公开(公告)号：US20130177855A1

公开(公告)日：2013-07-11

申请号：US13737707

申请日：2013-01-09

Applicant: NuFlare Technology, Inc.

Inventor： Sumito NAKADA ,  Osamu IIZUKA ,  Hikaru YAMAMURA

IPC: G21K5/10

CPC classification number: G21K5/10 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/30455 ,  H01J2237/31761 ,  H01J2237/31776 ,  H01J2237/31796

Abstract: A charged-particle beam drawing method includes: storing a plurality of time interval patterns defining time intervals for performing a diagnosis of a drift amount of charged-particle beam; drawing a predetermined drawing pattern on a sample by irradiating the beam on the sample; receiving first event information including occurrence of event and type of event; acquiring region information specifying a region being drawn by the beam; selecting a specific time interval pattern from the plurality of time interval patterns based on the type of the event of the first event information and the region information; diagnosing the drift amount of the beam based on the specific time interval pattern, until second event information is received, the second event information includes occurrence of event and type of event; and drawing a predetermined drawing pattern on the sample while performing a drift correction of the charged-particle beam, based on the diagnosing.

Abstract translation: 带电粒子束描绘方法包括：存储多个时间间隔图案，其限定用于执行带电粒子束漂移量的诊断的时间间隔; 通过将光束照射在样品上，在样品上绘制预定的图形; 接收包括事件发生和事件类型的第一事件信息; 获取指定由所述光束绘制的区域的区域信息; 基于所述第一事件信息和所述区域信息的事件的类型，从所述多个时间间隔模式中选择特定时间间隔模式; 基于所述特定时间间隔模式来诊断所述波束的漂移量，直到接收到第二事件信息，所述第二事件信息包括事件的发生和事件的类型; 并且基于诊断，在进行带电粒子束的漂移校正的同时，在样本上绘制预定的绘图图案。

公开(公告)号：US20200264588A1

公开(公告)日：2020-08-20

申请号：US16788359

申请日：2020-02-12

Applicant: NuFlare Technology, Inc.

Inventor： Hikaru YAMAMURA

IPC: G05B19/418 ,  G01R27/18 ,  G03F9/00

Abstract: A drawing apparatus according to the embodiment includes a chamber configured to house a processing target; a drawing part configured to draw a predetermined pattern on the processing target with a charged particle beam; a resistance measuring part configured to measure a resistance value of the processing target via a grounding member grounding the processing target in the chamber; a receiver configured to receive earthquake information; a controller configured to stop a drawing process in the chamber when the receiver receives the earthquake information; and an arithmetic processor configured to determine whether the processing target is grounded on a basis of the resistance value from the resistance measuring part, wherein the controller resumes the drawing process when the arithmetic processor determines that the processing target is grounded after the drawing process is stopped.