公开(公告)号：US09449792B2

公开(公告)日：2016-09-20

申请号：US14193182

申请日：2014-02-28

Applicant: NuFlare Technology, Inc.

Inventor： Tetsuro Nishiyama

IPC: H01L21/00 ,  H01J37/317 ,  H01J37/09 ,  H01L21/263

CPC classification number: H01J37/3174 ,  H01J37/09 ,  H01J2237/022 ,  H01J2237/0451 ,  H01L21/2636

Abstract: A charged particle beam writing apparatus according to an embodiment includes: a beam emitter configured to emit a charged particle beam; an aperture having an opening portion through which the charged particle beam emitted by the beam emitter passes; an aperture beam tube being provided on a surface of the aperture and functioning as a thermally conductive member having thermal conductivity; and a heater provided on a surface of the aperture beam tube and configured to supply heat to the aperture via the aperture beam tube.

Abstract translation: 根据实施例的带电粒子束写入装置包括：被配置为发射带电粒子束的射束发射器; 具有开口部分的孔，由射束发射器发射的带电粒子束通过该开口部分; 孔径管设置在孔的表面上并用作具有导热性的导热构件; 以及加热器，其设置在所述孔径光束管的表面上并且经配置以经由所述孔径管向所述孔提供热量。

公开(公告)号：US20160181062A1

公开(公告)日：2016-06-23

申请号：US14969478

申请日：2015-12-15

Applicant: NuFlare Technology, Inc.

Inventor： Yasuo KATO ,  Hideo INOUE ,  Hiroshi MATSUMOTO ,  Ryoh KAWANA

IPC: H01J37/24 ,  H01J37/244 ,  H01J37/304 ,  H01J37/09

CPC classification number: H01J37/243 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/30433 ,  H01J2237/31761

Abstract: A multi charged particle beam writing apparatus includes a modulation rate data calculation processing circuitry to calculate, for each pixel being a unit region, a modulation rate of a beam to a pixel concerned and each modulation rate of a beam to at least one pixel at a periphery of the pixel concerned, and a corrected-dose calculation processing circuitry to calculate, for the each pixel, a corrected dose by adding a multiplied value obtained by multiplying the modulation rate of the pixel concerned in a modulation rate map by beam dose to the pixel concerned, and a multiplied value obtained by multiplying the modulation rate of the pixel concerned which becomes one of the at least one pixel at the periphery with respect to another pixel defined for the position of the pixel concerned by a beam dose to the another pixel.

Abstract translation: 一种多带电粒子束写入装置，包括：调制率数据计算处理电路，用于针对每个像素为单位区域，将波束对于像素的调制率和波束的调制率计算为 以及校正剂量计算处理电路，通过将通过光束剂量将调制速率图中的相关像素的调制率相乘而获得的相乘值与每个像素一起计算校正剂量， 像素相关的像素相乘，并且通过将相对于相关像素的位置所定义的另一个像素的光束剂量相对于另一个像素的光束剂量相乘而成为相关像素的调制率， 。

公开(公告)号：US09373424B2

公开(公告)日：2016-06-21

申请号：US13768258

申请日：2013-02-15

Applicant: NuFlare Technology, Inc.

Inventor： Takanao Touya ,  Takahito Nakayama

IPC: H01J37/09 ,  H01J37/12 ,  H01J37/317 ,  G21K5/08 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: G21K5/08 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/12 ,  H01J37/3174

Abstract: An electron beam writing apparatus comprising a stage that a sample is placed on, an electron optical column, an electron gun emitting an electron beam disposed in the optical column, an electrostatic lens provided with electrodes aligned in an axial direction of the electron beam disposed in the optical column, and a voltage supply device for applying positive voltage constantly to the electrostatic lens. A shield plate is disposed between the XY stage and the electron optical column to block reflected electrons or secondary electrons generated by irradiation to the sample with the electron beam. The electrostatic lens is disposed immediately above the shield plate to change a focal position of the electron beam. A voltage supply device applies a positive voltage constantly to the electrostatic lens.

Abstract translation: 一种电子束写入装置，包括放置样品的电极，电子光学柱，发射设置在光学柱中的电子束的电子枪，设置有沿着电子束的轴向排列的电极的静电透镜， 光学柱，以及用于向静电透镜恒定施加正电压的电压供给装置。 屏蔽板设置在XY平台和电子光学柱之间以阻挡通过用电子束照射到样品产生的反射电子或二次电子。 静电透镜设置在屏蔽板的正上方，以改变电子束的焦点位置。 电压供给装置将静电透镜恒定地施加正电压。

公开(公告)号：US20160155603A1

公开(公告)日：2016-06-02

申请号：US15016743

申请日：2016-02-05

Applicant: Applied Materials Israel Ltd. ,  Carl Zeiss Microscopy GMBH

Inventor： Dirk Zeidler ,  Thomas KEMEN ,  Anger Pascal ,  Antonio Casares ,  Christof Riedesel

IPC: H01J37/09 ,  H01J37/21

CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/1205

Abstract: The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system downstream of the source; a first multi-aperture selector plate (313) having plural apertures; a easier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.

