公开(公告)号：US20170200582A1

公开(公告)日：2017-07-13

申请号：US15384897

申请日：2016-12-20

Applicant: NuFlare Technology, Inc.

Inventor： Jun YASHIMA

IPC: H01J37/147 ,  H01J37/317

CPC classification number: H01J37/1472 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/30416 ,  H01J2237/3175 ,  H01J2237/31754 ,  H01J2237/31762 ,  H01J2237/31764 ,  H01J2237/31769

Abstract: A charged particle beam writing apparatus according to an embodiment starts a wiring operation when the sum of the amount of shot data stored in a buffer memory of a transfer control calculator, the amount of shot data being transferred by a transfer unit, and the amount of shot data stored in a buffer memory of a deflection control circuit reaches the amount of data for one stripe region.

公开(公告)号：US20170047194A1

公开(公告)日：2017-02-16

申请号：US15225969

申请日：2016-08-02

Applicant: NuFlare Technology, Inc.

Inventor： Ryoichi YOSHIKAWA ,  Hideo INOUE ,  Hayato KIMURA ,  Yasuo KATO ,  Jun YASHIMA

IPC: H01J37/20 ,  H01J37/24 ,  H01J37/317

CPC classification number: H01J37/20 ,  H01J37/045 ,  H01J37/243 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/20285 ,  H01J2237/20292 ,  H01J2237/30422 ,  H01J2237/30438 ,  H01J2237/31762 ,  H01J2237/31764

Abstract: A multi charged particle beam writing apparatus includes a maximum irradiation time acquisition processing circuitry to acquire, for each shot of multi-beams, a maximum irradiation time of irradiation time of each of the multi-beams, a unit region writing time calculation processing circuitry to calculate, using the maximum irradiation time for each shot, a unit region writing time by totalizing the maximum irradiation time of each shot of a plurality of times of shots of the multi-beams which irradiate a unit region concerned during stage moving, for each unit region of a plurality of unit regions obtained by dividing a writing region of a target object, a stage speed calculation processing circuitry to calculate speed of the stage for each unit region so that the stage speed becomes variable, by using the unit region writing time and a stage control processing circuitry to variably control the stage speed.

Abstract translation: 多带电粒子束写入装置包括最大照射时间获取处理电路，用于针对每个射束的多光束获取每个多光束的照射时间的最大照射时间，单位区域写入时间计算处理电路 使用每个镜头的最大照射时间来计算单位区域的写入时间，通过在每个单元中累积在阶段移动期间照射相关单元区域的多次照射多次拍摄的每次镜头的最大照射时间 通过划分目标物体的写入区域而获得的多个单位区域的区域，台阶速度计算处理电路，通过使用单位区域写入时间，计算各单位区域的台阶速度，使台阶速度变化， 用于可变地控制舞台速度的舞台控制处理电路。

公开(公告)号：US20150060690A1

公开(公告)日：2015-03-05

申请号：US14459470

申请日：2014-08-14

Applicant: NuFlare Technology, Inc.

Inventor： Jun YASHIMA

IPC: H01J37/147 ,  H01J37/317

CPC classification number: H01J37/1472 ,  H01J37/3174 ,  H01J2237/3175 ,  H01J2237/31776

Abstract: Charged particle beam writing apparatus includes a first generation unit to generate a smallest deflection region layer in three or more deflection region layers each having deflection regions of a size different from those of other deflection region layers, for each of a plurality of figure types variably shapable using first and second shaping apertures, an assignment unit to assign each of a plurality of shot figure patterns to deflection regions of the smallest deflection region layer of a corresponding one of the plurality of figure types, a correction unit to correct, by shifting the position of each smallest deflection region layer, according to a variable shaping position of each figure type, and a writing unit to write each of the plurality of shot figure patterns on a target object, in a state where the position of each smallest deflection region layer has been corrected for each figure type.

Abstract translation: 带电粒子束写入装置包括：第一产生单元，用于在三个或更多个偏转区域层中产生最小的偏转区域层，每个偏转区域层具有与其它偏转区域层的尺寸不同的偏转区域，对于可变形的多个图形类型 使用第一和第二成形孔，分配单元，将多个照片图案中的每一个分配给多个图形类型中的相应一个图形类型的最小偏转区域层的偏转区域;校正单元，通过移位位置 根据每个图形类型的可变整形位置的每个最小偏转区域层，以及写入单元，用于在每个最小偏转区域层的位置具有的状态下将多个拍摄图案图案中的每一个写在目标对象上 已经针对每个图形类型进行了更正。

公开(公告)号：US20150014549A1

公开(公告)日：2015-01-15

申请号：US14324530

申请日：2014-07-07

Applicant: NuFlare Technology, Inc.

Inventor： Jun YASHIMA

IPC: H01J37/317

CPC classification number: H01J37/3174 ,  H01J37/3026 ,  H01J2237/31762

Abstract: A charged particle beam writing apparatus includes first and second transmission units to perform first and second transmission processing, where, in the first transmission processing, while one of the units performs data transmission processing, the other unit inputs processing data for N processing regions more than pre-set, data-converted, n processing regions, and while one of the units performs data input processing, the other transmits processing data for (N-n) processing regions in order, and in the second transmission processing, processing data for remaining n processing regions are transmitted in order after the first transmission processing, where one of the units starts inputting the processing data while the other performs the first transmission processing, and does not input processing data for a new processing region after starting the second transmission processing.

Abstract translation: 带电粒子束写入装置包括执行第一和第二传输处理的第一和第二传输单元，其中在第一传输处理中，当其中一个单元执行数据传输处理时，另一个单元输入超过N个处理区域的处理数据 预处理，数据转换，n个处理区域，并且当其中一个单元执行数据输入处理时，另一个依次发送（Nn）个处理区域的处理数据，并且在第二发送处理中，用于剩余的n个处理的处理数据 区域在第一发送处理之后依次发送，其中一个单元开始输入处理数据，而另一个单元执行第一发送处理，并且在开始第二发送处理之后不输入新处理区域的处理数据。