公开(公告)号：US20240299884A1

公开(公告)日：2024-09-12

申请号：US18604714

申请日：2024-03-14

申请人： Oxford Nanopore Technologies PLC

发明人： Ping Xie ,  Ken Healy ,  Justin Millis

IPC分类号： B01D67/00 ,  B01D69/02 ,  B01D69/06 ,  B01D69/12 ,  B82Y40/00 ,  C12Q1/6869 ,  C25F3/02 ,  C25F3/14 ,  C25F7/00 ,  G01N33/487

CPC分类号： B01D67/0062 ,  B01D69/02 ,  B01D69/06 ,  B01D69/12 ,  B01D69/1214 ,  C12Q1/6869 ,  C25F3/02 ,  C25F3/14 ,  C25F7/00 ,  G01N33/48721 ,  B01D2323/42 ,  B01D2325/021 ,  B01D2325/06 ,  B82Y40/00

摘要： Methods and apparatus for forming apertures in a solid state membrane using dielectric breakdown are provided. In one disclosed arrangement a plurality of apertures are formed. The membrane comprises a first surface area portion on one side of the membrane and a second surface area portion on the other side of the membrane. Each of a plurality of target regions comprises a recess or a fluidic passage opening out into the first or second surface area portion. The method comprises contacting all of the first surface area portion of the membrane with a first bath comprising ionic solution and all of the second surface area portion with a second bath comprising ionic solution. A voltage is applied across the membrane via first and second electrodes in respective contact with the first and second baths comprising ionic solutions to form an aperture at each of a plurality of the target regions in the membrane.

公开(公告)号：US20240272562A1

公开(公告)日：2024-08-15

申请号：US18644211

申请日：2024-04-24

申请人： CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED

发明人： Xiaosong LIU ,  Keqiang LI ,  Zhiyang WU ,  Yi LU

IPC分类号： G03F7/00 ,  B08B3/02 ,  C25F3/14 ,  G03F7/16 ,  H01M4/70

CPC分类号： G03F7/70991 ,  B08B3/02 ,  C25F3/14 ,  G03F7/168 ,  G03F7/7075 ,  B08B2203/02 ,  H01M4/70

摘要： A substrate treatment apparatus, comprising: a coating device configured to coat a substrate, which is conveyed at a first speed in a feeding direction, with a material; a drying device configured to receive the substrate, which is coated by means of the coating device, at the first speed and dry the material; an exposure device configured to receive the substrate, which is dried by means of the drying device, at the first speed and continuously convey a mask at the first speed in the feeding direction, the mask being used for regional shading during exposure of the material by means of the exposure device; and an etching device configured to receive the substrate, which is exposed by means of the exposure device, at the first speed and etch the material and a portion of the substrate in an unexposed region of the substrate.

公开(公告)号：US12060648B2

公开(公告)日：2024-08-13

申请号：US17704042

申请日：2022-03-25

申请人： City University of Hong Kong

发明人： Jian Lu ,  Yang Yang Li ,  Binbin Zhou ,  Junda Shen

IPC分类号： C25F3/14 ,  B23H3/00 ,  B23H3/08 ,  B23H9/00 ,  C23F1/02 ,  C23F4/00 ,  C25D5/00 ,  C25D5/18 ,  G01N21/65

CPC分类号： C25F3/14 ,  B23H3/00 ,  B23H3/08 ,  B23H9/008 ,  C23F1/02 ,  C23F4/00 ,  C25D5/18 ,  C25D5/605 ,  G01N21/658

摘要： A method for microengineering a gradient structure on a metal surface. A metal surface including at least first, second, and third metal surface regions is exposed to a metal-removing agent. A portion of surface metal atoms is removed by the metal-removing agent in each of the first, second, and third metal surface regions. Sequential metal removal processes expose only the second and third regions to the metal-removing agent, followed by exposing only the third region to the metal-removing agent. A gradient metal surface is formed having different properties in each of the first, second, and third metal surface regions. In a further aspect, quantitative surface-enhanced Raman spectroscopy may be performed using the treated metal surface. An amount of an analyte is determined based on its position in one of the first, second, or third metal surface regions.

