Ultraviolet energy shield for non-volatile charge storage memory
    76.
    发明授权
    Ultraviolet energy shield for non-volatile charge storage memory 有权
    用于非易失性电荷存储存储器的紫外线能量屏蔽

    公开(公告)号:US09406621B2

    公开(公告)日:2016-08-02

    申请号:US12797971

    申请日:2010-06-10

    Abstract: An integrated circuit with non-volatile memory cells shielded from ultraviolet light by a shielding structure compatible with chemical-mechanical processing. The disclosed shielding structure includes a roof structure with sides; along each side are spaced-apart contact posts, each with a width on the order of the wavelength of ultraviolet light to be shielded, and spaced apart by a distance that is also on the order of the wavelength of ultraviolet light to be shielded. The contact posts may be provided in multiple rows, and extending to a diffused region or to a polysilicon ring or both. The multiple rows may be aligned with one another or staggered relative to one another.

    Abstract translation: 一种具有非易失性存储单元的集成电路,通过与化学机械处理兼容的屏蔽结构来屏蔽紫外线。 所公开的屏蔽结构包括具有侧面的屋顶结构; 沿着每一侧具有间隔开的接触柱,每个接触柱具有要被屏蔽的紫外线的波长的宽度,并隔开一定距离,该距离也在要被屏蔽的紫外线的波长的数量级上。 接触柱可以设置成多排,并且延伸到扩散区域或多晶硅环或两者。 多行可以彼此对准或相互交错排列。

    Integrated circuit structure with active and passive devices in different tiers
    78.
    发明授权
    Integrated circuit structure with active and passive devices in different tiers 有权
    集成电路结构,主动和无源器件在不同层级

    公开(公告)号:US09355892B2

    公开(公告)日:2016-05-31

    申请号:US14021923

    申请日:2013-09-09

    Inventor: Yu-Nan Shih

    Abstract: An integrated circuit structure includes a two-tier die including a first tier and a second tier over and bonded to the first tier. The first tier includes a first substrate including a semiconductor material, an active device at a surface of the first substrate, and a first interconnect structure over the first substrate, wherein the first tier is free from passive devices therein. The second tier includes a second substrate bonded to and in contact with the first interconnect structure, and a second interconnect structure over the second substrate, wherein metal lines in the second interconnect structure are electrically coupled to the first interconnect structure. The second tier further includes a plurality of through-vias penetrating through the second substrate, wherein the plurality of through-vias lands on metal pads in a top metal layer of the first interconnect structure, and a passive device in the second interconnect structure.

    Abstract translation: 集成电路结构包括包括第一层和第二层的双层管芯,并结合到第一层。 第一层包括第一衬底,其包括半导体材料,在第一衬底的表面处的有源器件,以及在第一衬底上的第一互连结构,其中第一层在其中没有被动器件。 第二层包括结合到第一互连结构并与第一互连结构接触的第二衬底,以及在第二衬底上的第二互连结构,其中第二互连结构中的金属线电耦合到第一互连结构。 第二层还包括穿过第二衬底的多个通孔,其中多个通孔位于第一互连结构的顶部金属层中的金属焊盘上,以及第二互连结构中的无源器件。

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