公开(公告)号：US09875911B2

公开(公告)日：2018-01-23

申请号：US12714190

申请日：2010-02-26

Applicant: Reza A. Pagaila ,  Yaojian Lin ,  Jun Mo Koo ,  HeeJo Chi

Inventor： Reza A. Pagaila ,  Yaojian Lin ,  Jun Mo Koo ,  HeeJo Chi

IPC: H01L23/52 ,  H01L21/56 ,  H01L21/683 ,  H01L23/13 ,  H01L23/31 ,  H01L23/498 ,  H01L25/065 ,  H01L25/10 ,  H01L25/16 ,  H01L23/00 ,  H01L23/552

CPC classification number: H01L21/56 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/13 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/552 ,  H01L24/16 ,  H01L24/29 ,  H01L24/32 ,  H01L24/48 ,  H01L24/81 ,  H01L24/83 ,  H01L24/92 ,  H01L24/94 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/105 ,  H01L25/16 ,  H01L2221/68345 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05552 ,  H01L2224/0557 ,  H01L2224/12105 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/32145 ,  H01L2224/45015 ,  H01L2224/48091 ,  H01L2224/48157 ,  H01L2224/48158 ,  H01L2224/4816 ,  H01L2224/73203 ,  H01L2224/73253 ,  H01L2224/73259 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/81001 ,  H01L2224/812 ,  H01L2224/81801 ,  H01L2224/83 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06548 ,  H01L2225/06589 ,  H01L2924/00014 ,  H01L2924/0002 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/0105 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15151 ,  H01L2924/15174 ,  H01L2924/15311 ,  H01L2924/1532 ,  H01L2924/15331 ,  H01L2924/157 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/19041 ,  H01L2924/19105 ,  H01L2924/207 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2924/3511 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099

Abstract: A semiconductor device has an interposer mounted over a carrier. The interposer includes TSV formed either prior to or after mounting to the carrier. An opening is formed in the interposer. The interposer can have two-level stepped portions with a first vertical conduction path through a first stepped portion and second vertical conduction path through a second stepped portion. A first and second semiconductor die are mounted over the interposer. The second die is disposed within the opening of the interposer. A discrete semiconductor component can be mounted over the interposer. A conductive via can be formed through the second die or encapsulant. An encapsulant is deposited over the first and second die and interposer. A portion of the interposer can be removed to that the encapsulant forms around a side of the semiconductor device. An interconnect structure is formed over the interposer and second die.

公开(公告)号：US09484279B2

公开(公告)日：2016-11-01

申请号：US12792031

申请日：2010-06-02

Applicant: Reza A. Pagaila ,  Flynn Carson ,  Seung Uk Yoon

Inventor： Reza A. Pagaila ,  Flynn Carson ,  Seung Uk Yoon

IPC: H01L23/552 ,  H01L23/31 ,  H01L21/56 ,  H01L25/065 ,  H01L25/11 ,  H01L23/538 ,  H01L23/00 ,  H01L25/10

CPC classification number: H01L23/552 ,  H01L21/4871 ,  H01L21/561 ,  H01L21/568 ,  H01L23/06 ,  H01L23/10 ,  H01L23/3128 ,  H01L23/3135 ,  H01L23/5286 ,  H01L23/5389 ,  H01L24/02 ,  H01L24/11 ,  H01L24/13 ,  H01L24/19 ,  H01L24/20 ,  H01L24/95 ,  H01L24/96 ,  H01L25/0657 ,  H01L25/105 ,  H01L25/115 ,  H01L2223/6677 ,  H01L2224/02166 ,  H01L2224/0217 ,  H01L2224/02373 ,  H01L2224/02381 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05548 ,  H01L2224/05567 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/11849 ,  H01L2224/12105 ,  H01L2224/13022 ,  H01L2224/13024 ,  H01L2224/13027 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/16225 ,  H01L2224/20 ,  H01L2224/215 ,  H01L2224/221 ,  H01L2224/73253 ,  H01L2224/95001 ,  H01L2224/96 ,  H01L2225/06524 ,  H01L2225/06537 ,  H01L2225/06548 ,  H01L2225/06551 ,  H01L2225/06572 ,  H01L2225/06586 ,  H01L2924/00014 ,  H01L2924/0002 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2224/19 ,  H01L2224/11 ,  H01L2224/03 ,  H01L2924/00 ,  H01L2224/05552 ,  H01L2924/00012

