one of the separate blanking systems is fixed to the ground potential, the potential change mechanism changes the potential of the second electrode corresponding to the first electrode fixed to the ground potential, from the ground potential to the another potential.

Abstract translation: 用于多光束的消隐装置包括排列的多个单独的消隐系统，每个消隐控制系统执行消隐控制，以在光束接通状态和光束关闭状态之间切换相应的多带电粒子束束，并且每个包括第一电极，第一电位施加机构 选择性地与用于消隐控制的第一电极相对应的两个不同的电位，以及执行相应光束的消隐偏转的第二电极，第二电极与第一电极接地并配对;以及电位改变机构，改变第二电极的电位 将地电位转换为另一电势，其中当包括在一个分离的消隐系统中的第一电极的电位固定到接地电位时，电位改变机构改变对应于固定到地面的第一电极的第二电极的电位 潜力，从地面潜力到另一个潜力 。

公开(公告)号：US20160042908A1

公开(公告)日：2016-02-11

申请号：US14885726

申请日：2015-10-16

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO ,  Tomohiro IIJIMA ,  Munehiro OGASAWARA ,  Hideo INOUE ,  Ryoichi YOSHIKAWA

IPC: H01J37/04

CPC classification number: H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/0435 ,  H01J2237/31771 ,  H01J2237/31774

Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.

Abstract translation: 多带电粒子束写入方法包括：对于多束带电粒子束中的每个束，针对相关束的单个消隐系统，对于多个照射束的每次照射，执行光束的ON / OFF切换 次，通过使用多个单独的消隐系统，分别执行多光束中相应光束的光束ON / OFF控制，以及执行消隐控制，除了通过对每个光束的光束进行ON / OFF切换 单个消隐系统相对于每次照射多次照射，使得在对应于照射的照射时间期间光束处于ON状态，通过使用共同执行光束ON的公共消隐系统 / OFF控制整个多光束。

公开(公告)号：US20170098524A1

公开(公告)日：2017-04-06

申请号：US15384021

申请日：2016-12-19

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO ,  Tomohiro IIJIMA ,  Munehiro OGASAWARA ,  Hideo INOUE ,  Ryoichi YOSHIKAWA

IPC: H01J37/04 ,  H01J37/317

CPC classification number: H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/0435 ,  H01J2237/31771 ,  H01J2237/31774

Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.

公开(公告)号：US20150155138A1

公开(公告)日：2015-06-04

申请号：US14556503

申请日：2014-12-01

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi YOSHIKAWA ,  Hiroshi MATSUMOTO

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/147 ,  H01J37/302 ,  H01J37/24

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/1471 ,  H01J37/243 ,  H01J37/3023 ,  H01J2237/0437

Abstract: A multi charged particle beam writing apparatus includes a divided shot data generation unit to generate, for each shot of multi beams of charged particle beams, data for plural times of divided shots such that irradiation for one shot of each beam is divided into plural times of divided shots each having a different irradiation time, an individual blanking system to provide blanking control individually for each of multi beams, based on the data for plural times of divided shots, an elastic rate correction value acquisition unit to acquire, for each of plural times of divided shots, an elastic rate correction value for correcting an elastic rate of an image of the whole multi beams, depending upon the number of ON-beams of the multi beams, and a lens to correct, for each divided shot, the elastic rate of the image of the whole multi beams by using the correction value.

Abstract translation: 多带电粒子束写入装置包括：分割镜头数据生成单元，对于多束带电粒子束的每个镜头，生成多次分割镜头的数据，使得每个光束的一次照射被分割成多次 各个具有不同照射时间的分割镜头，单独的消隐系统，用于基于多次分割镜头的数据为每个多光束分别提供消隐控制;弹性率校正值获取单元，用于多次获取 分割镜头的弹性速率校正值，用于根据多光束的ON光束的数量来校正整个多光束的图像的弹性率，以及用于针对每个分割镜头校正弹性率的透镜 的整个多光束的图像。

公开(公告)号：US20140225008A1

公开(公告)日：2014-08-14

申请号：US14256124

申请日：2014-04-18

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi YOSHIKAWA ,  Munehiro OGASAWARA

