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    MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
    1.
    发明申请
    MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS 有权

    公开(公告)号：US20220359156A1

    公开(公告)日：2022-11-10

    申请号：US17812815

    申请日：2022-07-15

    Applicant: NuFlare Technology, Inc.

    Inventor： Tsubasa NANAO ,  Osamu IIZUKA

    IPC: H01J37/304 ,  H01J37/317 ,  H01J37/147 ,  G03F7/20

    Abstract: The mark position is measured with a multi-beam with high accuracy. A multi charged particle beam writing method includes forming a multi-beam (30a-30e) in which charged particle beams are arranged with a predetermined pitch, irradiating a mark (M) with beams in an on-beam region while shifting irradiation positions of the charged particle beams by sequentially changing the on-beam region in which beams in a partial region of the multi-beam (30a-30e) are set to ON, the mark (M) being provided at a predetermined position and having a width greater than the predetermined pitch, detecting a reflected charged particle signal from the mark (M), and calculating a position of the mark (M), and adjusting the irradiation positions of the multi-beam based on the calculated position of the mark (M), and writing a pattern.

    ROTATION ANGLE MEASURING METHOD OF MULTI-CHARGED PARTICLE BEAM IMAGE, ROTATION ANGLE ADJUSTMENT METHOD OF MULTI-CHARGED PARTICLE BEAM IMAGE, AND MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS
    2.
    发明申请
    ROTATION ANGLE MEASURING METHOD OF MULTI-CHARGED PARTICLE BEAM IMAGE, ROTATION ANGLE ADJUSTMENT METHOD OF MULTI-CHARGED PARTICLE BEAM IMAGE, AND MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS 有权
    多重粒子束图像的旋转角度测量方法，多重粒子束图像的旋转角度调整方法和多重粒子束波束写入装置

    公开(公告)号：US20160211111A1

    公开(公告)日：2016-07-21

    申请号：US14969069

    申请日：2015-12-15

    Applicant: NuFlare Technology, Inc.

    Inventor： Osamu IIZUKA ,  Kenji OHTOSHI

    IPC: H01J37/22 ,  H01J37/317

    CPC classification number: H01J37/3177 ,  H01J37/3045 ,  H01J2237/221

    Abstract: According to one aspect of the present invention, a rotation angle measuring method of a multi-charged particle beam image includes two-dimensionally scanning a mark arranged on a stage in a multi-charged particle beam writing apparatus using, among multi-charged particle beams that can be used for exposure, a plurality of representative beams of which number is smaller than the number of beams constituting the multi-charged particle beams, creating a two-dimensional image of the plurality of representative beams based on signals obtained by two-dimensional scanning, and acquiring a rotation angle of the multi-charged particle beam image using the two-dimensional image.

    Abstract translation: 根据本发明的一个方面，一种多电荷粒子束图像的旋转角度测量方法包括：使用多带电粒子束中的多带电粒子束书写装置，在二阶段扫描设置在舞台上的标记 其可以用于曝光，多个代表性的光束数量小于构成多电荷粒子束的光束的数量，基于通过二维获得的信号产生多个代表性光束的二维图像 使用二维图像扫描并获取多电荷粒子束图像的旋转角度。

    CHARGED-PARTICLE BEAM DRAWING METHOD, COMPUTER-READABLE RECORDING MEDIA, AND CHARGED-PARTICLE BEAM DRAWING APPARATUS
    3.
    发明申请
    CHARGED-PARTICLE BEAM DRAWING METHOD, COMPUTER-READABLE RECORDING MEDIA, AND CHARGED-PARTICLE BEAM DRAWING APPARATUS 有权
    充电颗粒光束绘图方法，计算机可读记录介质和充电颗粒光束绘图设备

    公开(公告)号：US20130177855A1

    公开(公告)日：2013-07-11

    申请号：US13737707

    申请日：2013-01-09

    Applicant: NuFlare Technology, Inc.