Abstract: A semiconductor device has a plurality of first semiconductor die mounted over an interface layer formed over a temporary carrier. An encapsulant is deposited over the first die and carrier. A flat shielding layer is formed over the encapsulant. A channel is formed through the shielding layer and encapsulant down to the interface layer. A conductive material is deposited in the channel and electrically connected to the shielding layer. The interface layer and carrier are removed. An interconnect structure is formed over conductive material, encapsulant, and first die. The conductive material is electrically connected through the interconnect structure to a ground point. The conductive material is singulated to separate the first die. A second semiconductor die can be mounted over the first die such that the shielding layer covers the second die and the conductive material surrounds the second die or the first and second die.

Abstract translation: 半导体器件具有安装在形成在临时载体上的界面层上的多个第一半导体管芯。 密封剂沉积在第一模具和载体上。 在密封剂上形成平坦的屏蔽层。 通过屏蔽层和密封剂形成通道，直到界面层。 导电材料沉积在通道中并电连接到屏蔽层。 界面层和载体被去除。 在导电材料，密封剂和第一模具上形成互连结构。 导电材料通过互连结构电连接到接地点。 将导电材料分开以分离第一模具。 可以将第二半导体管芯安装在第一管芯上，使得屏蔽层覆盖第二管芯，并且导电材料围绕第二管芯或第一和第二管芯。

公开(公告)号：US09337116B2

公开(公告)日：2016-05-10

申请号：US12914878

申请日：2010-10-28

Applicant: Reza A. Pagaila ,  Yaojian Lin ,  Jun Mo Koo

Inventor： Reza A. Pagaila ,  Yaojian Lin ,  Jun Mo Koo

IPC: H01L23/48 ,  H01L23/52 ,  H01L29/40 ,  H01L23/31 ,  H01L23/13 ,  H01L23/00 ,  H01L25/065 ,  H01L21/56 ,  H01L23/498 ,  H01L25/03 ,  H01L25/10

CPC classification number: H01L23/3128 ,  H01L21/561 ,  H01L23/13 ,  H01L23/49827 ,  H01L24/97 ,  H01L25/03 ,  H01L25/0657 ,  H01L25/105 ,  H01L2224/05571 ,  H01L2224/05573 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/97 ,  H01L2225/06517 ,  H01L2225/06548 ,  H01L2225/06568 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01079 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/12041 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1515 ,  H01L2924/15311 ,  H01L2924/15321 ,  H01L2924/15331 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2224/81 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/8091 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655

Abstract: A semiconductor substrate has a plurality of different size recesses formed in the substrate to provide a stepped interposer. A conductive via can be formed through the stepped interposer. An insulating layer follows a contour of the stepped interposer. A conductive layer is formed over the insulating layer following the contour of the stepped interposer. A first semiconductor die is partially disposed in a first recess and electrically connected to the conductive layer. A second semiconductor die is partially disposed in a second recess and electrically connected to the conductive layer. The first semiconductor die is electrically connected to the second semiconductor die through the conductive layer. The first and second semiconductor die can be flipchip type semiconductor die. An encapsulant is deposited over the first and second semiconductor die. A portion of the stepped interposer can be removed to reduce thickness.

Abstract translation: 半导体衬底具有形成在衬底中的多个不同尺寸的凹部以提供阶梯式插入器。 可以通过阶梯式内插器形成导电通孔。 绝缘层遵循阶梯式插入器的轮廓。 在阶梯式插入件的轮廓之后，在绝缘层之上形成导电层。 第一半导体管芯部分地设置在第一凹部中并电连接到导电层。 第二半导体管芯部分地设置在第二凹部中并电连接到导电层。 第一半导体管芯通过导电层与第二半导体管芯电连接。 第一和第二半导体管芯可以是倒装芯片型半导体管芯。 密封剂沉积在第一和第二半导体管芯上。 可以去除部分阶梯式内插器以减小厚度。

