公开(公告)号：US20150294836A1

公开(公告)日：2015-10-15

申请号：US14661496

申请日：2015-03-18

Applicant: NuFlare Technology, Inc.

Inventor： Hideo INOUE

IPC: H01J37/302 ,  H01J37/317 ,  G06F17/50

CPC classification number: H01J37/3026 ,  G11B9/10 ,  H01J37/3177 ,  H01J2237/30422 ,  H01J2237/3175 ,  H01J2237/31754 ,  H01J2237/31762

Abstract: A shot data generation method includes inputting writing data for writing a pattern on a target object with multi charged particle beams, and generating shot data for each beam of the multi charged particle beams by converting the writing data and using one of a first code indicating a first irradiation time period having been set beforehand, a second code indicating an irradiation time period being zero, and a third code indicating neither the first irradiation time period nor the irradiation time period being zero.

Abstract translation: 射击数据生成方法包括：输入用于将目标对象上的图案写入多个带电粒子束的写入数据，并通过转换写入数据并使用表示第一代码的第一代码中的一个来产生多个带电粒子束的每个波束的镜头数据 预先设定了第一照射时间段，指示照射时间段为零的第二代码，以及不表示第一照射时间段也不表示照射时间段为零的第三代码。

公开(公告)号：US20170098524A1

公开(公告)日：2017-04-06

申请号：US15384021

申请日：2016-12-19

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO ,  Tomohiro IIJIMA ,  Munehiro OGASAWARA ,  Hideo INOUE ,  Ryoichi YOSHIKAWA

IPC: H01J37/04 ,  H01J37/317

CPC classification number: H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/0435 ,  H01J2237/31771 ,  H01J2237/31774

Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.

公开(公告)号：US20160322196A1

公开(公告)日：2016-11-03

申请号：US15137290

申请日：2016-04-25

Applicant: NuFlare Technology, Inc.

Inventor： Kei HASEGAWA ,  Hayato KIMURA ,  Hideo INOUE ,  Yoshiaki ONIMARU

IPC: H01J37/304 ,  H01J37/20 ,  H01J37/04 ,  H01J37/244 ,  H01J37/317 ,  H01J37/30

CPC classification number: H01J37/045 ,  H01J37/3177 ,  H01J2237/2485 ,  H01J2237/31762

Abstract: According to one embodiment, in a multi-charged particle beam writing apparatus, a blanking plate includes a plurality of first buffers connected in series, second buffers in a plurality of stages connected in series between the first buffer and a blanker, and an error detection processing circuitry performing error detection on data stored in the first buffer and the second buffers. The blanking control data transfers to the corresponding blanker via the first buffer and the second buffers. In a case where the error detection processing circuitry detects an error, the control processing circuitry retransmits the blanking control data to the blanking plate with regard to a shot having the error detected therein and a shot which comes, in a shot order, after the shot having the error detected therein.

Abstract translation: 根据一个实施例，在多电荷粒子束写入装置中，消隐板包括串联连接的多个第一缓冲器，在第一缓冲器和消隐器之间串联连接的多级中的第二缓冲器，以及错误检测 处理电路对存储在第一缓冲器和第二缓冲器中的数据执行错误检测。 消隐控制数据经由第一缓冲器和第二缓冲器传送到相应的消隐器。 在错误检测处理电路检测到错误的情况下，控制处理电路相对于其中检测到的错误的镜头和拍摄顺序在拍摄之后重新发送到消隐板的消隐控制数据 其中检测到错误。

公开(公告)号：US20160284513A1

公开(公告)日：2016-09-29

申请号：US15072894

申请日：2016-03-17

Applicant: NuFlare Technology, Inc.

Inventor： Hideo INOUE

IPC: H01J37/317 ,  H01J37/302

CPC classification number: H01J37/3177 ,  H01J37/3026 ,  H01J2237/31762 ,  H01J2237/31764

Abstract: A multi charged particle beam writing apparatus includes a dividing circuitry to divide first irradiation time data into k pieces of second irradiation time data, where each of the k pieces of second irradiation time data has a different number of bits and the total of different numbers of bits is n-bits, in multi-pass writing of k or more passes by using multi charged particle beams, a data transmission circuitry to transmit, for each of k passes, corresponding second irradiation time data, for a beam concerned in multi charged particle beams, a resolution information transmission circuitry to transmit, for each of k passes, corresponding resolution information, and an irradiation time calculation circuitry to calculate an irradiation time of a corresponding beam in the multi charged particle beams of a pass concerned by using input second irradiation time data and resolution information.

