THERMAL VIAS DISPOSED IN A SUBSTRATE PROXIMATE TO A WELL THEREOF
    10.
    发明申请
    THERMAL VIAS DISPOSED IN A SUBSTRATE PROXIMATE TO A WELL THEREOF 有权
    在基材中处理的热叶可以很好地替代

    公开(公告)号:US20160284672A1

    公开(公告)日:2016-09-29

    申请号:US15174338

    申请日:2016-06-06

    IPC分类号: H01L25/065 H01L23/367

    摘要: An apparatus relates generally to a three-dimensional stacked integrated circuit. In such an apparatus, the three-dimensional stacked integrated circuit has at least a first die and a second die interconnected to one another using die-to-die interconnects. A substrate of the first die has at least one thermal via structure extending from a lower surface of the substrate toward a well of the substrate without extending to the well and without extending through the substrate. A first end of the at least one thermal via structure is at least sufficiently proximate to the well of the substrate for conduction of heat away therefrom. The substrate has at least one through substrate via structure extending from the lower surface of the substrate to an upper surface of the substrate. A second end of the at least one thermal via structure is coupled to at least one through die via structure of the second die for thermal conductivity.

    摘要翻译: 装置一般涉及三维堆叠集成电路。 在这种装置中,三维堆叠集成电路具有至少第一管芯和第二管芯,使用管芯到管芯互连彼此互连。 第一管芯的衬底具有至少一个热通孔结构,其从衬底的下表面朝向衬底的阱延伸,而不延伸到阱并且不延伸通过衬底。 所述至少一个热通孔结构的第一端至少足够靠近所述衬底的阱,用于将热量传导出来。 衬底具有从衬底的下表面延伸到衬底的上表面的至少一个穿过衬底通孔结构。 所述至少一个热通孔结构的第二端与所述第二管芯的至少一个通孔通孔结构耦合以进行导热。