公开(公告)号：US11791130B2

公开(公告)日：2023-10-17

申请号：US17299153

申请日：2019-01-23

Applicant: Hitachi High-Tech Corporation

Inventor： Koichi Hamada ,  Megumi Kimura ,  Momoyo Enyama ,  Ryou Yumiba ,  Makoto Sakakibara ,  Kei Sakai ,  Satoru Yamaguchi ,  Katsumi Setoguchi ,  Masumi Shirai ,  Yasunori Takasugi

IPC: H01J37/28 ,  H01J37/153 ,  H01J37/22

CPC classification number: H01J37/28 ,  H01J37/153 ,  H01J37/222 ,  H01J2237/2817

Abstract: The objective of the present invention is to reduce differences between individual electron beam observation devices accurately by means of image correction. This method for calculating a correction factor for correcting images between a plurality of electron beam observation devices, in electron beam observation devices which generate images by scanning an electron beam across a specimen, is characterized by including: a step in which a first electron beam observation device generates a first image by scanning a first electron beam across first and second patterns, on either a specimen including the first pattern and the second pattern, having a different shape or size to the first pattern, or a first specimen including the first pattern and a second specimen including the second pattern; a step in which a second electron beam observation device generates a second image by scanning a second electron beam across the first and second patterns; and a step in which the first or second electron beam observation device calculates a correction factor at a peak frequency extracted selectively from first and second frequency characteristics calculated on the basis of the first and second images.

公开(公告)号：US11170969B2

公开(公告)日：2021-11-09

申请号：US16617319

申请日：2018-03-30

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Koichi Hamada ,  Megumi Kimura ,  Momoyo Enyama ,  Ryou Yumiba ,  Makoto Sakakibara ,  Kei Sakai ,  Satoru Yamaguchi ,  Katsumi Setoguchi

IPC: H01J37/22 ,  H01J37/10 ,  H01J37/153 ,  H01J37/28

Abstract: Provided is an electron beam observation device that includes: an electron source; an objective lens concentrating an electron beam emitted from the electron source; and a control unit configured to perform control such that a plurality of images is generated by capturing images of a reference sample having a specific pattern, and a frequency characteristic is calculated for each of the plurality of images, in which an image is generated based on a secondary signal generated from a sample due to irradiation of the sample with the electron beam, and the control unit holds the plurality of frequency characteristics.

公开(公告)号：US11011346B2

公开(公告)日：2021-05-18

申请号：US16810246

申请日：2020-03-05

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Koichi Hamada ,  Kei Sakai ,  Satoru Yamaguchi

IPC: H04N5/349 ,  H01J37/22 ,  H01J37/28 ,  H04N7/18

Abstract: To acquire a correction image by performing a sub-pixel shift process for shifting an image using a pixel interpolation filter by a pixel shift amount between pixels and a frequency correction process for correcting a frequency characteristic of the image after shifted.