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公开(公告)号：US20230044748A1
公开(公告)日：2023-02-09
申请号：US17965158
申请日：2022-10-13
发明人： Yi LU , Xiaosong LIU , Keqiang LI
IPC分类号： C25D21/06
摘要： This application relates to a filtering mechanism and a device for producing a conductive material, where the filtering mechanism includes a filtering body, a cover, and a supporting member. The filtering body includes an accommodating cavity for accommodating an electroplating material and an opening provided on the filtering body; the cover is configured to cover the opening and connect to the filtering body to enclose the electroplating material in the filtering body; and the supporting member is provided on the cover to enhance connection strength between the cover and the filtering body.
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公开(公告)号：US20240282975A1
公开(公告)日：2024-08-22
申请号：US18638617
申请日：2024-04-17
发明人： Keqiang LI , Xiaosong LIU , Zhiyang WU , Yi LU
IPC分类号： H01M4/66
摘要： A device for preparing a current collector assembly includes: a first feeding apparatus configured to provide a transfer film, the transfer film having a base layer and a metal layer formed thereon; a second feeding apparatus configured to provide a bottom film, the bottom film having a first surface and a second surface opposite to the first surface; a coating apparatus configured to applying an adhesive on the first surface to obtain a base film; and a transfer apparatus configured to transfer the metal layer to the base film to obtain the current collector assembly.
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公开(公告)号：US20240088362A1
公开(公告)日：2024-03-14
申请号：US18518068
申请日：2023-11-22
发明人： Zhiyang WU , Changsheng HE , Keqiang LI , Xiaosong LIU
IPC分类号： H01M4/36 , H01M50/209 , H01M50/211
CPC分类号： H01M4/366 , H01M50/209 , H01M50/211 , H01M2220/20
摘要： An electrode plate, an electrode assembly, and a secondary battery are provided. The electrode plate includes a current collector, an active material layer arranged on one surface of the current collector, and an electrical connection member electrically connected to the current collector. The active material layer is arranged on a main body portion of the current collector, the electrical connection member and the current collector are connected to each other by welding at an edge of the current collector, the welding connection region is referred to as a transfer welding region, and the current collector includes a support layer and an electrically conductive layer arranged on one surface of the support layer. The electrode plate further includes a first insulation layer arranged on a further surface of the current collector and covering at least the entirety of the transfer welding region when viewed in a thickness direction of the electrode plate.
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公开(公告)号：US20240272562A1
公开(公告)日：2024-08-15
申请号：US18644211
申请日：2024-04-24
发明人： Xiaosong LIU , Keqiang LI , Zhiyang WU , Yi LU
CPC分类号： G03F7/70991 , B08B3/02 , C25F3/14 , G03F7/168 , G03F7/7075 , B08B2203/02 , H01M4/70
摘要： A substrate treatment apparatus, comprising: a coating device configured to coat a substrate, which is conveyed at a first speed in a feeding direction, with a material; a drying device configured to receive the substrate, which is coated by means of the coating device, at the first speed and dry the material; an exposure device configured to receive the substrate, which is dried by means of the drying device, at the first speed and continuously convey a mask at the first speed in the feeding direction, the mask being used for regional shading during exposure of the material by means of the exposure device; and an etching device configured to receive the substrate, which is exposed by means of the exposure device, at the first speed and etch the material and a portion of the substrate in an unexposed region of the substrate.
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公开(公告)号：US20240264541A1
公开(公告)日：2024-08-08
申请号：US18612799
申请日：2024-03-21
发明人： Xiaosong LIU , Keqiang LI , Zhiyang WU , Yi LU
CPC分类号： G03F7/70808 , G03F7/2002 , G03F7/2032 , G03F7/7005 , G03F7/7055 , G03F7/70733
摘要： An exposure apparatus includes a conveying mechanism and an exposure mechanism. The conveying mechanism is configured to convey a substrate, a surface of the substrate being coated with photoresist. The exposure mechanism includes an exposure source and an exposure member. The exposure source is configured to provide light to the substrate. The exposure member includes an exposure section opposite the substrate, where the exposure section is located between the exposure source and the substrate and disposed in close proximity to the substrate, the exposure section has a light-transmitting portion that allows light to be incident on the substrate and a light-shielding portion that prevents light from being incident on the substrate, and the exposure section is configured to keep the light-transmitting portion and the light-shielding portion in synchronized movement with the substrate.
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