IPC: H01J37/317 ,  G21K5/04

CPC classification number: G21K5/04 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/2059 ,  G03F7/2065 ,  G21K5/10 ,  H01J37/302 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/24507 ,  Y10S430/143

Abstract: A multi charged particle beam writing apparatus according to an embodiment, includes a setting unit to set a second region such that more openings in remaining openings except for an opening through which the defective beam passes are included in the second region, a selection unit to select a mode from a first mode in which a pattern is written on a target object by using multiple beams having passed openings in the second region and a second mode in which multiple writing is performed while shifting a position by using at least one of remaining multiple beams in the state where the defective beam is controlled to be beam off and additional writing is performed for a position which was supposed to be written by the defective beam, and a writing processing control unit to control to write in the mode selected.

Abstract translation: 根据实施例的多带电粒子束写入装置包括设置单元，用于设置第二区域，使得除了缺陷光束通过的开口之外的剩余开口中的更多开口包括在第二区域中，选择单元选择 通过使用在第二区域中通过的开口的多个光束将图案写在目标物体上的第一模式的模式以及通过使用剩余多个光束中的至少一个来移动位置的同时进行多次写入的第二模式 在有缺陷的光束被控制为光束关闭的状态下，并且对于应该由缺陷光束写入的位置执行附加写入;以及写入处理控制单元，用于控制以所选择的模式写入。

公开(公告)号：US20170047194A1

公开(公告)日：2017-02-16

申请号：US15225969

申请日：2016-08-02

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi YOSHIKAWA ,  Hideo INOUE ,  Hayato KIMURA ,  Yasuo KATO ,  Jun YASHIMA

IPC: H01J37/20 ,  H01J37/24 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/045 ,  H01J37/243 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/20285 ,  H01J2237/20292 ,  H01J2237/30422 ,  H01J2237/30438 ,  H01J2237/31762 ,  H01J2237/31764

Abstract: A multi charged particle beam writing apparatus includes a maximum irradiation time acquisition processing circuitry to acquire, for each shot of multi-beams, a maximum irradiation time of irradiation time of each of the multi-beams, a unit region writing time calculation processing circuitry to calculate, using the maximum irradiation time for each shot, a unit region writing time by totalizing the maximum irradiation time of each shot of a plurality of times of shots of the multi-beams which irradiate a unit region concerned during stage moving, for each unit region of a plurality of unit regions obtained by dividing a writing region of a target object, a stage speed calculation processing circuitry to calculate speed of the stage for each unit region so that the stage speed becomes variable, by using the unit region writing time and a stage control processing circuitry to variably control the stage speed.

Abstract translation: 多带电粒子束写入装置包括最大照射时间获取处理电路，用于针对每个射束的多光束获取每个多光束的照射时间的最大照射时间，单位区域写入时间计算处理电路 使用每个镜头的最大照射时间来计算单位区域的写入时间，通过在每个单元中累积在阶段移动期间照射相关单元区域的多次照射多次拍摄的每次镜头的最大照射时间 通过划分目标物体的写入区域而获得的多个单位区域的区域，台阶速度计算处理电路，通过使用单位区域写入时间，计算各单位区域的台阶速度，使台阶速度变化， 用于可变地控制舞台速度的舞台控制处理电路。

公开(公告)号：US20150340196A1

公开(公告)日：2015-11-26

申请号：US14699216

申请日：2015-04-29

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO ,  Munehiro OGASAWARA ,  Ryoichi YOSHIKAWA

IPC: H01J37/147 ,  H01J37/302 ,  H01J37/317 ,  H01J37/20

CPC classification number: H01J37/1471 ,  H01J37/045 ,  H01J37/147 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3026 ,  H01J37/317 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/0435 ,  H01J2237/202 ,  H01J2237/20278 ,  H01J2237/20285 ,  H01J2237/20292 ,  H01J2237/304 ,  H01J2237/30483 ,  H01J2237/3175

Abstract: A multi charged particle beam writing method includes, shifting a writing position of each corresponding beam to a next writing position by performing another beam deflection of multi charged particle beams, in addition to the beam deflection for a tracking control, while continuing the beam deflection for the tracking control after the maximum writing time has passed; emitting the each corresponding beam in the “on” state to the next writing position having been shifted of the each corresponding beam, during a corresponding writing time while continuing the tracking control; and returning a tracking position such that a next tracking start position is a former tracking start position where the tracking control was started, by resetting the beam deflection for the tracking control after emitting the each corresponding beam to the next writing position having been shifted at least once of the each corresponding beam while continuing the tracking control.

