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公开(公告)号：US12216068B2
公开(公告)日：2025-02-04
申请号：US18413637
申请日：2024-01-16
Applicant: FEI Company
Inventor： Alexander Henstra , Yuchen Deng , Holger Kohr
Abstract: Methods for using a single electron microscope system for investigating a sample with twin electron beams having different focal lengths include the steps of emitting electrons toward the sample, forming the electrons into a two beams, and then modifying the focal properties of at least one of the two beams such that they have different focal planes. Once the two beams have different focal planes, the first electron beam is focused at the sample, and the second electron beam is focused so that it acts as a TEM beam that is parallel beam when incident on the sample. Emissions resultant from the first electron beam and the TEM beam being incident on the sample can then be detected by a single detector or detector array and used to generate a TEM image.
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公开(公告)号：US20240249905A1
公开(公告)日：2024-07-25
申请号：US18409499
申请日：2024-01-10
Applicant: FEI Company
Inventor： Alexander Henstra , Ali Mohammadi-Gheidari
CPC classification number: H01J37/04 , H01J37/261
Abstract: Charged particle optical devices, systems, and methods are provided. A charged particle optical device can include a dispersing element disposed substantially on a beam axis, the dispersing element being configured to disperse particles of a beam of charged particles by energy in a dispersal plane parallel with the beam axis. The charged particle optical device can include a selector, disposed on the beam axis at a position substantially corresponding to a first crossover plane. The charged particle optical device can include an undispersing element. The charged particle optical device can include a cutoff disposed on the beam axis downstream of the selector at a position substantially corresponding to a second crossover plane on the beam axis. The second crossover plane can be downstream of the first crossover plane. The cutoff can include a material that is opaque to electrons and defining an aperture substantially aligned with the beam axis.
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公开(公告)号：US11456149B2
公开(公告)日：2022-09-27
申请号：US16835218
申请日：2020-03-30
Applicant: FEI Company
Inventor： Bart Buijsse , Alexander Henstra , Yuchen Deng
Abstract: Diffraction patterns of a sample at various tilt angles are acquired by irradiating a region of interest using a first charged particle beam. Sample images are acquired by irradiating the region of interest using a second charged particle beam. The first and second charged particle beams are formed by splitting charged particles generated by a charged particle source.
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公开(公告)号：US20200373115A1
公开(公告)日：2020-11-26
申请号：US16421192
申请日：2019-05-23
Applicant: FEI Company
Inventor： Ali Mohammadi-Gheidari , Alexander Henstra
Abstract: Variable multi-beam charged particle devices for inspection of a sample include a multi-beam source that produces a plurality of charged particle beamlets, an objective lens, a sample holder for holding the sample between the objective lens and the multi-beam source, and a focusing column that directs the plurality of charged particle beamlets so that they are incident upon the sample. The focusing column directs the plurality of charged beams such that there are one or more crossovers of the plurality of charged particle beamlets, where each crossover corresponds to a point where the plurality of charged particle beamlets pass through a common location. The variable multi-beam charged particle devices also include a variable aperture that is configured to vary the current of the plurality of charged particle beamlets, and which is located at a final crossover of the one or more crossovers that is most proximate to the sample.
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公开(公告)号：US20190180973A1
公开(公告)日：2019-06-13
申请号：US16210531
申请日：2018-12-05
Applicant: FEI Company
Inventor： Alexander Henstra
CPC classification number: H01J37/10 , H01J37/05 , H01J37/147 , H01J37/21 , H01J37/226 , H01J37/263 , H01J37/265 , H01J49/063 , H01J49/44 , H01J2237/057 , H01J2237/1534 , H01J2237/24485 , H01J2237/2802
Abstract: A method of using a Transmission Charged Particle Microscope comprising:A specimen holder, for holding a specimen;A source, for producing a beam of charged particles;An illuminator, for directing said beam so as to irradiate the specimen;An imaging system, for receiving a flux of charged particles transmitted through the specimen and directing it onto a sensing device;A controller, for controlling at least some operational aspects of the microscope, in which method the sensing device is chosen to be an EELS/EFTEM module comprising:An entrance plane;An image plane, where in EELS mode an EELS spectrum is formed and in EFTEM mode an EFTEM image is formed;A slit plane between said entrance plane and image plane, where in EFTEM mode an energy dispersed focus is formed;A dispersing device, between said entrance plane and slit plane, for dispersing an incoming beam into an energy-dispersed beam with an associated dispersion direction;A first series of quadrupoles between said dispersing device and slit plane;A second series of quadrupoles between said slit plane and image plane, which dispersing device and quadrupoles are arranged along an optical axis, whereby, for a Cartesian coordinate system (X,Y,Z) in which said optical axis is disposed along Z, said dispersion direction is defined as being parallel to X,comprising the following steps:In said first quadrupole series, exciting one or more quadrupoles so as to deflect an off-axis non-dispersive YZ ray leaving said dispersing device onto a path paraxial to said optical axis from said slit plane to said image plane;In said second quadrupole series, exciting either: (a) A single quadrupole; or (b) A pair of adjacent quadrupoles, so as to focus said energy-dispersed beam onto said image plane.