Abstract translation: 本发明涉及一种带电粒子多子束系统，其包括带电粒子源（301）; 第一多孔板（320），其具有设置在所述源的下游的所述系统的带电粒子束路径中的多个孔; 具有多个孔的第一多孔选择板（313） 更容易（340），其中所述第一多孔径选择器板安装在所述载体上; 以及构造成移动所述载体的致动器（350），使得所述第一多孔径选择器板在所述系统的第一操作模式中被布置在所述源的下游的系统的带电粒子束路径中，并且使得所述第一 多孔径选择器板在系统的第二操作模式中设置在带电粒子束路径的外部。 源极，第一多孔板和系统的载体被布置成使得在第一多孔径板和第一多孔径选择器板的下游位置处产生第一数量的带电粒子子束 第一操作模式，并且在第二操作模式的位置处产生第二数量的带电粒子子束，其中第一数量的子束与第二数量的子束不同。

公开(公告)号：US09324537B2

公开(公告)日：2016-04-26

申请号：US14309452

申请日：2014-06-19

Applicant: Carl Zeiss Microscopy GmbH ,  Applied Materials Israel, Ltd.

Inventor： Thomas Kemen ,  Rainer Knippelmeyer ,  Stefan Schubert

IPC: H01J37/00 ,  H01J37/04 ,  H01J37/09 ,  H01J37/317

CPC classification number: H01J37/04 ,  H01J37/045 ,  H01J37/09 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/04922 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/15 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2561 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.

Abstract translation: 带电粒子系统本发明涉及一种带电粒子系统，包括：带电粒子源; 第一个多孔板; 设置在所述第一多孔板的下游的第二多孔板，所述第二多孔板; 控制器，被配置为选择性地施加所述第一和第二多孔板之间的至少第一和第二电压差; 其中所述带电粒子源和所述第一和第二多孔径孔布置成使得多个带电粒子子束中的每一个穿过孔径对，所述孔径对包括所述第一多孔板的一个孔和所述第二多孔的一个孔 板，其中多个孔径对布置成使得当穿过穿过第一多孔板的孔的带电粒子束的入射方向从第一多孔板的孔的中心相对于中心位移时，第一多孔板的孔的中心 的第二多孔板的孔径。 本发明还涉及一种构造成改变一组带电粒子子束的发散度的粒子光学部件，以及包括使用不同数量的带电粒子子束检查物体的带电粒子检查方法。

公开(公告)号：US09263232B2

公开(公告)日：2016-02-16

申请号：US14395263

申请日：2013-04-11

Applicant: Hitachi High-Technologies Corporation

Inventor： Yusuke Ominami ,  Shinsuke Kawanishi ,  Tomohisa Ohtaki ,  Masahiko Ajima ,  Sukehiro Ito

IPC: H01J37/26 ,  G21K5/04 ,  H01J37/16 ,  H01J37/18 ,  H01J37/28 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/261 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/16 ,  H01J37/18 ,  H01J37/28 ,  H01J2237/0245 ,  H01J2237/043 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/162 ,  H01J2237/164 ,  H01J2237/2003 ,  H01J2237/2448 ,  H01J2237/2602 ,  H01J2237/2605

Abstract: A charged particle beam device (1) includes a charged particle optical lens barrel (10), a support housing (20) equipped with the charged particle optical lens barrel (10) thereon, and an insertion housing (30) inserted in the support housing (20). A first aperture member (15) is disposed in the vicinity of the center of the magnetic field of an objective lens, and a second aperture member (15) is disposed so as to externally close an opening part provided at the upper side of the insertion housing (30). Further, when a primary charged particle beam (12) is irradiated to a sample (60) arranged under the lower side of the second aperture member (31), secondary charged particles thus emitted are detected by a detector (16).

Abstract translation: 带电粒子束装置（1）包括带电粒子光学透镜镜筒（10），在其上装有带电粒子光学透镜镜筒（10）的支撑壳体（20）和插入支撑壳体 （20）。 第一孔径构件（15）设置在物镜的磁场的中心附近，并且第二孔径构件（15）设置成外部封闭设置在插入件的上侧的开口部分 住房（30）。 此外，当将初级带电粒子束（12）照射到布置在第二孔径构件（31）的下侧下方的样品（60）时，由检测器（16）检测如此发射的二次带电粒子。

公开(公告)号：US09240306B2

公开(公告)日：2016-01-19

申请号：US14373893

申请日：2012-12-05

Applicant: Mapper Lithography IP B.V.