Abstract translation: 多带电粒子束写入方法包括：除了用于跟踪控制的光束偏转之外，通过执行多带电粒子束的另一束偏转，将每个相应光束的写入位置移位到下一个写入位置，同时继续光束偏转 最大写入时间后的跟踪控制已过; 在相应的写入时间期间，将每个对应的波束处于“接通”状态，并将其发送到已经被移位的每个相应波束的下一个写入位置，同时继续跟踪控制; 并且返回跟踪位置，使得下一个跟踪开始位置是跟踪控制开始的前一个跟踪开始位置，通过在将每个对应的波束发射到至少已经移位的下一个写入位置之后将跟踪控制的光束偏转重置 在每个对应的光束中一次，同时继续跟踪控制。

公开(公告)号：US20130157198A1

公开(公告)日：2013-06-20

申请号：US13706908

申请日：2012-12-06

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi YOSHIKAWA ,  Munehiro Ogasawara

IPC: G03F7/20 ,  G21K5/10

CPC classification number: G21K5/04 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/2059 ,  G03F7/2065 ,  G21K5/10 ,  H01J37/302 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/24507 ,  Y10S430/143

Abstract: A multi charged particle beam writing apparatus according to an embodiment, includes a setting unit to set a second region such that more openings in remaining openings except for an opening through which the defective beam passes are included in the second region, a selection unit to select a mode from a first mode in which a pattern is written on a target object by using multiple beams having passed openings in the second region and a second mode in which multiple writing is performed while shifting a position by using at least one of remaining multiple beams in the state where the defective beam is controlled to be beam off and additional writing is performed for a position which was supposed to be written by the defective beam, and a writing processing control unit to control to write in the mode selected.

Abstract translation: 根据实施例的多带电粒子束写入装置包括设置单元，用于设置第二区域，使得除了缺陷光束通过的开口之外的剩余开口中的更多开口包括在第二区域中，选择单元选择 通过使用在第二区域中通过的开口的多个光束将图案写在目标物体上的第一模式的模式以及通过使用剩余多个光束中的至少一个来移动位置的同时进行多次写入的第二模式 在有缺陷的光束被控制为光束关闭的状态下，并且对于应该由缺陷光束写入的位置执行附加写入;以及写入处理控制单元，用于控制以所选择的模式写入。

公开(公告)号：US20140187056A1

公开(公告)日：2014-07-03

申请号：US14199535

申请日：2014-03-06

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi YOSHIKAWA ,  Munehiro Ogasawara

IPC: H01L21/263 ,  H01J37/317

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31766 ,  H01L21/263 ,  H01L21/2633 ,  H01L21/3085

Abstract: In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form multi-beams by making portions of the charged particle beam pass through the plurality of openings; a plurality of blankers configured to perform blanking-deflect regarding beams corresponding to the multi-beams; a writing processing control unit configured to control writing processing with a plurality of beams having passed through different openings among the plurality of openings being irradiated on the target object at a predetermined control grid interval; and a dose controlling unit configured to variably control a dose of a beam associated with deviation according to a deviation amount when an interval between the plurality of beams irradiated is deviated from the control grid interval.

Abstract translation: 根据本发明的一个方面，一种多带电粒子束写入装置，包括：孔部件，其中形成有多个开口，构成为通过使带电粒子束的部分通过多个开口而形成多光束; ; 多个阻挡器，被配置为对与所述多光束对应的光束执行消隐偏转; 写入处理控制单元，被配置为以预定的控制网格间隔以多个已经穿过所述多个开口中的不同开口的光束来对所述目标物体照射的所述写入处理进行控制; 以及剂量控制单元，被配置为当所述多个照射的光束之间的间隔偏离所述控制网格间隔时，根据偏差量可变地控制与偏差相关联的光束的剂量。