公开(公告)号：US20190193192A1

公开(公告)日：2019-06-27

申请号：US16195970

申请日：2018-11-20

Applicant: Arcam AB

Inventor： Mattias Fager ,  Johan Backlund

IPC: B23K15/00 ,  H01J37/147 ,  H01J37/063 ,  H01J37/18 ,  H01J37/09 ,  H01J37/10 ,  B33Y10/00 ,  B33Y30/00

CPC classification number: B23K15/0086 ,  B22F3/1055 ,  B22F2003/1056 ,  B22F2003/1057 ,  B23K15/002 ,  B23K15/0026 ,  B23K15/0046 ,  B23K15/06 ,  B29C64/153 ,  B29C64/268 ,  B29C64/393 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  H01J37/063 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/18 ,  H01J37/301 ,  H01J37/3045 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/3128 ,  H01J2237/316

Abstract: An electron beam source comprising a cathode, an anode, a means for deflecting an electron beam over a target surface and at least one vacuum pump, the electron beam source further comprising a contraction area arranged between the anode and the means for deflecting the electron beam where a hole in the contraction area is aligned with a hole in the anode with respect to the cathode, a first vacuum pump is arranged between the contraction area and the anode and a second vacuum pump is arranged above the anode, a gas inlet is provided between the contraction area and the means for deflecting the electron beam, wherein a first crossover of the electron beam is arranged between the cathode and the anode and a second crossover is arranged at or in close proximity to the contraction area.

公开(公告)号：US20190088440A1

公开(公告)日：2019-03-21

申请号：US16196081

申请日：2018-11-20

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Zeidler ,  Thomas Kemen ,  Christof Riedesel ,  Ralf Lenke

IPC: H01J37/10 ,  H01J37/28 ,  H01J37/12 ,  H01J37/26 ,  H01J37/24 ,  H01J37/09

CPC classification number: H01J37/10 ,  H01J37/09 ,  H01J37/12 ,  H01J37/24 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1202

Abstract: Particle beam system comprising a particle source; a first multi-aperture plate with a multiplicity of openings downstream of which particle beams are formed; a second multi-aperture plate with a multiplicity of openings which are penetrated by the particle beams; an aperture plate with an opening which is penetrated by all the particles which also penetrate the openings in the first and the second multi-aperture plate; a third multi-aperture plate with a multiplicity of openings which are penetrated by the particle beams, and with a multiplicity of field generators which respectively provide a dipole field or quadrupole field for a beam; and a controller for feeding electric potentials to the multi-aperture plates and the aperture plate so that the second openings in the second multi-aperture plate respectively act as a lens on the particle beams 3 and feed adjustable excitations to the field generators.

公开(公告)号：US20190043693A1

公开(公告)日：2019-02-07

申请号：US16052823

申请日：2018-08-02

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi MATSUMOTO

IPC: H01J37/304 ,  H01J37/09 ,  H01J37/317

CPC classification number: H01J37/304 ,  H01J37/09 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/24514 ,  H01J2237/30461 ,  H01J2237/31761 ,  H01J2237/31774

Abstract: A multiple charged particle beam writing apparatus includes a distribution coefficient calculation circuitry to calculate, using defective beam information based on which a defective beam can be identified, for each design grid in a plurality of design grids being irradiation positions in design of multiple charged particle beams, a distribution coefficient for each of three or more beams, for distributing a dose to irradiate a design grid concerned in the plurality of design grids to the three or more beams, excluding the defective beam, whose actual irradiation positions are close to or approximately coincident with the design grid concerned, such that the position of the gravity center of each distributed dose coincides with the position of the design grid concerned and the sum of each distributed dose after distribution coincides with the dose to irradiate the design grid concerned.

公开(公告)号：US20180330913A1

公开(公告)日：2018-11-15

申请号：US15966372

申请日：2018-04-30

Applicant: JEOL Ltd.

Inventor： Shogo Kataoka ,  Akio Isono

IPC: H01J37/20 ,  H01J37/09

CPC classification number: H01J37/20 ,  H01J37/09 ,  H01J37/3053 ,  H01J2237/20214 ,  H01J2237/3151

Abstract: A sample holder unit includes a sample holding portion, a shielding plate, and a rotating mechanism. The rotating mechanism supports the sample and the shielding plate and allows the sample and the shielding plate to rotate. The rotating mechanism is oriented such that an axis of rotation thereof is parallel to both a processing surface of the sample and a direction orthogonal to a direction of projection of the sample from the shielding plate. A center of rotation of the rotating mechanism resides on the processing surface of the sample.

公开(公告)号：US20180277334A1

公开(公告)日：2018-09-27

申请号：US15985763

申请日：2018-05-22

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Alexander Hendrik Vincent VAN VEEN ,  Willem Henk URBANUS ,  Marco Jan-Jaco WIELAND

IPC: H01J37/153 ,  H01J37/12 ,  H01J37/09

CPC classification number: H01J37/153 ,  H01J37/023 ,  H01J37/065 ,  H01J37/09 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/0213 ,  H01J2237/0264 ,  H01J2237/0453 ,  H01J2237/1207 ,  H01J2237/1534 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/31774 ,  H01J2237/31793

Abstract: A lens element of a charged particle system comprises an electrode having a central opening. The lens element is configured for functionally cooperating with an aperture array that is located directly adjacent said electrode, wherein the aperture array is configured for blocking part of a charged particle beam passing through the central opening of said electrode. The electrode is configured to operate at a first electric potential and the aperture array is configured to operate at a second electric potential different from the first electric potential. The electrode and the aperture array together form an aberration correcting lens.

公开(公告)号：US20180261422A1

公开(公告)日：2018-09-13

申请号：US15914498

申请日：2018-03-07

Applicant: JEOL Ltd.