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Patent Agency Ranking
公开(公告)号：US20170125210A1
公开(公告)日：2017-05-04
申请号：US15230667
申请日：2016-08-08
Applicant: FEI Company
Inventor： Alexander Henstra , Peter Christiaan Tiemeijer
CPC classification number: H01J37/28 , H01J37/05 , H01J37/14 , H01J37/22 , H01J37/263 , H01J2237/057 , H01J2237/1534 , H01J2237/2802
Abstract: The invention relates to a post-column filter (a PCF) for a (Scanning) Transmission Electron Microscope (a (S)TEM). Traditionally these filters use excitations of the optical elements before the slit plane that are identical in both the EFTEM and the EELS mode. Although this eases the task for the person skilled in the art of developing and tuning a PCF, as it reduces the number of degrees of freedom to a manageable amount. Inventors found ways to determine settings of the optical elements before the slit plane for EELS mode that are different from the EFTEM mode and where the performance of the PCF in EELS mode is improved (especially the relative energy range that can be imaged) without degrading the performance of the PCF in EFTEM mode.
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公开(公告)号：US20250112019A1
公开(公告)日：2025-04-03
申请号：US18478972
申请日：2023-09-29
Applicant: FEI Company
Inventor： Alexander Henstra , Galen Gledhill , Ali Gheidari
IPC: H01J37/153 , H01J37/28
Abstract: Multipole elements and charged particle microscope systems including the same. In an example, an apparatus can include plurality of electrodes including a first shape subset and a second shape subset. Each electrode of the first shape subset includes an electrode active surface with a shape that is different than that of each electrode of the second shape subset. In another example, an apparatus can include a plurality of electrodes including a first side subset and a second side subset. Each electrode includes an electrode extension extending along a first lateral direction or a second lateral direction. In another example, an apparatus can include an optical column with a plurality of multipole elements that are fully contained within a first angular envelope that subtends a first angle that is at most 50 degrees while the working distance is at most 10 mm.
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公开(公告)号：US12100585B2
公开(公告)日：2024-09-24
申请号：US17363641
申请日：2021-06-30
Applicant: FEI Company
Inventor： Arthur Reinout Hartong , Alexander Henstra , Sorin Lazar , Peter Christiaan Tiemeijer
CPC classification number: H01J49/46 , H01J37/26 , H01J2237/24485
Abstract: An energy spectrometer with dynamic focus for a transmission electron microscope (TEM) is disclosed herein. An example energy spectrometer and TEM at least includes a charged particle column including a projection system arranged after a sample plane, the projection system is operated in a first configuration; an energy spectrometer coupled to the charged particle column to acquire one or more energy loss spectra. The energy spectrometer including a dispersive element, a bias tube, optics for magnifying the energy loss spectrum and for correcting aberrations, and a detector arranged conjugate to a spectrum plane of the energy spectrometer, wherein the energy spectrometer further includes an optical element electrically biased to refocus at least a portion of a spectrum onto the detector, and wherein the value of the electrical bias is at least partially based on the first configuration of the charged particle column.
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公开(公告)号：US20240272100A1
公开(公告)日：2024-08-15
申请号：US18413637
申请日：2024-01-16
Applicant: FEI Company
Inventor： Alexander Henstra , Yuchen Deng , Holger Kohr
IPC: G01N23/207 , G03H5/00 , H01J37/04 , H01J37/26
CPC classification number: G01N23/207 , G01N33/39 , G03H5/00 , H01J37/04 , H01J37/26 , G01N2223/0566 , G01N2223/064 , G03H2224/04 , H01J2237/2614
Abstract: Methods for using a single electron microscope system for investigating a sample with twin electron beams having different focal lengths include the steps of emitting electrons toward the sample, forming the electrons into a two beams, and then modifying the focal properties of at least one of the two beams such that they have different focal planes. Once the two beams have different focal planes, the first electron beam is focused at the sample, and the second electron beam is focused so that it acts as a TEM beam that is parallel beam when incident on the sample. Emissions resultant from the first electron beam and the TEM beam being incident on the sample can then be detected by a single detector or detector array and used to generate a TEM image.
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公开(公告)号：US11906450B2
公开(公告)日：2024-02-20
申请号：US17900863
申请日：2022-08-31
Applicant: FEI Company
Inventor： Alexander Henstra , Yuchen Deng , Holger Kohr
CPC classification number: G01N23/207 , G01N33/385 , G03H5/00 , H01J37/04 , H01J37/26 , G01N2223/0566 , G01N2223/064 , G03H2224/04 , H01J2237/2614
Abstract: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.
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