Abstract translation: 多带电粒子束写入装置包括分割电路，用于将第一照射时间数据划分为k个第二照射时间数据，其中k个第二照射时间数据中的每一个具有不同数量的位， 位是n位，在通过使用多个带电粒子束的k次或更多遍的多遍写入中，数据传输电路针对k个通过中的每一个向多个带电粒子中的束传输相应的第二照射时间数据 光束，分辨率信息传输电路，用于针对k个通过中的每一个传送相应的分辨率信息，以及照射时间计算电路，以通过使用输入的第二次照射来计算所述多次带电粒子束中的相应光束的照射时间 时间数据和分辨率信息。

公开(公告)号：US20160155608A1

公开(公告)日：2016-06-02

申请号：US14944671

申请日：2015-11-18

Applicant: NuFlare Technology, Inc.

Inventor： Hideo INOUE

IPC: H01J37/304 ,  H01J37/04 ,  H01J37/317

CPC classification number: H01J37/304 ,  H01J37/045 ,  H01J37/20 ,  H01J37/3045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/15 ,  H01J2237/202 ,  H01J2237/20292 ,  H01J2237/31761

Abstract: A multi charged particle beam writing apparatus includes a deflector to collectively deflect each beam in an “on” state, by tracking control in such a way as to follow stage movement, an obtaining processing circuitry to obtain a deviation amount of an irradiation position of each beam of multi-beams depending on a tracking amount of the tracking control, a correction coefficient calculation processing circuitry to calculate a correction coefficient for correcting the deviation amount of the irradiation position depending on the tracking amount, for each beam of the multi-beams and for each irradiation position, a shot data generation processing circuitry to generate shot data where deviation of an irradiation position of each beam of multi-beams depending on a tracking amount is to be corrected using a correction coefficient, for each tracking operation, and a deflection control processing circuitry to control plural blankers, based on the shot data.

Abstract translation: 一种多带电粒子束写入装置，包括：偏转器，通过以跟踪级移动的方式进行跟踪控制，将各光束共同偏转为“接通”状态，获得处理电路，以获得每个光束的照射位置的偏差量 取决于跟踪控制的跟踪量的多光束的束;校正系数计算处理电路，用于针对每个多光束的光束计算用于校正根据跟踪量的照射位置的偏离量的校正系数;以及 针对每个照射位置，拍摄数据生成处理电路，用于生成拍摄数据，其中针对每个跟踪操作，使用校正系数校正根据跟踪量的每个多光束的照射位置的偏离，并且偏转 控制处理电路，用于根据镜头数据来控制多个消隐器。

公开(公告)号：US20160181062A1

公开(公告)日：2016-06-23

申请号：US14969478

申请日：2015-12-15

Applicant: NuFlare Technology, Inc.

Inventor： Yasuo KATO ,  Hideo INOUE ,  Hiroshi MATSUMOTO ,  Ryoh KAWANA

IPC: H01J37/24 ,  H01J37/244 ,  H01J37/304 ,  H01J37/09

CPC classification number: H01J37/243 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/30433 ,  H01J2237/31761

Abstract: A multi charged particle beam writing apparatus includes a modulation rate data calculation processing circuitry to calculate, for each pixel being a unit region, a modulation rate of a beam to a pixel concerned and each modulation rate of a beam to at least one pixel at a periphery of the pixel concerned, and a corrected-dose calculation processing circuitry to calculate, for the each pixel, a corrected dose by adding a multiplied value obtained by multiplying the modulation rate of the pixel concerned in a modulation rate map by beam dose to the pixel concerned, and a multiplied value obtained by multiplying the modulation rate of the pixel concerned which becomes one of the at least one pixel at the periphery with respect to another pixel defined for the position of the pixel concerned by a beam dose to the another pixel.

Abstract translation: 一种多带电粒子束写入装置，包括：调制率数据计算处理电路，用于针对每个像素为单位区域，将波束对于像素的调制率和波束的调制率计算为 以及校正剂量计算处理电路，通过将通过光束剂量将调制速率图中的相关像素的调制率相乘而获得的相乘值与每个像素一起计算校正剂量， 像素相关的像素相乘，并且通过将相对于相关像素的位置所定义的另一个像素的光束剂量相对于另一个像素的光束剂量相乘而成为相关像素的调制率， 。

公开(公告)号：US20160042908A1

公开(公告)日：2016-02-11

申请号：US14885726

申请日：2015-10-16

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO ,  Tomohiro IIJIMA ,  Munehiro OGASAWARA ,  Hideo INOUE ,  Ryoichi YOSHIKAWA

IPC: H01J37/04

CPC classification number: H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0432 ,  H01J2237/0435 ,  H01J2237/31771 ,  H01J2237/31774

Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.

