Abstract:
A circuit for aligning input signals includes a clock generating circuit (CGC) responsive to first signal and second signal to generate a clock signal. A first flip flop and a second flip flop, coupled to the CGC, are responsive to first type of edge of the clock signal to output the first signal and the second signal. A finite state machine (FSM), coupled to the CGC, the first flip flop and the second flip flop, is responsive to second type of edge of the clock signal to detect early arrival of one of the first signal and the second signal with respect to each other, and to generate first control signal and second control signal. A first programmable delay element and a second programmable delay element, coupled to the FSM, delays first input signal based on the first control signal and second input signal based on the second control signal.
Abstract:
A complementary metal-oxide semiconductor output driver provides a differential output signal having a particular differential voltage swing and a particular common mode voltage to a differential output node for various types of load circuits coupled to the differential output node. The load circuit may have any impedance within a particular impedance range. A current source provides a current with a variable current component that adjusts the differential voltage swing of the differential output signal. A common mode feedback circuit adjusts the common mode voltage of the differential output signal by sourcing current to the differential output node or sinking current from the differential output node. At least a portion of a current flowing into a load circuit coupled to the differential node is provided by the current source, thereby reusing current from the current source.
Abstract:
Compound semiconductor bodies are formed by bonding a layer of supporting material to the two opposite faces of a semiconductor wafer and then cutting the semiconductor wafer into two parts in a plane parallel to said faces. The cut surface of each part is then polished.
Abstract:
A bistable semiconductor component for high frequencies with a semiconductor chip includes a sequence of at least four zones of alternating opposed types of conductivity. The outer zones form the emitter zones and are more heavily doped than the two inner zones. The base zones are so doped that with a voltage V.sub.R smaller than or at most equal to the maximum inverse voltage V.sub.RS applied in the reverse direction across the two emitter zones, the shortest distance W between the two blocking layers formed at the two outer junctions is less than the diffusion length L.sub.B of the charge carriers in the base zones.
Abstract:
Semiconductor material stress sensors are provided where the sensing resistors therein have good electrical stability while being sufficiently protected without degrading sensor performance. This is accomplished through control of the locations of the maximum concentrations of the resistor dopant.
Abstract:
Substrate tensile stresses resulting from the combination of an electroplated gold or silver heat sink with a metal contact on III-V semiconductor devices, such as GaAs IMPATT diodes, may be substantially compensated by interposing a layer of tungsten under compressive stress between the contact layer and the heat sink. Since gold or silver is not easily plated on tungsten, a thin layer of platinum is deposited over the tungsten layer prior to forming the heat sink.
Abstract:
A resistive connecting contact for a silicon semiconductor component comprises, on the semiconductor body, a layer sequence platinum silicide-titanium-molybdenum-gold. The invention also includes a method of making such a connecting contact.
Abstract:
The device comprises a plurality of side by side transistor cells individually connected by a plurality of lead wires in a side-by-side lead wire array having a central axis. For reducing the effects of variations of mutual inductance among the various lead wires, and for providing a more uniform temperature from cell to cell, the individual lead wires are designed to have a self-inductance the magnitude of which is directly related to the distance of the particular lead wire from the central axis.
Abstract:
A protective layer for use in the manufacture of semiconductor devices and circuits and for thereafter protecting and passivating the devices comprising a combination of silicon, oxygen and nitrogen in selected atomic proportions.
Abstract:
A semiconductor device wherein a beam lead connected to each wiring layer is all formed on a silicon nitride film of a semiconductor wafer surface in a semiconductor device having a multilayer wiring structure on a semiconductor basic board.