Inventor： Tatsuru Kuramoto ,  Yuichiro Ohori ,  Yoshinori Matsuda ,  Makoto Aoshima

IPC: H01J37/09 ,  H01J37/28 ,  H01J37/244 ,  H01J37/14 ,  H01J37/30

CPC classification number: H01J37/09 ,  H01J37/023 ,  H01J37/14 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/3056 ,  H01J2237/024 ,  H01J2237/0262 ,  H01J2237/14 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2804 ,  H01J2237/2806

Abstract: A scanning electron microscope having a charged particle device that processes a specimen using a charged particle beam, the scanning electron microscope includes: an electron source; a secondary-electron detector that detects secondary electrons generated from the specimen; a backscattered-electron detector that is disposed closer to the electron source than a detection surface of the secondary-electron detector to detect backscattered electrons generated from the specimen; a shielding plate for shielding a detection surface of the backscattered-electron detector; and a moving mechanism that moves the shielding plate. In a state where the shielding plate is moved by the moving mechanism so as to shield the detection surface of the backscattered-electron detector, the shielding plate is located between the detection surface of the backscattered-electron detector and the detection surface of the secondary-electron detector.

公开(公告)号：US09997329B2

公开(公告)日：2018-06-12

申请号：US15361276

申请日：2016-11-25

Applicant: NuFlare Technology, Inc.

Inventor： Rieko Nishimura

IPC: H01J37/22 ,  H01J37/317 ,  H01J37/09

CPC classification number: H01J37/222 ,  H01J37/09 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/30433 ,  H01J2237/30455

Abstract: An evaluation method according to an embodiment is to evaluate a precision of an aperture formed with multiple openings, and includes steps of forming a first evaluation pattern based on evaluation data using multiple electron beams generated by electron beam that has passed through the aperture, dividing the aperture into multiple regions, each of the regions including the multiple openings and defining the multiple divided regions, forming a second evaluation pattern based on evaluation data using the electron beam that has passed through a first divided region among the multiple divided regions, comparing the first evaluation pattern with the second evaluation pattern, and evaluating the precision of the aperture based on the comparison result between the first evaluation pattern and the second evaluation pattern.

公开(公告)号：US09799482B2

公开(公告)日：2017-10-24

申请号：US15067832

申请日：2016-03-11

Applicant: Toshiba Memory Corporation

Inventor： Yuichi Ohsawa ,  Akio Ui ,  Junichi Ito ,  Chikayoshi Kamata ,  Megumi Yakabe ,  Saori Kashiwada

IPC: H01J37/08 ,  H01L43/12 ,  H01J37/30 ,  H01J37/09 ,  H01J37/20 ,  H01J37/305 ,  H01L27/22

CPC classification number: H01J37/08 ,  H01J37/09 ,  H01J37/20 ,  H01J37/30 ,  H01J37/3053 ,  H01J2237/0822 ,  H01J2237/083 ,  H01J2237/3151 ,  H01L27/228 ,  H01L43/12

Abstract: A device manufacturing apparatus and manufacturing method of a magnetic device. The device manufacturing apparatus can include a substrate holding portion configured to hold a substrate, an ion source, an anode disposed in a housing of the ion source, and a cathode disposed outside the housing of the ion source. A first opening can be disposed in a portion of the housing such the anode is exposed to a region between the anode and the substrate holding portion. The ion source can be configured to generate an ion beam with which the substrate is irradiated. A first structure can be disposed between the ion source and the substrate holding portion. The first structure can have a first through hole through which the ion beam can pass. The first structure can include a conductor, and an opening dimension of the first through hole can be equal to or larger than an opening dimension of the first opening.

公开(公告)号：US20170229278A1

公开(公告)日：2017-08-10

申请号：US15017559

申请日：2016-02-05

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Chwen YU ,  Chih-Ming TSAO

IPC: H01J37/09 ,  H01J37/30

CPC classification number: H05K9/00 ,  G12B17/00 ,  G12B17/02 ,  H01J37/09 ,  H01J37/3002 ,  H01J2237/0264 ,  H05K9/0001 ,  H05K9/0003

Abstract: A board includes a first magnetic conductive plate and a second magnetic conductive plate. The first magnetic conductive plate has a first magnetic conductive direction. The second magnetic conductive plate overlaps with the first magnetic conductive plate. The second magnetic conductive plate has a second magnetic conductive direction. The first magnetic conductive direction and the second magnetic conductive direction cross.

公开(公告)号：US20170194065A1

公开(公告)日：2017-07-06

申请号：US15117075

申请日：2014-02-05

Applicant: HITACHI, LTD.

Inventor： Ken HARADA ,  Teruo KOHASHI ,  Tomohiro IWANE

IPC: G21K1/06 ,  G02B5/18

CPC classification number: G21K1/06 ,  G02B5/1842 ,  G02B5/1866 ,  G02B2005/1804 ,  G21K2201/064 ,  G21K2201/067 ,  H01J37/04 ,  H01J37/09 ,  H01J37/26

Abstract: The outer shape and size of a diffraction grating including an edge dislocation is made smaller than the irradiation areas of light waves and electromagnetic waves, by using an opener different from in the diffraction grating, the shape and size of the opening is superposed on the shape of a spiral wave that is generated by an edge dislocation diffraction grating, and the shape and size of the opening are reflected in the shape and size of the spiral wave on the diffractive surface. In addition, not only a diffraction grating system including a pair of a single opener and a single diffraction grating, but also a diffraction grating system in which plural openers and plural edge dislocation diffraction gratings are combined are used, and plural spiral waves can be generated on the diffractive surface with a higher degree of freedom.