公开(公告)号：US11791130B2

公开(公告)日：2023-10-17

申请号：US17299153

申请日：2019-01-23

Applicant: Hitachi High-Tech Corporation

Inventor： Koichi Hamada ,  Megumi Kimura ,  Momoyo Enyama ,  Ryou Yumiba ,  Makoto Sakakibara ,  Kei Sakai ,  Satoru Yamaguchi ,  Katsumi Setoguchi ,  Masumi Shirai ,  Yasunori Takasugi

IPC: H01J37/28 ,  H01J37/153 ,  H01J37/22

CPC classification number: H01J37/28 ,  H01J37/153 ,  H01J37/222 ,  H01J2237/2817

Abstract: The objective of the present invention is to reduce differences between individual electron beam observation devices accurately by means of image correction. This method for calculating a correction factor for correcting images between a plurality of electron beam observation devices, in electron beam observation devices which generate images by scanning an electron beam across a specimen, is characterized by including: a step in which a first electron beam observation device generates a first image by scanning a first electron beam across first and second patterns, on either a specimen including the first pattern and the second pattern, having a different shape or size to the first pattern, or a first specimen including the first pattern and a second specimen including the second pattern; a step in which a second electron beam observation device generates a second image by scanning a second electron beam across the first and second patterns; and a step in which the first or second electron beam observation device calculates a correction factor at a peak frequency extracted selectively from first and second frequency characteristics calculated on the basis of the first and second images.

公开(公告)号：US20230260739A1

公开(公告)日：2023-08-17

申请号：US18012478

申请日：2020-07-13

Applicant: Hitachi High-Tech Corporation

Inventor： Keisuke TANUMA ,  Masato KAMIO ,  Hironori ITABASHI ,  Hiroki KANNAMI ,  Yusuke SEKI ,  Takumi UEZONO ,  Mitsuhiro NAKAMURA

IPC: H01J37/153 ,  H01J37/28 ,  H01J37/147

CPC classification number: H01J37/153 ,  H01J37/28 ,  H01J37/1474 ,  H01J2237/1536

Abstract: It is aimed to properly correct the various types of distortion without a reduction in observation throughput. The present disclosure provides a charged particle beam device that obtains an image by irradiating a specimen with a charged particle beam and includes: a deflection coil that scans the charged particle beam on the specimen; a D/A converter that converts a digital scan waveform into an analog scan waveform and outputs the analog scan waveform to the deflection coil to drive the deflection coil; and a scan waveform generation unit that generates a digital scan waveform and outputs the digital scan waveform to the D/A converter, in which the scan waveform generation unit has a basic LUT that stores parameters for correcting the digital scan waveform and includes a correction circuit that corrects a distortion characteristic of the deflection coil

公开(公告)号：US20230230796A1

公开(公告)日：2023-07-20

申请号：US18009898

申请日：2020-07-03

Applicant: Hitachi High-Tech Corporation

Inventor： Tomohito NAKANO ,  Makoto SUZUKI ,  Yuzuru MIZUHARA ,  Ryota WATANABE

IPC: H01J37/141 ,  H01J37/28 ,  H01J37/21 ,  H01J37/153

CPC classification number: H01J37/141 ,  H01J37/28 ,  H01J37/21 ,  H01J37/153 ,  H01J2237/216

Abstract: This charged particle beam device comprises: a charged particle beam source that generates charged particle beams; an objective lens in which coil current is inputted to focus the charged particle beams on a sample; a control unit that controls the coil current; a hysteresis characteristics storage unit that stores hysteresis characteristics information of the objective lens; a history information storage unit that stores history information relating to the coil current; and an estimating unit that estimates the magnetic field generated by the objective lens based on the coil current, the history information, and the hysteresis characteristic information, and has a magnetic field correction unit that, when the absolute value of the change amount of the coil current is greater than a prescribed value, further adds to the magnetic field estimated by the estimating unit a correction value according to the coil current and its change amount, correcting the magnetic field generated by the objective lens.

