Method of forming monolithic CMOS-MEMS hybrid integrated, packaged structures
    8.
    发明授权
    Method of forming monolithic CMOS-MEMS hybrid integrated, packaged structures 失效
    形成单片CMOS-MEMS混合集成封装结构的方法

    公开(公告)号:US08101469B2

    公开(公告)日:2012-01-24

    申请号:US12732689

    申请日:2010-03-26

    Abstract: A method of forming Monolithic CMOS-MEMS hybrid integrated, packaged structures includes the steps of providing: providing at least one semiconductor substrate having a CMOS device area including dielectric layers and metallization layers; applying at least one protective layer overlying the CMOS device area; forming at least one opening on the protective layer and patterning the dielectric and metallization layers to access the semiconductor substrate; forming at least one opening on the semiconductor substrate by etching the dielectric and metallization layers; applying at least one filler layer in the at least one opening on the semiconductor substrate; positioning at least one chip on the filler layer, the chip including a prefabricated front face and a bare backside; applying a first insulating layer covering the front face of the chip providing continuity from the semiconductor substrate to the chip; forming at least one via opening on the insulating layer covering the chip to access at least one contact area; applying at least one metallization layer overlying the insulating layer on the substrate and the chip connecting the metallization layer on the substrate to the at least one another contact area on the chip; applying a second insulating layer overlying the metallization layer on the at least one chip; applying at least one interfacial layer; applying at least one rigid substrate overlying the interfacial layer; and applying at least one secondary protective layer overlying the rigid substrate.

    Abstract translation: 一种形成单片CMOS-MEMS混合集成封装结构的方法包括以下步骤:提供至少一个具有包括电介质层和金属化层的CMOS器件区域的半导体衬底; 施加覆盖在CMOS器件区域上的至少一个保护层; 在所述保护层上形成至少一个开口,并且对所述电介质层和金属化层进行图形化以进入所述半导体衬底; 通过蚀刻所述电介质层和金属化层在所述半导体衬底上形成至少一个开口; 在所述半导体衬底上的所述至少一个开口中施加至少一个填充层; 将至少一个芯片定位在填充层上,该芯片包括预制的正面和裸露的背面; 施加覆盖芯片前表面的第一绝缘层,从半导体衬底到芯片提供连续性; 在覆盖芯片的绝缘层上形成至少一个通孔,以进入至少一个接触区域; 施加覆盖在所述衬底上的所述绝缘层上的至少一个金属化层和将所述衬底上的所述金属化层连接到所述芯片上的所述至少另一个接触区域中的所述芯片; 在所述至少一个芯片上施加覆盖所述金属化层的第二绝缘层; 施加至少一个界面层; 施加覆盖在界面层上的至少一个刚性基材; 以及施加覆盖在刚性基材上的至少一个二次保护层。

Patent Agency Ranking