公开(公告)号：US09263301B2

公开(公告)日：2016-02-16

申请号：US13607204

申请日：2012-09-07

Applicant: Reza A. Pagaila ,  Yaojian Lin ,  Jun Mo Koo

Inventor： Reza A. Pagaila ,  Yaojian Lin ,  Jun Mo Koo

IPC: H01L23/48 ,  H01L21/56 ,  H01L21/683 ,  H01L23/00 ,  H01L25/065 ,  H01L25/00 ,  H01L23/31 ,  H01L23/50 ,  H01L23/538

CPC classification number: H01L21/561 ,  H01L21/56 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/3128 ,  H01L23/50 ,  H01L23/5389 ,  H01L24/11 ,  H01L24/13 ,  H01L24/19 ,  H01L24/96 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/50 ,  H01L2221/68327 ,  H01L2221/68359 ,  H01L2224/03462 ,  H01L2224/03464 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/06181 ,  H01L2224/11849 ,  H01L2224/12105 ,  H01L2224/13022 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/16265 ,  H01L2224/48227 ,  H01L2224/73209 ,  H01L2224/73259 ,  H01L2224/73265 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06548 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/18162 ,  H01L2924/19103 ,  H01L2924/19104 ,  H01L2924/19105 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2224/03 ,  H01L2224/81 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor die has first and second discrete semiconductor components mounted over a plurality of wettable contact pads formed on a carrier. Conductive pillars are formed over the wettable contact pads. A semiconductor die is mounted to the conductive pillars over the first discrete components. The conductive pillars provide vertical stand-off of the semiconductor die as headroom for the first discrete components. The second discrete components are disposed outside a footprint of the semiconductor die. Conductive TSV can be formed through the semiconductor die. An encapsulant is deposited over the semiconductor die and first and second discrete components. The wettable contact pads reduce die and discrete component shifting during encapsulation. A portion of a back surface of the semiconductor die is removed to reduce package thickness. An interconnect structure is formed over the encapsulant and semiconductor die. Third discrete semiconductor components can be mounted over the semiconductor die.

Abstract translation: 半导体管芯具有安装在形成在载体上的多个可湿性接触焊盘上的第一和第二分立半导体部件。 导电柱形成在可湿性接触垫上。 半导体管芯通过第一分立元件安装到导电柱上。 导电柱提供半导体管芯的垂直间隔作为第一分立元件的余量。 第二分立元件设置在半导体管芯的占位面之外。 可以通过半导体管芯形成导电TSV。 密封剂沉积在半导体管芯和第一和第二分立元件上。 可湿式接触垫在封装期间减少管芯和分立元件的移动。 去除半导体管芯的后表面的一部分以减小封装厚度。 在密封剂和半导体管芯上形成互连结构。 第三分立半导体部件可以安装在半导体管芯上。

公开(公告)号：US09054095B2

公开(公告)日：2015-06-09

申请号：US13284003

申请日：2011-10-28

Applicant: Reza A. Pagaila

Inventor： Reza A. Pagaila

IPC: H01L21/00 ,  H01L21/48 ,  H01L23/498 ,  H01L23/538 ,  H01L21/56 ,  H01L25/03 ,  H01L25/10 ,  H01L25/00 ,  H01L23/00 ,  H01L25/065

CPC classification number: H01L24/81 ,  H01L21/56 ,  H01L23/3157 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/49833 ,  H01L23/5389 ,  H01L24/17 ,  H01L24/48 ,  H01L24/73 ,  H01L25/03 ,  H01L25/0657 ,  H01L25/105 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/04026 ,  H01L2224/04042 ,  H01L2224/0557 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11464 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/14181 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/16235 ,  H01L2224/17181 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/48235 ,  H01L2224/73204 ,  H01L2224/73207 ,  H01L2224/73253 ,  H01L2224/73265 ,  H01L2224/81024 ,  H01L2224/81201 ,  H01L2224/81805 ,  H01L2224/81815 ,  H01L2224/81986 ,  H01L2225/06558 ,  H01L2225/1023 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/00014 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/1533 ,  H01L2924/15331 ,  H01L2924/157 ,  H01L2924/181 ,  H01L2924/182 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device has a first substrate with a plurality of first conductive vias formed partially through the first substrate. A first semiconductor die is mounted over the first substrate and electrically connected to the first conductive vias. A plurality of bumps is formed over the first substrate. A second substrate has a plurality of second conductive vias formed partially through the second substrate. A penetrable encapsulant is deposited over the second substrate. The second substrate is mounted over the first substrate to embed the first semiconductor die and interconnect structure in the penetrable encapsulant. The encapsulant can be injected between the first and second substrates. A portion of the first substrate is removed to expose the first conductive vias. A portion of the second substrate is removed to expose the second conductive vias. A second semiconductor die is mounted over the second substrate.