公开(公告)号：US11664187B2

公开(公告)日：2023-05-30

申请号：US17344134

申请日：2021-06-10

Applicant: Intel Corporation

Inventor： Amir Raveh ,  Gideon Reisfeld ,  Patrick Pardy

IPC: H01J37/304 ,  H01J37/153 ,  H01J37/12 ,  H01J37/14 ,  G02B26/08 ,  H01J37/244 ,  H01J37/28 ,  H01J37/305 ,  H01J37/317

CPC classification number: H01J37/153 ,  G02B26/0816 ,  H01J37/12 ,  H01J37/14 ,  H01J37/244 ,  H01J37/304 ,  H01J37/28 ,  H01J37/3053 ,  H01J37/3174 ,  H01J2237/153 ,  H01J2237/24585

Abstract: An apparatus comprising a beam emitter to emit a beam comprising electrons, ions or laser-light photons toward a target substrate. A motion sensor to detect mechanical vibrations of the target substrate. The motion sensor is mechanically coupled to the target substrate, a processor coupled to an output of the motion sensor. The processor is to generate a vibration correction signal proportional to the mechanical vibrations detected by the motion sensor, and beam steering optics coupled to the processor. The beam steering optics are to deflect the beam according to the vibration correction signal to compensate for the mechanical vibrations of the target substrate.

公开(公告)号：US11651930B2

公开(公告)日：2023-05-16

申请号：US17540442

申请日：2021-12-02

Applicant: Hitachi High-Tech Corporation

Inventor： Makoto Kuwahara ,  Koh Saitoh

IPC: H01J37/073 ,  H01J37/10 ,  H01J37/153 ,  H01J37/26 ,  H03F1/02 ,  H03F3/24 ,  H04B1/04 ,  H04L25/03 ,  H04L27/08 ,  H04L27/26 ,  H04L27/36 ,  H04W56/00 ,  H04W74/00 ,  H04W88/02 ,  H04W88/08

CPC classification number: H01J37/073 ,  H01J37/10 ,  H01J37/153 ,  H01J37/26 ,  H03F1/02 ,  H03F3/24 ,  H04B1/04 ,  H04L25/03012 ,  H04L25/03343 ,  H04L27/08 ,  H04L27/2647 ,  H04L27/368 ,  H04W56/0035 ,  H01J2237/1534 ,  H04B2001/045 ,  H04B2001/0408 ,  H04W74/004 ,  H04W74/006 ,  H04W88/02 ,  H04W88/08

Abstract: The present invention is to generate a spatially phase modulated electron wave. A laser radiating apparatus, a spatial light phase modulator, and a photocathode are provided. The photocathode has a semiconductor film having an NEA film formed on a surface thereof, and a thickness of the semiconductor film is smaller than a value obtained by multiplying a coherent relaxation time of electrons in the semiconductor film by a moving speed of the electrons in the semiconductor film. According to the configuration, a spatial distribution of phase and a spatial distribution of intensity of spatial phase modulated light are transferred to an electron wave, and the electron wave emitted from an NEA film is modulated into the spatial distribution of phase and the spatial distribution of intensity of the light. Since the spatial distribution of phase of the light can be modulated as intended by a spatial phase modulation technique for light, it is possible to generate an electron wave having a spatial distribution of phase modulated as intended.

公开(公告)号：US20180254168A1

公开(公告)日：2018-09-06

申请号：US15448445

申请日：2017-03-02

Applicant: FEI Company

Inventor： Alexander Henstra ,  Peter Christiaan Tiemeijer

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/08

CPC classification number: H01J37/265 ,  H01J37/08 ,  H01J37/1472 ,  H01J37/153 ,  H01J2237/1534

Abstract: A method of operating a charged particle microscope comprising the following steps: Providing a specimen on a specimen holder; Using a source to produce a beam of charged particles; Passing said beam through an illuminator comprising: A source lens, with an associated particle-optical axis; A condenser aperture, which is disposed between the source lens and specimen and is configured to define a footprint of said beam upon the specimen; Irradiating the specimen with the beam emerging from said illuminator; Using a detector to detect radiation emanating from the specimen in response to said irradiation, and producing an associated image, specifically comprising the following steps: Choosing a set of emission angles from said source; For each emission angle in said set, selecting a corresponding sub-beam that emits from the source at that emission angle, and storing a test image formed by that sub-beam, thereby compiling a set of test images corresponding to said set of emission angles; Analyzing said set of test images to evaluate illuminator aberrations generated prior to said condenser aperture.

