公开(公告)号：US20180040456A1

公开(公告)日：2018-02-08

申请号：US15662495

申请日：2017-07-28

Applicant: NuFlare Technology, Inc.

Inventor： Yukitaka SHIMIZU

IPC: H01J37/305 ,  H01J37/04 ,  G01N21/95 ,  H01L21/027 ,  G01N21/21 ,  G01N21/956 ,  G03F7/20 ,  H01J37/22

CPC classification number: H01J37/305 ,  G01N21/21 ,  G01N21/9501 ,  G01N21/956 ,  G03F7/20 ,  G03F7/70091 ,  G03F7/70258 ,  H01J37/04 ,  H01J37/22 ,  H01L21/027

Abstract: In one embodiment, a method for measuring a resolution of a charged particle beam includes changing a focus position of the charged particle beam in a height direction, and scanning a dot mark formed on a substrate with the charged particle beam for each focus position, detecting a reflected charged particle reflected from the dot mark for each focus position, calculating a scattered charged particle distribution from a detection result of the reflected charged particle for each height corresponding to the focus position, performing a convolution operation on an approximate expression of a beam waveform of the charged particle beam and a mark shape of the dot mark, the approximate expression including an aperture angle and a resolution of the charged particle beam as parameters, and calculating the aperture angle and the resolution by fitting the scattered charged particle distribution by height and a calculation result of the convolution operation.

公开(公告)号：US20180138013A1

公开(公告)日：2018-05-17

申请号：US15806576

申请日：2017-11-08

Applicant: NuFlare Technology, Inc.

Inventor： Osamu IIZUKA ,  Yukitaka SHIMIZU

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/20 ,  H01J37/147 ,  H01J37/244 ,  H01J37/302

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/147 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3023 ,  H01J37/304 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/24542 ,  H01J2237/24564 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/3045 ,  H01J2237/31774 ,  H01J2237/31798

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes an aperture plate forming multiple beams, a stage on which a writing target substrate is placed, a stage position detector detecting the position of the stage, an inspection aperture plate provided in the stage, the inspection aperture plate permitting one of the multiple beams to pass through the inspection aperture plate, a deflector deflecting the multiple beams, a current detector detecting a beam current of each of the multiple beams scanned over the inspection aperture plate in X and Y directions and passed through the inspection aperture plate, and a control computer generating a beam image based on the detected beam currents and calculating positions of the beams based on the beam image and the position of the stage.

公开(公告)号：US20180144905A1

公开(公告)日：2018-05-24

申请号：US15806872

申请日：2017-11-08

Applicant: NuFlare Technology, Inc.

Inventor： Osamu IIZUKA ,  Yukitaka SHIMIZU

IPC: H01J37/302 ,  H01J37/317 ,  H01J37/04 ,  H01J37/20 ,  H01J37/10 ,  H01J37/153 ,  H01J37/147 ,  H01J37/244

CPC classification number: H01J37/302 ,  H01J37/045 ,  H01J37/10 ,  H01J37/147 ,  H01J37/153 ,  H01J37/20 ,  H01J37/244 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/1532 ,  H01J2237/20221 ,  H01J2237/21 ,  H01J2237/24514 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/31774 ,  H01J2237/31798

Abstract: According to one embodiment, a multi charged particle beam writing apparatus includes an objective lens adjusting a focus position of multiple beams, a coil correcting astigmatism of the multiple beams, an inspection aperture disposed in a stage and configured to allow one beam of the multiple beams to pass therethrough, a deflector deflecting the multiple beams, a current detector detecting a beam current of each beam of the multiple beams scanned over the inspection aperture in the XY direction and passed through the inspection aperture, and a controller generating a beam image on the basis of the detected beam current, calculating a feature quantity of the beam image, and controlling the objective lens or the coil on the basis of the feature quantity.

公开(公告)号：US20180138012A1

公开(公告)日：2018-05-17

申请号：US15806564

申请日：2017-11-08

Applicant: NuFlare Technology, Inc.

Inventor： Osamu IIZUKA ,  Yukitaka SHIMIZU

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/20 ,  H01J37/147 ,  H01J37/244 ,  H01J37/302

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/147 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3023 ,  H01J37/304 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/24535 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/31774 ,  H01J2237/31798

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes an aperture plate having a plurality of holes to form multiple beams, a blanking aperture array having a plurality of blankers which switch ON-OFF of corresponding respective beams among the multiple beams, a stage on which a writing target substrate is placed, an inspection aperture provided on the stage and that allows one beam among the multiple beams to pass therethrough, a deflector deflecting the multiple beams, a current detector detecting a beam current of each of the multiple beams that has passed through the inspection aperture in a case where the multiple beams are scanned on the inspection aperture, and a control computing machine that generates a beam image based on the detected beam current and detects a defect of the blanking aperture array or the aperture plate based on the beam image.