公开(公告)号：US11964337B2

公开(公告)日：2024-04-23

申请号：US18300408

申请日：2023-04-14

申请人： SHANDONG UNIVERSITY

发明人： Bing Wang ,  Zhanqiang Liu ,  Hong Wang ,  Jinfu Zhao ,  Qinghua Song ,  Yukui Cai

IPC分类号： B23D79/00 ,  C22C19/00 ,  C22F1/10 ,  C25F3/14

CPC分类号： B23D79/00 ,  C22C19/007 ,  C22F1/10 ,  C25F3/14

摘要： The present disclosure relates to a NiTi alloy surface cutting process and a roughness adjustment method. Aiming at defects of difficult machining and unsatisfactory machining performance of Ni—Ti alloys, the present disclosure provides a surface cutting process of a difficult-to-machine nickel-titanium alloy, in which firstly, the nickel-titanium alloy is transformed from a two-phase state to a single-phase state using its transformation characteristic, and electrochemical nickel removal treatment is carried out on a surface of the alloy in the single-phase state so as to obtain a porous surface layer, and then a surface material with the porous surface layer is cut. The method provided by the present disclosure can effectively reduce machining difficulty of alloy materials, and can also obtain alloy workpieces with adjustable roughness, which is of great significance for NiTi alloy machining.

公开(公告)号：US11939694B2

公开(公告)日：2024-03-26

申请号：US17825413

申请日：2022-05-26

申请人： MTU Aero Engines AG

发明人： Christoph Konstant ,  Stefan Mayr

IPC分类号： C25F3/14 ,  F01D25/00

CPC分类号： C25F3/14 ,  F01D25/00 ,  F05D2230/90

摘要： The present invention relates to a method for coating a component of a turbomachine in a bath, in which method, the component is partially immersed in the bath containing a coating material; the component is rotated at least intermittently around an axis of rotation, which lies outside of the bath, during the at least partial immersion; the component is at most immersed partially over and beyond the rotation.

公开(公告)号：US20240019392A1

公开(公告)日：2024-01-18

申请号：US18347411

申请日：2023-07-05

申请人： Sensix (Nanjing) Environmental Technology Co., Ltd.

发明人： Fuxing KANG

IPC分类号： G01N27/30 ,  G01N33/00 ,  G01N27/416 ,  C03B37/025 ,  C25F3/14 ,  C25D3/48 ,  C25D7/06

CPC分类号： G01N27/30 ,  G01N33/0014 ,  G01N27/416 ,  C03B37/0256 ,  C25F3/14 ,  C25D3/48 ,  C25D7/0607

摘要： A microsensor for monitoring phosphine and a preparation method thereof are provided, where the microsensor includes an interfering substance removal module, used to remove other impurity gases and keep a phosphine gas; a phosphine signal measuring module, used for measuring a concentration of the phosphine gas; a guard electrode, used to consume excess phosphine gas in the microsensor; and a power supply module, used for supplying power to the phosphine signal measuring module and the guard electrode; the power supply module is respectively connected with the phosphine signal measuring module and the guard electrode; and the interfering substance removal module is located at a front end of the guard electrode.

公开(公告)号：US20230235477A1

公开(公告)日：2023-07-27

申请号：US18097731

申请日：2023-01-17

申请人： BATTELLE SAVANNAH RIVER ALLIANCE, LLC

发明人： BRENDA L. GARCIA-DIAZ ,  CHRISTOPHER S. DANDENEAU ,  DALE A. HITCHCOCK

IPC分类号： C25F3/14 ,  C06B33/02 ,  C25C3/32 ,  C25C7/00

CPC分类号： C25F3/14 ,  C06B33/02 ,  C25C3/32 ,  C25C7/005

摘要： Methods and systems for use in targeted removal of metals from a substrate via electrorefining are described. A self-propagating reaction is initiated by use of a thermite to reach high temperatures sufficient to induce localized melting of a salt situated on a metal or alloy substrate. Using a power supply connected to an electrode assembly, an electrorefining reaction capable of generating significant localized corrosion of the substrate is produced.