    Inventor： Sumito NAKADA ,  Osamu IIZUKA ,  Hikaru YAMAMURA

    IPC: G21K5/10

    CPC classification number: G21K5/10 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/30455 ,  H01J2237/31761 ,  H01J2237/31776 ,  H01J2237/31796

    Abstract: A charged-particle beam drawing method includes: storing a plurality of time interval patterns defining time intervals for performing a diagnosis of a drift amount of charged-particle beam; drawing a predetermined drawing pattern on a sample by irradiating the beam on the sample; receiving first event information including occurrence of event and type of event; acquiring region information specifying a region being drawn by the beam; selecting a specific time interval pattern from the plurality of time interval patterns based on the type of the event of the first event information and the region information; diagnosing the drift amount of the beam based on the specific time interval pattern, until second event information is received, the second event information includes occurrence of event and type of event; and drawing a predetermined drawing pattern on the sample while performing a drift correction of the charged-particle beam, based on the diagnosing.

    Abstract translation: 带电粒子束描绘方法包括：存储多个时间间隔图案，其限定用于执行带电粒子束漂移量的诊断的时间间隔; 通过将光束照射在样品上，在样品上绘制预定的图形; 接收包括事件发生和事件类型的第一事件信息; 获取指定由所述光束绘制的区域的区域信息; 基于所述第一事件信息和所述区域信息的事件的类型，从所述多个时间间隔模式中选择特定时间间隔模式; 基于所述特定时间间隔模式来诊断所述波束的漂移量，直到接收到第二事件信息，所述第二事件信息包括事件的发生和事件的类型; 并且基于诊断，在进行带电粒子束的漂移校正的同时，在样本上绘制预定的绘图图案。

    MULTI-CHARGED-PARTICLE-BEAM WRITING APPARATUS AND BEAM EVALUATING METHOD FOR THE SAME
    4.
    发明申请
    MULTI-CHARGED-PARTICLE-BEAM WRITING APPARATUS AND BEAM EVALUATING METHOD FOR THE SAME 审中-公开

    公开(公告)号：US20190385812A1

    公开(公告)日：2019-12-19

    申请号：US16431906

    申请日：2019-06-05

    Applicant: NuFlare Technology, Inc.

    Inventor： Eita FUJISAKI ,  Osamu IIZUKA

    IPC: H01J37/317 ,  H01J37/304 ,  H01J37/30

    Abstract: In one embodiment, a multi-charged-particle-beam writing apparatus includes a shaping aperture array plate including a plurality of first apertures through which a charged particle beam passes to form multiple beams, a movable stage on which a writing target substrate is placed, an inspection aperture plate disposed on the stage, the inspection aperture plate including a second aperture through which one of the multiple beams passes, a current detector detecting a current of the beam that has passed through the second aperture of the inspection aperture plate, a deflector deflecting the multiple beams, the deflector controlling deflection of one of the multiple beams such that the one beam is located at a predetermined position in a region including the second aperture and a surrounding region of the second aperture, and a calculator obtaining a beam position based on the beam current detected by the current detector.

    APERTURE ARRAY ALIGNMENT METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
    6.
    发明申请
    APERTURE ARRAY ALIGNMENT METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS 审中-公开

    公开(公告)号：US20190214218A1

    公开(公告)日：2019-07-11

    申请号：US16236668

    申请日：2018-12-31

    Applicant: NuFlare Technology, Inc.

    Inventor： Osamu IIZUKA

    IPC: H01J37/04 ,  H01J37/317 ,  H01J37/20

    CPC classification number: H01J37/045 ,  H01J37/20 ,  H01J37/3177 ,  H01J2237/024 ,  H01J2237/0435

    Abstract: An aperture array alignment method according to the present embodiment includes switching on and off of each of multiple beams using a blanking aperture array plate, and detecting beam current on a stage using a detector. At least one of the multiple beams is turned on to scan the blanking aperture array plate, and a current map is generated on the basis of a result of detection of the beam current made by the detector and a position of the blanking aperture array plate. An on-beam is switched from one to another to generate the current map for each of the on-beams. The position of the blanking aperture array plate is adjusted on the basis of the current maps for the on-beams.