Abstract translation: 半导体器件具有第一衬底，其具有部分地穿过第一衬底形成的多个第一导电通孔。 第一半导体管芯安装在第一衬底上并电连接到第一导电通孔。 在第一基板上形成多个凸块。 第二衬底具有部分地穿过第二衬底形成的多个第二导电通孔。 可渗透的密封剂沉积在第二基底上。 将第二衬底安装在第一衬底上以将第一半导体管芯和互连结构嵌入可渗透的密封剂中。 密封剂可以注射在第一和第二基底之间。 去除第一衬底的一部分以露出第一导电通孔。 去除第二衬底的一部分以露出第二导电通孔。 第二半导体管芯安装在第二衬底上。

公开(公告)号：US09006882B2

公开(公告)日：2015-04-14

申请号：US12719398

申请日：2010-03-08

Applicant: Reza A. Pagaila ,  Byung Tai Do ,  Heap Hoe Kuan

Inventor： Reza A. Pagaila ,  Byung Tai Do ,  Heap Hoe Kuan

IPC: H01L23/34 ,  H01L23/00 ,  H01L21/56 ,  H01L21/683 ,  H01L23/31 ,  H01L25/03 ,  H01L25/065 ,  H01L25/10 ,  H01L25/00 ,  H01L23/48

CPC classification number: H01L24/18 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/3128 ,  H01L23/3185 ,  H01L23/481 ,  H01L24/19 ,  H01L24/48 ,  H01L25/03 ,  H01L25/0657 ,  H01L25/105 ,  H01L25/50 ,  H01L2221/68345 ,  H01L2221/68359 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/16145 ,  H01L2224/16227 ,  H01L2224/16235 ,  H01L2224/18 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48225 ,  H01L2224/48227 ,  H01L2224/48472 ,  H01L2224/73215 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/82 ,  H01L2224/9222 ,  H01L2225/0651 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06568 ,  H01L2225/1023 ,  H01L2225/1058 ,  H01L2225/1088 ,  H01L2924/00014 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/1815 ,  H01L2924/18162 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/19107 ,  H01L2924/30105 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor die has an insulating material disposed in a peripheral region around the die. A blind via is formed through the gap. A conductive material is deposited in the blind via to form a conductive via. A conductive layer is formed between the conductive via and contact pad on the semiconductor die. A protective layer is formed over the front side of the semiconductor die. A portion of the insulating material and conductive via is removed from a backside of the semiconductor die opposite the front side of the semiconductor die so that a thickness of the conductive via is less than a thickness of the semiconductor wafer. The insulating material and conductive via are tapered. The wafer is singulated through the gap to separate the semiconductor die. A plurality of semiconductor die can be stacked and electrically interconnected through the conductive vias.

公开(公告)号：US08822281B2

公开(公告)日：2014-09-02

申请号：US12710995

申请日：2010-02-23

Applicant: Reza A. Pagaila ,  Yaojian Lin ,  Seung Uk Yoon

Inventor： Reza A. Pagaila ,  Yaojian Lin ,  Seung Uk Yoon

IPC: H01L21/337 ,  H01L23/538 ,  H01L23/48 ,  H01L25/10 ,  H01L21/768 ,  H01L23/31 ,  H01L21/56 ,  H01L23/498 ,  H01L23/00

CPC classification number: H01L23/5384 ,  H01L21/568 ,  H01L21/76898 ,  H01L23/3128 ,  H01L23/481 ,  H01L23/49816 ,  H01L23/5389 ,  H01L24/10 ,  H01L24/19 ,  H01L24/48 ,  H01L24/97 ,  H01L25/105 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/2518 ,  H01L2224/48247 ,  H01L2224/73259 ,  H01L2224/73265 ,  H01L2224/97 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/30105 ,  H01L2224/82 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device has a semiconductor die mounted over a carrier. An encapsulant is deposited over the semiconductor die and carrier. An insulating layer is formed over the semiconductor die and encapsulant. A plurality of first vias is formed through the insulating layer and semiconductor die while mounted to the carrier. A plurality of second vias is formed through the insulating layer and encapsulant in the same direction as the first vias while the semiconductor die is mounted to the carrier. An electrically conductive material is deposited in the first vias to form conductive TSV and in the second vias to form conductive TMV. A first interconnect structure is formed over the insulating layer and electrically connected to the TSV and TMV. The carrier is removed. A second interconnect structure is formed over the semiconductor die and encapsulant and electrically connected to the TSV and TMV.