Abstract translation: 多带电粒子束写入方法包括：对于多束带电粒子束中的每个束，针对相关束的单个消隐系统，对于多个照射束的每次照射，执行光束的ON / OFF切换 次，通过使用多个单独的消隐系统，分别执行多光束中相应光束的光束ON / OFF控制，以及执行消隐控制，除了通过对每个光束的光束进行ON / OFF切换 单个消隐系统相对于每次照射多次照射，使得在对应于照射的照射时间期间光束处于ON状态，通过使用共同执行光束ON的公共消隐系统 / OFF控制整个多光束。

公开(公告)号：US20150325407A1

公开(公告)日：2015-11-12

申请号：US14709200

申请日：2015-05-11

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Hironori MIZOGUCHI ,  Hideo INOUE

IPC: H01J37/244 ,  H01J37/317

CPC classification number: H01J37/244 ,  H01J37/045 ,  H01J37/3174 ,  H01J2237/24514 ,  H01J2237/24535 ,  H01J2237/31776

Abstract: A charged particle beam writing apparatus includes a first limiting aperture member, in which a first opening is formed, to block a charged particle beam having been blanking-controlled to be beam “off”, and to let a part of the charged particle beam having been blanking-controlled to be beam “on” pass through the first opening, a first detector to detect a first electron amount irradiating the first limiting aperture member, in a state were beam “on” and beam “off” are repeated, a first integration processing unit to generate a first integrated signal by integrating components in a band sufficiently lower than a band of a repetition cycle of beam “on” and beam “off”, in a first detected signal detected for obtaining the first electron amount, and a first irregularity detection unit to detect irregularity in a dose amount of the charged particle beam by using the first integrated signal.

Abstract translation: 一种带电粒子束写入装置包括：第一限制孔径构件，其中形成有第一开口，以阻挡被消隐控制的带电粒子束以使其“离开”，并且使带电粒子束的一部分具有 被消隐控制为通过第一开口的光束“开”，用于检测在第一限制光圈部件中照射第一限制光圈部件的第一检测器处于反光的状态，并且反射光束“关”，第一检测器 积分处理单元，用于通过在被检测以获得第一电子量的第一检测信号中积分足够低于波束“开”的重复周期的波段和波束“截止”的波段的分量的分量来产生第一积分信号，以及 第一不规则检测单元，通过使用第一积分信号来检测带电粒子束的剂量的不均匀性。

公开(公告)号：US20190198290A1

公开(公告)日：2019-06-27

申请号：US16199472

申请日：2018-11-26

Applicant: NuFlare Technology, Inc.

Inventor： Hideo INOUE

IPC: H01J37/302 ,  H01J37/04 ,  H01J37/317 ,  H01J37/20 ,  H01J37/147

CPC classification number: H01J37/3023 ,  H01J37/045 ,  H01J37/147 ,  H01J37/20 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1536 ,  H01J2237/20214 ,  H01J2237/20228 ,  H01J2237/30488 ,  H01J2237/31774

Abstract: A multiple charged particle beam writing apparatus includes a rotatable shaping aperture array substrate, including plural openings, to form/shape multiple beams by letting portions of a charged particle beam individually pass through the plural openings, a data rotation correction circuitry to read writing data from a storage device, and generate pattern data, in which the entire figure pattern has been reversely rotated against a rotational deviation direction of an aperture array image by a rotational deviation amount of the aperture array image, using information on the rotational deviation amount of the aperture array image of the multiple beams on the target object caused by a residual error of rotation adjustment of the shaping aperture array substrate, and a blanking aperture array mechanism, rotatable with the shaping aperture array substrate, to provide individual blanking control of the multiple beams, based on the pattern data of the figure pattern reversely rotated.

公开(公告)号：US20170229280A1

公开(公告)日：2017-08-10

申请号：US15423013

申请日：2017-02-02

Applicant: NuFlare Technology, Inc.

Inventor： Yasuo KATO ,  Hideo INOUE ,  Hiroshi MATSUMOTO ,  Ryoh KAWANA

IPC: H01J37/147 ,  H01J37/304 ,  H01J37/04 ,  H01J37/317 ,  H01J37/20

CPC classification number: H01J37/147 ,  H01J37/045 ,  H01J37/20 ,  H01J37/304 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/202 ,  H01J2237/30461 ,  H01J2237/31769 ,  H01J2237/31774

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes processing circuitry that is programmed to perform the function of a data region determination part determining a data region based on boundaries of pixels obtained by dividing a writing area of a substrate into mesh-shaped regions, an irradiation range of multiple charged particle beams, and boundaries of stripe segments obtained by dividing the writing area into segments having a predetermined width such that the segments are arranged in a predetermined direction, a deflection coordinate adjustment part adjusting deflection coordinates of the multiple charged particle beams such that the boundaries of the pixels are mapped to a boundary of the irradiation range, and a correction part calculating a corrected dose of each beam of the multiple charged particle beams by distributing, based on a positional relationship between the beam and pixels in the data region, a dose of the beam corresponding to a pixel in the data region calculated based on write data to one or more beams, and adding doses distributed to the beam, and a writing mechanism, including a charged particle beam source, a deflector, and a stage on which a target object is placed, and the writing mechanism deflecting the multiple charged particle beams based on the adjusted deflection coordinates and applying the beams each having the corrected dose to write a pattern.