公开(公告)号：US10014153B2

公开(公告)日：2018-07-03

申请号：US15422936

申请日：2017-02-02

Applicant: JEOL Ltd.

Inventor： Yuji Kohno

IPC: H01J37/153 ,  H01J37/22 ,  H01J37/28 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/153 ,  H01J37/22 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1534 ,  H01J2237/24455 ,  H01J2237/2802

Abstract: There is provided an electron microscope capable of measuring aberration with high accuracy. The electron microscope (100) comprises: an electron beam source (10) for producing an electron beam (EB); an illumination lens system (101) for focusing the electron beam (EB) onto a sample (S); a scanner (12) for scanning the focused electron beam (EB) over the sample (S); an aperture stop (30) having a plurality of detection angle-limiting holes (32) for extracting rays of the electron beam (EB) having mutually different detection angles from the electron beam (EB) transmitted through the sample (S); and a detector (20) for detecting the rays of the electron beam (EB) passed through the aperture stop (30).

公开(公告)号：US20180166252A1

公开(公告)日：2018-06-14

申请号：US15372536

申请日：2016-12-08

Applicant: JEOL Ltd.

Inventor： Hidetaka Sawada ,  Yu Jimbo ,  Masashi Shimizu

IPC: H01J37/153 ,  H01J37/26 ,  H01J37/22 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/153 ,  H01J37/10 ,  H01J37/1474 ,  H01J37/22 ,  H01J37/26 ,  H01J2237/1534 ,  H01J2237/182

Abstract: There is provided a liner tube capable of reducing the effects of magnetic field variations on an electron beam. The liner tube (10) is disposed inside the electron optical column (2) of an electron microscope (100). The interior of the tube (10) forms a path for the electron beam (EB). The liner tube (10) has a first cylindrical member (110) that is made of copper, gold, silver, or an alloy consisting principally of one of these metals.

公开(公告)号：US20180144905A1

公开(公告)日：2018-05-24

申请号：US15806872

申请日：2017-11-08

Applicant: NuFlare Technology, Inc.

Inventor： Osamu IIZUKA ,  Yukitaka SHIMIZU

IPC: H01J37/302 ,  H01J37/317 ,  H01J37/04 ,  H01J37/20 ,  H01J37/10 ,  H01J37/153 ,  H01J37/147 ,  H01J37/244

CPC classification number: H01J37/302 ,  H01J37/045 ,  H01J37/10 ,  H01J37/147 ,  H01J37/153 ,  H01J37/20 ,  H01J37/244 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/1532 ,  H01J2237/20221 ,  H01J2237/21 ,  H01J2237/24514 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/31774 ,  H01J2237/31798

Abstract: According to one embodiment, a multi charged particle beam writing apparatus includes an objective lens adjusting a focus position of multiple beams, a coil correcting astigmatism of the multiple beams, an inspection aperture disposed in a stage and configured to allow one beam of the multiple beams to pass therethrough, a deflector deflecting the multiple beams, a current detector detecting a beam current of each beam of the multiple beams scanned over the inspection aperture in the XY direction and passed through the inspection aperture, and a controller generating a beam image on the basis of the detected beam current, calculating a feature quantity of the beam image, and controlling the objective lens or the coil on the basis of the feature quantity.

公开(公告)号：US09953802B2

公开(公告)日：2018-04-24

申请号：US15112716

申请日：2015-01-21

Applicant: Ramot at Tel-Aviv University Ltd.

Inventor： Roy Shiloh ,  Yossi Lereah ,  Ady Arie

IPC: G21K1/08 ,  H01J37/153 ,  H01J37/26

CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J37/261 ,  H01J37/263 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/2614

Abstract: A method of manipulating an electron beam is disclosed. The method comprises transmitting the beam through a phase mask selected to spatially modulate a phase of the beam over a cross-section thereof.