Abstract translation: 半导体器件具有安装在载体上的半导体管芯。 密封剂沉积在半导体管芯和载体上。 在半导体管芯和密封剂上形成绝缘层。 在安装到载体上时，通过绝缘层和半导体管芯形成多个第一通孔。 在将半导体管芯安装到载体上的同时，通过绝缘层和密封剂沿与第一通孔相同的方向形成多个第二通孔。 在第一通孔中沉积导电材料以形成导电TSV，并在第二通孔中形成导电TMV。 第一互连结构形成在绝缘层上并电连接到TSV和TMV。 载体被移除。 第二互连结构形成在半导体管芯和密封剂上并电连接到TSV和TMV。

公开(公告)号：US08592975B2

公开(公告)日：2013-11-26

申请号：US13559430

申请日：2012-07-26

Applicant: Reza A. Pagaila

Inventor： Reza A. Pagaila

IPC: H01L23/48 ,  H01L23/52 ,  H01L29/40 ,  H01L21/44 ,  H01L21/48 ,  H01L21/50

CPC classification number: H01L25/0657 ,  H01L21/56 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/3107 ,  H01L23/3128 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/5389 ,  H01L23/552 ,  H01L24/11 ,  H01L24/16 ,  H01L24/19 ,  H01L24/24 ,  H01L24/25 ,  H01L24/81 ,  H01L24/82 ,  H01L24/96 ,  H01L24/97 ,  H01L25/50 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/16145 ,  H01L2224/16227 ,  H01L2224/18 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06527 ,  H01L2225/06537 ,  H01L2225/06548 ,  H01L2924/00011 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01076 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/18162 ,  H01L2924/19041 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2224/82 ,  H01L2924/00 ,  H01L2224/81 ,  H01L2924/00012 ,  H01L2224/81805

Abstract: A semiconductor device has a first interconnect structure. A first semiconductor die has an active surface oriented towards and mounted to a first surface of the first interconnect structure. A first encapsulant is deposited over the first interconnect structure and first semiconductor die. A second semiconductor die has an active surface oriented towards and mounted to a second surface of the first interconnect structure opposite the first surface. A plurality of first conductive pillars is formed over the second surface of the first interconnect structure and around the second semiconductor die. A second encapsulant is deposited over the second semiconductor die and around the plurality of first conductive pillars. A second interconnect structure including a conductive layer and bumps are formed over the second encapsulant and electrically connect to the plurality of first conductive pillars and the first and second semiconductor die.

公开(公告)号：US08501541B2

公开(公告)日：2013-08-06

申请号：US13228226

申请日：2011-09-08

Applicant: Reza A. Pagaila ,  Linda Pei Ee Chua ,  Byung Tai Do

Inventor： Reza A. Pagaila ,  Linda Pei Ee Chua ,  Byung Tai Do

IPC: H01L21/00

CPC classification number: H01L24/24 ,  H01L21/56 ,  H01L21/6835 ,  H01L23/3128 ,  H01L23/481 ,  H01L24/19 ,  H01L24/29 ,  H01L24/48 ,  H01L24/73 ,  H01L25/03 ,  H01L25/0657 ,  H01L25/105 ,  H01L2221/68345 ,  H01L2221/68359 ,  H01L2224/24137 ,  H01L2224/24226 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/48465 ,  H01L2224/73265 ,  H01L2224/82001 ,  H01L2225/0651 ,  H01L2225/06551 ,  H01L2225/1023 ,  H01L2225/1035 ,  H01L2225/1058 ,  H01L2225/1088 ,  H01L2924/00014 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/078 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/1815 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/19107 ,  H01L2924/30105 ,  H01L2924/351 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device is made by disposing a plurality of semiconductor die on a carrier and creating a gap between each of the semiconductor die. A first insulating material is deposited in the gap. A portion of the first insulating material is removed. A conductive layer is formed over the semiconductor die. A conductive lining is conformally formed on the remaining portion of the first insulating material to form conductive via within the gap. The conductive vias can be tapered or vertical. The conductive via is electrically connected to a contact pad on the semiconductor die. A second insulating material is deposited in the gap over the conductive lining. A portion of the conductive via may extend outside the first and second insulating materials. The semiconductor die are singulated through the gap. The semiconductor die can be stacked and interconnected through the conductive vias.