    METHOD OF MEASURING BEAM POSITION OF MULTI CHARGED PARTICLE BEAM, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
    8.
    发明申请
    METHOD OF MEASURING BEAM POSITION OF MULTI CHARGED PARTICLE BEAM, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS 有权
    测量多束粒子束的光束位置的方法和多重粒子束波束写入装置

    公开(公告)号：US20160086764A1

    公开(公告)日：2016-03-24

    申请号：US14823015

    申请日：2015-08-11

    Applicant: NuFlare Technology, Inc.

    Inventor： Osamu IIZUKA ,  Kenji OHTOSHI

    IPC: H01J37/147 ,  H01J37/20 ,  H01J37/317

    CPC classification number: H01J37/3177 ,  H01J37/3045 ,  H01J2237/30438 ,  H01J2237/3045

    Abstract: A method of measuring beam positions of multi charged particle beams includes acquiring the number of beams of multi charged particle beams, needed for the measurement reproducibility of a current amount to be within the range of an allowable value, setting a plurality of measurement points depending on a desired dimensional accuracy value, in an irradiation region irradiated by the whole of the multi charged particle beams, setting, for each of a plurality of measurement points, a beam region, including a measurement point of a plurality of measurement points, irradiated by a plurality of beams whose number is the number of beams needed for the measurement reproducibility in the multi charged particle beams, and measuring, for each of a plurality of measurement points, the position of a measurement point concerned in a plurality of measurement points by using a plurality of beams of a corresponding beam region.

    Abstract translation: 一种测量多带电粒子束的光束位置的方法包括获取当前量的测量再现性在允许值范围内所需的多带电粒子束的数量，设定多个测量点取决于 在由整个多带电粒子束照射的照射区域中的期望的尺寸精度值，对于多个测量点中的每一个，设置包括多个测量点的测量点的光束区域， 多个光束，其数量是多带电粒子束中的测量重现性所需的光束数，并且通过使用多个测量点中的多个测量点中的每个测量点的位置来测量多个测量点中的测量点的位置 多个光束对应的光束区域。

    MULTI CHARGED-PARTICLE BEAM WRITING APPARATUS AND ADJUSTMENT METHOD FOR THE SAME
    10.
    发明申请
    MULTI CHARGED-PARTICLE BEAM WRITING APPARATUS AND ADJUSTMENT METHOD FOR THE SAME 审中-公开

    公开(公告)号：US20170358425A1

    公开(公告)日：2017-12-14

    申请号：US15616462

    申请日：2017-06-07

    Applicant: NuFlare Technology, Inc.

    Inventor： Osamu IIZUKA

    IPC: H01J37/30 ,  H01J37/317 ,  H01J37/04 ,  H01J37/244 ,  H01J37/147

    CPC classification number: H01J37/3005 ,  H01J37/045 ,  H01J37/1474 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/24542 ,  H01J2237/31776

    Abstract: In one embodiment, a multi charged-particle beam writing apparatus includes a plurality of blankers switching between ON and OFF state of a corresponding beam among multiple beams, a main deflector deflecting beams having been subjected to blanking deflection to a writing position of the beams in accordance with movement of a stage, a detector scanning a mark on the stage with each of the beams having been deflected by the main deflector and detecting a beam position from a change in intensity of reflected charged particles and a position of the stage, and a beam shape calculator switching an ON beam, scanning the mark with the ON beam, and calculating a shape of the multiple beams from a beam position. A shape of a deflection field of the main deflector is corrected by using a polynomial representing an amount of beam position shift that is dependent on a beam deflection position of the main deflector and then the mark is scanned with the ON beam. The polynomial is different for each ON beam.

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