Inventor： Jan Andries Meijer ,  Paul IJmert Scheffers ,  Abdourahmane Ange Sarr

IPC: H01J37/00 ,  H01J37/252 ,  H01J37/09 ,  H01J37/244 ,  H01J37/30 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J37/252 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/244 ,  H01J37/3002 ,  H01J37/3005 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/2001 ,  H01J2237/24521 ,  H01J2237/2802 ,  H01J2237/30477 ,  H01J2237/31793

Abstract: The invention relates to a device for spot size measurement at wafer level in a multi charged particle beam lithography system. The device comprises a knife edge structure on top of a scintillating material, such a YAG material. The knife edge structure is arranged in a Si wafer which has a top plane at a sharp angle to a (1 1 0) plane of the Si. In an embodiment the angle is in the range from 2 to 4 degrees, preferably in the range from 2.9-3.1 degrees. The invention relates in addition to a method for manufacturing a device for spot size measurement at wafer level in a multi charged particle beam lithography system.

Abstract translation: 本发明涉及一种用于在多带电粒子束光刻系统中在晶片级进行点尺寸测量的装置。 该装置包括在闪烁材料的顶部上的刀刃结构，例如YAG材料。 刀刃结构布置在Si晶片中，其具有与Si的（110）平面成锐角的顶面。 在一个实施例中，角度在2至4度的范围内，优选在2.9-3.1度的范围内。 本发明还涉及一种用于在多带电粒子束光刻系统中制造用于晶片级的点尺寸测量的装置的方法。

公开(公告)号：US09224576B2

公开(公告)日：2015-12-29

申请号：US14165573

申请日：2014-01-27

Applicant: Carl Zeiss Microscopy GmbH ,  Applied Materials Israel, Ltd.

Inventor： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares ,  Steven Rogers

IPC: G21K5/10 ,  H01J37/08 ,  H01J37/30 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/28 ,  H01J37/317 ,  H01J37/14 ,  H01J37/10

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

Abstract translation: 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

公开(公告)号：US09208990B2

公开(公告)日：2015-12-08

申请号：US14129261

申请日：2012-05-22

Applicant: Hirokazu Tamaki ,  Yoshio Takahashi ,  Hiroto Kasai ,  Hiroyuki Kobayashi

Inventor： Hirokazu Tamaki ,  Yoshio Takahashi ,  Hiroto Kasai ,  Hiroyuki Kobayashi

IPC: H01J37/09 ,  H01J37/295 ,  H01J37/147 ,  H01J37/26

CPC classification number: H01J37/147 ,  H01J37/09 ,  H01J37/26 ,  H01J37/263 ,  H01J37/295 ,  H01J2237/2614

Abstract: Provided is a phase plate for use in an electron microscope which lessens the problem of image information loss caused by interruption of an electron beam and ameliorates the problem of anisotropic potential distributions. This phase plate comprises openings (23) connected into a single opening, and multiple electrodes (11) arranged in the opening from the outer portion of the opening towards the center of the opening. The cross sections of the electrodes (11) are configured such that a voltage application layer (24) comprising a conductor or a semiconductor is covered by a shield layer comprising a conductor or a semiconductor with an intermediate insulating layer. By this means, this phase plate is capable of lessening electron beam interruption due to the electrodes (11), and of ameliorating the problem of anisotropic potential distributions.

Abstract translation: 提供一种用于电子显微镜的相位板，其减少了由电子束的中断引起的图像信息损失的问题，并且改善了各向异性势分布的问题。 该相板包括连接到单个开口中的开口（23）和从开口的外部部分朝向开口的中心布置在开口中的多个电极（11）。 电极（11）的横截面被构造成使得包括导体或半导体的电压施加层（24）被包括具有中间绝缘层的导体或半导体的屏蔽层覆盖。 通过这种方式，该相位板能够减少由于电极（11）引起的电子束中断，并且能够改善各向异性势分布的问题。

公开(公告)号：US09208989B2

公开(公告)日：2015-12-08

申请号：US13295243

申请日：2011-11-14

Applicant: Alexander Hendrik Vincent Van Veen ,  Yanxia Zhang ,  Gun Sari Mari Berglund ,  Pieter Kruit

Inventor： Alexander Hendrik Vincent Van Veen ,  Yanxia Zhang ,  Gun Sari Mari Berglund ,  Pieter Kruit

IPC: H01J3/26 ,  H01J37/09

CPC classification number: H01J37/09 ,  H01J2237/002 ,  H01J2237/0453 ,  H01J2237/1534 ,  H01J2237/31774

Abstract: A charged particle lithography system for transferring a pattern onto the surface of a target, such as a wafer, comprising a charged particle source adapted for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam, the converging means comprising a first electrode, and an aperture array element comprising a plurality of apertures, the aperture array element forming a second electrode, wherein the system is adapted for creating an electric field between the first electrode and the second electrode.

Abstract translation: 一种用于将图案转印到诸如晶片的靶的表面上的带电粒子光刻系统，包括适于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置，所述会聚装置包括 第一电极和包括多个孔的孔阵列元件，所述孔阵列元件形成第二电极，其中所述系统适于在所述第一电极和所述第二电极之间产生电场。