公开(公告)号：US20180242981A1

公开(公告)日：2018-08-30

申请号：US15968223

申请日：2018-05-01

申请人： INCUMEDx, Inc.

发明人： Armando Garza

IPC分类号： A61B17/12 ,  C25F3/14 ,  B23K26/21 ,  C23F1/00 ,  B23K26/362 ,  B23K11/00 ,  B23H3/00 ,  C23F4/00 ,  B23K26/361 ,  A61B17/00

CPC分类号： A61B17/12177 ,  A61B17/12 ,  A61B17/12031 ,  A61B17/12113 ,  A61B17/1214 ,  A61B17/1215 ,  A61B2017/00526 ,  A61B2017/00867 ,  A61B2017/1205 ,  B23H3/00 ,  B23K11/002 ,  B23K26/21 ,  B23K26/361 ,  B23K26/362 ,  C23F1/00 ,  C23F4/00 ,  C25F3/14

摘要： An embolic implant for treating aneurysms or other vascular disorders may include a cover component of unitary construction that is disposed about the exterior of a microcoil such that it does not extend into a lumen formed by the coil. The cover can enhance packing volume and density per unit length of coil, and can prevent blood flow and cause blood clotting while not risking rupture of the vascular disorder. The cover may also provide a platform for the application of multiple treatments and/or therapies including, for example, functionalized and/or bioactive coatings, drug coatings, gene therapy, thrombogenicity control coatings, and surface modifications, while preserving key coil performance attributes.

公开(公告)号：US09982359B2

公开(公告)日：2018-05-29

申请号：US14955791

申请日：2015-12-01

申请人： TOYOTA JIDOSHA KABUSHIKI KAISHA

发明人： Yuki Sato ,  Motoki Hiraoka ,  Hiroshi Yanagimoto

IPC分类号： C25F3/14 ,  C25D5/02 ,  C25D17/00 ,  C25F7/00

CPC分类号： C25F3/14 ,  C25D5/022 ,  C25D17/002 ,  C25F7/00

摘要： A surface treatment method includes: roughening a surface region of a substrate corresponding to a through hole provided to a masking plate by supplying a solvent to a solid electrolyte film from a second surface of a masking plate through the through hole, in a state where: a first surface of the solid electrolyte film is arranged directly on the surface of the substrate; and a first surface of the masking plate is arranged directly on a second surface of the solid electrolyte film, wherein the supplied solvent penetrates the solid electrolyte film, and dissolves the surface of the substrate.

公开(公告)号：US09981851B2

公开(公告)日：2018-05-29

申请号：US14480774

申请日：2014-09-09

申请人： Michael James Darling

发明人： Michael James Darling

IPC分类号： C01B31/04 ,  C25F3/14 ,  B82Y40/00 ,  C25F3/00 ,  B82Y30/00 ,  C25F3/02 ,  C01B32/194

CPC分类号： C01B32/194 ,  B82Y30/00 ,  B82Y40/00 ,  C25F3/00 ,  C25F3/02 ,  C25F3/14

摘要： Disclosed is a method for etching graphene using a DNA sample of a predetermined DNA shape. The DNA sample is preferably placed onto a reaction area of a piece of highly oriented pyrolytic graphite (HOPG), and both the DNA sample and HOPG are then preferably placed into a humidity-controlled chamber. Humidity is preferably applied to the HOPG to produce a film of water across the surface of the DNA sample. Electrical voltage is also applied to the HOPG to create potential energy for the etching process. After the etching is completed, the reaction area is typically rinsed with deionized water.