Abstract translation: 通过将多个半导体管芯设置在载体上并在每个半导体管芯之间产生间隙来制造半导体器件。 第一绝缘材料沉积在间隙中。 去除第一绝缘材料的一部分。 在半导体管芯上形成导电层。 在第一绝缘材料的剩余部分上保形地形成导电衬里，以在间隙内形成导电通孔。 导电通孔可以是锥形或垂直的。 导电通孔电连接到半导体管芯上的接触焊盘。 第二绝缘材料沉积在导电衬里上的间隙中。 导电通孔的一部分可以延伸到第一和第二绝缘材料的外部。 半导体管芯通过间隙被切割。 半导体管芯可以通过导电通孔进行堆叠和互连。

公开(公告)号：US08476772B2

公开(公告)日：2013-07-02

申请号：US12953812

申请日：2010-11-24

Applicant: Byung Tai Do ,  Arnel Trasporto ,  Linda Pei Ee Chua ,  Reza A. Pagaila

Inventor： Byung Tai Do ,  Arnel Trasporto ,  Linda Pei Ee Chua ,  Reza A. Pagaila

IPC: H01L23/48

CPC classification number: H01L24/14 ,  H01L21/4832 ,  H01L21/561 ,  H01L23/3107 ,  H01L23/3121 ,  H01L23/3128 ,  H01L23/49548 ,  H01L23/49582 ,  H01L24/13 ,  H01L24/16 ,  H01L24/29 ,  H01L24/32 ,  H01L24/73 ,  H01L24/81 ,  H01L24/92 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/10175 ,  H01L2224/16225 ,  H01L2224/16245 ,  H01L2224/26175 ,  H01L2224/2919 ,  H01L2224/32145 ,  H01L2224/48091 ,  H01L2224/48245 ,  H01L2224/48247 ,  H01L2224/73253 ,  H01L2224/73265 ,  H01L2224/8114 ,  H01L2224/81203 ,  H01L2224/81385 ,  H01L2224/81815 ,  H01L2224/92247 ,  H01L2224/97 ,  H01L2225/06558 ,  H01L2924/00013 ,  H01L2924/00014 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01074 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/381 ,  H01L2224/85 ,  H01L2224/83 ,  H01L2224/81 ,  H01L2224/13099 ,  H01L2924/0665 ,  H01L2224/05099 ,  H01L2924/00 ,  H01L2224/13599 ,  H01L2224/05599 ,  H01L2224/29099 ,  H01L2224/29599 ,  H01L2224/45099 ,  H01L2924/00012

Abstract: A semiconductor device has a base substrate with recesses formed in a first surface of the base substrate. A first conductive layer is formed over the first surface and into the recesses. A second conductive layer is formed over a second surface of the base substrate. A first semiconductor die is mounted to the base substrate with bumps partially disposed within the recesses over the first conductive layer. A second semiconductor die is mounted to the first semiconductor die. Bond wires are formed between the second semiconductor die and the first conductive layer over the first surface of the base substrate. An encapsulant is deposited over the first and second semiconductor die and base substrate. A portion of the base substrate is removed from the second surface between the second conductive layer down to the recesses to form electrically isolated base leads for the bumps and bond wires.

Abstract translation: 半导体器件具有形成在基底基板的第一表面中的凹部的基底基板。 第一导电层形成在第一表面上并进入凹槽中。 在基底基板的第二表面上形成第二导电层。 第一半导体管芯安装到基底基板上，凸起部分设置在第一导电层的凹槽内。 第二半导体管芯安装到第一半导体管芯。 在第二半导体管芯和第一导电层之间的基底衬底的第一表面上形成接合线。 密封剂沉积在第一和第二半导体管芯和基底衬底上。 基底基板的一部分从第二导电层之间的第二表面移除到凹部，以形成用于凸块和接合线的电隔离的基底引线。